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21. 发明授权

US06394797B1 Substrate temperature control system and method for controlling temperature of substrate 失效
标题翻译：基板温度控制系统及控制基板温度的方法
公开(公告)号：US06394797B1
公开(公告)日：2002-05-28
申请号：US09526460
申请日：2000-03-16
申请人： Masakazu Sugaya , Fumio Murai , Yutaka Kaneko , Masafumi Kanetomo , Shigeki Hirasawa , Tomoji Watanabe , Tatuharu Yamamoto , Katsuhiro Kuroda
发明人： Masakazu Sugaya , Fumio Murai , Yutaka Kaneko , Masafumi Kanetomo , Shigeki Hirasawa , Tomoji Watanabe , Tatuharu Yamamoto , Katsuhiro Kuroda
IPC分类号： F27D500
CPC分类号： H01L21/67103 , H01L21/67248
摘要： To provide a substrate temperature control system capable of unifying the temperature of the substrate and capable of shortening the temperature elevation time (temperature lowering time), the substrate temperature control system is equipped with a temperature control plate (heating or cooling plate) having a plurality of projections on its surface and acting to set the temperature of the substrate. A chuck mechanism is provided to fix the substrate in contact with a plurality of the projections by chucking the substrate toward the temperature control plate.
摘要翻译：为了提供能够统一基板的温度并且能够缩短升温时间（降温时间）的基板温度控制系统，基板温度控制系统配备有具有多个温度控制板（加热或冷却板）的表面上的突起并用于设定基板的温度。提供卡盘机构，通过将基板夹持到温度控制板来固定基板与多个突起接触。

22. 发明授权

US5256454A Method for suppression of electrification 失效
标题翻译：抑制电气化的方法
公开(公告)号：US5256454A
公开(公告)日：1993-10-26
申请号：US707819
申请日：1991-05-30
申请人： Fumio Murai , Yasunori Suzuki , Hideki Tomozawa , Ryuma Takashi , Yoshihiro Saida , Yoshiaki Ikenoue
发明人： Fumio Murai , Yasunori Suzuki , Hideki Tomozawa , Ryuma Takashi , Yoshihiro Saida , Yoshiaki Ikenoue
IPC分类号： G21K5/04 , C09D5/24 , G03F7/038 , G03F7/09 , G03F7/11 , G03F7/20 , H01J37/305 , H01J37/317 , H01L21/027 , H01L21/265 , H01L21/266 , H01L21/66 , B05D3/06
CPC分类号： G03F7/2059 , G03F7/093 , Y10T428/31504
摘要： Electrification is suppressed with a water-soluble electrification-suppressing film having an electron conductivity and comprising a polymer resin. A high electrification-suppressing effect which is also high in vacuum can be easily obtained by using the electrification-suppressing film with less contamination.

23. 发明授权

US5149975A Pattern fabrication method using a charged particle beam and apparatus for realizing same 失效
标题翻译：使用带电粒子束的图案制造方法及其实现装置
公开(公告)号：US5149975A
公开(公告)日：1992-09-22
申请号：US647562
申请日：1991-01-29
申请人： Haruo Yoda , Fumio Murai
发明人： Haruo Yoda , Fumio Murai
IPC分类号： G03F7/20 , H01J37/302 , H01L21/027 , H01L21/30
CPC分类号： H01J37/3026 , H01J2237/31769
摘要： The present application relates to a method and an apparatus for forming a pattern, in which a plane on which a pattern on a sample is traced is decomposed into predetermined partial regions; the pattern density in each of the partial regions is stored in data storing means as pattern density map data; and the irradiation energy amount of a charged particle beam is corrected on the basis of the pattern density map data to correct shortage and excess in the exposure dose due to roughness and fineness of the the pattern, i.e. the proximity effect. Further, the present application relates to a method and an apparatus for forming a pattern, in which when one or a plurality of layers located under the layer on which the pattern should be formed have patterns, influences of the underlayers on the proximity effect are taken into account.
摘要翻译：本申请涉及一种用于形成图案的方法和装置，其中将跟踪样本上的图案的平面分解成预定的部分区域; 每个部分区域中的图案密度作为图案密度图数据存储在数据存储装置中; 并且基于图案密度图数据校正带电粒子束的照射能量，以校正由于图案的粗糙度和细度，即邻近效应引起的曝光剂量的不足和过剩。此外，本申请涉及用于形成图案的方法和装置，其中当位于其上应形成图案的层下面的一个或多个层具有图案时，取下底层对邻近效应的影响考虑到

