专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明专利

JP2000171284A LIQUID LEVEL INDICATOR AND GAS PRESSURE FEEDING TYPE CHEMICAL SUPPLY UNIT 失效
公开(公告)号：JP2000171284A
公开(公告)日：2000-06-23
申请号：JP34632898
申请日：1998-12-07
申请人： ULTRA CLEAN TECHNOLOGY KAIHATS , FUJIKIN KK
发明人： NITTA TAKEHISA , IKEDA SHINICHI , NISHINO KOJI , YASUMOTO TADASHI
IPC分类号： G01F23/26
摘要： PROBLEM TO BE SOLVED: To measure the liquid level of a corrosive chemical, e.g. hydrofluoric acid, without causing corrosion or elution of metallic component. SOLUTION: A chemical supply unit comprises an airtight container 3, a chemical container 4 contained therein, a tube 5 for feeding chemical in the chemical container 4 to the outside, and an liquid level indicator 2 for detecting liquid level variation of the chemical in the chemical container 4. The liquid level indicator 2 detects variation of capacitance between the electrodes 7 incident to variation of liquid level and the electrodes 7 are formed of amorphous carbon.

22. 发明专利

JP2000167318A GASKET FILTER 失效
公开(公告)号：JP2000167318A
公开(公告)日：2000-06-20
申请号：JP34089398
申请日：1998-12-01
申请人： ULTRA CLEAN TECHNOLOGY KAIHATS , FUJIKIN KK
发明人： OMI TADAHIRO , IDETA EIJI , IKEDA SHINICHI , MORIMOTO AKIHIRO , KOMEHANA KATSUNORI
IPC分类号： B01D29/01 , B01D35/02
摘要： PROBLEM TO BE SOLVED: To make water adherent to a filter removed easily and a surface treatment applied easily by installing a ring-shaped gasket main body and a filter fitted integrally to the gasket main body and forming the filter by boring numbers of holes in a disk-shaped metal body. SOLUTION: The gasket filter 41 is composed of a ring-shaped gasket main body 42 and a filter 43 installed integrally with the gasket main body 42. The filter 43 is formed by boring numbers of holes 45 by etching in a part excluding the peripheral part of a thin metal disk 44. A ring-shaped recessed place 46 coaxial with the gasket main body 42 is formed on one end surface of the gasket main body 42, and a filter housing recessed place 47 of a small diameter is formed on the bottom surface of the recessed place 46. Moreover, the recessed place 47 is formed to have a depth equal to the thickness of the filter 43 and a diameter equal to the outside diameter of the filter 43, and the filter 43 is inserted into the recessed place 47 and welded to the gasket main body 42.

23. 发明专利

JP2000137528A METHOD AND DEVICE FOR DETECTING ORIFICE CLOGGING IN PRESSURE-TYPE FLOW RATE CONTROLLER 失效
公开(公告)号：JP2000137528A
公开(公告)日：2000-05-16
申请号：JP21363399
申请日：1999-07-28
申请人： OMI TADAHIRO , TOKYO ELECTRON LTD , FUJIKIN KK
发明人： OMI TADAHIRO , IIDA SEIICHI , KAGATSUME SATORU , HIROSE JUN , UNO TOMIO , NISHINO KOJI , IKEDA SHINICHI , YAMAJI MICHIO , DOI RYOSUKE , IDETA EIJI , HIROSE TAKASHI , YOSHIKAWA KAZUHIRO , KOGAI MUTSUNORI
IPC分类号： G01F1/42 , G05D7/06 , G05D16/20
摘要： PROBLEM TO BE SOLVED: To judge clogging with simple operation without disassembling piping by comparing reference pressure attenuation data when an orifice is not clogged with pressure attenuation data at the time of an actual operation and judging the propriety of clogging according to whether or not they are dissociated for not less than a prescribed degree. SOLUTION: A setting flow rate is held to a high setting flow rate. The high setting flow rate is switched to a low setting flow rate and it is kept. Upper stream side pressure is measured and pressure attenuation data is obtained. Reference pressure attenuation data measured when an orifice is not clogged and pressure attenuation data obtained by measurement are compared with same conditions. When pressure attenuation data is dissociated from reference pressure attenuation data for not less than a prescribed degree, clogging is reported. The clogging detector is constituted of a central processing unit CPU, a memory device for data storage M, a communication part PT 42 with outside, the outer circuit 4 of a trigger circuit, an alarm circuit 46 at the time of clogging, a power source circuit SC 48 and the outer power source 50 of ±15 V, for example.

