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    • 21. 发明申请
    • Liquid crystal display with a planarization layer having black resin
    • 具有具有黑色树脂的平坦化层的液晶显示器
    • US20050094070A1
    • 2005-05-05
    • US10979930
    • 2004-11-01
    • Chien-Ting LaiJia-Pang PangYung Chen
    • Chien-Ting LaiJia-Pang PangYung Chen
    • G02F1/1335G02F1/1362G02F1/1333
    • G02F1/136209G02F1/133553G02F1/133555
    • A liquid crystal display (LCD) (2) includes an upper substrate (201), a lower substrate (202), and a liquid crystal layer (208) interposed between the substrates. The upper substrate has a color filter (216). A planarization layer (204) and a reflection electrode (217) are disposed on the lower substrate. The planarization layer is made of a black resin. An adhesive frame (215) for conglutinating the substrates is disposed therebetween. The reflection layer has gaps therein, the gaps defining non-display areas. Parts of the planarization layer corresponding to the non-display areas absorb light beams leaked from the non-display areas. These parts of the planarization layer perform the function of a black matrix. Because the black matrix is provided on the lower substrate, light beams used to solidify the adhesive frame during manufacturing of the LCD are not obstructed. Thus the LCD has enhanced sealing and is more durable and reliable.
    • 液晶显示器(LCD)(2)包括上基板(201),下基板(202)和置于基板之间的液晶层(208)。 上基板具有滤色器(216)。 平坦化层(204)和反射电极(217)设置在下基板上。 平坦化层由黑色树脂制成。 用于粘合基板的粘合框架(215)设置在其间。 反射层在其中具有间隙,间隙限定非显示区域。 对应于非显示区域的平坦化层的部分吸收从非显示区域泄漏的光束。 平坦化层的这些部分执行黑矩阵的功能。 由于黑色矩阵设置在下基板上,所以在LCD的制造期间用于固化粘合框架的光束不被阻挡。 因此,LCD具有增强的密封性,并且更加耐用和可靠。
    • 23. 发明申请
    • Liquid crystal panel having notches for repair
    • 液晶面板有修补缺口
    • US20090066869A1
    • 2009-03-12
    • US12231805
    • 2008-09-05
    • Hong-Gi WuChien-Ting Lai
    • Hong-Gi WuChien-Ting Lai
    • G02F1/136
    • G02F1/136259G02F2001/136268
    • A liquid crystal panel of the present disclosure includes a first common electrode defining a plurality of first common electrode portions, a plurality of second common electrode portions connected to the first common electrode, and a plurality of pixel electrodes. Each pixel electrode overlaps one of the first common electrode portions and a corresponding one of the second common electrode portions, thereby forming storage capacitors therebetween. Each second common electrode portion defines a first notch adjacent to the pixel electrode. There is no overlap between the pixel electrode and the second common electrode portion at the first notch.
    • 本公开的液晶面板包括限定多个第一公共电极部分的第一公共电极,连接到第一公共电极的多个第二公共电极部分和多个像素电极。 每个像素电极与第一公共电极部分中的一个和第二公共电极部分中的相应一个重叠,由此在其间形成存储电容器。 每个第二公共电极部分限定与像素电极相邻的第一凹口。 像素电极和第二公共电极部分在第一缺口处没有重叠。
    • 24. 发明授权
    • Dual mode liquid crystal display device with capacitor electrodes separate from pixel electrode performing and functioning as a reflection electrode
    • 双模式液晶显示装置,其电容器电极与执行并用作反射电极的像素电极分开
    • US07443456B2
    • 2008-10-28
    • US11273384
    • 2005-11-14
    • Chien-Ting Lai
    • Chien-Ting Lai
    • G02F1/1343
    • G02F1/133555G02F1/136213
    • An LCD device (100) includes a first substrate (110), a second substrate (120), and a liquid crystal layer (130) having liquid crystal molecules interposed between the first and second substrates. A pixel electrode (112) is disposed at an inner surface of the first substrate, and a common electrode (122) is disposed at an inner surface of the second substrate. A storage capacitor (140) has an upper storage electrode (118) and a lower storage electrode (113) disposed at an inner surface of the first substrate, with the upper storage electrode electrically connecting with the pixel electrode. The upper storage electrode functions as a reflection electrode. This structure ensures the LCD device is capable of providing a display both in a reflection mode and a transmission mode.
