专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明申请

US20090105511A1 Uniformly, Highly Dispersed Metal Catalyst and Process for Producing the Same 有权
标题翻译：均匀的高分散金属催化剂及其制备方法
公开(公告)号：US20090105511A1
公开(公告)日：2009-04-23
申请号：US11922462
申请日：2006-06-19
申请人： Yoshimi Okada , Toshiji Makabe , Masashi Saito , Takako Nishijima
发明人： Yoshimi Okada , Toshiji Makabe , Masashi Saito , Takako Nishijima
IPC分类号： B01J27/02 , B01J27/053 , B01J31/02 , C07C5/367
CPC分类号： B01J27/053 , B01J21/04 , B01J23/42 , B01J23/464 , B01J27/045 , B01J35/008 , B01J35/0093 , B01J35/1019 , B01J35/1038 , B01J35/1061 , B01J37/0201 , B01J37/18 , B01J37/20 , C07C5/367 , Y02P20/52 , C07C15/06 , C07C15/24 , C07C15/02 , C07C15/27
摘要： Provided are: a uniformly, highly dispersed metal catalyst including a catalyst carrier and a catalyst metal being loaded thereon dispersed throughout the carrier, the uniformly, highly dispersed metal catalyst having excellent performances with respect to catalytic activity, selectivity, life, etc.; and a method of producing the same. The uniformly, highly dispersed metal catalyst includes a catalyst carrier made of a metal oxide and a catalyst metal having catalytic activity, the catalyst metal being loaded on the catalyst carrier, in which the catalyst carrier is a sulfur-containing catalyst carrier having sulfur or a sulfur compound almost evenly distributed throughout the carrier and the catalyst metal is loaded on the sulfur-containing catalyst carrier in a substantially evenly dispersed manner over the entire carrier substantially according to the distribution of the sulfur or the sulfur compound.
摘要翻译：提供：均匀高度分散的金属催化剂，其包含分散在整个载体上的催化剂载体和催化剂金属，均匀高度分散的金属催化剂在催化活性，选择性，寿命等方面具有优异的性能; 及其制造方法。均匀，高度分散的金属催化剂包括由金属氧化物制成的催化剂载体和具有催化活性的催化剂金属，催化剂金属负载在催化剂载体上，其中催化剂载体是具有硫或硫的催化剂载体硫化合物几乎均匀分布在整个载体上，催化剂金属基本上按照硫或硫化合物的分布，以基本上均匀分散的方式载于整个载体上。

22. 发明申请

US20090027541A1 Solid State Imaging Device 失效
标题翻译：固态成像装置
公开(公告)号：US20090027541A1
公开(公告)日：2009-01-29
申请号：US11665031
申请日：2005-10-04
申请人： Jun Takayama , Masashi Saito
发明人： Jun Takayama , Masashi Saito
IPC分类号： H04N5/225
CPC分类号： H04N5/335 , H01L27/14605 , H01L27/14627
摘要： A solid-state imaging device provided with a light receiving surface, in which plural unit pixels, each having a photoelectric transducer to convert light signals into electric signals, are two-dimensionally arranged; a microlens to focus a light beam, the microlens being arranged in each unit pixel corresponding to the photoelectric transducer; an aperture section, to allow the light beam to enter the photoelectric transducer, the aperture section being arranged in each unit pixel corresponding to the photoelectric transducer; a wiring layer, which comprises plural layers, and is formed between the photoelectric transducer and the microlens, wherein the plural unit pixels are arranged such that each of the photoelectric transducer is located axisymmetrically with a symmetrical axis of a first centerline passing through an approximate center of the light receiving surface.
摘要翻译：具有光接收表面的固态成像装置被二维布置，其中具有将光信号转换为电信号的光电转换器的多个单位像素; 微透镜聚焦光束，微透镜被布置在对应于光电传感器的每个单位像素中; 开口部分，以允许光束进入光电传感器，孔部分布置在与光电传感器对应的每个单位像素中; 布线层，其包括多层，并且形成在所述光电转换器和所述微透镜之间，其中所述多个单位像素布置成使得每个所述光电变换器位于轴对称的位置，所述对称轴线通过大致中心的第一中心线的光接收表面。

