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    • 22. 发明申请
    • Thin film transistor substrate and fabricating method thereof, liquid crystal display panel using the same and fabricating method thereof
    • 薄膜晶体管基板及其制造方法,使用其的液晶显示面板及其制造方法
    • US20090284676A1
    • 2009-11-19
    • US12458784
    • 2009-07-22
    • Byung Chul AhnByoung Ho LimJae Jun Ahn
    • Byung Chul AhnByoung Ho LimJae Jun Ahn
    • G02F1/1368
    • G02F1/136227G02F2001/136231H01L27/124H01L27/1288
    • A thin film transistor substrate and a fabricating method thereof; and a liquid crystal display panel employing the same and a fabricating method thereof for simplifying a process are disclosed. A thin film transistor substrate, including: a gate line on a substrate; a data line crossing the gate line having a gate insulating film therebetween to define a pixel area; a pixel hole in the pixel area; a pixel electrode made of a transparent conductive film on the gate insulating film in the pixel hole in the pixel area; and a thin film transistor including a gate electrode connected to the gate line, a source electrode connected to the data line, a drain electrode connected to the pixel electrode, and a semiconductor layer defining a channel between the source electrode and the drain electrode, wherein the semiconductor layer overlaps with a source/drain metal pattern including the data line, the source electrode, and the drain electrode; wherein the drain electrode protrudes from the semiconductor layer toward an upper portion of the pixel electrode, and the drain electrode connects to the pixel electrode; and wherein the semiconductor layer is removed from where it overlaps the transparent conductive film.
    • 一种薄膜晶体管基板及其制造方法; 并且公开了一种使用该液晶显示面板的液晶显示面板及其制造方法,用于简化工艺。 一种薄膜晶体管衬底,包括:衬底上的栅极线; 与栅极线交叉的数据线,其间具有栅极绝缘膜,以限定像素区域; 像素区域中的像素孔; 像素区域中的像素孔中的栅极绝缘膜上的由透明导电膜构成的像素电极; 以及薄膜晶体管,其包括连接到所述栅极线的栅电极,连接到所述数据线的源电极,连接到所述像素电极的漏电极以及限定所述源电极和所述漏电极之间的沟道的半导体层,其中, 半导体层与包括数据线,源电极和漏电极的源极/漏极金属图案重叠; 其中,所述漏电极从所述半导体层向所述像素电极的上部突出,所述漏电极与所述像素电极连接; 并且其中半导体层从其与透明导电膜重叠的地方去除。
    • 23. 发明授权
    • Fabricating method for a liquid crystal display of horizontal electric field applying type
    • 水平电场应用型液晶显示器的制造方法
    • US07553708B2
    • 2009-06-30
    • US11529592
    • 2006-09-29
    • Byung Chul AhnByoung Ho Lim
    • Byung Chul AhnByoung Ho Lim
    • H01L29/04
    • G02F1/13458G02F1/134363G02F2001/136236H01L27/124H01L27/1288
    • A liquid crystal display having an applied horizontal electric field comprising: a gate line; a common line substantially parallel to the gate line; a data line arranged to cross the gate line and the common line to define a pixel area; a thin film transistor formed at each crossing of the gate line and the data line; a common electrode formed in the pixel area and connected to the common line; a pixel electrode connected to the thin film transistor, wherein the horizontal electric field is formed between the pixel electrode and the common electrode in the pixel area; a gate pad formed with at least one conductive layer included in the gate line; a data pad formed with at least one conductive layer included in the data line; a common pad formed with at least one conductive layer included in the common line; a passivation film to expose at least one of the gate pad, the data pad and the common pad; and a driving integrated circuit mounted on a substrate to connect directly to one of the gate pad and the data pad.
