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21. 发明申请

US20090146082A1 Pattern Lock System for Particle-Beam Exposure Apparatus 有权
标题翻译：用于粒子束曝光装置的图案锁定系统
公开(公告)号：US20090146082A1
公开(公告)日：2009-06-11
申请号：US11719320
申请日：2005-11-15
申请人： Gerhard Stengl , Herbert Buschbeck , Robert Nowak
发明人： Gerhard Stengl , Herbert Buschbeck , Robert Nowak
IPC分类号： G21K5/10
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3045 , H01J37/3177
摘要： In a pattern-lock system of particle-beam apparatus wherein the imaging of the pattern is done by means of at least two consecutive projector stages of the projecting system, reference marks are imaged upon registering means to determine the position of the particle-beam, at the location of an intermediary image of the reference marks produced by a non-final projector stage, with the registering means being positioned at locations of nominal positions of an intermediary imaging plane. Furthermore, to produce a scanning movement over the registering means the reference beamlets are shifted laterally by means of deflector means provided in the pattern defining means in dependence of a time-dependent electric voltage.
摘要翻译：在粒子束装置的图案锁定系统中，其中通过投影系统的至少两个连续的投影台进行图案的成像，参考标记在登记装置上成像以确定粒子束的位置，在由非最终投影仪舞台产生的参考标记的中间图像的位置处，其中登记装置位于中间成像平面的标称位置的位置。此外，为了在登记装置上产生扫描运动，根据时间相关的电压，通过设置在图案定义装置中的偏转装置横向移动参考子束。

22. 发明授权

US07772574B2 Pattern lock system for particle-beam exposure apparatus 有权
标题翻译：用于粒子束曝光装置的图案锁定系统
公开(公告)号：US07772574B2
公开(公告)日：2010-08-10
申请号：US11719320
申请日：2005-11-15
申请人： Gerhard Stengl , Herbert Buschbeck , Robert Nowak
发明人： Gerhard Stengl , Herbert Buschbeck , Robert Nowak
IPC分类号： G21K5/10
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3045 , H01J37/3177
摘要： In a pattern-lock system of particle-beam apparatus wherein the imaging of the pattern is done by means of at least two consecutive projector stages of the projecting system, reference marks are imaged upon registering means to determine the position of the particle-beam, at the location of an intermediary image of the reference marks produced by a non-final projector stage, with the registering means being positioned at locations of nominal positions of an intermediary imaging plane. Furthermore, to produce a scanning movement over the registering means the reference beamlets are shifted laterally by means of deflector means provided in the pattern defining means in dependence of a time-dependent electric voltage.
摘要翻译：在粒子束装置的图案锁定系统中，其中通过投影系统的至少两个连续的投影台进行图案的成像，参考标记在登记装置上成像以确定粒子束的位置，在由非最终投影仪舞台产生的参考标记的中间图像的位置处，其中登记装置位于中间成像平面的标称位置的位置。此外，为了在登记装置上产生扫描运动，根据时间相关的电压，通过设置在图案定义装置中的偏转装置横向移动参考子束。

23. 发明授权

US08368015B2 Particle-optical system 有权
标题翻译：粒子光学系统
公开(公告)号：US08368015B2
公开(公告)日：2013-02-05
申请号：US11990067
申请日：2006-08-08
申请人： Elmar Platzgummer , Gerhard Stengl , Helmut Falkner
发明人： Elmar Platzgummer , Gerhard Stengl , Helmut Falkner
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/12 , B82Y10/00 , B82Y40/00 , H01J37/3177
摘要： The present invention relates to a multi-beamlet multi-column particle-optical system comprising a plurality of columns which are disposed in an array for simultaneously exposing a substrate, each column having an optical axis and comprising: a beamlet generating arrangement comprising at least one multi-aperture plate for generating a pattern of multiple beamlets of charged particles, and an electrostatic lens arrangement comprising at least one electrode element; the at least one electrode element having an aperture defined by an inner peripheral edge facing the optical axis, the aperture having a center and a predetermined shape in a plane orthogonal to the optical axis; wherein in at least one of the plurality of columns, the predetermined shape of the aperture is a non-circular shape with at least one of a protrusion and an indentation from an ideal circle about the center of the aperture.
摘要翻译：多子束多列粒子光学系统技术领域本发明涉及一种多子束多列粒子光学系统，该多子束多列粒子光学系统包括多个列，其被布置成阵列以同时暴露衬底，每个列具有光轴，并且包括：子束产生装置，其包括至少一个用于产生多个带电粒子束的图案的多孔板，以及包括至少一个电极元件的静电透镜装置; 所述至少一个电极元件具有由面向光轴的内周边缘限定的孔，所述孔在与所述光轴正交的平面中具有中心和预定形状; 其中在所述多个列中的至少一个列中，所述孔的预定形状是非圆形形状，其具有围绕所述孔的中心的来自理想圆的突起和凹陷中的至少一个。

