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21. 发明申请

WO2011065589A3 SUBSTRATE CARRIER DEVICE, SUBSTRATE CARRYING METHOD, SUBSTRATE SUPPORTING MEMBER, SUBSTRATE HOLDING DEVICE, EXPOSURE APPARATUS, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：基板承载装置，基板承载方法，基板支撑件，基板保持装置，曝光装置，曝光方法及装置制造方法
公开(公告)号：WO2011065589A3
公开(公告)日：2011-10-06
申请号：PCT/JP2010071762
申请日：2010-11-29
申请人： NIPPON KOGAKU KK , AOKI YASUO , SEKI TADASHI , YANAGAWA TAKUYA
发明人： AOKI YASUO , SEKI TADASHI , YANAGAWA TAKUYA
IPC分类号： H01L21/677 , B65G49/06 , G03F7/20
CPC分类号： G03F7/70733 , B65G49/064 , B65G2249/045 , H01L21/67706 , H01L21/67715 , H01L21/67748
摘要： A substrate carry-out device (70) carries out an exposed substrate (P) mounted on a substrate stage (20) from a substrate holder (50) by moving the substrate (P) in one axis direction (X-axis direction) parallel to a horizontal plane in a state where the substrate (P) is mounted on a substrate tray (90) housed in the substrate holder (50). Meanwhile, a substrate carry-in device (80) makes an unexposed substrate (P) to be carried into the substrate stage (20) wait at a substrate exchange position in a state where the unexposed substrate (P) is mounted on another substrate tray (90), and after the exposed substrate (P) is carried out from the substrate stage (20), lowers the another substrate tray (90), thereby mounting the unexposed substrate (P) onto the substrate holder (50).
摘要翻译：基板搬出装置（70）通过使基板（P）沿一个轴方向（X轴方向）平行地移动而从基板支架（50）搬出安装在基板载台（20）上的露出基板在基板（P）安装在容纳在基板保持件（50）中的基板托盘（90）上的状态下移动到水平面。另一方面，基板搬入装置80在未曝光基板P搭载于其他基板托盘的状态下，使未曝光基板P搬入基板载置台20，（90），从衬底载台（20）搬出露出的衬底（P）后，使另一衬底托盘（90）下降，将未曝光的衬底（P）安装到衬底支架（50）上。

22. 发明申请

WO2010134643A3 OBJECT EXCHANGE METHOD, CARRIER SYSTEM, EXPOSURE AND APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：对象交换方法，载体系统，曝光和装置以及装置制造方法
公开(公告)号：WO2010134643A3
公开(公告)日：2011-08-25
申请号：PCT/JP2010058946
申请日：2010-05-20
申请人： NIPPON KOGAKU KK , SHIBAZAKI YUICHI
发明人： SHIBAZAKI YUICHI
IPC分类号： G03F7/20
CPC分类号： G03F7/70733 , G03F7/70691 , G03F7/707 , G03F7/70775 , H01L21/67225 , H01L21/67748 , H01L21/6838
摘要： A carrier apparatus positions a chuck member (108) above a wafer (W) mounted on a fine movement stage (WFS2), relatively moves the chuck member (108) and the fine movement stage(WFS2) in a vertical direction, makes the chuck member (108) approach a position which is a predetermined distance away from the upper surface of the wafer (W), makes the chuck member(108) hold the wafer (W) from above in a non-contact manner, and makes the chuck member holding the wafer and the fine movement stage move apart within a predetermined plane after making the chuck member holding the wafer and the fine movement stage move apart in the vertical direction. Further, the carrier apparatus loads the wafer (W) held in a non-contact manner from above by the chuck member on the fine movement stage. Therefore, it is not necessary to form or provide a notch to house an arm and the like used in the wafer exchange on a holding member such as a wafer holder on the fine movement stage, and a vertical movement member used in the delivery of the wafer, in the holding member.
摘要翻译：载体装置将安装在微动台（WFS2）上的晶片（W）上方的卡盘构件（108）定位在垂直方向上相对移动卡盘构件（108）和微动载置台（WFS2），使卡盘构件（108）接近离开晶片（W）的上表面预定距离的位置，使卡盘构件（108）以不接触的方式从上方保持晶片（W），并使卡盘在使夹持构件保持晶片并且微动台在垂直方向上分离的同时，保持晶片和微动载置台在预定平面内移动的构件。此外，载体装置通过卡盘构件在微动载台上将不以非接触方式保持的晶片（W）装载在卡盘部件上。因此，不需要在微动台上的保持构件例如晶片保持架上形成或设置用于在晶片更换中使用的臂等的凹口，以及用于输送晶片，在保持构件中。

