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21. 发明授权

US6059985A Method of processing a substrate and apparatus for the method 失效
标题翻译：处理基板的方法和方法的装置
公开(公告)号：US6059985A
公开(公告)日：2000-05-09
申请号：US826735
申请日：1997-04-04
申请人： Takanori Yoshimura , Shigeru Mizuno , Shinya Hasegawa , Yoichiro Numasawa , Nobuyuki Takahashi
发明人： Takanori Yoshimura , Shigeru Mizuno , Shinya Hasegawa , Yoichiro Numasawa , Nobuyuki Takahashi
IPC分类号： H01L21/28 , H01L21/00 , H01L21/20 , H01L21/205 , H01L21/285 , H01L21/302 , H01L21/3065 , H01L21/68
CPC分类号： H01L21/0209
摘要： A method of processing a substrate has the following processes. After depositing a thin film onto a substrate by a CVD method, the front surface of the substrate is brought close to a gas supply surface of a gas supply mechanism to have a desired interval without making contact between the front surface and the gas supply surface. Afterwards, an etching gas is supplied into a back space of the substrate to generate plasma there, and further a purge gas is also supplied into a space between the gas supply surface and the substrate so that the purge gas flows into the back space through a peripheral-edge region of the substrate. This purge gas prevents radicals included in the plasma from diffusing into the space between the gas supply surface and the substrate.
摘要翻译：处理基板的方法具有以下处理。在通过CVD法将薄膜沉积到基板上之后，使基板的前表面靠近气体供给机构的气体供给表面，使其具有期望的间隔而不会在前表面和气体供给表面之间接触。然后，将蚀刻气体供给到基板的后部空间中以在其中产生等离子体，并且还将吹扫气体供应到气体供给表面和基板之间的空间中，使得净化气体通过衬底的周边边缘区域。这种净化气体防止包括在等离子体中的自由基扩散到气体供应表面和基底之间的空间中。

22. 发明授权

US6022461A Sputtering apparatus 失效
标题翻译：溅射装置
公开(公告)号：US6022461A
公开(公告)日：2000-02-08
申请号：US740011
申请日：1996-10-23
申请人： Masahiko Kobayashi , Nobuyuki Takahashi
发明人： Masahiko Kobayashi , Nobuyuki Takahashi
IPC分类号： C23C14/34 , C23C14/04 , C23C14/35 , H01J37/34 , H01L21/203 , H01L21/285
CPC分类号： C23C14/046 , C23C14/228 , C23C14/35 , H01J37/3244 , H01J37/3408
摘要： A long distance sputtering apparatus is provided in which a target and a substrate are disposed so as to oppose each other in a vacuum vessel provided with an exhaust system, wherein the target and substrate are separated by a distance of 150 mm or more. The long distance sputtering apparatus includes a gas-introducing tube, a cylindrical shield, and an exhaust hole. The gas-introducing tube introduces gas from a location closer to the target than halfway between the target and the substrate. The shield is disposed so as to surround the space between the target and the substrate. The exhaust hole is formed closer to the substrate than the gas-introducing tube. The pressure distribution of the sputtering gas between the target and the substrate is characterized by a higher pressure toward the target and a lower pressure toward the substrate.
摘要翻译：提供了一种长距离溅射装置，其中靶和衬底在设置有排气系统的真空容器中彼此相对设置，其中靶和衬底被分开150mm以上的距离。长距离溅射装置包括气体导入管，圆筒形罩和排气孔。气体导入管从距靶子和基板之间的距离较近的位置引入气体。该屏蔽被设置为围绕靶和基板之间的空间。排气孔形成为比气体导入管更靠近基板。靶和基板之间的溅射气体的压力分布的特征在于朝向目标物的压力较高，朝向基板的压力较低。

23. 发明授权

US5808708A Lighting apparatus 失效
标题翻译：照明设备
公开(公告)号：US5808708A
公开(公告)日：1998-09-15
申请号：US573498
申请日：1995-12-14
申请人： Hisashi Oyama , Youko Ohta , Kenichi Ukai , Nobuyuki Takahashi , Takayoshi Tanabe , Hirohide Terasaki
发明人： Hisashi Oyama , Youko Ohta , Kenichi Ukai , Nobuyuki Takahashi , Takayoshi Tanabe , Hirohide Terasaki
IPC分类号： F21V8/00 , G02B6/00 , G02B6/42 , G02F1/13357 , G02F1/1335
CPC分类号： G02B6/0018 , G02B6/4298 , G02B6/0001 , G02B6/002 , G02F1/133615 , Y10S385/901
摘要： A lighting apparatus for irradiating a liquid crystal display panel from the back includes a light guiding plate having at least an end which is bent in a direction opposite to the liquid crystal display panel, and a light source disposed on the back surface of the light guiding plate with respect to the liquid crystal display panel. Light from the light source is incident on the bent section of the light guiding plate, reflected by a reflector covering the outside surface of the bent section, and then falls on a section corresponding to a data display space of the liquid crystal display panel. This structure enables an increase in the ratio of the area of a light emitting section to the area of the entire lighting apparatus.
摘要翻译：用于从背面照射液晶显示面板的照明装置包括导光板，该导光板至少具有沿与液晶显示面板相反的方向弯曲的端部，以及设置在导光板的背面的光源相对于液晶显示面板。来自光源的光入射在导光板的弯曲部分上，由覆盖弯曲部分的外表面的反射器反射，然后落在与液晶显示面板的数据显示空间相对应的部分上。这种结构使得能够增加发光部的面积与整个照明装置的面积的比率。