24. 发明申请

US20100270474A1 Particle-Optical System 有权
标题翻译：粒子光学系统
公开(公告)号：US20100270474A1
公开(公告)日：2010-10-28
申请号：US11990067
申请日：2006-08-08
申请人： Elmar Platzgummer , Gerhard Stengl , Helmut Falkner
发明人： Elmar Platzgummer , Gerhard Stengl , Helmut Falkner
IPC分类号： H01J37/12 , H01J3/18
CPC分类号： H01J37/12 , B82Y10/00 , B82Y40/00 , H01J37/3177
摘要： The present invention relates to a multi-beamlet multi-column particle-optical system comprising a plurality of columns which are disposed in an array for simultaneously exposing a substrate, each column having an optical axis and comprising: a beamlet generating arrangement comprising at least one multi-aperture plate for generating a pattern of multiple beamlets of charged particles, and an electrostatic lens arrangement comprising at least one electrode element; the at least one electrode element having an aperture defined by an inner peripheral edge facing the optical axis, the aperture having a center and a predetermined shape in a plane orthogonal to the optical axis; wherein in at least one of the plurality of columns, the predetermined shape of the aperture is a non-circular shape with at least one of a protrusion and an indentation from an ideal circle about the center of the aperture.
摘要翻译：多子束多列粒子光学系统技术领域本发明涉及一种多子束多列粒子光学系统，该多子束多列粒子光学系统包括多个列，其被布置成阵列以同时暴露衬底，每个列具有光轴，并且包括：子束产生装置，其包括至少一个用于产生多个带电粒子束的图案的多孔板，以及包括至少一个电极元件的静电透镜装置; 所述至少一个电极元件具有由面向光轴的内周边缘限定的孔，所述孔在与所述光轴正交的平面中具有中心和预定形状; 其中在所述多个列中的至少一个列中，所述孔的预定形状是非圆形形状，其具有围绕所述孔的中心的来自理想圆的突起和凹陷中的至少一个。

25. 发明申请

US20080258084A1 Charged-Particle Exposure Apparatus 有权
标题翻译：带电粒子曝光装置
公开(公告)号：US20080258084A1
公开(公告)日：2008-10-23
申请号：US11816353
申请日：2006-02-16
申请人： Elmar Platzgummer , Stefan Cernusca , Gerhard Stengl
发明人： Elmar Platzgummer , Stefan Cernusca , Gerhard Stengl
IPC分类号： G21K5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3175 , H01J2237/31788 , H01J2237/31793
摘要： A particle-beam projection processing apparatus for irradiating a target, with an illumination system for forming a wide-area illuminating beam of energetic electrically charged particles; a pattern definition means for positioning an aperture pattern in the path of the illuminating beam; and a projection system for projecting the beam thus patterned onto a target to be positioned after the projection system. A foil located across the path of the patterned beam is positioned between the pattern definition means and the position of the target at a location close to an image of the aperture pattern formed by the projection system.
摘要翻译：一种用于照射目标的粒子束投影处理装置，具有用于形成能量带电粒子的广域照明光束的照明系统; 用于将光圈图案定位在照明光束的路径中的图案定义装置; 以及投影系统，用于将如此图案化的光束投影到待投影系统上的待定位的靶上。位于图案化光束的路径上的箔位于图案定义装置之间并且位于靠近由投影系统形成的孔径图案的图像的位置处的目标的位置。

26. 发明授权

US08368030B2 Charged particle beam exposure system and beam manipulating arrangement 有权
公开(公告)号：US08368030B2
公开(公告)日：2013-02-05
申请号：US11988922
申请日：2006-07-20
申请人： Elmar Platzgummer , Gerhard Stengl
发明人： Elmar Platzgummer , Gerhard Stengl
IPC分类号： G21K5/04
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/0435
摘要： A beam manipulating arrangement for a multi beam application using charged particles comprises a multi-aperture plate having plural apertures traversed by beams of charged particles. A frame portion of the multi-aperture plate is heated to reduce temperature gradients within the multi-aperture plate. Further, a heat emissivity of a surface of the multi-aperture plate may be higher in some regions as compared to other regions in view of also reducing temperature gradients.

27. 发明授权

US07041992B2 Charged-particle multi-beam exposure apparatus 有权
公开(公告)号：US07041992B2
公开(公告)日：2006-05-09
申请号：US10969493
申请日：2004-10-20
申请人： Gerhard Stengl , Elmar Platzgummer , Hans Loschner
发明人： Gerhard Stengl , Elmar Platzgummer , Hans Loschner
IPC分类号： H01J37/08 , G21G5/00
摘要： A charged-particle multi-beam exposure apparatus (1) for exposure of a target (41) uses a plurality of beams of electrically charged particles, which propagate along parallel beam paths towards the target (41). For each particle beam an illumination system (10), a pattern definition means (20) and a projection optics system (30) are provided. The illuminating system (10) and/or the projection optics system (30) comprise particle-optical lenses having lens elements (L1, L2, L3, L4, L5) common to more than one particle beam. The pattern definition means (20) defines a multitude of beamlets in the respective particle beam, forming its shape into a desired pattern which is projected onto the target (41), by allowing it to pass only through a plurality of apertures defining the shape of beamlets permeating said apertures, and further comprises a blanking means to switch off the passage of selected beamlets from the respective paths of the beamlets.

