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21. 发明授权

US08168976B2 Display panel and method for manufacturing the same 有权
标题翻译：显示面板及其制造方法
公开(公告)号：US08168976B2
公开(公告)日：2012-05-01
申请号：US12576840
申请日：2009-10-09
申请人： Chih-Hung Shih , Chih-Chun Yang , Ming-Yuan Huang
发明人： Chih-Hung Shih , Chih-Chun Yang , Ming-Yuan Huang
IPC分类号： H01L29/04
CPC分类号： H01L27/12 , H01L21/76838 , H01L27/124 , H01L27/1288
摘要： A display panel includes a substrate having a display area and a blank area. The blank area includes at least one of a non-metal line region and a metal-line region. The non-metal line region includes a plurality of insulating patterns and a first conductive pattern layer formed on the substrate. The insulating patterns are isolated from each other by the first conductive pattern layer. The metal-line region includes an insulating multilayer formed on the substrate and a conductive pattern layer formed on the insulating multilayer. Several isolated zones are formed by the conductive pattern layer on the surface of the insulating multilayer.
摘要翻译：显示面板包括具有显示区域和空白区域的基板。空白区域包括非金属线区域和金属线区域中的至少一个。非金属线区域包括多个绝缘图案和形成在基板上的第一导电图案层。绝缘图案通过第一导电图案层彼此隔离。金属线区域包括形成在基板上的绝缘层和形成在绝缘层上的导电图案层。由绝缘多层的表面上的导电图案层形成几个隔离区。

22. 发明授权

US08012815B2 Array substrate and method for fabricating thereof 有权
标题翻译：阵列基板及其制造方法
公开(公告)号：US08012815B2
公开(公告)日：2011-09-06
申请号：US12837787
申请日：2010-07-16
申请人： Chih-Hung Shih , Ming-Yuan Huang , Chih-Chun Yang
发明人： Chih-Hung Shih , Ming-Yuan Huang , Chih-Chun Yang
IPC分类号： H01L21/84
CPC分类号： H01L21/268 , H01L27/124 , H01L27/1248 , H01L27/1255
摘要： The invention provides a method for manufacturing an array substrate utilizing a laser ablation process. A conductive layer can be selectively patterned by the laser ablation process without a photo mask due to different adhesions between the conductive layer and other materials. The patterned conductive layer thus formed adjoins an inorganic passivation layer to provide a substantially continuous surface.
摘要翻译：本发明提供一种使用激光烧蚀工艺制造阵列基板的方法。由于导电层和其它材料之间的不同粘附，可以通过激光烧蚀工艺来选择性地构图导电层，而不需要光掩膜。如此形成的图案化导电层与无机钝化层相邻以提供基本连续的表面。

23. 发明授权

US07663145B2 Display panel and method for manufacturing the same 有权
标题翻译：显示面板及其制造方法
公开(公告)号：US07663145B2
公开(公告)日：2010-02-16
申请号：US11727448
申请日：2007-03-27
申请人： Chih-Hung Shih , Chih-Chun Yang , Ming-Yuan Huang
发明人： Chih-Hung Shih , Chih-Chun Yang , Ming-Yuan Huang
IPC分类号： H01L29/04
CPC分类号： H01L27/12 , H01L21/76838 , H01L27/124 , H01L27/1288
摘要： A display panel includes a substrate having a display area and a blank area. The blank area includes at least one of a non-metal line region and a metal-line region. The non-metal line region includes a plurality of insulating patterns and a first conductive pattern layer formed on the substrate. The insulating patterns are isolated from each other by the first conductive pattern layer. The metal-line region includes an insulating multilayer formed on the substrate and a conductive pattern layer formed on the insulating multilayer. Several isolated zones are formed by the conductive pattern layer on the surface of the insulating multilayer.
摘要翻译：显示面板包括具有显示区域和空白区域的基板。空白区域包括非金属线区域和金属线区域中的至少一个。非金属线区域包括多个绝缘图案和形成在基板上的第一导电图案层。绝缘图案通过第一导电图案层彼此隔离。金属线区域包括形成在基板上的绝缘层和形成在绝缘层上的导电图案层。由绝缘多层的表面上的导电图案层形成几个隔离区。