    • LCD装置(100)包括第一基板(110),第二基板(120)和液晶分子(130),液晶分子插入在第一和第二基板之间。 像素电极(112)设置在第一基板的内表面,公共电极(122)设置在第二基板的内表面。 存储电容器(140)具有设置在第一基板的内表面的上部存储电极(118)和下部存储电极(113),上部存储电极与像素电极电连接。 上部存储电极用作反射电极。 这种结构确保了LCD装置能够以反射模式和透射模式提供显示。
    • 25. 发明申请
    • Method for fabricating organic light emitting display
    • 制造有机发光显示器的方法
    • US20080176476A1
    • 2008-07-24
    • US11788968
    • 2007-04-23
    • Jung-Lung HuangChien-Ting LaiJia-Pang Pang
    • Jung-Lung HuangChien-Ting LaiJia-Pang Pang
    • H01J9/02
    • H01L51/5259
    • An exemplary method for fabricating an organic light emitting display (OLED) (200) includes: providing a first substrate (210); providing moisture absorber (240) on the first substrate; processing the moisture absorber by using hydrogen plasma; providing a second substrate (220) having an organic light emitting unit (250) formed thereat; and attaching the first and second substrates together with a sealant, such that the moisture absorber and the organic light emitting unit are hermetically sealed between the first and second substrates, with the moisture absorber facing the organic light emitting unit. Because the moisture absorber is finished during the method for fabricating the OLED, and is sealed in the space between the first substrate and the second substrate soon after being finished, the moisture absorber is difficult to react with air. Thus, the OLED has improved quality.
    • 一种制造有机发光显示器(OLED)(200)的示例性方法包括:提供第一衬底(210); 在第一基板上提供吸湿剂(240); 通过使用氢等离子体处理吸湿剂; 提供具有在其上形成的有机发光单元(250)的第二基板(220) 以及用密封剂将第一和第二基板连接在一起,使得吸湿剂和有机发光单元气密地密封在第一和第二基板之间,吸湿剂面向有机发光单元。 由于在制造OLED的方法中吸湿剂被完成,并且在完成之后不久将其密封在第一基板和第二基板之间的空间中,所以吸湿剂难以与空气反应。 因此,OLED具有改进的质量。
    • 26. 发明申请
    • Method for fabricating transflective liquid crystal display
    • 半透射液晶显示器的制造方法
    • US20070148802A1
    • 2007-06-28
    • US11642141
    • 2006-12-20
    • Tzu-Min YanChien-Ting Lai
    • Tzu-Min YanChien-Ting Lai
    • H01L21/00H01L33/00
    • G02F1/133555G02F2001/136236
    • An exemplary method for fabricating a transflective liquid crystal display is provided. The transflective liquid crystal display includes a substrate (200) having a transmission region (201) and a reflection region (202). The method includes: forming a transparent electrode layer (210), a buffer layer (220), and a reflective metal layer (230) on the substrate; forming a photo-resist layer (240) on the reflective metal layer; providing a photo-mask (300) comprising a first portion corresponding to the transmission region and a second portion corresponding to the reflection region, transmittance of the first portion being greater than transmittance of the second portion; exposing the photo-resist layer using the photo-mask and developing the exposed photo-resist layer; ashing the residual photo-resist in the transparent region; etching the reflective metal layer and the buffer layer in the transmission region; and removing the residual photo-resist in the reflection region.
    • 提供一种用于制造透反射液晶显示器的示例性方法。 半透射型液晶显示器包括具有透射区域(201)和反射区域(202)的基板(200)。 该方法包括:在基板上形成透明电极层(210),缓冲层(220)和反射金属层(230) 在所述反射金属层上形成光致抗蚀剂层(240); 提供包括对应于所述透射区域的第一部分和对应于所述反射区域的第二部分的光掩模(300),所述第一部分的透射率大于所述第二部分的透射率; 使用光掩模曝光光刻胶层并显影曝光的光致抗蚀剂层; 在透明区域中灰化残留光刻胶; 蚀刻透射区域中的反射金属层和缓冲层; 并去除反射区域中的残留光刻胶。
    • 27. 发明申请
    • THIN FILM TRANSISTOR SUBSTRATE
    • 薄膜晶体管基板
    • US20110031512A1
    • 2011-02-10
    • US12825340
    • 2010-06-29
    • YI-YU KAOCHAO-YI HUNGCHIEN-TING LAI
    • YI-YU KAOCHAO-YI HUNGCHIEN-TING LAI
    • H01L33/08
    • H01L27/1214
    • A thin film transistor substrate, capable of being assembled, is attached to a filter substrate to provide a semi-finished liquid crystal display panel. The thin film transistor substrate includes a base substrate with thin film transistors formed thereon, wiring assemblies formed on the substrate and electrically connected to the corresponding thin film transistors selectively, metal sheets formed on the base substrate, a protection layer formed on the thin film transistors, the wiring assemblies, and the metal sheets, and a buffer module formed on the protection layer. The buffer module is positioned above a projection of a cutting line onto the base substrate, and the surplus materials of the filter substrate are removed along the cutting line.