28. 发明申请

US20060068096A1 METHOD OF SYNTHESISING CARBON NANO TUBES 失效
标题翻译：合成碳纳米管的方法
公开(公告)号：US20060068096A1
公开(公告)日：2006-03-30
申请号：US10301317
申请日：2002-11-20
申请人： Xinhe Tang , Klaus Mauthner , Ernst Hammel , Hans Loschner , Elmar Platzgummer , Gerhard Stengl
发明人： Xinhe Tang , Klaus Mauthner , Ernst Hammel , Hans Loschner , Elmar Platzgummer , Gerhard Stengl
IPC分类号： C23C16/00
CPC分类号： C30B23/00 , B82Y30/00 , B82Y40/00 , C01B32/162 , C30B29/02 , C30B29/605 , C30B33/00 , Y10S427/102
摘要： Method of synthesising carbon nano tubes (CNTs) on a catalyst layer formed on a support member, by catalytic deposition of carbon from a gaseous phase, whereby an ion beam is used prior to, during and/or after formation of said carbon nano tubes for modifying the physical, chemical and/or conductive properties of said carbon nano tubes.
摘要翻译：在形成在支撑构件上的催化剂层上合成碳纳米管（CNT）的方法，通过从气相中催化沉积碳，由此在形成所述碳纳米管之前，期间和/或之后使用离子束，改变所述碳纳米管的物理，化学和/或导电性质。

29. 发明申请

US20050104013A1 Charged-particle multi-beam exposure apparatus 有权
标题翻译：带电粒子多光束曝光装置
公开(公告)号：US20050104013A1
公开(公告)日：2005-05-19
申请号：US10969493
申请日：2004-10-20
申请人： Gerhard Stengl , Elmar Platzgummer , Hans Loschner
发明人： Gerhard Stengl , Elmar Platzgummer , Hans Loschner
IPC分类号： G03F7/20 , H01J37/317 , H01L21/027 , H01J37/08
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3177
摘要： A charged-particle multi-beam exposure apparatus (1) for exposure of a target (41) uses a plurality of beams of electrically charged particles, which propagate along parallel beam paths towards the target (41). For each particle beam an illumination system (10), a pattern definition means (20) and a projection optics system (30) are provided. The illuminating system (10) and/or the projection optics system (30) comprise particle-optical lenses having lens elements (L1, L2, L3, L4, L5) common to more than one particle beam. The pattern definition means (20) defines a multitude of beamlets in the respective particle beam, forming its shape into a desired pattern which is projected onto the target (41), by allowing it to pass only through a plurality of apertures defining the shape of beamlets permeating said apertures, and further comprises a blanking means to switch off the passage of selected beamlets from the respective paths of the beamlets.
摘要翻译：用于曝光目标（41）的带电粒子多光束曝光装置（1）使用沿平行光束路径朝向目标（41）传播的多个带电粒子束。对于每个粒子束，提供照明系统（10），图案定义装置（20）和投影光学系统（30）。照明系统（10）和/或投影光学系统（30）包括具有多于一个粒子束共有的透镜元件（L 1，L 2，L 3，L 4，L 5）的粒子 - 光学透镜。图案定义装置（20）在相应的粒子束中限定多个子束，通过使其仅通过限定形状的多个孔而将其形状形成为投射到目标（41）上的期望图案子束穿透所述孔，并且还包括消隐装置，以切断所选子束从子束的相应路径的通过。

30. 发明申请

US20090140160A1 Charged particle beam exposure system and beam manipulating arrangement 有权
标题翻译：带电粒子束曝光系统和光束操纵装置
公开(公告)号：US20090140160A1
公开(公告)日：2009-06-04
申请号：US11988922
申请日：2006-07-20
申请人： Elmar Platzgummer , Gerhard Stengl
发明人： Elmar Platzgummer , Gerhard Stengl
IPC分类号： H01J3/14
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/0435
摘要： A beam manipulating arrangement for a multi beam application using charged particles comprises a multi-aperture plate having plural apertures traversed by beams of charged particles. A frame portion of the multi-aperture plate is heated to reduce temperature gradients within the multi-aperture plate. Further, a heat emissivity of a surface of the multi-aperture plate may be higher in some regions as compared to other regions in view of also reducing temperature gradients.
摘要翻译：用于使用带电粒子的多光束施加的光束操纵装置包括具有由带电粒子束穿过的多个孔的多孔板。加热多孔板的框架部分以降低多孔板内的温度梯度。此外，考虑到降低温度梯度，与其他区域相比，多孔板的表面的发热率在一些区域可能更高。

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