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    • 24. 发明申请
    • DEFECT REDUCTION RINSE SOLUTION CONTAINING AMMONIUM SALTS OF SULFOESTERS
    • 含有硫酸钠的缺陷减少溶液
    • WO2017009068A1
    • 2017-01-19
    • PCT/EP2016/065474
    • 2016-07-01
    • BASF SE
    • BITTNER, ChristianOETTER, GuenterHONCIUC, AndreiKLIPP, AndreasBRAUN, Simon
    • C11D1/12C11D11/00G03F7/42H01L21/02
    • C11D11/0047C11D1/123G03F7/40G03F7/425G03F7/426
    • The present invention relates to the use of a composition comprising one or more ammonium salt(s) of one or more compounds selected from the group consisting of sulfobutanedioic acid diester(s), (sulfomethyl)-butanedioic acid diester(s), methyl-sulfobutanedioic acid diester(s), sulfoglutaric acid diester(s), and sulfotricarballic acid triester(s), for cleaning or rinsing a product comprising a substrate and supported thereon a patterned material layer having line-space structures with a line width of 50 nm and below. The invention also relates to a corresponding method of making a cleaned or rinsed product comprising a substrate and supported thereon a patterned material layer having line-space structures with a line width of 50 nm or below. The invention also relates to a solution with color of HAZEN number below 1000 and/or a turbidity in the range of from 0.08 to 10 NTU, wherein the solution comprises water and one or more ammonium salt(s) and optionally one or more organic solvent compounds. The invention also relates to a method of making a corresponding solution.
    • 本发明涉及包含一种或多种选自下组的一种或多种化合物的组合物的组合物的用途:磺基丁二酸二酯,(磺甲基) - 丁二酸二酯,甲基 - 磺基丁二酸二酯,磺基戊二酸二酯和磺基三球酸酸三酯,用于清洗或漂洗包含基材的产品,并在其上支撑具有线宽为50nm的线间距结构的图案化材料层 及以下。 本发明还涉及一种制造包括基底并在其上被支撑在其上的具有线宽为50nm或更小的线空间结构的图案化材料层的清洁或冲洗产品的相应方法。 本发明还涉及HAZEN值低于1000的颜色和/或0.08至10NTU范围内的浊度的溶液,其中溶液包含水和一种或多种铵盐和任选的一种或多种有机溶剂 化合物。 本发明还涉及制备相应溶液的方法。