24. 发明申请

US20080176346A1 METHOD FOR MANUFACTURING PIXEL STRUCTURE 有权
标题翻译：制造像素结构的方法
公开(公告)号：US20080176346A1
公开(公告)日：2008-07-24
申请号：US11942732
申请日：2007-11-20
申请人： Chih-Hung Shih , Chih-Chun Yang , Ming-Yuan Huang
发明人： Chih-Hung Shih , Chih-Chun Yang , Ming-Yuan Huang
IPC分类号： H01L33/00
CPC分类号： H01L27/1288 , G02F1/136227 , H01L27/1214 , H01L27/3248 , H01L51/5206 , H01L51/56 , H01L2227/323
摘要： A method for manufacturing a pixel structure includes providing a substrate having an active device thereon and forming a dielectric layer covering the active device. Then, an uneven first photoresist layer having an opening is formed over the active device. After an etching process is implemented to form a contact hole in the dielectric layer through said opening, a thickness of the first photoresist layer is reduced so as to expose a portion of the dielectric layer. A transparent conductive layer covering the exposed dielectric layer and the remained first photoresist layer is formed and electrically connected to the active device via the contact hole. Thereafter, the transparent conductive layer on the remained first photoresist layer is removed, while the transparent conductive layer on the exposed dielectric layer forms a pixel electrode. Then, the remained first photoresist layer is removed. With fewer photomasks, the method reduces the manufacturing costs.
摘要翻译：一种用于制造像素结构的方法包括提供其上具有有源器件的衬底，并形成覆盖有源器件的介电层。然后，在有源器件上形成具有开口的不均匀的第一光致抗蚀剂层。在通过所述开口实现在电介质层中形成接触孔的蚀刻工艺之后，减小第一光致抗蚀剂层的厚度以暴露电介质层的一部分。覆盖暴露的电介质层和残留的第一光致抗蚀剂层的透明导电层被形成并经由接触孔与有源器件电连接。此后，去除残留的第一光致抗蚀剂层上的透明导电层，而暴露的电介质层上的透明导电层形成像素电极。然后，除去残留的第一光致抗蚀剂层。使用较少的光掩模，该方法降低了制造成本。

25. 发明申请

US20100285623A1 Array Substrate and Method for Fabricating Thereof 有权
标题翻译：阵列基板及其制造方法
公开(公告)号：US20100285623A1
公开(公告)日：2010-11-11
申请号：US12837787
申请日：2010-07-16
申请人： Chih-Hung Shih , Ming-Yuan Huang , Chih-Chun Yang
发明人： Chih-Hung Shih , Ming-Yuan Huang , Chih-Chun Yang
IPC分类号： H01L21/28
CPC分类号： H01L21/268 , H01L27/124 , H01L27/1248 , H01L27/1255
摘要： The invention provides a method for manufacturing an array substrate utilizing a laser ablation process. A conductive layer can be selectively patterned by the laser ablation process without a photo mask due to different adhesions between the conductive layer and other materials. The patterned conductive layer thus formed adjoins an inorganic passivation layer to provide a substantially continuous surface.
摘要翻译：本发明提供一种使用激光烧蚀工艺制造阵列基板的方法。由于导电层和其它材料之间的不同粘附，可以通过激光烧蚀工艺来选择性地构图导电层，而不需要光掩膜。如此形成的图案化导电层与无机钝化层相邻以提供基本连续的表面。