24. 发明授权

US5658923A Azepine derivatives and use thereof 失效
标题翻译： Azepine衍生物及其用途
公开(公告)号：US5658923A
公开(公告)日：1997-08-19
申请号：US413285
申请日：1995-03-30
申请人： Nobuyuki Takahashi , Daisuke Mochizuki
发明人： Nobuyuki Takahashi , Daisuke Mochizuki
IPC分类号： C07D221/24 , A61K31/44
CPC分类号： C07D221/24
摘要： An azepine compound of the formula ##STR1## wherein R is (a) ##STR2## in which R.sup.1 is hydrogen, lower alkyl, lower alkoxy, hydroxy, halogen, or optionally substituted phenyl, and n is 0 or 1, (b) cycloalkyl of C.sub.5-8 which is optionally substituted by lower alkyl, (c) norbornyl, (d) bicyclo[3.3.1]nonyl, (e) naphthyl, (f) 1,3-benzoxolyl, (g) pyridyl, or (h) thienyl, m is an integer of 0-4, and C* is an asymmetric carbon, and nontoxic salts thereof, processes for producing the same, and therapeutic agents containing the same as the active ingredient for treating diseases related to .sigma.-receptor. The compound (1) and nontoxic salts thereof have a high affinity for .sigma.-receptor but scarcely any affinity for other receptors, thus being utilized for treating diseases related to .sigma.-receptor, such as schizophrenia.
摘要翻译：式（1）的吖庚因化合物其中R是（a）其中R 1是氢，低级烷基，低级烷氧基，羟基，卤素或任选取代的苯基，并且n是0或 1，（b）任选被低级烷基取代的C 5-8的环烷基，（c）降冰片基，（d）双环[3.3.1]壬基，（e）萘基，（f）1,3-苯并恶唑基，（g ）吡啶基，或（h）噻吩基，m为0-4的整数，C *为不对称碳，及其无毒盐，其制备方法，以及含有其作为治疗疾病的活性成分的治疗剂与σ-受体有关。化合物（1）及其无毒盐对σ-受体具有高亲和力，但对其它受体几乎没有任何亲和力，因此用于治疗与σ-受体有关的疾病，例如精神分裂症。

25. 发明授权

US5539173A Electric discharge machining fluid 失效
标题翻译：放电加工液
公开(公告)号：US5539173A
公开(公告)日：1996-07-23
申请号：US144528
申请日：1993-11-02
申请人： Nobuyuki Takahashi
发明人： Nobuyuki Takahashi
IPC分类号： B23H1/08 , B23H5/12
CPC分类号： B23H5/12 , B23H1/08
摘要： An EDM fluid comprising in mixture, a liquid dielectric and a powder, including polycrystalline silicon and a small amount of inorganic oxide, provided for forming a smooth workpiece surface having a carbon-iron-silicon alloy. The powder is preferably present in an amount ranging from about 0.1 to 5.0 wt. % of the liquid dielectric. The inorganic oxide may include silicon oxide, iron oxide, and calcium oxide. Further, a concentrate made by kneading the powder with an oil comprising mainly an aromatic hydrocarbon having a density of more than 0.93 g/milliliter at 15.degree. C. added to the dielectric, whereby the powder is dispersed uniformly.
摘要翻译：包括混合物的电火花液体，包括多晶硅和少量无机氧化物的液体电介质和粉末，用于形成具有碳 - 铁 - 硅合金的光滑工件表面。粉末优选以约0.1至5.0重量％的量存在。％的液体电介质。无机氧化物可以包括氧化硅，氧化铁和氧化钙。此外，通过将粉末与主要包含密度大于0.93g /毫升的芳烃的油在15℃下捏合的浓缩物加入到电介质中，由此粉末均匀分散。

