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    • 21. 发明申请
    • THIN-FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
    • 薄膜晶体管基板及其制造方法
    • US20090108256A1
    • 2009-04-30
    • US12186659
    • 2008-08-06
    • Sang-Ki KwakHyang-Shik KongSun-Il Kim
    • Sang-Ki KwakHyang-Shik KongSun-Il Kim
    • H01L27/088H01L29/12H01L21/70
    • H01L27/1288H01L27/1225H01L27/124H01L29/7869
    • A thin-film transistor (TFT) substrate includes a semiconductor pattern, a conductive pattern, a first wiring pattern, an insulation pattern and a second wiring pattern. The semiconductor pattern is formed on a substrate. The conductive pattern is formed as a layer identical to the semiconductor pattern on the substrate. The first wiring pattern is formed on the semiconductor pattern. The first wiring pattern includes a source electrode and a drain electrode spaced apart from the source electrode. The insulation pattern is formed on the substrate having the first wiring pattern to cover the first wiring pattern. The second wiring pattern is formed on the insulation pattern. The second wiring pattern includes a gate electrode formed on the source and drain electrodes. Therefore, a TFT substrate is manufactured using two or three masks, so that manufacturing costs may be decreased.
    • 薄膜晶体管(TFT)衬底包括半导体图案,导电图案,第一布线图案,绝缘图案和第二布线图案。 半导体图案形成在基板上。 导电图案形成为与衬底上的半导体图案相同的层。 第一布线图案形成在半导体图案上。 第一布线图案包括与源电极间隔开的源电极和漏电极。 在具有第一布线图案的基板上形成绝缘图案以覆盖第一布线图案。 第二布线图案形成在绝缘图案上。 第二布线图案包括形成在源极和漏极上的栅电极。 因此,使用两个或三个掩模制造TFT基板,从而可以降低制造成本。
    • 23. 发明申请
    • THIN FILM TRANSISTOR SUBSTRATE
    • 薄膜晶体管基板
    • US20110025968A1
    • 2011-02-03
    • US12816591
    • 2010-06-16
    • Se-Hwan YUHyang-Shik KongSu-Hyoung Kang
    • Se-Hwan YUHyang-Shik KongSu-Hyoung Kang
    • G02F1/1343
    • G02F1/136286G02F2001/13629
    • A thin film transistor array panel including a display area having a gate line, a data line insulated from and intersecting the gate line, a thin film transistor connected to the gate line and the data line, and a pixel electrode connected to the thin film transistor, and a peripheral area formed on the circumference of the display area, according to an exemplary embodiment of the present invention, includes: a driving signal line formed with the same layer as the gate line in the peripheral area and receiving an external signal; a connection signal line formed with the same layer as the data line in the peripheral area; a disconnection prevention member overlapping the side surface of the connection signal line on the connection signal line; and a connection assistance member formed on the disconnection prevention member and connecting the driving signal line and the connection signal line.
    • 一种薄膜晶体管阵列面板,包括具有栅极线的显示区域,与栅极线绝缘并与之相交的数据线,连接到栅极线和数据线的薄膜晶体管,以及连接到薄膜晶体管的像素电极 以及形成在显示区域的圆周上的周边区域,根据本发明的示例性实施例,包括:形成与周边区域中的栅极线相同层并且接收外部信号的驱动信号线; 连接信号线,其与周边区域中的数据线形成相同的层; 断开防止部件与连接信号线上的连接信号线的侧面重叠; 以及连接辅助构件,其形成在所述防止断开构件上并且连接所述驱动信号线和所述连接信号线。
    • 26. 发明授权
    • Thin film transistor substrate including disconnection prevention member
    • 薄膜晶体管基板,包括防断断部件
    • US08427623B2
    • 2013-04-23
    • US12816591
    • 2010-06-16
    • Se-Hwan YuHyang-Shik KongSu-Hyoung Kang
    • Se-Hwan YuHyang-Shik KongSu-Hyoung Kang
    • G02F1/1333G02F1/1343G02F1/1345
    • G02F1/136286G02F2001/13629
    • A thin film transistor array panel including a display area having a gate line, a data line insulated from and intersecting the gate line, a thin film transistor connected to the gate line and the data line, and a pixel electrode connected to the thin film transistor, and a peripheral area formed on the circumference of the display area, according to an exemplary embodiment of the present invention, includes: a driving signal line formed with the same layer as the gate line in the peripheral area and receiving an external signal; a connection signal line formed with the same layer as the data line in the peripheral area; a disconnection prevention member overlapping the side surface of the connection signal line on the connection signal line; and a connection assistance member formed on the disconnection prevention member and connecting the driving signal line and the connection signal line.