23. 发明申请

US20080129193A1 LIGHT EMITTING DEVICE AND PRODUCING METHOD THEREOF 审中-公开
标题翻译：发光装置及其制造方法
公开(公告)号：US20080129193A1
公开(公告)日：2008-06-05
申请号：US11942958
申请日：2007-11-20
申请人： Yoshiyuki ASABE , Takashi NITTA , Masashi SAITO
发明人： Yoshiyuki ASABE , Takashi NITTA , Masashi SAITO
IPC分类号： H01J1/62 , H01L51/56
CPC分类号： H05B33/28 , H01L51/5203 , H01L51/5206 , H01L51/5212 , H01L2251/5338 , H01L2251/5361
摘要： A light emitting device and a producing method thereof are provided. The light emitting device is configured such that a transparent electrode layer, an organic light emitting layer and a counter electrode layer are laminated in this order on a transparent substrate, in which the transparent electrode layer is formed of mesh-like metal material and a transparent conductive polymer. The producing method includes: (a) printing a solution in which metal particles are dispersed in a solvent in a mesh shape on a transparent substrate so as to form a mesh-like metal layer on the transparent substrate; (b) forming a transparent conductive polymer layer on the mesh-like metal layer; (c) forming an organic light emitting layer on the transparent conductive polymer layer; and (d) forming a counter electrode layer on the organic light emitting layer.
摘要翻译：提供一种发光器件及其制造方法。发光装置被构造成使得透明电极层，有机发光层和对电极层依次层叠在透明基板上，透明电极层由网状金属材料形成，透明电极层透明导电聚合物。制造方法包括：（a）在透明基板上将金属粒子分散在网状的溶剂中的溶液印刷，以在透明基板上形成网状金属层; （b）在网状金属层上形成透明导电聚合物层; （c）在透明导电聚合物层上形成有机发光层; 和（d）在有机发光层上形成对电极层。

24. 发明授权

US07314058B2 Reservoir tank for storing a liquid 有权
标题翻译：用于储存液体的储罐
公开(公告)号：US07314058B2
公开(公告)日：2008-01-01
申请号：US10891080
申请日：2004-07-15
申请人： Masashi Saito
发明人： Masashi Saito
IPC分类号： B63B39/03 , G01M3/00
CPC分类号： B65D88/08 , B65D90/024 , B65D90/028 , B65D90/24 , Y10T137/5762
摘要： A reservoir tank comprises a tank body and a double bottom. The tank body is constituted of a roof, a tank bottom plate and a tank wall. The roof and the tank bottom plate are fixed to the tank wall by welding. The double bottom includes a double bottom plate and a rim, which are fixed to each other by welding. A leakage liquid outlet is formed at one side of the double bottom plate on which reinforcement ribs are arranged in a lattice state. Cutouts are formed in the reinforcement ribs. The double bottom plate has a declivity so that the leakage liquid outlet is positioned at the lowermost level. The rim is provided with three detection ports. Upon welding the tank wall to the rim, the inside of the double bottom becomes an airtight state.
摘要翻译：储罐包括罐体和双层底。罐体由屋顶，罐底板和罐壁组成。屋顶和罐底板通过焊接固定在罐壁上。双层底部包括通过焊接彼此固定的双层底板和边缘。在双层底板的一侧形成泄漏液体出口，加强肋以格状排列。在加强筋中形成切口。双底板具有倾斜度，使得泄漏液体出口位于最低水平。轮辋设有三个检测口。在将罐壁焊接到轮辋上时，双层底部的内部变成气密状态。