24. 发明专利

JP2000072405A REACTION FURNACE FOR GENERATING WATER 失效
公开(公告)号：JP2000072405A
公开(公告)日：2000-03-07
申请号：JP24787498
申请日：1998-09-02
申请人： OMI TADAHIRO , FUJIKIN KK
发明人： OMI TADAHIRO , KAWADA KOJI , MINAMI YUKIO , HIRAO YOSHIYUKI , IKEDA SHINICHI
IPC分类号： H01L21/31 , B01J23/42 , C01B5/00 , H01L21/316
摘要： PROBLEM TO BE SOLVED: To provide a reaction furnace for generating water capable of stably attaining water generation reaction rate exceeding 99% even under the condition that the temp. of the furnace is =1000 sccm. SOLUTION: The inside of a reaction furnace main body 1 is partitioned into two of upper and lower chambers 14 and 15 by a gas permeable diffusion filter 2. A gaseous starting material being a gaseous mixture of hydrogen with oxygen is fed to the upper part 1st chamber 14 from a gaseous starting material feed port 4 formed on the top wall 12 of the reaction furnace main body 1 and introduced into the lower part 2nd chamber 15 while being diffused by a 1st reflection plate 3 and the diffusion filter 2. Hydrogen and oxygen introduced to the 2nd chamber 15 radically react with each other by bringing it to contact with a platinum catalytic film 5 formed on the peripheral wall 11 and the bottom wall 13 of the reaction furnace main body 1 and the produced water is taken out from a water take-out port 7 of the bottom wall 13. The reaction of hydrogen with oxygen occurs mainly in a narrow space 15a between a 2nd reflection plate 6 and the bottom wall having the size that the outer peripheral part is adjacent to the inner surface of the peripheral wall 11 of the reaction furnace main body 1.

25. 发明专利

JPH1170328A DEVICE AND METHOD FOR CHEMICAL LIQUID QUANTITATIVE INJECTION 失效
公开(公告)号：JPH1170328A
公开(公告)日：1999-03-16
申请号：JP23472197
申请日：1997-08-29
申请人： URUTORA CLEAN TECHNOL KAIHATSU , FUJIKIN KK
发明人： MIKI MASAHIRO , NITTA TAKEHISA , OMI TADAHIRO , IKEDA SHINICHI , YASUMOTO TADASHI
IPC分类号： B01J4/02 , B01F3/08 , C02F1/68 , F04B13/00 , F04B53/14 , H01L21/00 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a chemical liquid injection device for injecting a chemical liquid into ultrapure water without generating dust, controlling the injection interval of the chemical liquid into a cleaning nozzle by the unit of several seconds to ten and several seconds and carrying out the changeover of kinds of chemical liquid, changing over the ultrapure water cleaning and the like in a short time of approximately one second. SOLUTION: A chemical liquid quantitative injection device 2 is used for injecting respective kinds of chemical liquid 3 into an ultrapure water flow path 1 for supplying ultrapure water into a sheet cleaning device for cleaning the surface of a material to be cleaned in a sheet cleaning manner, and provided with a chemical liquid injection system 4 with a chemical liquid storage section for storing the chemical liquid 3, a pressure increasing and decreasing control system 5 for controlling the pressure of the chemical liquid 3 in the chemical liquid storage section at the given intervals, an injection control system 6 so constituted as to carry out the continuous injection, the spontaneous operation of mixing the chemical liquid from the chemical liquid injection system 4 into the ultrapure water flow path 1 linked with the control of the pressure of the chemical liquid 3 and a chemical liquid replenishing system 8 so constituted as to replenish the chemical liquid from a chemical liquid source 7 into the chemical liquid storage section linked with the control of the chemical liquid 3.

