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    • 22. 发明申请
    • Magnetic read head having increased electron exchange
    • 磁读头具有增加的电子交换
    • US20080137236A1
    • 2008-06-12
    • US11638271
    • 2006-12-12
    • Wen-Yaung LeeJinshan LiDaniele MauriBrian R. York
    • Wen-Yaung LeeJinshan LiDaniele MauriBrian R. York
    • G11B5/33G11B5/127
    • G11B5/3906B82Y25/00G01R33/093G11B5/3163
    • A magnetic head of either CIP or CPP configuration is disclosed, having a read sensor with a strongly pinned ferromagnetic layer due to increased electronic exchange with the AFM layer. The read sensor includes a lower seed layer whose material is chosen from a group consisting of Ta, NiFeCr, NiFeCoCr, NiFe, Cu, Ta/NiFeCr, Ta/NiFeCr/NiFe, Ta/Ru and Ta/NiFeCoCr, and an upper seed layer where the upper seed layer material is chosen from a group consisting of Ru, Cu, NiFe, Cu(x)Au(1-x)(x=0.22-0.5) alloys, Ru(x)Cr(1-x)(x=0.1-0.5) alloys, NiFeCr and NiFeCoCr. An AFM layer is formed on the upper seed layer and a ferromagnetic pinned layer is formed on the AFM layer. The exchange coupling energy Jk between the AFM layer and pinned layers exceeds 1.3 erg/cm2. Also disclosed is a method of fabrication of a magnetic head including a read head sensor with a strongly pinned ferromagnetic layer due to increased electronic exchange.
    • 公开了CIP或CPP配置的磁头,其具有由于与AFM层的电子交换增加而具有强固定的铁磁层的读取传感器。 读取传感器包括下部种子层,其材料选自由Ta,NiFeCr,NiFeCoCr,NiFe,Cu,Ta / NiFeCr,Ta / NiFeCr / NiFe,Ta / Ru和Ta / NiFeCoCr组成的组,以及上部种子层 其中上部种子层材料选自Ru,Cu,NiFe,Cu(x)Au(1-x)(x = 0.22-0.5)合金,Ru(x)Cr(1-x)(x = 0.1-0.5)合金,NiFeCr和NiFeCoCr。 在上种籽层上形成AFM层,在AFM层上形成铁磁性钉扎层。 AFM层和钉扎层之间的交换耦合能量Jk超过1.3erg / cm2。 还公开了一种由于增加的电子交换而制造包括具有强固定铁磁层的读头传感器的磁头的方法。
    • 25. 发明申请
    • Method for reactive sputter deposition of an ultra-thin metal oxide film
    • 超薄金属氧化物膜的反应溅射沉积方法
    • US20060042929A1
    • 2006-03-02
    • US10927888
    • 2004-08-26
    • Daniele Mauri
    • Daniele Mauri
    • C23C14/00C23C14/32
    • H01L43/12C23C14/0042C23C14/0089C23C14/081G11B5/127G11B5/39
    • The invention is a method for reactive sputter deposition of an ultra-thin film of an oxide of a first metal onto a film of a second metal. The method can be part of the fabrication of a magnetic tunnel junction (MTJ) with the metal oxide film becoming the tunnel barrier of the MTJ. The metal oxide film is reactively sputter deposited in the presence of reactive oxygen gas (O2) from a target consisting essentially of the first metal, with the sputtering occurring in the “high-voltage” state to assure that deposition occurs with the target in its metallic mode, i.e., no or minimal oxidation. When the metal oxide film is for a MTJ tunnel barrier, then the target is formed of a metal of Al, Ti, Ta, Y, Ga or In; an alloy of two or more of these metals; or an alloy of one or more of these metals with Mg; and the film of the second metal is an iron-containing film, typically a film of Fe or a CoFe alloy.
    • 本发明是将第一金属的氧化物的超薄膜反应溅射沉积到第二金属的膜上的方法。 该方法可以是金属氧化物膜成为MTJ隧道势垒的磁隧道结(MTJ)的制造的一部分。 在基本由第一金属组成的靶上,在活性氧气(O 2 O 2)存在下,金属氧化物膜被溅射沉积,溅射以“高电压”状态发生,以确保 目标在其金属模式中发生沉积,即没有或最小的氧化。 当金属氧化物膜用于MTJ隧道势垒时,靶由Al,Ti,Ta,Y,Ga或In的金属形成; 这些金属中的两种或更多种的合金; 或这些金属中的一种或多种与Mg的合金; 并且第二金属的膜是含铁膜,通常是Fe或CoFe合金的膜。
    • 29. 发明授权
    • In-situ oxidized films for use as cap and gap layers in a spin-valve sensor and methods of manufacture
    • 用于自旋阀传感器中的盖和间隙层的原位氧化膜和制造方法
    • US06709767B2
    • 2004-03-23
    • US09919280
    • 2001-07-31
    • Tsann LinDaniele Mauri
    • Tsann LinDaniele Mauri
    • G11B5127
    • B82Y25/00B82Y10/00G01R33/093G11B5/012G11B5/3903Y10T29/49044Y10T428/1129Y10T428/1164Y10T428/1171Y10T428/12549Y10T428/1259Y10T428/12611Y10T428/12646Y10T428/12667Y10T428/1291Y10T428/12917Y10T428/12931Y10T428/12937Y10T428/24967Y10T428/265
    • Disclosed is a spin-valve sensor employing one or more in-situ oxidized films as cap and/or gap layers in order to achieve an increased GMR coefficient and improved thermal stability. A fabrication method comprises depositing multilayer metallic films on a wafer in ion-beam and DC-magnetron sputtering modules of a sputtering system, and then transferring the wafer in a vacuum to an oxidation module where in-situ oxidation is conducted. When the method is used to form a cap layer, the cap layer may only be partially oxidized. A magnetic-field annealing may be subsequently conducted without the substantial occurrence of interface mixing and oxygen diffusion during the anneal process. The resulting spin-valve sensor exhibits an increased GMR coefficient, possibly due to induced specular scattering of conduction electrons and improved thermal stability mainly due to the protection of an underlying sensing layer from interface mixing and oxygen diffusion during the annealing process. Gap layers may also be formed from multi-layer in-situ deposition and oxidation of metal films. Smaller, more sensitive spin-valve sensors may be fabricated through the use of the alternative deposition and in-situ oxidization of the metallic films, thus allowing for greater recording data densities in disk drive systems.
    • 公开了一种使用一个或多个原位氧化膜作为盖和/或间隙层的自旋阀传感器,以便实现增加的GMR系数和改善的热稳定性。 制造方法包括在溅射系统的离子束和DC-磁控溅射模块中的晶片上沉积多层金属膜,然后将晶片真空转移到进行原位氧化的氧化模块。 当该方法用于形成覆盖层时,盖层仅可被部分氧化。 随后可以进行磁场退火,而不会在退火过程中基本上出现界面混合和氧扩散。 所产生的自旋阀传感器表现出增加的GMR系数,这可能是由于传导电子的诱导镜面散射和改进的热稳定性,这主要是由于在退火过程中保护底层感测层免于界面混合和氧扩散。 间隙层也可以由金属膜的多层原位沉积和氧化形成。 可以通过使用金属膜的替代沉积和原位氧化来制造更小,更灵敏的自旋阀传感器,从而允许磁盘驱动系统中更大的记录数据密度。