25. 发明授权

US07215115B2 Module to control a rotating output shaft and module to change a driving condition of vehicle 有权
标题翻译：用于控制旋转输出轴和模块以改变车辆驾驶状态的模块
公开(公告)号：US07215115B2
公开(公告)日：2007-05-08
申请号：US11132178
申请日：2005-05-19
申请人： Masashi Saito , Youichi Nakano , Hayato Sugawara , Hiroaki Saeki
发明人： Masashi Saito , Youichi Nakano , Hayato Sugawara , Hiroaki Saeki
IPC分类号： G01B7/30 , H01L43/08
CPC分类号： G01D3/0365 , F16H59/70 , F16H61/0003 , F16H61/32 , F16H63/304 , F16H2063/005 , G01D5/145 , G01D11/245 , G01D18/00 , H02K7/1166 , H02K11/21 , H02K11/38 , Y10T74/19251
摘要： A sensor and a control circuit are provided externally of a gear cover. This enhances reliability of a shift controller operated by an electric actuator and a motor driven control module similar thereto, and constitute them compact. Further, this provides a rotating position detection sensor suitably used for a switching device as described. A circuit and a sensor are not contaminated with oil or metal powder of a gear mechanism portion.
摘要翻译：传感器和控制电路设置在齿轮罩的外部。这增强了由与其类似的电动致动器和电动机驱动的控制模块操作的变速控制器的可靠性，并且构成它们。此外，这提供了适用于所述的开关装置的旋转位置检测传感器。电路和传感器不会被齿轮机构部分的油或金属粉末污染。

26. 发明授权

US07194898B2 Stroke determination unit and method of measuring stroke in a multi-cylinder four-cycle engine 有权
标题翻译：一个多缸四冲程发动机的行程确定单元和测量方法
公开(公告)号：US07194898B2
公开(公告)日：2007-03-27
申请号：US11389324
申请日：2006-03-24
申请人： Kenichi Machida , Masashi Saito
发明人： Kenichi Machida , Masashi Saito
IPC分类号： G01M15/00
CPC分类号： F02D41/009 , F02D2200/0406
摘要： A stroke determination unit for a 4-cycle engine uses intake pressure as a parameter to provide accurate stroke determination. A combined pressure combines the detected pressures of intake ports of the first to third cylinders, and stroke determination is carried out by recognizing, within a combined pressure waveform based on a detection value for the combined pressure, shapes of the combined pressure waveform for a specified phase period of a crankshaft. The pressure pattern recognition is carried out by storing variation patterns of pressure values measured within the specified crankshaft phase period, and collating patterns with a data map stored within an ECU. Alternatively, the pattern recognition is carried out by collating with condition equations representing “rising” or “upward peak”. With the latter, pressure variation due to contamination such as electrical noise to the pressure sensor is made negligible, and noise suppression of the stroke determination unit is improved.
摘要翻译：用于4冲程发动机的冲程确定单元使用进气压力作为参数来提供精确的冲程确定。组合压力将检测到的第一至第三气缸的进气口的压力相结合，并且通过基于组合压力的检测值在组合压力波形内识别针对特定的压力波形的组合压力波形的形状来进行行程确定曲轴的相位周期。压力模式识别通过存储在规定的曲轴相位周期内测量的压力值的变化模式，以及将存储在ECU内的数据图形对照图案进行。或者，通过与表示“上升”或“上升”的条件方程对照来进行模式识别。后者由于诸如电压噪声对压力传感器的污染引起的压力变化可以忽略不计，并且提高了行程确定单元的噪声抑制。