    • 能够组装的薄膜晶体管衬底附着到过滤器衬底上,以提供半成品液晶显示面板。 所述薄膜晶体管基板包括:基板,其上形成有薄膜晶体管;布线组件,形成在所述基板上,并且与所述薄膜晶体管选择性地电连接;形成在所述基板上的金属板,形成在所述薄膜晶体管上的保护层 ,布线组件和金属片,以及形成在保护层上的缓冲模块。 将缓冲模块定位在切割线的突起上方到基底基板上,并且沿着切割线去除过滤器基板的剩余材料。
    • 28. 发明申请
    • ESD protection circuit and driving circuit for LCD
    • ESD保护电路和LCD驱动电路
    • US20070146564A1
    • 2007-06-28
    • US11317502
    • 2005-12-23
    • Hong WuYung-chang ChenChien-Ting Lai
    • Hong WuYung-chang ChenChien-Ting Lai
    • G02F1/1333
    • G02F1/136204H01L27/0266
    • An electrostatic discharge (ESD) protection circuit (140) includes: a first transistor (141), a second transistor (142), a third transistor (143), and a fourth transistor (144). Each transistor includes a source electrode ‘s’, a drain electrode ‘d’ and a gate electrode ‘g’. The gate electrode ‘g’ of the first transistor, the gate electrode ‘g’ of the second transistor, the drain electrode ‘d’ of the third transistor, and the drain electrode ‘d’ of the fourth transistor are connected to each other. The source electrode ‘s’ of the first transistor, the source electrode ‘s’ of the second transistor, and the source and gate electrodes of the third transistor are connected to each other. The drain electrode ‘d’ of the first transistor, the drain electrode ‘d’ of the second transistor, and the source and gate electrodes of the fourth transistor are connected to each other.
    • 静电放电(ESD)保护电路(140)包括:第一晶体管(141),第二晶体管(142),第三晶体管(143)和第四晶体管(144)。 每个晶体管包括源电极',漏电极'd'和栅电极'g'。 第一晶体管的栅极电极“g”,第二晶体管的栅极电极“g”,第三晶体管的漏电极“d”和第四晶体管的漏电极“d”彼此连接。 第一晶体管的源极电极,第二晶体管的源极电极以及第三晶体管的源极和栅极彼此连接。 第一晶体管的漏电极d,第二晶体管的漏电极d'和第四晶体管的源电极和栅电极彼此连接。
    • 29. 发明申请
    • Method for fabricating TFT array substrate
    • TFT阵列基板的制造方法
    • US20070138472A1
    • 2007-06-21
    • US11642042
    • 2006-12-18
    • Tzu-Min YanChien-Ting Lai
    • Tzu-Min YanChien-Ting Lai
    • H01L29/04
    • H01L27/1288H01L27/124
    • An exemplary method for fabricating a thin film transistor (TFT) array substrate includes: providing an insulating substrate; forming a plurality of gate electrodes and a plurality of reflective patterns on the insulating substrate using a first photo-mask process; forming a gate insulating layer, an amorphous silicon layer, a doped amorphous silicon layer, and a source/drain metal layer on the insulating substrate having the gate electrodes and the reflective patterns; forming a plurality of source electrodes and a plurality of drain electrodes on the doped amorphous silicon layer; depositing a passivation layer on the source electrodes, the drain electrodes and the gate insulating layer; and forming a pixel electrode on the passivation layer.
    • 制造薄膜晶体管(TFT)阵列基板的示例性方法包括:提供绝缘基板; 使用第一光掩模工艺在绝缘基板上形成多个栅电极和多个反射图案; 在具有栅电极和反射图案的绝缘基板上形成栅极绝缘层,非晶硅层,掺杂非晶硅层和源极/漏极金属层; 在所述掺杂非晶硅层上形成多个源电极和多个漏电极; 在源电极,漏电极和栅极绝缘层上沉积钝化层; 以及在所述钝化层上形成像素电极。
    • 30. 发明申请
    • Method of simulation of an exposure process
    • 曝光过程的模拟方法
    • US20050278155A1
    • 2005-12-15
    • US10887777
    • 2004-07-09
    • Chien-Ting LaiJia-Pang Pang
    • Chien-Ting LaiJia-Pang Pang
    • G03F1/14G06F17/10G06F17/50
    • G06F17/5009G03F1/36G03F7/705
    • A method of simulation of an exposure system includes the steps of: establishing a model of an exposure system, initializing a computer, and setting relevant parameters of the exposure system in the computer; providing a pattern to be exposed, and analyzing the pattern; using a transform to transfer the pattern, and obtaining a far-field diffraction spectrum of light intensity distribution according to the pattern in a light entrance pupil plane (305) of a lens system (30) of the exposure system; multiplying the far-field diffraction spectrum by a transfer function of the exposure system to obtain an effective diffraction spectrum passing through the exposure system; and using an inverse transform according to said transform to transfer the effective diffraction spectrum, and obtaining a final light intensity distribution. The transform is a Fourier transform, a Laplace transform, a Z transform, or a T transform.
    • 曝光系统的模拟方法包括以下步骤:建立曝光系统的模型,初始化计算机,以及在计算机中设置曝光系统的相关参数; 提供暴露的模式,分析模式; 使用变换来转印图案,并且根据曝光系统的透镜系统(30)的光入射光瞳平面(305)中的图案获得光强分布的远场衍射光谱; 将远场衍射光谱乘以曝光系统的传递函数,以获得通过曝光系统的有效衍射光谱; 并使用根据所述变换的逆变换来转移有效衍射光谱,并获得最终的光强度分布。 该变换是傅立叶变换,拉普拉斯变换,Z变换或T变换。