    • 一种薄膜晶体管阵列面板,包括具有栅极线的显示区域,与栅极线绝缘并与之相交的数据线,连接到栅极线和数据线的薄膜晶体管,以及连接到薄膜晶体管的像素电极 以及形成在显示区域的圆周上的周边区域,根据本发明的示例性实施例,包括:形成与周边区域中的栅极线相同层并且接收外部信号的驱动信号线; 连接信号线,其与周边区域中的数据线形成相同的层; 断开防止部件与连接信号线上的连接信号线的侧面重叠; 以及连接辅助构件,其形成在所述防止断开构件上并且连接所述驱动信号线和所述连接信号线。
    • 29. 发明授权
    • Thin film transistor array panel for liquid crystal display having pixel electrode
    • 具有像素电极的液晶显示器的薄膜晶体管阵列面板
    • US07646444B2
    • 2010-01-12
    • US11873767
    • 2007-10-17
    • Dong-Gyu KimHyang-Shik KongJang-Soo Kim
    • Dong-Gyu KimHyang-Shik KongJang-Soo Kim
    • G02F1/136G02F1/1343
    • G02F1/136213G02F1/1337G02F1/133784G02F1/134336G02F1/136227G02F2201/123
    • A TFT array panel includes an insulating substrate, a gate line and a storage electrode line formed thereon. The gate line and the storage electrode line are covered with a gate insulating layer, and a semiconductor island is formed on the gate insulating layer. A pair of ohmic contacts are formed on the semiconductor island, and a data line and a drain electrode are formed thereon. The data line and the drain electrode are covered with a passivation layer having a contact hole exposing the drain electrode. A pixel electrode is formed on the passivation layer and connected to the drain electrode through the contact hole. The TFT array panel is covered with an alignment layer rubbed approximately in a direction from the upper left corner to the lower right corner of the TFT array panel or the pixel electrodes. The pixel electrode has approximately a rectangular shape and overlaps the gate line and the data line. The pixel electrode has an expansion located near the upper left corner of the pixel electrode to increase the width of the corresponding overlapping area between the pixel electrode and the gate line and/or the data line.
    • TFT阵列面板包括绝缘基板,栅极线和形成在其上的存储电极线。 栅极线和存储电极线被栅极绝缘层覆盖,并且在栅极绝缘层上形成半导体岛。 在半导体岛上形成一对欧姆接触,在其上形成数据线和漏电极。 数据线和漏电极被具有暴露漏电极的接触孔的钝化层覆盖。 像素电极形成在钝化层上,并通过接触孔与漏电极连接。 TFT阵列面板被大致沿着从TFT阵列板的左上角到右下角或像素电极的方向摩擦的取向膜覆盖。 像素电极具有大致矩形形状并且与栅极线和数据线重叠。 像素电极具有位于像素电极的左上角附近的扩展部,以增加像素电极与栅极线和/或数据线之间的对应重叠区域的宽度。
    • 30. 发明授权
    • Method for manufacturing contact structures of wiring
    • 制造布线接触结构的方法
    • US07575963B2
    • 2009-08-18
    • US11874769
    • 2007-10-18
    • Hyang-Shik KongMyung-Koo HurChi-Woo Kim
    • Hyang-Shik KongMyung-Koo HurChi-Woo Kim
    • H01L21/84H01L21/00
    • G02F1/13439G02F1/13458H01L21/76801H01L21/76838H01L23/53209H01L27/12H01L27/124H01L27/1288H01L29/458H01L2924/0002H01L2924/00
    • First, a conductive material of aluminum-based material is deposited and patterned to form a gate wire including a gate line, a gate pad, and a gate electrode. A gate insulating layer is formed by depositing nitride silicon in the range of more than 300° C. for 5 minutes, and a semiconductor layer an ohmic contact layer are sequentially formed. Next, a conductor layer of a metal such as Cr is deposited and patterned to form a data wire include a data line intersecting the gate line, a source electrode, a drain electrode and a data pad. Then, a passivation layer is deposited and patterned to form contact holes exposing the drain electrode, the gate pad and the data pad. Next, indium zinc oxide is deposited and patterned to form a pixel electrode, a redundant gate pad and a redundant data pad respectively connected to the drain electrode, the gate pad and the data pad.
    • 首先,将铝基材料的导电材料沉积并图案化以形成包括栅极线,栅极焊盘和栅电极的栅极线。 通过在大于300℃的范围内沉积氮化硅5分钟形成栅极绝缘层,并依次形成半导体层欧姆接触层。 接下来,沉积并图案化诸如Cr的金属的导体层以形成数据线,其包括与栅极线相交的数据线,源电极,漏电极和数据焊盘。 然后,沉积并图案化钝化层以形成暴露漏电极,栅极焊盘和数据焊盘的接触孔。 接下来,沉积并图案化氧化铟锌以形成分别连接到漏电极,栅极焊盘和数据焊盘的像素电极,冗余栅极焊盘和冗余数据焊盘。