27. 发明申请

US20060181166A1 Electric motor unit with controller 审中-公开
标题翻译：带控制器的电动机组
公开(公告)号：US20060181166A1
公开(公告)日：2006-08-17
申请号：US10543559
申请日：2003-01-27
申请人： Masashi Saito , Youichi Nakano , Yasuro Kameshiro , Satoshi Tazawa , Kouji Harada
发明人： Masashi Saito , Youichi Nakano , Yasuro Kameshiro , Satoshi Tazawa , Kouji Harada
IPC分类号： H02K11/00 , H02K7/10 , H02K23/66
CPC分类号： H02K11/38 , F16H61/0003 , F16H61/32 , F16H2063/005 , H02K7/1166
摘要： An object of the present invention is to provide an electric motor unit with a controller of a machinery and electricity integration type for eliminating variations due to mechanical factors and obtaining excellent operation reliability. A magnet member is attached to a gear on the side of a gear case, and a sensor for sensing the magnet member and detecting a rotational angle of the gear in a controller case, and a cylindrical opening concentric with the rotational center of the gear is installed on the gear case, and a cylindrical part fitting into the cylindrical opening is installed on the controller case, and the controller case is positioned and mounted on the gear case by the fitting between the cylindrical part and the cylindrical opening.
摘要翻译：本发明的目的是提供一种具有机电一体化控制器的电动机单元，用于消除由于机械因素引起的变化并获得优异的操作可靠性。磁铁部件安装在齿轮箱的齿轮上，传感器用于检测磁体部件并检测控制器壳体中的齿轮的旋转角度以及与齿轮的旋转中心同心的圆柱形开口，安装在齿轮箱上，并且安装在圆筒形开口中的圆筒形部件安装在控制器壳体上，并且通过圆柱形部件和圆柱形开口之间的配合将控制器壳体定位并安装在齿轮箱上。

28. 发明申请

US20060146170A1 Imaging device, portable terminal using the same, and image device producing method 有权
标题翻译：成像装置，使用其的便携式终端和图像装置的制造方法
公开(公告)号：US20060146170A1
公开(公告)日：2006-07-06
申请号：US10562530
申请日：2004-07-05
申请人： Masashi Saito , Mutsumi Sugiura
发明人： Masashi Saito , Mutsumi Sugiura
IPC分类号： H04N5/225
CPC分类号： G02B27/0006 , H04N5/2253 , H04N5/2254 , H04N5/2257
摘要： This invention relates to dust-proof, moisture-proof structures of the image pickup devices mounted in small-size thin types of electronic apparatus. More specifically, an image pickup device of this invention includes an image pickup element, a mounting base having a formed leg section which abuts on the image pickup element, an image pickup optical system that guides photographic object light to the imaging region of the image pickup element, and an outer frame member that contains the image pickup element, the mounting base, and the image pickup optical system. The space formed at the photoelectric conversion plane side of the image pickup element is sealed by using the mounting base or by using the mounting base and a part of the outer frame member.
摘要翻译：本发明涉及安装在小型薄型电子设备中的摄像装置的防尘，防湿结构。更具体地说，本发明的图像拾取装置包括一个图像拾取元件，一个安装基座，其具有形成的支脚部分，该支撑部分邻接图像拾取元件;摄像光学系统，其将摄影对象光引导到图像拾取器的成像区域元件，以及包含图像拾取元件，安装基座和图像拾取光学系统的外框构件。通过使用安装基座或使用安装基座和外框架部件的一部分来密封在摄像元件的光电转换面侧形成的空间。

