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    • 22. 发明申请
    • CHANNEL CHANGER IN A VIDEO PROCESSING APPARATUS AND METHOD THEREOF
    • 视频处理设备中的信道更换及其方法
    • US20120133834A1
    • 2012-05-31
    • US13367054
    • 2012-02-06
    • Kum-yon HANMi-young YOOMin-gu KANG
    • Kum-yon HANMi-young YOOMin-gu KANG
    • H04N5/50
    • H04N7/16H04N21/23424H04N21/4384H04N21/44016H04N21/482
    • A video processing apparatus, comprises a signal receiving part receiving a video signal through one of a plurality of channels, a user inputting part in which the channel is selected and inputted by a user, a video processing part processing the video signal received by the signal receiving part, and a controller controlling the signal receiving part to start receiving a video signal through a first channel upon the first channel selection among the plurality of channels by the user, and to start receiving a video signal through a second channel upon the second channel selection among the plurality of channels by the user, wherein the second channel selection is made during the receiving process of the first channel.Thus, the present invention provides a video processing apparatus and a video processing method capable of performing a channel change rapidly to solve the above-described problem.
    • 一种视频处理装置,包括通过多个通道之一接收视频信号的信号接收部分,由用户选择和输入信道的用户输入部分,处理由信号接收的视频信号的视频处理部分 以及控制信号接收部分的控制器,以在用户在多个频道中进行第一频道选择之后通过第一频道开始接收视频信号,并且在第二频道上开始通过第二频道接收视频信号 用户在多个信道之间进行选择,其中在第一信道的接收过程期间进行第二信道选择。 因此,本发明提供了能够快速地进行频道改变以解决上述问题的视频处理装置和视频处理方法。
    • 23. 发明申请
    • Door for washing machine
    • 洗衣机门
    • US20100031581A1
    • 2010-02-11
    • US12385556
    • 2009-04-10
    • Min-Gu KangKyu-Chul LeeChang-Woo Son
    • Min-Gu KangKyu-Chul LeeChang-Woo Son
    • E06B5/00
    • D06F39/14
    • A door for a washing machine is disclosed. A door for a washing machine includes an inner frame having an opening with a predetermined size, an outer frame provided at a front surface of the inner frame, having an opening in communication with the opening of the inner frame, a glass member fitted between the inner and outer frames, covering the openings of the inner and outer frames, a decorative member provided at a front surface of the outer frame, having an opening in communication with the openings, and a front cover fitted between the decorative member and the outer frame, covering the openings of the inner and outer frames and the decorative member, the front cover having a positioning portion determining a position of the front cover coupled to the outer frame.
    • 公开了一种用于洗衣机的门。 一种用于洗衣机的门包括具有预定尺寸的开口的内框架,设置在内框架的前表面处的外框架,具有与内框架的开口连通的开口;玻璃构件, 内框架和外框架,覆盖内框架和外框架的开口;设置在外框架的前表面处的装饰构件,具有与开口连通的开口,以及装配构件和外框架之间的前盖 覆盖内框架和外框架和装饰构件的开口,前盖具有确定联接到外框架的前盖的位置的定位部分。
    • 24. 发明授权
    • Pump container
    • US10960423B1
    • 2021-03-30
    • US16834224
    • 2020-03-30
    • Min Gu Kang
    • Min Gu Kang
    • B05B11/00F16F1/06F16F1/04
    • Provided is a pump container including a container body, a pump body having a cylindrical spring, a shoulder member, and a discharge nozzle. The cylindrical spring is made of a plastic material and includes: a top ring plate having a hole formed at the center thereof; a first spring member erectly extended downward from one side undersurface of the top ring plate, while rotating in a clockwise direction; a second spring member erectly extended downward from the other side undersurface of the top ring plate which is a position symmetrical to one side undersurface thereof, while rotating in the same direction as the first spring member; and a pair of connection spring members erectly extended downward from two center surfaces between one side undersurface and the other side undersurface of the top ring plate, while rotating in the opposite direction to the first spring member and the second spring member.
