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    • 23. 发明授权
    • Slot-type shadow mask
    • 槽型荫罩
    • US5877586A
    • 1999-03-02
    • US820172
    • 1997-03-19
    • Nobumitsu Aibara
    • Nobumitsu Aibara
    • H01J29/07
    • H01J29/076
    • A slot-type shadow mask is provided, which enables one to avoid the problem termed the "phosphor-stripe loss" to thereby improve the quality. This shadow mask includes a plate-like body having slots for selectively allowing electron beams to pass through the mask. The slots are located in a rectangular slot area of the body. Each of the slots has a vertically elongated shape. The slots are arranged horizontally at a specific horizontal pitch and vertically at a specific vertical pitch. The slots form first to m-th slot columns, where m is a natural number. A part of the slots included in the first slot column and a part of the slots included in the m-th slot column have a first width. A part of the slots included in the second slot column and a part of the slots included in the (m-1)-th slot column have a second width. The remaining slots have a third width. The first width is smaller than the third width and the second width is larger than the third width.
    • 提供了一种槽型荫罩,可以避免被称为“荧光条纹损耗”的问题,从而提高质量。 该荫罩包括具有用于选择性地允许电子束通过掩模的槽的板状体。 槽位于主体的矩形槽区域中。 每个槽具有垂直细长的形状。 槽以特定的水平间距水平布置,并以特定的垂直间距垂直布置。 插槽形成第一到第m个插槽列,其中m是自然数。 包括在第一槽列中的槽的一部分和包括在第m个槽列中的槽的一部分具有第一宽度。 包括在第二槽列中的槽的一部分和包括在第(m-1)槽列中的槽的一部分具有第二宽度。 其余插槽具有第三宽度。 第一宽度小于第三宽度,第二宽度大于第三宽度。