24. 发明授权

US06964832B2 Semiconductor device and manufacturing method thereof 失效
标题翻译：半导体装置及其制造方法
公开(公告)号：US06964832B2
公开(公告)日：2005-11-15
申请号：US10374096
申请日：2003-02-27
申请人： Akemi Moniwa , Jiro Yamamoto , Fumio Murai , Hiroshi Fukuda
发明人： Akemi Moniwa , Jiro Yamamoto , Fumio Murai , Hiroshi Fukuda
IPC分类号： G03F1/20 , G03F1/68 , G03F7/20 , H01L21/027 , G03F9/00 , G03C5/00
CPC分类号： G03F1/20 , H01J2237/31794 , Y10S430/143
摘要： A method is provided for solving a problem that the fine processing property is degraded by an increase of a current applied to complementarily divided masks in an electron beam projection process. In the method, the complementarily divided masks used for electron projection are used whereby one mask is used for patterns requiring high dimensional accuracy and another is used for other patterns. Consequently, it is possible to lower the current applied to the patterns requiring high dimensional accuracy to realize high printing accuracy. In addition, the highly accurate patterns can be formed at a high throughput.
摘要翻译：提供了一种解决在电子束投影处理中通过施加到互补分割掩模的电流的增加而使精细加工性能劣化的问题的方法。在该方法中，使用用于电子投影的互补分割的掩模，其中一个掩模用于需要高尺寸精度的图案，另一个掩模用于其它图案。因此，可以降低施加到需要高尺寸精度的图案的电流，以实现高的打印精度。此外，可以以高产量形成高精度图案。

25. 发明授权

US5589270A Processed substrate obtained by a process for effecting suppression of electrification 失效
标题翻译：通过抑制电气化的方法获得的加工底物
公开(公告)号：US5589270A
公开(公告)日：1996-12-31
申请号：US456313
申请日：1995-06-01
申请人： Fumio Murai , Yasunori Suzuki , Hideki Tomozawa , Ryuma Takashi , Yoshihiro Saida , Yoshiaki Ikenoue
发明人： Fumio Murai , Yasunori Suzuki , Hideki Tomozawa , Ryuma Takashi , Yoshihiro Saida , Yoshiaki Ikenoue
IPC分类号： G21K5/04 , C09D5/24 , G03F7/038 , G03F7/09 , G03F7/11 , G03F7/20 , H01J37/305 , H01J37/317 , H01L21/027 , H01L21/265 , H01L21/266 , H01L21/66 , B32B9/04
CPC分类号： G03F7/2059 , G03F7/093 , Y10T428/31504
摘要： Electrification is suppressed with a water-soluble electrification-suppressing film having an electron conductivity and comprising a polymer resin. A high electrification-suppressing effect which is also high in vacuum can be easily obtained by using the electrification-suppressing film with less contamination.
摘要翻译：用具有电子传导性并包含聚合物树脂的水溶性带电抑制膜抑制电化。通过使用污染少的带电抑制膜，可以容易地获得真空中高的高电气化抑制效果。

26. 发明授权

US5317168A Superconducting field effect transistor 失效
标题翻译：超导场效应晶体管
公开(公告)号：US5317168A
公开(公告)日：1994-05-31
申请号：US978454
申请日：1992-11-19
申请人： Toshikazu Nishino , Ushio Kawabe , Fumio Murai , Tokuo Kure , Mutsuko Hatano , Haruhiro Hasegawa
发明人： Toshikazu Nishino , Ushio Kawabe , Fumio Murai , Tokuo Kure , Mutsuko Hatano , Haruhiro Hasegawa
IPC分类号： H01L29/43 , H01L39/22
CPC分类号： H01L29/437
摘要： A superconducting field effect transistor which is very small in size and high in dimensional accuracy, has a first layer of material forming a control electrode and a second layer of another material is disposed on said first layer. A width of said first layer in a direction toward a superconducting source electrode and a superconducting drain electrode is narrower than a width of the second layer in the same direction. Polycrystalline silicon may be used as the control electrode while the second layer can be made of silicon nitride. Furthermore, a side surface of the control electrode may be coated with an insulator film. Accordingly, the above transistor has a fine structure gate electrode part that can be fabricated easily and accurately.
摘要翻译：尺寸非常小，尺寸精度高的超导场效应晶体管具有形成控制电极的第一层材料，另一材料的第二层设置在所述第一层上。所述第一层在朝向超导源电极和超导漏电极的方向上的宽度比相同方向上的第二层的宽度窄。多晶硅可以用作控制电极，而第二层可以由氮化硅制成。此外，控制电极的侧表面可以涂覆有绝缘膜。因此，上述晶体管具有可以容易且精确地制造的精细结构的栅电极部。