    • 一种具有施加的水平电场的液晶显示器,包括:栅极线; 基本上平行于栅极线的公共线; 布置成跨越所述栅极线和所述公共线以限定像素区域的数据线; 形成在栅极线和数据线的每个交叉处的薄膜晶体管; 在像素区域中形成并连接到公共线的公共电极; 连接到所述薄膜晶体管的像素电极,其中在像素区域中的像素电极和公共电极之间形成水平电场; 栅极焊盘,其形成有包括在栅极线中的至少一个导电层; 数据焊盘,其形成有包括在所述数据线中的至少一个导电层; 公共焊盘,其形成有包括在所述公共线中的至少一个导电层; 钝化膜以暴露所述栅极焊盘,所述数据焊盘和所述公共焊盘中的至少一个; 以及安装在基板上以直接连接到所述栅极焊盘和所述数据焊盘之一的驱动集成电路。
    • 24. 发明授权
    • Liquid crystal display device and fabricating method having reflective electrode connecting pixel electrode with drain and upper storage capacitor electrodes at edge of transmission hole
    • 具有反射电极的液晶显示装置及其制造方法,该反射电极将透明孔的边缘处的漏极和上部存储电容器电极的像素电极连接
    • US07528909B2
    • 2009-05-05
    • US11139501
    • 2005-05-31
    • Byung Chul AhnJong Woo Park
    • Byung Chul AhnJong Woo Park
    • G02F1/1335
    • G02F1/13458G02F1/133555G02F1/13624G02F2001/136231G02F2001/136236G02F2001/13629
    • A method of fabricating a LCD device includes forming a gate line, a gate electrode, and a pixel electrode having a double-layer structure on a first substrate using a first mask, the double-layer structure including first and second conductive layers; forming a first insulation film, a semiconductor pattern on the first insulation film, a source/drain pattern having an upper storage electrode, source and drain electrodes, a data line using a second mask, the data and gate lines defining a pixel region having transmission and reflection areas; forming a second insulation film on the source/drain pattern and a transmission hole by passing through the second insulation film to the second conductive layer in the transmission area using a third mask; and forming a reflective electrode in the reflection area using a fourth mask, the reflective electrode connecting the pixel electrode with the drain electrode and the storage electrode.
    • 一种制造LCD器件的方法包括:使用第一掩模在第一衬底上形成具有双层结构的栅极线,栅电极和像素电极,所述双层结构包括第一和第二导电层; 形成第一绝缘膜,第一绝缘膜上的半导体图案,具有上部存储电极的源极/漏极图案,源极和漏极,使用第二掩模的数据线,限定具有透射的像素区域的数据线和栅极线 和反射区域; 在所述源极/漏极图案上形成第二绝缘膜,通过使用第三掩模将所述第二绝缘膜穿过所述透射区域中的所述第二导电层,形成透射孔; 以及使用第四掩模在所述反射区域中形成反射电极,所述反射电极将所述像素电极与所述漏电极和所述存储电极连接。
    • 27. 发明申请
    • Liquid crystal display device
    • 液晶显示装置
    • US20080143903A1
    • 2008-06-19
    • US12068361
    • 2008-02-05
    • Byung Chul Ahn
    • Byung Chul Ahn
    • G02F1/1343
    • G02F1/136286G02F1/136213G02F2001/136236G02F2001/13629H01L27/124H01L27/1255H01L27/1288
    • A thin film transistor substrate of a LCD device and a fabricating method thereof are disclosed for simplifying a fabricating process and enlarging a capacitance value of a storage capacitor without any reduction of aperture ratio. The LCD device includes: a double-layered gate line having a first transparent conductive layer and a second opaque conductive layer, the second opaque conductive layer have a step coverage; a gate insulation layer film on the gate line; a data line crossing the gate line to define a pixel region; a TFT connected to the gate line and the data line; a pixel electrode connected to the TFT via a contact hole of a protective film on the TFT; and a storage capacitor overlapping the pixel electrode and having a lower storage electrode formed of the first transparent conductive layer.
