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    • 24. 发明授权
    • Thin film transistor formed by an etching process with high anisotropy
    • 通过具有高各向异性的蚀刻工艺形成的薄膜晶体管
    • US06815270B2
    • 2004-11-09
    • US10438725
    • 2003-05-15
    • Takatoshi TsujimuraMasatomo TakeichiKai R. SchleupenEvan G. Colgan
    • Takatoshi TsujimuraMasatomo TakeichiKai R. SchleupenEvan G. Colgan
    • H01L2100
    • H01L27/12H01L27/124H01L27/1248H01L29/66765Y10S438/90
    • The present invention discloses a thin film transistor and a process for forming thereof by a high anisotropy etching process. A thin film transistor according to the present invention comprises a transistor element including a gate electrode, a gate insulating layer, a semiconductor layer, and source and drain electrodes; a passivation layer being deposited on the layers and having first openings for contact holes; and an interlayer insulator extending along with the passivation layer and having second openings for the contact holes, the first openings and the second openings being aligned each other over the substrate, wherein an electrical conductive layer is deposited on an inner wall of the contact hole and the inner wall is formed by the first and second openings tapered smoothly and continuously through an anisotropic etching process.
    • 本发明公开了一种薄膜晶体管及其通过高各向异性蚀刻工艺形成的方法。 根据本发明的薄膜晶体管包括晶体管元件,其包括栅极电极,栅极绝缘层,半导体层以及源极和漏极电极; 钝化层沉积在层上并具有用于接触孔的第一开口; 以及与所述钝化层一起延伸并具有用于所述接触孔的第二开口的层间绝缘体,所述第一开口和所述第二开口在所述衬底上彼此对准,其中导电层沉积在所述接触孔的内壁上,并且 内壁由第一和第二开口形成,其平滑且连续地通过各向异性蚀刻工艺而逐渐变细。