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    • 23. 发明申请
    • NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME
    • 非易失性半导体存储器件及其制造方法
    • US20100320527A1
    • 2010-12-23
    • US12792378
    • 2010-06-02
    • Takayuki OKAMURANoboru OOIKEWataru SAKAMOTOTakashi IZUMIDA
    • Takayuki OKAMURANoboru OOIKEWataru SAKAMOTOTakashi IZUMIDA
    • H01L29/792H01L21/28
    • H01L27/11565H01L21/28282H01L27/11568
    • A nonvolatile semiconductor memory device according to embodiment includes: a semiconductor substrate having an upper portion being partitioned into a plurality of semiconductor portions extending in a first direction; a charge storage film provided on the semiconductor portion; a word-line electrode provided on the semiconductor substrate and extending in a second direction intersecting with the first direction; and a pair of selection gate electrodes provided on both sides of the word-line electrode in the first direction on the semiconductor substrate and extending in the second direction, a shortest distance between a corner portion of each of the semiconductor portions and each of the selection gate electrodes being longer than a shortest distance between the corner portion of the semiconductor portion and the word-line electrode in a cross section parallel to the second direction.
    • 根据实施例的非易失性半导体存储器件包括:半导体衬底,其具有被分隔成沿第一方向延伸的多个半导体部分的上部; 设置在半导体部分上的电荷存储膜; 字线电极,其设置在所述半导体基板上并沿与所述第一方向交叉的第二方向延伸; 以及一对选择栅电极,其设置在所述半导体基板上的所述字线电极的所述第一方向的两侧,并且沿所述第二方向延伸,所述半导体部分的每个的角部与所述选择中的每一个之间的最短距离 栅电极比与半导体部分的角部和字线电极之间的平行于第二方向的截面中的最短距离更长。
    • 30. 发明申请
    • NONVOLATILE SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME
    • 非易失性半导体存储器件及其制造方法
    • US20130207175A1
    • 2013-08-15
    • US13589517
    • 2012-08-20
    • Wataru SAKAMOTO
    • Wataru SAKAMOTO
    • H01L21/3205H01L21/82H01L27/088
    • H01L21/32053H01L21/28273H01L21/764H01L21/82H01L27/088H01L27/11529H01L29/66825
    • A nonvolatile semiconductor storage device including a first transistor comprising a first gate electrode including a charge storage layer, an interelectrode insulating film, and a control electrode layer; a second transistor comprising a second gate electrode including a lower electrode, an upper electrode, and an upper silicide portion above the upper electrode; and a third transistor comprising a third gate electrode including a lower electrode, an upper electrode, and an upper silicide portion above the upper electrode; wherein the lower electrodes of the second and the third gate electrodes have a first side and a second side taken along a length direction of the second and the third gate electrodes, the lower electrodes of the second and the third gate electrodes including a lower silicide portion in which at least the first side of the lower electrodes are partially silicided.
    • 一种非易失性半导体存储装置,包括:第一晶体管,包括包含电荷存储层的第一栅电极,电极间绝缘膜和控制电极层; 第二晶体管,包括在上电极上方包括下电极,上电极和上硅化物部分的第二栅电极; 以及第三晶体管,包括在所述上电极上方包括下电极,上电极和上硅化物部分的第三栅电极; 其中所述第二和第三栅电极的下电极具有沿着所述第二和第三栅电极的长度方向截取的第一侧和第二侧,所述第二和第三栅电极的下电极包括下硅化物部分 其中至少第一侧的下部电极部分地被硅化。