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    • 23. 发明专利
    • INDICATING METHOD AND INDICATOR AND CONFIRMING DEVICE HAVING THIS INDICATOR
    • JPH03150900A
    • 1991-06-27
    • JP28886489
    • 1989-11-08
    • HITACHI LTD
    • NOMOTO MINEONINOMIYA TAKANORIYOSHIMURA KAZUSHI
    • B23Q17/00G09F9/00G09G3/18H05K3/00H05K13/00H05K13/08
    • PURPOSE:To increase workability and enable precise position indication even if a substance to be indicated is soft, by indicating a specified position of the substance by the optical indication of an optical 2-dimensional indicating means provided on the side opposite to the mounting surface of a substance holder. CONSTITUTION:A board holder 2 is made of light transmittable material and a mounting surface 4 on which a circuit board 1 is mounted has a plane shape. And an optical 2-dimensional indicating mechanism, that is, a plasma display 9, etc., are put on a base 5 on the side opposite to the mounting surface 4 of the board holder 2. Then a circuit board 1 whose defect has been detected beforehand is located and put on the mounting surface 4 of the board holder 2, and the coordinates of the defect position recorded in a floppy disk 8 are inputted into a microcomputer 7. And they are converted into X,Y-coordinates of the light-emitting element 10 group of the plasma display 9. Then the specified defect position of the circuit board 1 is lit from the side opposite to the mounting surface 4 of the board holder 2, by lighting the light-emitting element 10 at the specified position. And, this increases the workability and enables precise position indicating even in case of a soft circuit board 1.
    • 26. 发明专利
    • Scanning type electron microscope
    • 扫描型电子显微镜
    • JPS59217935A
    • 1984-12-08
    • JP9154483
    • 1983-05-26
    • Hitachi Ltd
    • KUJI TOMOHIROHAMADA TOSHIMITSUYOSHIMURA KAZUSHISHIGEMURA TAKASHI
    • G01B15/00H01J37/28
    • H01J37/28
    • PURPOSE:To keep magnification in an externally preset value even when working distance varies by detecting the current amount applied to an electronic lens and varying the deviation of an electron beam interlocking with the current amount. CONSTITUTION:An electron emitted from an electron gun is accelerated by an anode and an electron beam is converged by a convergent lens and an objective lens 5 and then a sample is irradiated with the electron beam. A focal point current regulator 17 externally operates a knob and varies the current value. The lens 5 varies the current value and focal point position through a constant- current amplifier 18 by the output of the regulator 17. A current detection resistor 19 detects the current value of the lens 5 and amplifies it using a buffer amplifier 20. A magnification setting device 21 varies the size of a deflectionsignal interlocking with an external knob and sets the magnification of a picture. The output of the setting device 21 is issued to an attenuator 22. The attenuator 22. The attenuator 22 reduces attenuation as a signal from the amplifier 20 increases and increases the deflection signal. The output of the attenuator 22 is applied to a deflection coil 9 through a constant-current amplifier 23 and preset magnification can be maintained.
    • 目的:即使通过检测施加到电子透镜的电流量并改变与电流量互锁的电子束的偏差,即使工作距离变化,也可以将倍率保持在外部预设值。 构成:由电子枪发射的电子被阳极加速,电子束被会聚透镜和物镜5会聚,然后用电子束照射样品。 焦点电流调节器17从外部操作旋钮并改变电流值。 透镜5通过调节器17的输出通过恒流放大器18改变电流值和焦点位置。电流检测电阻器19检测透镜5的电流值并使用缓冲放大器20放大。放大倍率 设置装置21改变与外部旋钮互锁的偏转信号的尺寸并设置图像的放大率。 设定装置21的输出被发送到衰减器22.衰减器22.衰减器22随着来自放大器20的信号的增加而减小衰减并增加偏转信号。 衰减器22的输出通过恒流放大器23施加到偏转线圈9,并且可以保持预设倍率。
    • 27. 发明专利
    • Focusing method for scanning electron microscope
    • 用于扫描电子显微镜的聚焦方法
    • JPS59103256A
    • 1984-06-14
    • JP21140382
    • 1982-12-03
    • Hitachi Ltd
    • HAMADA TOSHIMITSUKUJI TOMOHIROMAKIHIRA HIROSHIYOSHIMURA KAZUSHI
    • H01J37/21H01J37/28
    • H01J37/21
    • PURPOSE:To reduce a charging phenomenon on a sample and the damage of the sample caused by an electron beam by mounting an optical microscope in a vacuum sample chamber and controlling the objective lens coil current of a scanning electron microscope based on the location in the optical axis direction. CONSTITUTION:The data at the time when an optical microscope 15 and a scanning electron microscope 12 are focused is written in memory 24 in advance. A sample is positioned in the optical microscope 15 and the microscope is focused. When focusing is completed, the operator notifies a control section 20 of the successful focusing through an operation board 25 and the control section 20 inputs the value of the laser range finder 18 and a linear encoder 19. The value of a D/A converter 23 that corresponds to the value measured by the laser range finder 18 is obtained by memory 24 and is set to the converter 23. A sample stage 16 is moved by the value of the encoder 19 and the distance between both microscopes 12 and 15 and the sample is positioned in the microscope 12. As a result, since the focused scanning electron microscope image can be obtained if the sample is irradiated by electrons, the sample need not be irradiated by excessive electrons for focusing and the damage and charging on the sample can be prevented.