23. 发明申请

WO2011040642A3 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：WO2011040642A3
公开(公告)日：2011-06-09
申请号：PCT/JP2010067602
申请日：2010-09-30
申请人： NIPPON KOGAKU KK , ICHINOSE GO
发明人： ICHINOSE GO
IPC分类号： G03F7/20
CPC分类号： G03F7/70758 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70775 , G03F7/70783
摘要： A first driving section (84a, 94a) and a second driving section (84b, 94b) apply a drive force in an X-axis direction, a Y-axis direction, a Z-axis direction, and a ?x direction, respectively, with respect to one end and the other end of a fine movement stage (WFS1) whose one end and the other end in the Y-axis direction are each supported, so that the fine movement stage is relatively movable with respect to a coarse movement stage (WCS1) within an XY plane. Accordingly, by the first and the second driving sections making drive forces in directions opposite to each other in a ?x direction apply simultaneously to one end and the other end of the fine movement stage (WFS1) (refer to the black arrow in the drawing), the fine movement stage (WFS1) (and a wafer (W) held by the stage) can be deformed to a concave shape or a convex shape within a YZ plane.
摘要翻译：第一驱动部（84a，94a）和第二驱动部（84b，94b）分别在X轴方向，Y轴方向，Z轴方向和θx方向上施加驱动力，相对于其一端和Y轴方向的另一端各自被支撑的微动载台（WFS1）的一端和另一端，使得微动载台相对于粗移动台相对移动（WCS1）在XY平面内。因此，通过第一驱动部和第二驱动部在θx方向上使彼此相反的驱动力同时施加到微动台（WFS1）的一端和另一端（参照图中的黑色箭头）），微移动台（WFS1）（以及由台架保持的晶片（W））可以在YZ平面内变形为凹形或凸形。

24. 发明申请

WO2008123535A3 EXPOSURE METHOD, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光方法，曝光装置和装置制造方法
公开(公告)号：WO2008123535A3
公开(公告)日：2009-04-09
申请号：PCT/JP2008056519
申请日：2008-03-26
申请人： NIPPON KOGAKU KK , NOBORU MICHIO
发明人： NOBORU MICHIO
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70275 , G03F7/7035 , G03F7/70466 , Y10T29/49
摘要： An exposure method includes a first exposure step of irradiating a mask (10), which is arranged near a plate (P), with exposure light and exposing a predetermined pattern formed on the mask onto a plate; and a second exposure step of irradiating a light converging pattern formation member (20), which is arranged near the plate and includes a plurality of light converging portions (20a, 20b), with exposure light and exposing a light converging pattern having a predetermined shape onto the plate. At least part of the predetermined pattern exposed onto the plate in the first exposure step and at least part of the light converging pattern formed on the plate in the second exposure step overlap each other.
摘要翻译：曝光方法包括：第一曝光步骤，用曝光光照射布置在平板（P）附近的掩模（10），并将形成在掩模上的预定图案曝光在板上; 以及第二曝光步骤，其照射布置在所述板附近并且具有多个聚光部分（20a，20b）的聚光图案形成部件（20,20），并具有曝光光并曝光具有预定形状的聚光图案到盘子上在第一曝光步骤中暴露于板上的预定图案的至少一部分和在第二曝光步骤中形成在该板上的聚光图案的至少一部分彼此重叠。

25. 发明申请

WO2008108253A3 EXPOSING METHOD, EXPOSURE APPARATUS, DEVICE FABRICATING METHOD, AND SUBSTRATE FOR IMMERSION EXPOSURE 审中-公开
标题翻译：曝光方法，曝光装置，装置制造方法和浸没曝光基板
公开(公告)号：WO2008108253A3
公开(公告)日：2008-12-04
申请号：PCT/JP2008053453
申请日：2008-02-21
申请人： NIPPON KOGAKU KK , NAKANO KATSUSHI
发明人： NAKANO KATSUSHI
IPC分类号： G03F7/20
CPC分类号： G03F7/70916 , G03F7/70341 , G03F7/70866
摘要： In an exposing method which exposes a substrate (P) through a liquid, the pH value of the liquid is adjusted in accordance with a material of a surface layer of the substrate that contacts the liquid (LQ).
摘要翻译：在通过液体露出基板（P）的曝光方法中，根据与液体（LQ）接触的基板的表面层的材料来调节液体的pH值。