26. 发明授权

US5203448A Push button key switch 失效
标题翻译：按键开关
公开(公告)号：US5203448A
公开(公告)日：1993-04-20
申请号：US832929
申请日：1992-02-11
申请人： Masamitsu Osada , Nobuyuki Takahashi
发明人： Masamitsu Osada , Nobuyuki Takahashi
IPC分类号： H01H3/12 , H01H13/14 , H01H13/705
CPC分类号： H01H13/705 , H01H2215/002 , H01H2215/006 , H01H2221/028 , H01H2221/05 , H01H2227/036 , H01H2233/056
摘要： A push button key switch has an intermediate guide cylinder which is free to slide lengthwise inside a fixed guide cylinder and which at the same time holds the neck of a keytop while allowing it to slide freely lengthwise. The intermediate guide cylinder guides the keytop in its motion while the fixed guide cylinder guides the intermediate guide cylinder in its motion. Downward motion of the keytop causes the lower ends of the neck and the intermediate guide cylinder to collapse an elastic member which, in turn, then activates an electrical contact mechanism.
摘要翻译：按钮按钮开关具有中间导向筒，该中间导向筒在固定导向筒内部可自由地纵向滑动，并且同时保持键顶的颈部同时允许其纵向自由滑动。中间导向筒在其运动中引导键顶，同时固定导向筒在其运动中引导中间导向气缸。键顶的向下运动导致颈部和中间导向筒的下端折叠弹性构件，弹性构件然后启动电接触机构。

27. 发明授权

US5145533A Process for producing grain-oriented electrical steel sheet having excellent magnetic characteristic 失效
标题翻译：具有优异磁特性的晶粒取向电工钢板的制造方法
公开(公告)号：US5145533A
公开(公告)日：1992-09-08
申请号：US769586
申请日：1991-10-02
申请人： Yasunari Yoshitomi , Yozo Suga , Nobuyuki Takahashi , Yoshiyuki Ushigami , Tadashi Nakayama
发明人： Yasunari Yoshitomi , Yozo Suga , Nobuyuki Takahashi , Yoshiyuki Ushigami , Tadashi Nakayama
IPC分类号： C21D8/12 , C21D11/00 , C22C38/00 , C22C38/02 , C22C38/06 , H01F1/16
CPC分类号： C21D8/1255 , C21D11/00 , C21D8/1283
摘要： A process for producing a grain-oriented electrical steel sheet having an excellent magnetic characteristic, comprising the steps of: heating to a temperature lower than 1280.degree. C. a steel slab comprising 0.025 to 0.075 wt % C, 2.5 to 4.5 wt % Si, 0.010 to 0.060 wt % acid-soluble Al, 0.0030 to 0.0130 wt % N, 0.014 wt % or less (S+0.405 Se), 0.05 to 0.8 wt % Mn, and the balance consisting of Fe and unavoidable impurities; hot-rolling the thus heated slab to form a hot-rolled strip; cold-rolling the hot-rolled strip to form a cold-rolled strip; decarburization-annealing the cold-rolled strip; applying an annealing separator on the strip; final-annealing the strip; measuring a primary-recrystallized grain size in the stage after completion of a primary recrystallization during the decarburization annealing and before completion of a secondary recrystallization during the final annealing; and controlling in that stage the subsequent grain growth of primary-recrystallized grains by an absorption of nitrogen into the steel strip in accordance with the measured grain size.
摘要翻译：一种具有优异磁特性的晶粒取向电工钢板的制造方法，包括以下步骤：加热至低于1280℃的钢坯，其包含0.025〜0.075重量％的C，2.5〜4.5重量％的Si， 0.010〜0.060重量％的酸溶性Al，0.0030〜0.0130重量％的N，0.014重量％以下（S + 0.405 Se），0.05〜0.8重量％的Mn，余量由Fe和不可避免的杂质构成。热轧如此加热的板坯以形成热轧带材; 冷轧热轧钢带以形成冷轧带材; 对冷轧带材进行脱碳退火; 在带上施加退火分离器; 对带进行最终退火; 在脱碳退火期间完成一次再结晶之后的阶段和在最终退火期间二次再结晶完成之前的阶段中测量一次再结晶的晶粒尺寸; 并且在该阶段通过根据测量的晶粒尺寸将氮吸收到钢带中来控制一次再结晶晶粒随后的晶粒生长。

28. 发明授权

US5120991A Driver circuit for converting a CMOS level signal to a high-voltage level 失效
标题翻译：将CMOS电平信号转换为高电平电平的驱动电路
公开(公告)号：US5120991A
公开(公告)日：1992-06-09
申请号：US457771
申请日：1990-01-12
申请人： Nobuyuki Takahashi
发明人： Nobuyuki Takahashi
IPC分类号： G06F3/00 , H03K5/02 , H03K17/04 , H03K17/0412 , H03K17/567 , H03K17/687 , H03K19/0175
CPC分类号： H03K17/567 , H03K17/0406 , H03K17/04123
摘要： There is disclosed a driver circuit for driving a flat panel display. In this invention, a gate bias for a MOS transistor for charging an output terminal to high level is generated by a constant voltage element. The value of a current supplied to the constant voltage element is controlled by a current control circuit. In order to turn off the charging MOS transistor, a MOS transistor for discharging the node of the gate of the charging MOS transistor is set in an ON state. In order to switch an output, two drive signals are output from a drive signal generator to turn off both the charging MOS transistor for charging the output terminal to high level and the discharging MOS transistor for discharging the output terminal to low level.

