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21. 发明申请

US20080096332A1 METHOD OF MANUFACTURING A THIN-FILM TRANSISTOR SUBSTRATE 审中-公开
标题翻译：制造薄膜晶体管基板的方法
公开(公告)号：US20080096332A1
公开(公告)日：2008-04-24
申请号：US11746265
申请日：2007-05-09
申请人： Duck-Jung LEE , Kyung-Seop KIM , Yong-Eui LEE , Myung-Il PARK , Dong-Chin LEE
发明人： Duck-Jung LEE , Kyung-Seop KIM , Yong-Eui LEE , Myung-Il PARK , Dong-Chin LEE
IPC分类号： H01L21/336
CPC分类号： H01L27/1288 , H01L27/1214
摘要： A gate insulating layer, an active layer and a data metal film are sequentially formed on a substrate. A first photoresist pattern having a relatively small thickness in a channel forming area with respect to a thickness of the photoresist pattern not in the channel forming area is formed on the data metal film. The data metal film and the active layer are sequentially etched using the first photoresist pattern. The active layer is etched using the first photoresist pattern. The first photoresist pattern is dry etched using a gas mixture including a sulfur hexafluoride gas and an oxygen gas to form a second photoresist pattern with an opening formed in the channel forming area. The data metal film is then etched using the second photoresist pattern. Dry, wet or acid cleaning procedures used within the manufacturing method reduce formation of stringers in the substrate.
摘要翻译：栅极绝缘层，有源层和数据金属膜依次形成在基板上。在数据金属膜上形成相对于不在通道形成区域中的光致抗蚀剂图案的厚度的通道形成区域中具有相对较小厚度的第一光致抗蚀剂图案。使用第一光致抗蚀剂图案依次蚀刻数据金属膜和有源层。使用第一光致抗蚀剂图案蚀刻有源层。使用包括六氟化硫气体和氧气的气体混合物对第一光致抗蚀剂图案进行干蚀刻，以形成在通道形成区域中形成的开口的第二光致抗蚀剂图案。然后使用第二光致抗蚀剂图案蚀刻数据金属膜。在制造方法中使用的干，湿或酸清洗程序减少了基材中桁条的形成。

22. 发明申请

US20070081105A1 Repairing manufacturing defects in flat panel displays 有权
标题翻译：修复平板显示器中的制造缺陷
公开(公告)号：US20070081105A1
公开(公告)日：2007-04-12
申请号：US11545038
申请日：2006-10-06
申请人： Myung-Il Park , Yeong-Beom Lee , Kyung-Seop Kim , Yong-Eui Lee
发明人： Myung-Il Park , Yeong-Beom Lee , Kyung-Seop Kim , Yong-Eui Lee
IPC分类号： G02F1/133
CPC分类号： G02F1/136259
摘要： Apparatus and methods for repairing display devices of a type that include a first substrate having a plurality of signal lines formed thereon and/or a second substrate having a plurality of color filters formed thereon include a laser that radiates laser light having a wavelength in a range of from about 750 to about 850 nm, or alternatively, of from about 1000 to about 1100 nm, and a pulse width of femtoseconds (10−15 seconds) to picoseconds (10−12 seconds) and arranged such that the laser light can be focused on selected ones of the signal lines and/or color filters. The apparatus enables repairs to be effected on the display device during any one of several manufacturing test processes using only a single laser apparatus, without the need for additional or different repair devices for each test process.
摘要翻译：用于修复包括其上形成有多条信号线的第一基板和/或具有形成在其上的多个滤色器的第二基板的类型的显示装置的装置和方法包括：激光器，其将波长在一定范围内的激光约750至约850nm，或者约1000至约1100nm，脉冲宽度为飞秒（10-15秒）至皮秒（10-12秒） / SUP>秒），并且被布置为使得激光可以聚焦在所选择的信号线和/或滤色器上。该装置能够在仅使用单个激光装置的几个制造测试过程中的任何一个期间在显示装置上进行修复，而不需要用于每个测试过程的附加或不同的修复装置。

23. 发明授权

US06674234B2 Thin film electroluminescent device having thin-film current control layer 失效
标题翻译：具有薄膜电流控制层的薄膜电致发光器件
公开(公告)号：US06674234B2
公开(公告)日：2004-01-06
申请号：US09978456
申请日：2001-10-16
申请人： Yong-Shin Kim , Sun Jin Yun , Sang-Hee Park , Yong Eui Lee
发明人： Yong-Shin Kim , Sun Jin Yun , Sang-Hee Park , Yong Eui Lee
IPC分类号： H05B3302
CPC分类号： H05B33/22
摘要： The inventive thin-film DC-driving electroluminescent device (ELD) is characterized by the thin-film current control layer which is inserted between a thin film phosphor layer and metal electrodes. This kind of ELD has the advantages of having a lower operation voltage than that of the conventional thin-film AC ELD and a higher resolution than that of the conventional thin-film/powder hybrid DC ELD. The thin-film current control layer acts as an energy barrier layer which supplies energetic electrons into said phosphor layer by a field-assistant injection of electron, and a current-limiting layer which prevents an electric field breakdown of said electroluminescent device caused by an excess current flow. The current control layer is embodied with a multilayered thin film laminated by an alternate deposition of metal oxides. In another embodiment, the current control layer consists of both an energy barrier layer and a current-limiting layer, separately formed.
摘要翻译：本发明的薄膜直流驱动电致发光器件（ELD）的特征在于薄膜电流控制层，其插入在薄膜荧光体层和金属电极之间。这种ELD具有比常规薄膜AC ELD低的操作电压和比常规薄膜/粉末混合DC ELD更高的分辨率的优点。薄膜电流控制层用作通过场辅助电子注入向高能电子提供能量电子的能量阻挡层，以及限制所述电致发光器件由过量的电场引起的电场击穿的限流层当前流。电流控制层由通过金属氧化物的交替沉积层压的多层薄膜来实现。在另一个实施例中，电流控制层由分别形成的能量阻挡层和限流层组成。

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