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21. 发明申请

US20070188729A1 Projection Lens for a Microlithographic Projection Exposure Apparatus 审中-公开
标题翻译：用于微光刻投影曝光装置的投影透镜
公开(公告)号：US20070188729A1
公开(公告)日：2007-08-16
申请号：US11738935
申请日：2007-04-23
申请人： Hans-Jurgen Mann , Wolfgang Singer
发明人： Hans-Jurgen Mann , Wolfgang Singer
IPC分类号： G03B27/54
CPC分类号： G03F7/70233 , G02B5/005 , G02B17/0657 , G03F7/7025
摘要： A projection lens for a EUV microlithographic projection exposure apparatus comprises a diaphragm (BL) which is arranged at a distance (D) in front of a mirror (S2) of the lens. The diaphragm (BL) has a non-round aperture with an edge contour that may be configured such two rays of a light bundle disposed symmetrically with respect to a chief ray are treated equally, i.e. either both rays pass through the diaphragm aperture or both are blocked by the diaphragm.
摘要翻译：用于EUV微光刻投影曝光装置的投影透镜包括在透镜的反射镜（S 2）的前方设置有距离（D）的光阑（BL）。隔膜（BL）具有非圆形孔口，其边缘轮廓可以被配置为相对于主射线对称设置的两束光束被均等地对待，即两条光线通过隔膜孔径或两者都是被隔膜封闭

22. 发明授权

US07190530B2 Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 有权
标题翻译：投影物镜包括多个镜子，前视镜M3
公开(公告)号：US07190530B2
公开(公告)日：2007-03-13
申请号：US11356525
申请日：2006-02-16
申请人： Hans-Jurgen Mann , Russell Hudyma , Alexander Epple
发明人： Hans-Jurgen Mann , Russell Hudyma , Alexander Epple
IPC分类号： G02B17/00
CPC分类号： G02B17/0892 , G02B17/0844 , G02B17/0856 , G03F7/70225
摘要： According to one exemplary embodiment, a projection objective is provided and includes at least two non-planar (curved) mirrors, wherein an axial distance between a next to last non-planar mirror and a last non-planar mirror, as defined along a light path, is greater than an axial distance between the last non-planar mirror and a first refracting surface of lenses following in the light path. In one exemplary embodiment, the first refracting surface is associated with a single pass type lens. The present objectives form images with numerical apertures of at least about 0.80 or higher, e.g., 0.95. Preferably, the objective does not include folding mirrors and there is no intermediate image between the two mirrors, as well as the pupil of the objective being free of obscuration.
摘要翻译：根据一个示例性实施例，提供了一种投影物镜，并且包括至少两个非平面（弯曲）反射镜，其中，沿着光线定义的下一个至最后的非平面镜与最后的非平面镜之间的轴向距离路径大于最后的非平面镜与在光路中跟随的透镜的第一折射表面之间的轴向距离。在一个示例性实施例中，第一折射表面与单遍型透镜相关联。当前目标形成具有至少约0.80或更高（例如0.95）的数值孔径的图像。优选地，该目的不包括折叠反射镜，并且在两个反射镜之间不存在中间图像，以及物镜的瞳孔没有遮蔽。

23. 发明申请

US20060215272A1 Objective in a microlithographic projection exposure apparatus 审中-公开
标题翻译：目的在微光刻投影曝光装置
公开(公告)号：US20060215272A1
公开(公告)日：2006-09-28
申请号：US11443077
申请日：2006-05-31
申请人： Toralf Gruner , Hans-Jurgen Mann
发明人： Toralf Gruner , Hans-Jurgen Mann
IPC分类号： G02B3/00
CPC分类号： G02B27/286 , G02B13/14 , G02B17/08 , G02B17/0892 , G03F7/70191 , G03F7/70225 , G03F7/70566
摘要： An objective in a microlithographic projection exposure apparatus has a first optical element that has polarization dependent properties causing intensity fluctuations in an image plane of the objective. These fluctuations may be produced by a second optical element that is arranged downstream of the first optical element. A gray filter disposed in the beam path reduces the intensity fluctuations.
摘要翻译：微光刻投影曝光装置中的目的是具有第一光学元件，该第一光学元件具有导致物镜的图像平面中的强度波动的偏振相关特性。这些波动可以由布置在第一光学元件的下游的第二光学元件产生。布置在光束路径中的灰色滤光器减小了强度波动。

24. 发明申请

US20050036213A1 Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 失效
标题翻译：投影物镜包括多个镜子，前视镜M3
公开(公告)号：US20050036213A1
公开(公告)日：2005-02-17
申请号：US10639780
申请日：2003-08-12
申请人： Hans-Jurgen Mann , Russell Hudyma , Alexander Epple
发明人： Hans-Jurgen Mann , Russell Hudyma , Alexander Epple
IPC分类号： G02B17/08 , G03F7/20 , G02B17/00
CPC分类号： G02B17/0892 , G02B17/0844 , G02B17/0856 , G03F7/70225
摘要： According to one exemplary embodiment, a projection objective is provided and includes at least two non-planar (curved) mirrors, wherein an axial distance between a next to last non-planar mirror and a last non-planar mirror, as defined along a light path, is greater than an axial distance between the last non-planar mirror and a first refracting surface of lenses following in the light path. In one exemplary embodiment, the first refracting surface is associated with a single pass type lens. The present objectives form images with numerical apertures of at least about 0.80 or higher, e.g., 0.95. Preferably, the objective does not include folding mirrors and there is no intermediate image between the two mirrors, as well as the pupil of the objective being free of obscuration.
摘要翻译：根据一个示例性实施例，提供了一种投影物镜，并且包括至少两个非平面（弯曲）反射镜，其中在沿着光线定义的下一个至最后的非平面镜与最后的非平面镜之间的轴向距离路径大于最后的非平面镜与在光路中跟随的透镜的第一折射表面之间的轴向距离。在一个示例性实施例中，第一折射表面与单遍型透镜相关联。当前目标形成具有至少约0.80或更高（例如0.95）的数值孔径的图像。优选地，该目的不包括折叠反射镜，并且在两个反射镜之间不存在中间图像，以及物镜的瞳孔没有遮蔽。

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