    • 目的:通过将光学显微镜安装在真空样品室中,减少样品上的充电现象和电子束造成的样品损伤,并根据光学位置控制扫描电子显微镜的物镜线圈电流 轴方向。 构成:将光学显微镜15和扫描电子显微镜12聚焦时的数据预先写入存储器24。 将样品定位在光学显微镜15中并且显微镜被聚焦。 当聚焦完成时,操作者通过操作板25向控制部分20通知成功聚焦,并且控制部分20输入激光测距仪18和线性编码器19的值.D / A转换器23的值 对应于由激光测距仪18测量的值由存储器24获得并被设置到转换器23.样品台16移动编码器19的值和两个显微镜12和15之间的距离以及样品 结果,由于如果样品被电子照射可以获得聚焦的扫描电子显微镜图像,所以不需要用过量的电子照射样品进行聚焦,并且样品的损伤和充电可以是 预防。
    • 28. 发明专利
    • PATTERN CHECK SYSTEM
    • JPS5861448A
    • 1983-04-12
    • JP16017081
    • 1981-10-09
    • HITACHI LTD
    • HAMADA TOSHIMITSUYOSHIMURA KAZUSHIKUJI TOMOHIROAOKI NOBUHIKO
    • G01N21/88G01B11/24G01N21/93G01N21/956
    • PURPOSE:To use various contracted patterns generated from a fault-free standard pattern, to check on dissidence with a pattern to be checked, and to eliminate an error in quantization by a system which uses the fault-free standard pattern, picks up the pattern to be checked through an image pickup device, and checks on both patterns by comparing both of them, one over another, after binary checking. CONSTITUTION:A pattern contracting circuit 4 and a dead zone generating circuit 5 are used to form a horizontally right contracted pattern (b) of a standard pattern 9, a left contracted pattern (c), a vertically downward contracted pattern (d), an upward contracted pattern (e), a pattern of said four patterns contracted in combined contraction directions, and the standard pattern 9. Every pattern is provided with a dead zone G at its boundary part circumference (only outside of the pattern). A video signal from an image pickup device 1 which picks up a pattern to be checked is coded into a binary signal to obtain a dissidence part between the binary-coded signal and each of said patterns within the permissible range of the position shift between the pattern to be checked and the standard pattern; when dissidence is detected with regard to all the patterns, a decision on the presence of a fault is made and when no dissidence is detected with regard to at least one pattern, the pattern is regarded as a normal pattern.
    • 30. 发明专利
    • Internal flaw inspection method and device therefor
    • 内部检查方法及其设备
    • JP2012127897A
    • 2012-07-05
    • JP2010281390
    • 2010-12-17
    • Hitachi Ltd株式会社日立製作所
    • TACHIZAKI TAKEHIRONAKADA TOSHIHIKOYOSHIMURA KAZUSHISHIBATA YUKIHIRO
    • G01N21/88G01B9/02G01B11/00G01N21/45G01N29/04
    • G01N29/2418
    • PROBLEM TO BE SOLVED: To inspect an internal flaw at high sensitivity in a non-destructive state and in a non-contact state with a compact configuration without an operating part by performing ultrasonic excitation to a sample surface in non-contact state, and by observing a sample interior in non-contact state by means for optical interference measurement of a point exciting an ultrasonic wave.SOLUTION: An internal flaw inspection method and a device therefor are so devised that an ultrasonic wave is emitted from a place distant from a sample to be inspected and the sample is irradiated with the ultrasonic wave; that a place irradiated with the ultrasonic wave on the sample surface is irradiated with polarized light whose polarized state is controlled; that light having the same polarization property as that of the irradiation polarized light among reflected and scattered light from the sample surface irradiated with the polarized light is detected by a photodetector; and that a signal detected by the photodetector is processed to detect an internal flaw inside the sample.
    • 要解决的问题:通过以非接触状态对样品表面进行超声波激发,以非破坏性状态和非接触状态以非紧凑形式检查内部缺陷,无需操作部件 并且通过用于激发超声波的点的光学干涉测量来观察非接触状态的样本内部。 解决方案:设计了一种内部缺陷检查方法及其装置,使得从远离检查样品的位置发射超声波,并用超声波照射样品; 用超声波在样品表面照射的地方照射极化状态被控制的偏振光; 通过光电检测器检测与来自被偏振光照射的样品表面的反射和散射光中具有与照射偏振光相同的偏振特性的光; 并且处理由光电检测器检测到的信号以检测样品内的内部缺陷。 版权所有(C)2012,JPO&INPIT