29. 发明授权

US4965027A Method for the freeze-pressure molding of inorganic powders 失效
标题翻译：无机粉末的冷冻成型方法
公开(公告)号：US4965027A
公开(公告)日：1990-10-23
申请号：US286366
申请日：1988-12-16
申请人： Nobuyuki Takahashi
发明人： Nobuyuki Takahashi
IPC分类号： B22F3/22 , B28B1/00 , B28B1/20 , B28B1/24 , B28B3/20 , C04B35/111 , C04B35/565 , C04B35/584
CPC分类号： C04B35/584 , B22F3/222 , B28B1/007 , C04B35/111 , C04B35/565
摘要： The present invention is concerned with a method of molding inorganic powders, primarily ceramic powders, in which a binder fluid having a specific freezing point, typically water, is added to the powder to be molded to form a mixture, after which a mold having the desired cavity is filled with the said mixture. The mixture is then pressure molded and rapidly cooled, freezing the binder fluid to produce a frozen molded shape, which is then dried to remove the binder fluid and sintered.The amount of the binder fluid of specific freezing point to be added to the said inorganic powder is the minimum amount that will satisfy the dual demands of flowability during molding and shape retention after the removal of the binder fluid, with from 25 to 50 vol % generally being appropriate. Holding is achieved by injection molding, compression molding or other technique in which pressure is applied to the material in the mold.The present invention makes possible the easy and economical mass production of sintered products of complex shape, high dimensional accuracy, and high density using inorganic material.
摘要翻译：本发明涉及一种成型无机粉末，主要是陶瓷粉末的方法，其中将具有特定凝固点（通常为水）的粘合剂流体加入待模制的粉末中以形成混合物，之后将具有所需的腔体填充有所述混合物。然后将混合物加压模制并快速冷却，冷冻粘合剂流体以产生冷冻模制形状，然后将其干燥以除去粘合剂流体并烧结。要添加到所述无机粉末中的特定凝固点的粘合剂流体的量是在除去粘合剂流体之后将满足成型期间的流动性和形状保持的双重要求的最小量，其中25至50体积％一般是适当的。保持是通过注射成型，压缩成型或其它对模具中的材料施加压力的技术实现的。本发明可以容易且经济地大量生产具有复杂形状，高尺寸精度和高密度的无机材料的烧结产品。

30. 发明授权

US4825808A Substrate processing apparatus 失效
标题翻译：基板加工装置
公开(公告)号：US4825808A
公开(公告)日：1989-05-02
申请号：US70986
申请日：1987-07-08
申请人： Nobuyuki Takahashi , Hiroaki Kitahara
发明人： Nobuyuki Takahashi , Hiroaki Kitahara
IPC分类号： H01L21/302 , C23C14/56 , C23C16/54 , H01L21/00 , H01L21/205 , H01L21/3065 , H01L21/31 , H01L21/677 , C23C14/00 , C23C16/00
CPC分类号： H01L21/67161 , C23C14/568 , C23C16/54
摘要： A substrate processing apparatus includes input and output chambers for loading and unloading substrates into and out of the apparatus, a separation chamber connected to the input and output chambers, a plurality of substrate processing chambers connected to the separation chamber for processing the substrates therein, and gate valves provided between the separation chamber and the input and output chambers and between the separation chamber and the respective substrate processing chambers for selectively providing communication between the chambers between which the gate valves are arranged. The separation chamber is able to transfer the substrates therethrough, to distribute the substrate into the respective processing chambers and to temporarily maintain the substrate in the separation chamber. With this arrangement, the substrate processing apparatus is capable of effecting different processings of substrates by freely selecting the kinds, orders and repetitions of the processing for the substrates without any interference between these processings.
摘要翻译：基板处理装置包括用于将基板装载和卸载的设备的输入和输出室，连接到输入和输出室的分离室，连接到分离室的多个基板处理室，用于在其中处理基板;以及设置在分离室与输入和输出室之间以及分离室和各个基板处理室之间的闸阀，用于选择性地在其间布置有闸阀的室之间提供连通。分离室能够将基板传送通过其中，以将基板分配到相应的处理室中并将基板暂时保持在分离室中。通过这种布置，基板处理装置能够通过自由地选择基板的处理的种类，顺序和重复来实现基板的不同处理，而不会在这些处理之间产生任何干扰。

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