26. 发明申请

US20090104722A1 METHOD FOR MANUFACTURING PIXEL STRUCTURE 有权
标题翻译：制造像素结构的方法
公开(公告)号：US20090104722A1
公开(公告)日：2009-04-23
申请号：US12342026
申请日：2008-12-22
申请人： Chih-Hung Shih , Chih-Chun Yang , Ming-Yuan Huang
发明人： Chih-Hung Shih , Chih-Chun Yang , Ming-Yuan Huang
IPC分类号： H01L21/77
CPC分类号： H01L27/1288 , G02F1/136227 , H01L27/1214 , H01L27/3248 , H01L51/5206 , H01L51/56 , H01L2227/323
摘要： A method for manufacturing a pixel structure includes providing a substrate having an active device thereon and forming a dielectric layer covering the active device. The dielectric layer has a contact hole disposed over the active device. Next, a first photoresist layer is formed on the dielectric layer over the active device, and a transparent conductive layer is formed to cover a portion of the dielectric layer and the first photoresist layer. The transparent conductive layer is electrically connected to the active device via the contact hole. Besides, the transparent conductive layer is irradiated with use of a laser beam, and a portion of the transparent conductive layer on the first photoresist layer is removed, such that the other portion of the transparent conductive layer on the portion of the dielectric layer forms a pixel electrode. The first patterned photoresist layer is then removed.
摘要翻译：一种用于制造像素结构的方法包括提供其上具有有源器件的衬底，并形成覆盖有源器件的介电层。电介质层具有设置在有源器件上方的接触孔。接下来，在有源器件上的介电层上形成第一光致抗蚀剂层，并且形成透明导电层以覆盖电介质层和第一光致抗蚀剂层的一部分。透明导电层经由接触孔与有源器件电连接。此外，使用激光束照射透明导电层，并且去除第一光致抗蚀剂层上的透明导电层的一部分，使得介电层部分上的透明导电层的另一部分形成像素电极。然后去除第一图案化光致抗蚀剂层。

27. 发明授权

US08008135B2 Method for manufacturing pixel structure 有权
标题翻译：像素结构制造方法
公开(公告)号：US08008135B2
公开(公告)日：2011-08-30
申请号：US12342026
申请日：2008-12-22
申请人： Chih-Hung Shih , Chih-Chun Yang , Ming-Yuan Huang
发明人： Chih-Hung Shih , Chih-Chun Yang , Ming-Yuan Huang
IPC分类号： H01L21/20
CPC分类号： H01L27/1288 , G02F1/136227 , H01L27/1214 , H01L27/3248 , H01L51/5206 , H01L51/56 , H01L2227/323
摘要： A method for manufacturing a pixel structure includes providing a substrate having an active device thereon and forming a dielectric layer covering the active device. The dielectric layer has a contact hole disposed over the active device. Next, a first photoresist layer is formed on the dielectric layer over the active device, and a transparent conductive layer is formed to cover a portion of the dielectric layer and the first photoresist layer. The transparent conductive layer is electrically connected to the active device via the contact hole. Besides, the transparent conductive layer is irradiated with use of a laser beam, and a portion of the transparent conductive layer on the first photoresist layer is removed, such that the other portion of the transparent conductive layer on the portion of the dielectric layer forms a pixel electrode. The first patterned photoresist layer is then removed.
摘要翻译：一种用于制造像素结构的方法包括提供其上具有有源器件的衬底，并形成覆盖有源器件的介电层。电介质层具有设置在有源器件上方的接触孔。接下来，在有源器件上的介电层上形成第一光致抗蚀剂层，并且形成透明导电层以覆盖电介质层和第一光致抗蚀剂层的一部分。透明导电层经由接触孔与有源器件电连接。此外，使用激光束照射透明导电层，并且去除第一光致抗蚀剂层上的透明导电层的一部分，使得介电层部分上的透明导电层的另一部分形成像素电极。然后去除第一图案化光致抗蚀剂层。