29. 发明申请

US20060066247A1 Plasma processing apparatus and method 有权
标题翻译：等离子体处理装置及方法
公开(公告)号：US20060066247A1
公开(公告)日：2006-03-30
申请号：US11157061
申请日：2005-06-21
申请人： Akira Koshiishi , Masaru Sugimoto , Kunihiko Hinata , Noriyuki Kobayashi , Chishio Koshimizu , Ryuji Ohtani , Kazuo Kibi , Masashi Saito , Naoki Matsumoto , Yoshinobu Ooya , Manabu Iwata , Daisuke Yano , Yohei Yamazawa , Hidetoshi Hanaoka , Toshihiro Hayami , Hiroki Yamazaki , Manabu Sato
发明人： Akira Koshiishi , Masaru Sugimoto , Kunihiko Hinata , Noriyuki Kobayashi , Chishio Koshimizu , Ryuji Ohtani , Kazuo Kibi , Masashi Saito , Naoki Matsumoto , Yoshinobu Ooya , Manabu Iwata , Daisuke Yano , Yohei Yamazawa , Hidetoshi Hanaoka , Toshihiro Hayami , Hiroki Yamazaki , Manabu Sato
IPC分类号： H01J7/24
CPC分类号： H01J37/32422 , H01J37/32018 , H01J37/32091 , H01J37/3244 , H01J37/32522 , H01J37/32834 , H01J2237/2001 , H01J2237/334 , H01J2237/3344 , H01L21/67069 , Y10S156/915
摘要： A plasma etching apparatus includes an upper electrode and a lower electrode, between which plasma of a process gas is generated to perform plasma etching on a wafer W. The apparatus further comprises a variable DC power supply to apply a DC voltage to the upper electrode, so as to cause the absolute value of a self-bias voltage on the surface thereof to be large enough to obtain a suitable sputtering effect on the surface, and to increase the plasma sheath length on the upper electrode side to generate predetermined pressed plasma.
摘要翻译：等离子体蚀刻装置包括上电极和下电极，在其间产生处理气体的等离子体，以对晶片W进行等离子体蚀刻。该装置还包括用于向上电极施加直流电压的可变直流电源，使得其表面上的自偏压的绝对值足够大以在表面上获得合适的溅射效应，并且增加上电极侧的等离子体鞘长度以产生预定的按压等离子体。

30. 发明申请

US20060037701A1 Plasma processing apparatus and method 有权
标题翻译：等离子体处理装置及方法
公开(公告)号：US20060037701A1
公开(公告)日：2006-02-23
申请号：US11156559
申请日：2005-06-21
申请人： Akira Koshiishi , Masaru Sugimoto , Kunihiko Hinata , Noriyuki Kobayashi , Chishio Koshimizu , Ryuji Ohtani , Kazuo Kibi , Masashi Saito , Naoki Matsumoto , Manabu Iwata , Daisuke Yano , Yohei Yamazawa
发明人： Akira Koshiishi , Masaru Sugimoto , Kunihiko Hinata , Noriyuki Kobayashi , Chishio Koshimizu , Ryuji Ohtani , Kazuo Kibi , Masashi Saito , Naoki Matsumoto , Manabu Iwata , Daisuke Yano , Yohei Yamazawa
IPC分类号： C23F1/00
CPC分类号： H01J37/32091 , H01J37/32082 , H01J37/32174 , H01J37/32348 , H01J37/3244 , H01J37/32541 , H01J37/32568 , H01J37/32642 , H01J37/32706 , H01J37/32834 , H01J2237/3344 , H01L21/02126 , H01L21/02164 , H01L21/0217 , H01L21/31116 , H01L21/31138 , H01L21/31144 , H01L21/67069
摘要： An apparatus includes an upper electrode and a lower electrode for supporting a wafer disposed opposite each other within a process chamber. A first RF power supply configured to apply a first RF power having a relatively higher frequency is connected to the upper electrode. A second RF power supply configured to apply a second RF power having a relatively lower frequency is connected to the lower electrode. A variable DC power supply is connected to the upper electrode. A process gas is supplied into the process chamber while any one of application voltage, application current, and application power from the variable DC power supply to the upper electrode is controlled, to generate plasma of the process gas so as to perform plasma etching.
摘要翻译：一种装置包括用于支撑在处理室内相对设置的晶片的上电极和下电极。被配置为施加具有相对较高频率的第一RF功率的第一RF电源连接到上电极。配置为施加具有相对较低频率的第二RF功率的第二RF电源连接到下电极。可变直流电源连接到上电极。将处理气体供给到处理室中，同时控制来自可变直流电源到上部电极的施加电压，施加电流和施加电力中的任何一个，以产生处理气体的等离子体，以进行等离子体蚀刻。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式