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11. 发明专利

JPH0612442B2 失效
公开(公告)号：JPH0612442B2
公开(公告)日：1994-02-16
申请号：JP15894583
申请日：1983-08-30
申请人： GRACE W R & CO
发明人： JON AARU UOONZU
IPC分类号： G03C7/10 , G03C1/72 , G03F7/00 , G03F7/027 , G03F7/032 , G03F7/033 , G03F7/038

12. 发明专利

JPH0470622B2 失效
公开(公告)号：JPH0470622B2
公开(公告)日：1992-11-11
申请号：JP3622883
申请日：1983-03-04
申请人： KONISHIROKU PHOTO IND
发明人： HOTSUTA JUJI , HIRABAYASHI SHIGETO , YAMASHITA KYOSHI
IPC分类号： G03C5/08 , G03C7/10 , G03C8/08 , G03C8/10 , G03C8/30

13. 发明专利

JPH01131548A PHOTOSENSITIVE RESIN COMPOSITION AND PRINTING PLATE MATERIAL 失效
公开(公告)号：JPH01131548A
公开(公告)日：1989-05-24
申请号：JP28993387
申请日：1987-11-17
申请人： TORAY INDUSTRIES
发明人： TANIGUCHI MASAHARU , FUJIKAWA JUNICHI
IPC分类号： G03C7/10 , G03F7/037
摘要： PURPOSE:To obtain a printing plate material having improved formability and developability by using a material consisting of a compsn. consisting of a specified ethylenic unsatd. compd. and an amine compd. contg. each specified amt. of soluble polyamide or polyesteramide and a photopolymn. initiator. CONSTITUTION:3-40pts.wt. soluble polyamide or polyesteramide and 0.01-10pts. wt. photopolymn. initiator are admixed with a compsn. consisting of 100pts.wt. ethylenic unsatd. compd. having >=150 deg.C b.p., and 0.1-50pts.wt. amine compd. having >=1 active hydrogen in the molecule. At least a part of the ethylenic unsatd. compd. is a polyene having 500-20,000 number average mol.wt. or its modified product or an oligomeric urethane acrylate or methacrylate having 500-5,000 number average mol.wt. By this constitution, a solid printing plate material having flexibility, developability, and resistance to ink together, and having also superior formability is obtd.

14. 发明专利

JPS62111250A PHOTOSENSITIVE COMPOSITION, PHOTOGRAPHIC MATERIAL AND SCREENPRINTING MATERIAL CONTAINING COMPOSITION 失效
公开(公告)号：JPS62111250A
公开(公告)日：1987-05-22
申请号：JP18024486
申请日：1986-08-01
申请人： HOECHST CO AMERICAN
发明人： JIYON II UOORUZU , MEJIYAA ESU DEIRON , FURANKU SHII PAGANO , KARUROSU TERECHIEA
IPC分类号： G03C7/10 , G03F7/032 , G03F7/033

15. 发明专利

JPS60257445A POSITIVE TYPE REDIATION RESIST MATERIAL 失效
公开(公告)号：JPS60257445A
公开(公告)日：1985-12-19
申请号：JP11349484
申请日：1984-06-01
申请人： KURARAY CO
发明人： SUGITA KAZUYUKI , UENO NOBUO , SASAKI SHIGERU , OSADA SHIROU
IPC分类号： G03F7/20 , G03C1/72 , G03C5/08 , G03C7/10 , G03F7/039
摘要： PURPOSE:To obtain a positive type radiation resist material superior in sensitivity, resolution, and dry etching resistance by using a material made of a copolymer composed of alpha-methylstyrene or its deriv., and another monomer for forming a positive type radiation resist polymer having a prescribed mol.wt. CONSTITUTION:The deriv. of alpha-methylstyrene is obtained by replacing H of the aromatic ring by a substituent, such as halogen, e.g., F or Cl, lower alkyl like methyl or ethyl, cyano, amino, or the like. The monomer for forming a positive type radiation resist is methyl methacrylate or allyl methacrylate or the like capable of copolymerizing with alpha-methylstyrene or its deriv. The copolymer contains alpha-methylstyrene or its deriv. in an amt. of 3-90mol% and it has a mol.wt. of 100,000-1,000,000. To use this resist, it is dissolved in a solvent, a substrate is coated with this soln. by using a spinner, irradiated with radiation, and subjected to dry etching in high density.