26. 发明申请

WO2008047587A2 IMMERSION OBJECTIVE OPTICAL SYSTEM, EXPOSURE APPARATUS, DEVICE FABRICATION METHOD, AND BOUNDARY OPTICAL ELEMENT 审中-公开
标题翻译：浸没式目标光学系统，曝光装置，装置制造方法和边界光学元件
公开(公告)号：WO2008047587A2
公开(公告)日：2008-04-24
申请号：PCT/JP2007069140
申请日：2007-09-21
申请人： NIPPON KOGAKU KK , OMURA YASUHIRO , IKEZAWA HIRONORI
发明人： OMURA YASUHIRO , IKEZAWA HIRONORI
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G02B1/02 , G02B13/143 , G02B17/08 , G02B21/33 , G03F7/70225
摘要： In a liquid immersion type projection optical system for forming an image of a first plane (R) on a second plane (W), an optical path between the optical system and the second plane is filled with a liquid (Lm) having the refractive index larger than 1.5, and the optical system has a boundary optical element (Lb) whose surface on the first plane side is in contact with a gas and whose surface on the second plane side is in contact with the liquid. The optical system satisfies the condition of 3.2
摘要翻译：在用于在第二平面（W）上形成第一平面（R）的图像的液浸型投影光学系统中，光学系统与第二平面之间的光路充满具有折射率的液体（Lm）大于1.5，并且光学系统具有边界光学元件（Lb），其边界光学元件（Lb）在第一平面侧上的表面与气体接触并且在第二平面侧上的表面与液体接触。光学系统满足3.2

27. 发明申请

WO2007145725A3 IMMERSION LITHOGRAPHY SYSTEM AND METHOD HAVING AN IMMERSION FLUID CONFINEMENT PLATE FOR SUBMERGING THE SUBSTRATE 审中-公开
标题翻译：具有用于浸取基材的浸没流体限制板的渗透层析系统和方法
公开(公告)号：WO2007145725A3
公开(公告)日：2008-02-21
申请号：PCT/US2007010791
申请日：2007-05-04
申请人： NIPPON KOGAKU KK , POON ALEX KA TIM , KHO LEONARD WAI FUNG , KESWANI GAURAV , COON DEREK
发明人： POON ALEX KA TIM , KHO LEONARD WAI FUNG , KESWANI GAURAV , COON DEREK
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： G03F7/70341
摘要： A lithography apparatus (10) having a fluid confinement plate (24), which completely submerges the imaging surface of a substrate (16) is disclosed A gap, filled with immersion fluid, is provided between the imaging surface of the substrate (16) and the last optical element (20) of the projection optical system (18) The fluid confinement plate (24), which is positioned within the gap is sufficiently sized so that the imaging surface is completely submerged in the immersion fluid The fluid confinement plate (24) includes a first surface (24a) The first surface (24a) includes a droplet control element (40) to control the formation of droplets forming on the first surface (24a) In one embodiment, the droplet control element is a porous surface formed on the first surface (24a) In a second embodiment, the droplet control element is a sloped surface (44) that causes any immersion fluid on the first surface (24a) to flow toward to main body of immersion fluid in the gap.
摘要翻译：公开了一种具有完全浸没衬底（16）的成像表面的流体限制板（24）的光刻设备（10）。在衬底（16）的成像表面和投影光学系统（18）的最后一个光学元件（20）位于间隙内的流体限制板（24）具有足够的尺寸，使得成像表面完全浸没在浸没流体中。流体限制板（24））包括第一表面（24a）第一表面（24a）包括用于控制形成在第一表面（24a）上的液滴的形成的液滴控制元件（40）。在一个实施例中，液滴控制元件是形成在第一表面（24a）在第二实施例中，液滴控制元件是使第一表面（24a）上的任何浸没流体朝着间隙中的浸没流体的主体流动的倾斜表面（44）。

