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    • 21. 发明授权
    • Method for reducing metal ion concentration in brine solution
    • 降低盐水溶液中金属离子浓度的方法
    • US06426008B2
    • 2002-07-30
    • US09378957
    • 1999-08-23
    • James Manio SilvaDonald Franklin FoustThomas Joseph Fyvie
    • James Manio SilvaDonald Franklin FoustThomas Joseph Fyvie
    • B01D1500
    • C01D3/145
    • This invention relates to a method for removing impurities from a brine solution, the brine solution comprising a water soluble chelating agent, the method comprising the steps of: a) adjusting the pH of the brine solution to a pH of from about 2 to about 4; b) passing the brine solution through a first functionalized resin; the first functionalized resin having functional groups capable of removing multivalent metal cations from the brine solution; c) adjusting the pH of the brine solution to a pH of from about 9 to about 11.5; and d) passing the brine solution through a second functionalized resin; the second functionalized resin having functional groups capable of removing alkaline earth metal cations from the brine solution.
    • 本发明涉及一种从盐水溶液中除去杂质的方法,盐水溶液包含水溶性螯合剂,该方法包括以下步骤:a)将盐水溶液的pH值调节至约2至约4的pH值 b)使盐水溶液通过第一官能化树脂; 具有能够从盐水溶液中除去多价金属阳离子的官能团的第一官能化树脂; c)将盐水溶液的pH调节至约9至约11.5的pH; 和)将盐水溶液通过第二官能化树脂; 第二官能化树脂具有能够从盐水溶液中除去碱土金属阳离子的官能团。
    • 22. 发明授权
    • Method of forming ruthenium oxide films
    • 形成氧化钌膜的方法
    • US06417062B1
    • 2002-07-09
    • US09562194
    • 2000-05-01
    • Donald Franklin FoustJames Wilson RoseErnest Wayne Balch
    • Donald Franklin FoustJames Wilson RoseErnest Wayne Balch
    • H01L2120
    • H01L28/24C23C18/1216C23C18/14H01L21/288H01L21/31683H01L21/76888H01L28/60H05K1/167
    • A method of forming a ruthenium dioxide film for such purposes as the fabrication of stable thin-film resistors for microcircuits. The method generally entails forming an inorganic ruthenium-based film on a substrate, and then thermally decomposing at least a portion of the ruthenium-based film by exposure to a high-intensity beam of radiation, preferably visible light, to yield a ruthenium dioxide film on the substrate. Particular ruthenium-based precursors useful for forming the ruthenium-based film include ruthenium (III) chloride (RuCl3.nH2O) and ruthenium (III) nitrosyl nitrate. The method does not require a thermal treatment that heats the bulk of the substrate on which the ruthenium dioxide film is formed, and is therefore suitable for non-ceramic substrate materials, e.g., polymers such as those used as printed circuit boards (PCBs) and flexible circuits.
    • 形成用于微电路的稳定薄膜电阻器的制造的目的的二氧化钌膜的方法。 该方法通常需要在基板上形成无机钌基膜,然后通过暴露于高强度辐射束(优选可见光)来热分解钌基膜的至少一部分,以产生二氧化钌膜 在基板上。 用于形成钌基膜的特定的基于钌的前体包括氯化钌(III)(RuCl 3·nH 2 O)和硝酸亚硝基硝酸钌(III)。 该方法不需要加热其上形成有二氧化钌膜的基底的主体的热处理,因此适用于非陶瓷基底材料,例如聚合物,例如用作印刷电路板(PCB)的聚合物和 柔性电路。
    • 26. 发明授权
    • Process for preparing a photo-mask for imaging three-dimensional objects
    • 制备用于成像三维物体的光掩模的方法
    • US5153084A
    • 1992-10-06
    • US580064
    • 1990-09-10
    • Donald Franklin FoustBradley R. KarasEdward J. LambyWilliam V. Dumas
    • Donald Franklin FoustBradley R. KarasEdward J. LambyWilliam V. Dumas
    • G03F1/68H05K1/00H05K3/00
    • G03F7/24G03F1/68H05K3/0002H05K1/0284H05K2203/056
    • A method for the preparation a photo-mask used for photo-imaging selected areas on the surfaces of a three-dimensional printed circuit board substrate. The photo-mask comprises a membrane transparent and degradation resistant to UV light, having at least one side with a contoured shape conforming, and flexible enough to comply with surface irregularities on the surfaces of the three-dimensional substrate being photo-imaged. A pattern of tracks opaque to UV light is positioned along the contoured shape of the membrane. The pattern of tracks on the photo-mask is in accordance with a desired conductive metal trace pattern on the surfaces of the three-dimensional printed circuit board substrate. The photo-mask is prepared by dispensing a track material in a boustrophedenous manner on the surfaces of the substrate being photo-imaged. A membrane material is then poured upon the surfaces containing the dispensed tracks. Once the materials of tracks and membrane set and are separated from the substrate, the photo-mask of the present invention is formed.
    • 一种用于制备用于对三维印刷电路板基板的表面上的选定区域进行光学成像的光掩模的方法。 所述光掩模包括透明且耐紫外光降解的膜,其具有至少一个具有轮廓形状的侧面,并且足够柔性以使其符合正在被光成像的三维基底的表面上的表面凹凸。 沿紫外线不透明的轨道图案沿着膜的轮廓形状定位。 光掩模上的轨迹图案与三维印刷电路板基板表面上所需的导电金属迹线图案相符。 光掩模的制备方法是以光束成像的方式在基底表面上分散轨道材料。 然后将膜材料倒在包含分配的轨道的表面上。 轨道和膜的材料一旦与衬底分离,就形成本发明的光掩膜。