    • 公开了一种LCD器件的薄膜晶体管基板及其制造方法,用于简化制造工艺并扩大存储电容器的电容值,而不会降低开口率。 LCD装置包括:具有第一透明导电层和第二不透明导电层的双层栅极线,第二不透明导电层具有台阶覆盖; 栅极线上的栅极绝缘层膜; 与栅极线交叉以限定像素区域的数据线; 连接到栅极线和数据线的TFT; 通过TFT上的保护膜的接触孔与TFT连接的像素电极; 以及与所述像素电极重叠并具有由所述第一透明导电层形成的下部存储电极的存储电容器。
    • 29. 发明授权
    • Liquid crystal display device and fabricating method thereof
    • 液晶显示装置及其制造方法
    • US08179510B2
    • 2012-05-15
    • US11168358
    • 2005-06-29
    • Byung Chul AhnByoung Ho LimJae Jun Ahn
    • Byung Chul AhnByoung Ho LimJae Jun Ahn
    • G02F1/1343G02F1/1345G02F1/13
    • G02F1/134363G02F1/1368G02F2001/136231
    • A liquid crystal display device having first and second substrates; a gate line on the first substrate; a data line crossing the gate line to define a pixel area, the gate line and the data line having a gate insulating film there between; a thin film transistor including a gate electrode, a source electrode, a drain electrode and a semiconductor layer for defining a channel between the source electrode and the drain electrode; a common line in parallel to the gate line on the first substrate; a common electrode extended from the common line in the pixel area; and a pixel electrode spaced apart from the common line and the common electrode in the pixel area to be defined in a pixel hole passing through the gate insulating film, wherein the semiconductor layer overlaps with a source and drain metal pattern including the data line, the source electrode and the drain electrode, and wherein the drain electrode protrudes from the semiconductor layer toward an upper portion of the pixel electrode to be connected to the pixel electrode.
    • 一种具有第一和第二基板的液晶显示装置; 第一基板上的栅极线; 与栅极线交叉以限定像素区域的数据线,栅极线和数据线之间具有栅极绝缘膜; 包括栅电极,源电极,漏电极和用于限定源电极和漏电极之间的沟道的半导体层的薄膜晶体管; 与第一衬底上的栅极线并联的公共线; 从像素区域中的公共线延伸的公共电极; 以及与通过栅极绝缘膜的像素孔中限定的像素区域中的公共线和公共电极间隔开的像素电极,其中半导体层与包括数据线的源极和漏极金属图案重叠, 源电极和漏电极,并且其中漏电极从半导体层突出到像素电极的上部,以连接到像素电极。
    • 30. 发明授权
    • Liquid crystal display device and fabricating method thereof
    • 液晶显示装置及其制造方法
    • US08111363B2
    • 2012-02-07
    • US12951907
    • 2010-11-22
    • Byung Chul Ahn
    • Byung Chul Ahn
    • G02F1/1343
    • G02F1/134363G02F2001/136231G02F2001/13629
    • A LCD device includes a gate line on a substrate and a data line crossing the gate line to define a pixel area; a thin film transistor source and drain electrodes; a common line parallel to the gate line; a common electrode extended from the common line and a pixel electrode extending from the drain electrode wherein the gate line and the common line have a first conductive layer group having at least double conductive layers, and the common electrode is formed by an extension of at least one transparent conductive layer of the common line; and the gate line, the source electrode and the drain electrode have a second conductive layer group having at least double conductive layers, and the pixel electrode is formed by an extension of at least one transparent conductive layer of the drain electrode.
    • LCD装置包括在基板上的栅极线和与栅极线交叉以限定像素区域的数据线; 薄膜晶体管源极和漏极; 与栅极线平行的公共线; 从公共线延伸的公共电极和从漏电极延伸的像素电极,其中栅极线和公共线具有至少具有双重导电层的第一导电层组,并且公共电极至少由延伸形成 公共线的一个透明导电层; 并且栅极线,源电极和漏电极具有至少具有双重导电层的第二导电层组,并且像素电极由漏电极的至少一个透明导电层的延伸形成。