28. 发明授权

US07670883B2 Method for manufacturing pixel structure 有权
标题翻译：像素结构制造方法
公开(公告)号：US07670883B2
公开(公告)日：2010-03-02
申请号：US11942732
申请日：2007-11-20
申请人： Chih-Hung Shih , Chih-Chun Yang , Ming-Yuan Huang
发明人： Chih-Hung Shih , Chih-Chun Yang , Ming-Yuan Huang
IPC分类号： H01L21/20
CPC分类号： H01L27/1288 , G02F1/136227 , H01L27/1214 , H01L27/3248 , H01L51/5206 , H01L51/56 , H01L2227/323
摘要： A method for manufacturing a pixel structure includes providing a substrate having an active device thereon and forming a dielectric layer covering the active device. Then, an uneven first photoresist layer having an opening is formed over the active device. After an etching process is implemented to form a contact hole in the dielectric layer through said opening, a thickness of the first photoresist layer is reduced so as to expose a portion of the dielectric layer. A transparent conductive layer covering the exposed dielectric layer and the remained first photoresist layer is formed and electrically connected to the active device via the contact hole. Thereafter, the transparent conductive layer on the remained first photoresist layer is removed, while the transparent conductive layer on the exposed dielectric layer forms a pixel electrode. Then, the remained first photoresist layer is removed. With fewer photomasks, the method reduces the manufacturing costs.
摘要翻译：一种用于制造像素结构的方法包括提供其上具有有源器件的衬底，并形成覆盖有源器件的介电层。然后，在有源器件上形成具有开口的不均匀的第一光致抗蚀剂层。在通过所述开口实现在电介质层中形成接触孔的蚀刻工艺之后，减小第一光致抗蚀剂层的厚度以暴露电介质层的一部分。覆盖暴露的电介质层和残留的第一光致抗蚀剂层的透明导电层被形成并经由接触孔与有源器件电连接。此后，去除残留的第一光致抗蚀剂层上的透明导电层，而暴露的电介质层上的透明导电层形成像素电极。然后，除去残留的第一光致抗蚀剂层。使用较少的光掩模，该方法降低了制造成本。

29. 发明授权

US07547590B2 Method for forming an array substrate including forming a transparent conductive layer on a photoresist and laser ablating 有权
标题翻译：用于形成阵列基板的方法，包括在光致抗蚀剂上形成透明导电层并进行激光烧蚀
公开(公告)号：US07547590B2
公开(公告)日：2009-06-16
申请号：US11744934
申请日：2007-05-07
申请人： Chih-Chun Yang , Chih-Hung Shih , Ming-Yuan Huang
发明人： Chih-Chun Yang , Chih-Hung Shih , Ming-Yuan Huang
IPC分类号： H01L21/00 , H01L21/84 , H01L21/302 , H01L21/461
CPC分类号： H01L27/1288 , H01L27/1255 , Y10S438/951
摘要： Disclosed is a method for manufacturing an array substrate utilizing a laser ablation process. With the laser ablation process, a photoresist layer is removed along with the transparent conductive layer therefrom, while maintaining other portions of the transparent conductive layer. Moreover, the laser ablation process of the invention does not need additional photo-mask, so the fabrication cost can be reduced.
摘要翻译：公开了利用激光烧蚀工艺制造阵列基板的方法。通过激光烧蚀工艺，与其透明导电层一起去除光致抗蚀剂层，同时保持透明导电层的其它部分。此外，本发明的激光烧蚀工艺不需要额外的光掩模，因此可以降低制造成本。

30. 发明申请

US20080042132A1 Display panel and method for manufacturing the same 有权
标题翻译：显示面板及其制造方法
公开(公告)号：US20080042132A1
公开(公告)日：2008-02-21
申请号：US11727448
申请日：2007-03-27
申请人： Chih-Hung Shih , Chih-Chun Yang , Ming-Yuan Huang
发明人： Chih-Hung Shih , Chih-Chun Yang , Ming-Yuan Huang
IPC分类号： H01L29/10 , H01L21/4763
CPC分类号： H01L27/12 , H01L21/76838 , H01L27/124 , H01L27/1288
摘要： A display panel includes a substrate having a display area and a blank area. The blank area includes at least one of a non-metal line region and a metal-line region. The non-metal line region includes a plurality of insulating patterns and a first conductive pattern layer formed on the substrate. The insulating patterns are isolated from each other by the first conductive pattern layer. The metal-line region includes an insulating multilayer formed on the substrate and a conductive pattern layer formed on the insulating multilayer. Several isolated zones are formed by the conductive pattern layer on the surface of the insulating multilayer.
摘要翻译：显示面板包括具有显示区域和空白区域的基板。空白区域包括非金属线区域和金属线区域中的至少一个。非金属线区域包括多个绝缘图案和形成在基板上的第一导电图案层。绝缘图案通过第一导电图案层彼此隔离。金属线区域包括形成在基板上的绝缘层和形成在绝缘层上的导电图案层。由绝缘多层的表面上的导电图案层形成几个隔离区。

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