    • 26. 发明授权
    • Apparatus for and method of measuring image
    • 用于测量图像的装置和方法
    • US08155483B2
    • 2012-04-10
    • US12090592
    • 2006-10-18
    • Sang-yoon LeeMin-gu KangSsang-gun Lim
    • Sang-yoon LeeMin-gu KangSsang-gun Lim
    • G06K9/20
    • G01B9/04
    • An image measuring apparatus for enhancing an accuracy of an image captured by an optical system and a method thereof are disclosed. The apparatus includes a CCD camera for capturing the object and outputting the captured image, a lamp for generating white light to illuminate a capturing area of the object, an illumination controller for controlling the lamp to be turned on, a piezoelectric actuator for controlling a minute height of the optical system with respect to the object, an image capturing device for acquiring the image captured by the CCD camera, a driving signal generator for outputting a driving signal to the illumination controller and the piezoelectric actuator when an enable signal is generated from the CCD camera, and an image signal processor for estimating height information of the object from data transmitted from the image capturing unit.
    • 公开了一种用于提高由光学系统捕获的图像的精度的图像测量装置及其方法。 该装置包括用于捕获物体并输出拍摄图像的CCD照相机,用于产生白光以照亮被摄体的拍摄区域的灯,用于控制被导通的灯的照明控制器,用于控制分钟的压电致动器 相对于物体的光学系统的高度,用于获取由CCD照相机拍摄的图像的图像捕获装置,当从该照相机产生使能信号时,将驱动信号输出到照明控制器和压电致动器的驱动信号发生器 CCD摄像机和图像信号处理器,用于根据从图像捕获单元发送的数据来估计物体的高度信息。
    • 27. 发明授权
    • Fin field effect transistor and method of manufacturing the same
    • Fin场效应晶体管及其制造方法
    • US07652340B2
    • 2010-01-26
    • US11952676
    • 2007-12-07
    • Deok-Hyung LeeYu-Gyun ShinJong-Wook LeeMin-Gu Kang
    • Deok-Hyung LeeYu-Gyun ShinJong-Wook LeeMin-Gu Kang
    • H01L29/78
    • H01L29/7851H01L29/66795H01L29/7854
    • In a fin field effect transistor (FET), an active pattern protrudes in a vertical direction from a substrate and extends across the substrate in a first horizontal direction. A first silicon nitride pattern is formed on the active pattern, and a first oxide pattern and a second silicon nitride pattern are sequentially formed on the substrate and on a sidewall of a lower portion of the active pattern. A device isolation layer is formed on the second silicon nitride pattern, and a top surface of the device isolation layer is coplanar with top surfaces of the oxide pattern and the second silicon nitride pattern. A buffer pattern having an etching selectivity with respect to the second silicon nitride pattern is formed between the first oxide pattern and the second silicon nitride pattern. Internal stresses that can be generated in sidewalls of the active pattern are sufficiently released and an original shape of the first silicon nitride pattern remains unchanged, thereby improving electrical characteristics of the fin FET.