26. 发明专利

JPH116585A PIPE JOINT 失效
公开(公告)号：JPH116585A
公开(公告)日：1999-01-12
申请号：JP16104797
申请日：1997-06-18
申请人： OMI TADAHIRO , FUJIKIN KK
发明人： OMI TADAHIRO , YAMAJI MICHIO , IKEDA SHINICHI , SHINOHARA TSUTOMU , KOJIMA TETSUYA
IPC分类号： F16L17/06 , F16L19/02
摘要： PROBLEM TO BE SOLVED: To provide an optimum shape of an annular seal projection provided on a butting end face of a joint member. SOLUTION: Each seal projection 7, 8 is located closely to the radial outside of inner peripheries 1a, 2a of butting end faces of joint members (1), (2). The contour shapes of cross section of each seal projections 7, 8 is constituted of circular arc parts 7b, 8b extending from the butting end faces toward the radial outside and linear parts 7a, 8a continued to the circular arc parts 7b, 8b. The centers of the circular arc parts 7b, 8b are located at the radial inside of the intersection of the circular arc parts 7b, 8b and the linear parts 7a, 8a and the linear parts 7a, 8a are axially inclined by 45 deg..

27. 发明专利

JPH112400A MIXING GAS SUPPLYING DEVICE 失效
公开(公告)号：JPH112400A
公开(公告)日：1999-01-06
申请号：JP15333697
申请日：1997-06-11
申请人： FUJIKIN KK , TOKYO ELECTRON LTD
发明人： MINAMI YUKIO , IKEDA SHINICHI , MANOHARU L SHURESTA , KAGATSUME SATORU
IPC分类号： F15D1/02 , B01J4/00 , F17D1/02 , G05D7/06 , G05D11/13 , H01L21/205 , H01L21/302 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To adequately prevent gas from flowing reversely, by constituting a mixing gas supplying device with a manifold which mixes gas and supplies it to a gas using object, and a flow velocity adjuster which equalizes ratio of path cross section of a gas supplying line to flowing gas flow. SOLUTION: Gas G1 with minimum flow is supplied to a gas supplying line 21 far away from a gas out part 11 of a manifold 3, flow of gas G2 larger than that of the gas G1 is supplied to a gas supplying line 22 adjacent to the gas supplying line 21 , flow of gas G3 larger than that of the gas G2 is supplied to a gas supplying line 23 adjacent to the gas supplying line 22 and, gas Gn with maximum flow is supplied to a gas supplying line 2n nearest the gas out part 11 of the manifold 3. Flow passage inner diameters of gas supplying lines 21 -2n are equal, and flow velocities of gas flowing through gas supplying lines 21 -2n are different. Each flow velocity adjuster 41 -4n on each gas supplying line 21 -2n equalizes ratio of path cross section of each gas supplying line to flowing gas flow of each gas supplying line 21 -2n .

