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    • 23. 发明授权
    • Method for optimization in RFID location recognition system using blueprint
    • 使用蓝图的RFID位置识别系统优化方法
    • US08164427B2
    • 2012-04-24
    • US12318327
    • 2008-12-24
    • Sung Woo TakTae Hoon KimByung Hoon KimKi Joune LiChi Won SonDong Geon LeeYoung Mann Kim
    • Sung Woo TakTae Hoon KimByung Hoon KimKi Joune LiChi Won SonDong Geon LeeYoung Mann Kim
    • G08B13/14
    • H04Q9/00G08C21/00H04Q2209/47
    • A method for optimization in an RFID location recognition system is developed to use in a blueprint in which an optimum location for installing an RFID reader is determined for using a blueprint so as to improve location recognition. The method includes the steps of inputting a blueprint and dividing a location recognition unit space from the blueprint; establishing a building interior space analysis model and an interior radio propagation space analysis model and deriving a building spatial significance and a radio propagation spatial significance; analyzing correlation between a building space and a radio propagation space and deriving a correlation coefficient; and defining an objective function for determining a location of a RFID reader based on the building spatial significance, the radio propagation spatial significance, and the correlation coefficient between the building space and the radio propagation space and performing optimization.
    • 开发RFID位置识别系统中的优化方法用于蓝图,其中确定用于安装RFID读取器的最佳位置以使用蓝图以改善位置识别。 该方法包括步骤:输入蓝图,并从蓝图中分离位置识别单元空间; 建立建筑内部空间分析模型和内部无线电传播空间分析模型,推导建筑空间意义和无线电传播空间意义; 分析建筑空间与无线电传播空间之间的相关性,得出相关系数; 并根据构建空间意义,无线电传播空间意义以及建筑物空间与无线电传播空间之间的相关系数来确定RFID读取器的位置的目标函数,并进行优化。
    • 24. 发明授权
    • Apparatus and method for controlling auto exposure
    • 用于控制自动曝光的装置和方法
    • US08115829B2
    • 2012-02-14
    • US12467504
    • 2009-05-18
    • Joo Young HaBong Soon KangKyung Rin KimWon Tae ChoiByung Hoon Kim
    • Joo Young HaBong Soon KangKyung Rin KimWon Tae ChoiByung Hoon Kim
    • H04N5/238H04N5/243
    • H04N5/2353
    • An apparatus and method for controlling auto exposure (AE) that is used in digital imaging devices. The apparatus controlling the luminance of an image being outputted from an image sensor by controlling exposure time and analog gain of the image sensor includes: a luminance operation unit operating and outputting a mean luminance of the image outputted from the image sensor; a shutter index determination unit comparing a predetermined target luminance with the mean luminance of the outputted image and determining a shutter index in different manners according to the magnitude of the difference between the target luminance and the mean luminance of the outputted image; and an exposure time/analog gain determination unit generating exposure time and analog gain corresponding to the shutter index determined in the shutter index determination unit and applying the generated exposure time and analog gain to the image sensor.
    • 一种用于控制数字成像装置中使用的自动曝光(AE)的装置和方法。 通过控制图像传感器的曝光时间和模拟增益来控制从图像传感器输出的图像的亮度的装置包括:亮度操作单元,操作并输出从图像传感器输出的图像的平均亮度; 快门指标确定单元,将预定目标亮度与输出图像的平均亮度进行比较,并根据目标亮度和输出图像的平均亮度之间的差值的大小以不同的方式确定快门指数; 以及曝光时间/模拟增益确定单元,其生成与在快门指定确定单元中确定的快门指标相对应的曝光时间和模拟增益,并将所生成的曝光时间和模拟增益应用于图像传感器。
    • 26. 发明授权
    • Method of fabricating liquid crystal display device
    • 制造液晶显示装置的方法
    • US07718329B2
    • 2010-05-18
    • US12099630
    • 2008-04-08
    • Suk ChoiSoon Ju JangByung Hoon Kim
    • Suk ChoiSoon Ju JangByung Hoon Kim
    • H01L21/64
    • G02F1/133502G02F1/133512
    • Provided is a method of fabricating a liquid crystal display device. The method includes fabricating a liquid crystal panel divided into transmission and non-transmission regions, and including an upper substrate and a lower substrate, which are spaced apart from and opposite to each other, and a liquid crystal layer filled between the substrates, wherein the lower substrate has a plurality of thin film transistors; depositing a transparent conductive layer having a certain thickness on the upper substrate exposed to the exterior of the liquid crystal panel; and performing an etching process for removing the entire transparent conductive layer and a portion of the upper substrate to form irregular prominences and depressions on a surface of the upper substrate exposed to the exterior. Therefore, it is possible to improve readability and contrast ratio by diffusely reflecting external light and scattering internal light.
    • 提供一种制造液晶显示装置的方法。 该方法包括制造分为透射区域和非透射区域的液晶面板,并且包括彼此间隔开和相对的上基板和下基板以及填充在基板之间的液晶层,其中 下基板具有多个薄膜晶体管; 在暴露于液晶面板的外部的上基板上沉积具有一定厚度的透明导电层; 以及进行用于去除整个透明导电层和上部基板的一部分的蚀刻工艺,以在暴露于外部的上基板的表面上形成不规则的凸起和凹陷。 因此,可以通过漫反射外部光和散射内部光来提高可读性和对比度。
    • 28. 发明授权
    • Method for manufacturing array substrate of translucent LCD
    • 制造半透明液晶显示阵列基板的方法
    • US07480015B2
    • 2009-01-20
    • US11595455
    • 2006-11-09
    • Byung Hoon KimSam Ho Ihm
    • Byung Hoon KimSam Ho Ihm
    • G02F1/136
    • G02F1/133555G02F1/134309G02F2001/136231
    • Disclosed is a method for manufacturing an array substrate of a translucent LCD capable of simultaneously forming source and drain metal layers as reflective electrodes while improving both the contact resistance in a transmissive region and the reflectivity properties in a reflective region. The source and drain metal layers have a triple-layered structure of Mo—Al—Mo and, the top Mo is selectively removed from the reflective region. As a result, the screen quality of products improves. In addition, about 5-6 masks are enough to manufacture an array substrate using half-tone exposure technology, in contrast to the prior art which uses 8-11 masks. As the number of masks and processes is reduced in this manner, the manufacturing cost decreases accordingly and the process is simplified.
    • 公开了一种半导体LCD的阵列基板的制造方法,其能够同时形成源极和漏极金属层作为反射电极,同时提高透射区域中的接触电阻和反射区域中的反射率特性。 源极和漏极金属层具有Mo-Al-Mo的三层结构,并且从反射区域选择性地去除顶部Mo。 结果,产品的屏幕质量提高。 此外,与使用8-11掩模的现有技术相比,约5-6个掩模足以制造使用半色调曝光技术的阵列基板。 由于以这种方式减少了掩模和处理的数量,因此制造成本相应降低,并且简化了处理。