    • 在鳍状场效应晶体管(FET)中,有源图案在垂直方向上从基板突出,并且在第一水平方向上延伸穿过基板。 第一氮化硅图案形成在有源图案上,并且第一氧化物图案和第二氮化硅图案依次形成在衬底上和活性图案的下部的侧壁上。 在第二氮化硅图案上形成器件隔离层,器件隔离层的顶表面与氧化物图案和第二氮化硅图案的顶表面共面。 在第一氧化物图案和第二氮化硅图案之间形成具有相对于第二氮化硅图案的蚀刻选择性的缓冲图案。 可以在有源图案的侧壁中产生的内部应力被充分地释放,并且第一氮化硅图案的原始形状保持不变,从而改善了鳍式FET的电特性。
    • 29. 发明授权
    • Methods of manufacturing fin type field effect transistors
    • 制造鳍式场效应晶体管的方法
    • US07442596B2
    • 2008-10-28
    • US11359000
    • 2006-02-22
    • Jong-Wook LeeDeok-Hyung LeeMin-Gu KangYu-Gyun Shin
    • Jong-Wook LeeDeok-Hyung LeeMin-Gu KangYu-Gyun Shin
    • H01L21/336H01L21/8234
    • H01L29/78618H01L29/66545H01L29/66795H01L29/785
    • A fin type field effect transistor includes a semiconductor substrate, an active fin, a first hard mask layer pattern, a gate insulation layer pattern, a first conductive layer pattern, and source/drain regions. The active fin includes a semiconductor material and is formed on the substrate and extends in a direction away from a major surface of the substrate. The first hard mask layer pattern is formed on a distal surface of the active fin from the substrate. The gate insulation layer is formed on a sidewall portion of the active fin. The first conductive layer pattern includes a metal silicide and is formed on surfaces of the substrate and the gate insulation layer pattern, and on a sidewall of the first hard mask pattern. The source/drain regions are formed in the active fin on opposite sides of the first conductive layer pattern.
    • 鳍型场效应晶体管包括半导体衬底,有源鳍,第一硬掩模层图案,栅极绝缘层图案,第一导电层图案和源极/漏极区域。 活性鳍片包括半导体材料,并且形成在基底上并沿远离基底的主表面的方向延伸。 第一硬掩模层图案形成在有源鳍片的远离表面上的基底上。 栅极绝缘层形成在有源鳍片的侧壁部分上。 第一导电层图案包括金属硅化物,并且形成在基板和栅极绝缘层图案的表面上,以及在第一硬掩模图案的侧壁上。 源极/漏极区域形成在第一导电层图案的相对侧上的有源鳍片中。
    • 30. 发明授权
    • Fin field effect transistor and method of manufacturing the same
    • Fin场效应晶体管及其制造方法
    • US07326608B2
    • 2008-02-05
    • US11292261
    • 2005-11-30
    • Deok-Hyung LeeYu-Gyun ShinJong-Wook LeeMin-Gu Kang
    • Deok-Hyung LeeYu-Gyun ShinJong-Wook LeeMin-Gu Kang
    • H01L21/8238
    • H01L29/7851H01L29/66795H01L29/7854
    • In a fin field effect transistor (FET), an active pattern protrudes in a vertical direction from a substrate and extends across the substrate in a first horizontal direction. A first silicon nitride pattern is formed on the active pattern, and a first oxide pattern and a second silicon nitride pattern are sequentially formed on the substrate and on a sidewall of a lower portion of the active pattern. A device isolation layer is formed on the second silicon nitride pattern, and a top surface of the device isolation layer is coplanar with top surfaces of the oxide pattern and the second silicon nitride pattern. A buffer pattern having an etching selectivity with respect to the second silicon nitride pattern is formed between the first oxide pattern and the second silicon nitride pattern. Internal stresses that can be generated in sidewalls of the active pattern are sufficiently released and an original shape of the first silicon nitride pattern remains unchanged, thereby improving electrical characteristics of the fin FET.
    • 在鳍状场效应晶体管(FET)中,有源图案在垂直方向上从基板突出,并且在第一水平方向上延伸穿过基板。 第一氮化硅图案形成在有源图案上,并且第一氧化物图案和第二氮化硅图案依次形成在衬底上和活性图案的下部的侧壁上。 在第二氮化硅图案上形成器件隔离层,器件隔离层的顶表面与氧化物图案和第二氮化硅图案的顶表面共面。 在第一氧化物图案和第二氮化硅图案之间形成具有相对于第二氮化硅图案的蚀刻选择性的缓冲图案。 可以在有源图案的侧壁中产生的内部应力被充分地释放,并且第一氮化硅图案的原始形状保持不变,从而改善了鳍式FET的电特性。