28. 发明申请

WO2006083754A3 RADIANTLY HEATED CATHODE FOR AN ELECTRON GUN AND HEATING ASSEMBLY 审中-公开
标题翻译：用于电子枪和加热组件的辐射加热阴极
公开(公告)号：WO2006083754A3
公开(公告)日：2007-04-12
申请号：PCT/US2006003175
申请日：2006-01-27
申请人： NIPPON KOGAKU KK , SOGARD MICHAEL , TAKITA MARK
发明人： SOGARD MICHAEL , TAKITA MARK
IPC分类号： G01N23/04 , G21K5/10
CPC分类号： H01J37/242 , H01J2237/3175
摘要： A heating assembly (36) for heating a cathode (38) of an electron gun (30) of an exposure apparatus (10) includes a radiation source (42) and a beam shaper (44). The radiation source (42) generates a source beam (46). The beam shaper (44) receives the source beam (46) and selectively shapes the source beam (46) into a shaped beam (48) that is directed to the cathode (38). In certain embodiments, the beam shaper (44) can readily change the shape and intensity profile of the shaped beam (48) to achieve a desired electron beam (32) from the electron gun (30). In one embodiment, the radiation source (42) generates a pulsed source beam (46).
摘要翻译：用于加热曝光装置（10）的电子枪（30）的阴极（38）的加热组件（36）包括辐射源（42）和光束整形器（44）。辐射源（42）产生源光束（46）。光束整形器（44）接收源光束（46）并且选择性地将源光束（46）成形为被引导到阴极（38）的成形光束（48）。在某些实施例中，光束整形器（44）可以容易地改变成形光束（48）的形状和强度分布，以实现来自电子枪（30）的期望的电子束（32）。在一个实施例中，辐射源（42）产生脉冲源光束（46）。

29. 发明申请

WO2006052855A2 FINE STAGE Z SUPPORT APPARATUS 审中-公开
标题翻译：精美舞台Z支持装置
公开(公告)号：WO2006052855A2
公开(公告)日：2006-05-18
申请号：PCT/US2005040229
申请日：2005-11-04
申请人： NIPPON KOGAKU KK , BINNARD MICHAEL B , HAZELTON ANDREW J , WATSON DOUGLAS C , ARAI YOICHI
发明人： BINNARD MICHAEL B , HAZELTON ANDREW J , WATSON DOUGLAS C , ARAI YOICHI
IPC分类号： A47J43/08
CPC分类号： G03F7/70816 , G03F7/70716 , H01L21/682 , Y10T29/41
摘要： An apparatus for supporting an object is disclosed. The apparatus includes an air bearing coupled to an air bellows. When used in a vacuum environment, the apparatus preferably includes an air bearing housing with vacuum to remove the pressurized fluid used in the air bearing.
摘要翻译：公开了一种用于支撑物体的装置。该装置包括联接到空气波纹管的空气轴承。当在真空环境中使用时，装置优选地包括具有真空的空气轴承壳体，以去除在空气轴承中使用的加压流体。

30. 发明申请

WO2005047981A3 THERMOPHORETIC TECHNIQUES FOR PROTECTING RETICLES FROM CONTAMINANTS 审中-公开
标题翻译：热污染技术保护污染物不受污染
公开(公告)号：WO2005047981A3
公开(公告)日：2005-10-20
申请号：PCT/US2004037542
申请日：2004-11-10
申请人： NIPPON KOGAKU KK , ALTON PHILLIPS H , SOGARD MICHAEL R , WATSON DOUGLAS C , TANAKA KEIICHI
发明人： ALTON PHILLIPS H , SOGARD MICHAEL R , WATSON DOUGLAS C , TANAKA KEIICHI
IPC分类号： G03F7/20
CPC分类号： G03F7/70741 , G03B27/52 , G03F1/82 , G03F7/70875 , G03F7/70916
摘要： Thermophoresis within lithography systems for protecting reticles from contaminants (e.g., floating particles). Generally, thermophoretic protection is implemented by maintaining the reticle at a higher temperature than its surrounding environment. Thermophoretic protection can be maintained throughout a reticle's use in a lithography system. For example, a reticle can be thermophoretically protected while in storage, through various stages of transportation via a reticle handler (also referred to as an end-effector), to its period of use while attached to a reticle chuck.
摘要翻译：光刻系统内用于保护标线免受污染物（例如漂浮颗粒）的热泳。通常，热泳保护是通过将光罩保持在比周围环境更高的温度下来实现的。在光刻系统中使用掩模版的过程中可以保持热泳保护。例如，掩模版可以在储存期间通过经由掩模版处理器（也称为末端执行器）的各种运输阶段被热泳保护到其附着于掩模版卡盘的使用期间。

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