16. 发明专利

JPS5960435A Uniform elastomer-like photosensitive composition 失效
标题翻译：均质弹性体 - 像光敏组合物
公开(公告)号：JPS5960435A
公开(公告)日：1984-04-06
申请号：JP15894583
申请日：1983-08-30
申请人： Uniroyal Inc
发明人： JIYON AARU UOONZU
IPC分类号： G03C7/10 , G03C1/72 , G03F7/00 , G03F7/027 , G03F7/032 , G03F7/033
CPC分类号： G03F7/033

17. 发明专利

JPS57100103A PHOTO-INSOLUBILIZING POLYVINYL ALCOHOL DERIVATIVE AND ITS PREPARATION 失效
公开(公告)号：JPS57100103A
公开(公告)日：1982-06-22
申请号：JP17565980
申请日：1980-12-12
申请人： KOGYO GIJUTSUIN
发明人： NAKANISHI HACHIROU , ICHIMURA KUNIHIRO , FUJISHIGE NORINAGA , KATOU MASAO
IPC分类号： C08F8/00 , C08F8/28 , C08F16/00 , C08F16/02 , G03C7/10 , G03F7/038 , H01L21/027 , H01L21/302 , H05K3/00 , H05K3/06
摘要： PURPOSE:To prepare the titled PVA derivative having high photo-sensitivity even at a low content of the photo-sensitive functional group, and suitable as a photoresist, etc., by reacting a (partially) saponified polyvinyl acetate with an aldehyde or its acetal derivative. CONSTITUTION:The objective derivative having the structure substituted with the unit of formula II, is prepared by reacting (A) a (partially) saponified saponified polyvinyl acetate (pref. having a saponification degree of >=70% and an average polymerization degree of 200-3,000) with (B) the aldehyde of formulaI(A is polymethylene which may have side chain) or its acetal derivative[e.g. 2-(p- formylbenzylidene)cyclopentanone], in water or a hydrous organic solvent, in the presence of an acid catalyst (pref. hydrochloric acid.).

18. 发明公开

EP0273113A2 Photosensitive polymer composition and master printing plate 失效
标题翻译：光聚合物光聚合物和Druckplatte。
公开(公告)号：EP0273113A2
公开(公告)日：1988-07-06
申请号：EP87114351.7
申请日：1987-10-01
申请人： TORAY INDUSTRIES, INC.
发明人： Taniguchi, Masaharu , Tokunou, Masazumi , Fujikawa, Junichi
IPC分类号： G03C7/10 , G03F7/027
CPC分类号： G03F7/037 , Y10S430/107
摘要： The present invention relates to a photosensitive polymer composition comprising the following components A, B and C:

A: 100 parts by weight of ethylenically unsaturated compounds,
B: 3 to 40 parts by weight of a polyamide or 3 to 32 parts by weight of a polyesteramide soluble in the ethylenically unsaturated compounds and
C: 0.01 to 10 parts by weight of a photopolymerization initiator,
and a solid photosensitive printing plate material comprising the above-mentioned photosensitive polymer composition and a support, which solid photosensitive printing plate material can be easily prepared from a substantially solvent-free starting material and usable for the production of a printing plate, flexible printing plate and flexographic printing plate developable with water and/or an alcohol.
摘要翻译：本发明涉及包含以下组分A，B和C的感光性聚合物组合物：A：100重量份的烯键式不饱和化合物，B：3〜40重量份的聚酰胺或3〜32重量份的可溶于烯键式不饱和化合物的聚酯酰胺和C：0.01至10重量份的光聚合引发剂，以及包含上述感光性聚合物组合物和载体的固体感光性印刷版材料，该固体感光性印刷版材料可以容易地制备来自基本上无溶剂的原料，可用于生产可用水和/或醇显影的印版，柔版印版和柔版印版。

19. 发明授权

EP0079111B1 Colour imaging device 失效
标题翻译：彩色成像装置
公开(公告)号：EP0079111B1
公开(公告)日：1986-10-22
申请号：EP82201409.8
申请日：1982-11-09
申请人： Philips Electronics N.V.
发明人： Needs, Howard Curtis , Blok, Lodewijk
IPC分类号： H01L31/02 , H01J29/89 , G03C7/10 , G03C7/12
CPC分类号： H01L31/02162 , G03F7/0007 , H04N9/045

20. 发明授权

EP0273113B1 Photosensitive polymer composition and master printing plate 失效
标题翻译：光敏聚合物组合物和主打印板
公开(公告)号：EP0273113B1
公开(公告)日：1991-01-23
申请号：EP87114351.7
申请日：1987-10-01
申请人： TORAY INDUSTRIES, INC.
发明人： Taniguchi, Masaharu , Tokunou, Masazumi , Fujikawa, Junichi
IPC分类号： G03C7/10 , G03F7/027
CPC分类号： G03F7/037 , Y10S430/107

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