27. 发明授权

US5250812A Electron beam lithography using an aperture having an array of repeated unit patterns 失效
标题翻译：使用具有重复单元图案阵列的孔的电子束光刻
公开(公告)号：US5250812A
公开(公告)日：1993-10-05
申请号：US858868
申请日：1992-03-27
申请人： Fumio Murai , Shinji Okazaki , Haruo Yoda , Yukinobu Shibata , Akira Tsukizoe
发明人： Fumio Murai , Shinji Okazaki , Haruo Yoda , Yukinobu Shibata , Akira Tsukizoe
IPC分类号： H01J37/317 , H01J37/04
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31769 , H01J2237/31776
摘要： An electron beam lithography apparatus is disclosed which has an aperture plate provided with an aperture including an array of repeated unit patterns and an ordinary aperture of a rectangular shape. A region free of the influence of a proximity effect is delineated using the former aperture, and a region affected by the proximity effect is delineated using the latter aperture. The number of repeated unit patterns included in the former aperture is determined considering the number of repeated unit patterns included in a pattern array to be delineated on a substrate. Thereby, the number of electron beam shots is reduced. A plurality of apertures having slightly different aperture widths may be provided for always keeping a pattern line width constant.
摘要翻译：公开了一种电子束光刻设备，其具有设置有包括重复单元图案阵列和矩形形状的普通孔径的孔的孔板。使用前一个孔径来描绘没有接近效应的影响的区域，并且使用后一个孔来描绘受邻近效应影响的区域。考虑包括在衬底上要描绘的图案阵列中的重复单位图案的数量来确定包括在前一孔径中的重复单位图案的数量。因此，电子束拍摄的数量减少。可以提供具有略微不同的孔径宽度的多个孔，以始终保持图案线宽度恒定。

28. 发明授权

US5061599A Radiation sensitive materials 失效
标题翻译：辐射敏感材料
公开(公告)号：US5061599A
公开(公告)日：1991-10-29
申请号：US462856
申请日：1990-01-05
申请人： Tetsuichi Kudo , Akira Ishikawa , Hiroshi Okamoto , Katsuki Miyauchi , Takao Iwayanagi , Fumio Murai , Shinji Okazaki
发明人： Tetsuichi Kudo , Akira Ishikawa , Hiroshi Okamoto , Katsuki Miyauchi , Takao Iwayanagi , Fumio Murai , Shinji Okazaki
IPC分类号： G03F7/004
CPC分类号： G03F7/0042
摘要： A radiation-sensitive material comprising a polyacid composed of tungsten and niobium, titanium and/or tantalum. A uniform film can be formed by an easy spin coating method. The polyacid has a radiation sensitivity higher than that of a polyacid comprising only tungsten.
摘要翻译：一种辐射敏感材料，包括由钨和铌组成的多元酸，钛和/或钽。可以通过简单的旋涂法形成均匀的膜。多酸的辐射灵敏度高于仅含钨的多酸的辐射敏感性。

29. 发明授权

US06709880B2 Semiconductor device and a manufacturing method of the same 失效
标题翻译：半导体装置及其制造方法
公开(公告)号：US06709880B2
公开(公告)日：2004-03-23
申请号：US10171769
申请日：2002-06-17
申请人： Jiro Yamamoto , Fumio Murai , Tsuneo Terasawa , Tosiyuki Yamamoto
发明人： Jiro Yamamoto , Fumio Murai , Tsuneo Terasawa , Tosiyuki Yamamoto
IPC分类号： H01L2100
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/7045 , H01J37/3174 , H01J2237/31757
摘要： There is disclosed a method for forming micro patterns in a semiconductor integrated circuit device with high productivity and high accuracy. A photolithography having high throughput and electron beam lithography using a reticle and having relatively high throughput and high resolution are selectively used so as to obtain highest throughput while satisfying accuracy and resolution required for each product/layer. In the case of using the electron beam lithography, a non-complementary reticle and a complementary reticle are selectively used so as to obtain highest throughput while satisfying required accuracy and resolution. Thus, productivity and integration can be improved for the semiconductor integrated circuit device.
摘要翻译：公开了一种以高生产率和高精度在半导体集成电路器件中形成微图案的方法。选择性地使用具有高通量和使用掩模版并且具有相对高的通量和高分辨率的电子束光刻的光刻，以便在满足每个产品/层所需的精度和分辨率的同时获得最高的吞吐量。在使用电子束光刻的情况下，选择性地使用非互补掩模版和互补掩模版，以便在满足所需精度和分辨率的同时获得最高的吞吐量。因此，可以提高半导体集成电路器件的生产率和集成度。

30. 发明授权

US06518548B2 Substrate temperature control system and method for controlling temperature of substrate 失效
公开(公告)号：US06518548B2
公开(公告)日：2003-02-11
申请号：US10084378
申请日：2002-02-28
申请人： Masakazu Sugaya , Fumio Murai , Yutaka Kaneko , Masafumi Kanetomo , Shigeki Hirasawa , Tomoji Watanabe , Tatuharu Yamamoto , Katsuhiro Kuroda
发明人： Masakazu Sugaya , Fumio Murai , Yutaka Kaneko , Masafumi Kanetomo , Shigeki Hirasawa , Tomoji Watanabe , Tatuharu Yamamoto , Katsuhiro Kuroda
IPC分类号： H05B368
CPC分类号： H01L21/67103 , H01L21/67248
摘要： So as to provide a substrate temperature control system capable of unifying the temperature of the substrate and capable of shortening the temperature elevation time (temperature lowering time), the substrate temperature control system is equipped with a temperature control plate (heating or cooling plate) having a plurality of projections on the surface and serving to set the temperature of the substrate, and a chuck mechanism to fix the substrate in contact to a plurality of the projections by chucking the substrate toward the direction of the temperature control plate.

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