28. 发明专利

JPH10270437A WATER CONTENT PRODUCING REACTOR 失效
公开(公告)号：JPH10270437A
公开(公告)日：1998-10-09
申请号：JP7413097
申请日：1997-03-26
申请人： OMI TADAHIRO , FUJIKIN KK , HITACHI LTD
发明人： OMI TADAHIRO , KAWADA KOJI , TANABE YOSHIKAZU , IKEDA SHINICHI , MORIMOTO AKIHIRO , MINAMI YUKIO
IPC分类号： H01L21/31 , C01B5/00
摘要： PROBLEM TO BE SOLVED: To raise the water content producing reactivity to stably produce the water content under specified condition by providing an inlet reflector, filter and outlet reflector-diffuser in a reactor and providing a diffusion filter having a Pt coating in the outlet reflector-diffuser. SOLUTION: A gas diffusing member 8 is composed of an inlet reflector, filter and outlet reflector-diffuser 12 which has a diffusion filter 12c and Pt coating 12d on the outer surface of the filter 12 at the space side. A Pt coating 13 provided on the inner wall of a reactor 1 top covert a non-radical H or O gas into radicals, thus H and O are brought into reaction instantaneously to produce water. The coating 13 stably produces water continuously at 1000 cc/min or more at about 500 deg.C over the entire area due to the reaction heat.

29. 发明专利

JPH1082707A PRESSURE DETECTOR 失效
公开(公告)号：JPH1082707A
公开(公告)日：1998-03-31
申请号：JP23870696
申请日：1996-09-10
申请人： OMI TADAHIRO , FUJIKIN KK
发明人： OMI TADAHIRO , DOI RYOSUKE , NISHINO KOJI , IKEDA SHINICHI
IPC分类号： G01L9/04 , G01L9/00 , G01L19/00 , G01L19/06
摘要： PROBLEM TO BE SOLVED: To eliminate the possibility of lowering the quality of product even a pressure detector is applied to a semiconductor production process, by forming a passive film on the gas-contact face of a stainless steel diaphragm having specified dimensions provided on a diaphraqm base. SOLUTION: A diaphragm 3 of about 50μm thick having an inside diameter of about 10mm is made of stainless steel and has a gas-contact face 3a on which a passive film 3b of chromium oxide, a fluorinated passive film 3b or a mixed oxide passive film 3b of aluminum oxide and chromium oxide is formed. After forming the diaphragm 3 integrally with a diaphragm base 4, the diaphragm base 4 formed with the passive film 3b and a sensor base 1 are abutted against the gas contact face 3a of the diaphragm 3 and the entire circumference of the side wall face is welded 8. Subsequently, an oil injection hole 1b is filled with a pressure transmission medium (silicon oil) 5 and a sealing body (ball) 6 is welded 10 to the sensor base 1 thus sealing the silicon oil 5 hermetically.

30. 发明专利

JPH09283504A FEED OF MIXED GAS, MIXED GAS FEEDING DEVICE AND SEMICONDUCTOR MANUFACTURING DEVICE PROVIDED WITH THESE 失效
公开(公告)号：JPH09283504A
公开(公告)日：1997-10-31
申请号：JP366797
申请日：1997-01-13
申请人： FUJIKIN KK , TOKYO ELECTRON LTD
发明人： MINAMI YUKIO , IKEDA SHINICHI , MANOHARU ERU SHIYURESUTA , KAGATSUME SATORU
IPC分类号： B01J4/00 , C23C16/44 , C23C16/455 , F17D1/04 , G05D11/13 , H01L21/205 , H01L21/302 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To prevent a backward flow of each gas from being generated from gas feeding lines of a higher flow rate into gas feeding lines of a lower flow rate by a method wherein the gas of the lowest flow rate among a plurality of the gases is fed through the gas feeding line provided at the longest distance from a gas outlet part. SOLUTION: In the feed A of mixed gas, the first gas G1 by the lowest flow rate is fed to a gas feeding line L1 separated by the longest distance from a gas outlet part G0 and the n gas Gn of the highest flow rate is fed to a gas feeding line L which is closest to the part G0 . Moreover, the third gas G3 which is fed to a gas feeding line L3 adjacent to the line Ln , which is fed the n gas Gn , is gas of a flow rate lower than that of the n gas G and the second gas G2 . which is fed to a gas feeding line L2 adjacent to the L3 , which is fed the third gas G3 , is gas of a flow rate lower than that of the gas G3 . Thereby, it can be made to nil that the gases of the higher flow rate flow backward or are diffused in the gas of the lowest flow rate.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式