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11. 发明专利

NO875032A 未知
公开(公告)号：NO875032A
公开(公告)日：1988-06-09
申请号：NO875032
申请日：1987-12-02
申请人： AIR PROD & CHEM
发明人： LANGSAM MICHAEL , SAVOCA ANN COATES LESCHER
IPC分类号： B01D53/22 , B01D71/44 , B29C39/00 , C08F38/00 , C08J5/18 , C08J7/12 , C08J7/16 , C08F30/10 , B01D53/00 , C08F8/20
CPC分类号： C08F38/00 , B01D71/44

12. 发明专利

AU526693B2 HIGH VINYL BUTADIENE POLYMERS 未知
公开(公告)号：AU526693B2
公开(公告)日：1983-01-27
申请号：AU7540781
申请日：1981-09-16
申请人： JAPAN SYNTHETIC RUBBER CO LTD
发明人： TAKEUCHI YASUMASA , YOSHIMURA YOSHITO , OSHIMA NOBORU , SAKAKIBARA MITSUHIKO , TSUJI AKIRA
IPC分类号： B65H75/40 , C08C19/44 , C08F2/06 , C08F4/46 , C08F8/42 , C08F8/44 , C08F30/04 , C08F30/10 , C08F36/06 , C08F212/08 , C08G81/02 , C08L9/00 , C08L9/06 , C08L25/04 , D21H13/44 , C08F4/48 , C08F295/00

13. 发明专利

JPWO2018230507A1 接着性組成物审中-公开
公开(公告)号：JPWO2018230507A1
公开(公告)日：2020-04-09
申请号：JP2018022254
申请日：2018-06-11
申请人：日本曹達株式会社
发明人：山手太軌 , 立石祐一
IPC分类号： C08F30/10 , C09J201/02
摘要：本発明は、ポリオレフィン材料などの接着性の悪い材料に対しても優れた接着性を示す新規の接着性組成物を提供することを課題とする。本発明の接着性組成物は、式〔I〕(式中、R 1 〜R 3 は、それぞれ独立に、無置換の若しくは置換基を有するアリール基を示す。R 1 とR 2 、R 2 とR 3 、またはR 3 とR 1 は、単結合で結合していてもよい。Aは、無置換の若しくは置換基を有するアリーレン基を示し、Gは、炭素原子、ケイ素原子、または、ゲルマニウム原子を示す。*は、結合位置を示す。)で表される部分構造を有するポリマーを含有する。【化1】

14. 发明专利

JP2001174601A OPTICAL GOODS 失效
公开(公告)号：JP2001174601A
公开(公告)日：2001-06-29
申请号：JP35829699
申请日：1999-12-17
申请人： HOYA CORP
发明人： OKUBO TAKESHI , KYO TAKESHI
IPC分类号： G02B1/04 , C07F7/30 , C08F30/10 , C08G18/77 , C08G18/81
摘要： PROBLEM TO BE SOLVED: To provide optical goods having a high refractive index and a high Abbe constant and excellent in heat resistance, weather resistance and transparency. SOLUTION: The optical goods comprise a polymer obtained by using at least a polymerizable organogermanium compound as an essential monomeric component.

15. 发明专利

JP2769038B2 失效
公开(公告)号：JP2769038B2
公开(公告)日：1998-06-25
申请号：JP31833290
申请日：1990-11-21
IPC分类号： G03F7/038 , C08F30/00 , C08F30/04 , C08F30/10 , G03F7/039 , G03F7/26 , G03F7/42 , H01L21/027 , H01L21/30
摘要： The present invention is directed to a method of forming and removing a resist pattern, used in a semiconductor manufacture. In a first mode of the present invention, an upper resist layer containing germanium is selectively formed on a bottom resist layer and a resist pattern is formed with the upper resist layer as a mask. In a second mode of the present invention, a resist layer formed on a substrate is selectively exposed to introduce a germanium compound into the exposed portions and the above described resist layer is subjected to an anisotropic dry etching to remove the nonexposed portions of the resist layer, whereby forming a resist pattern. Accordingly, the fine pattern can be formed on the substrate in high accuracy by the use of the above described resist pattern. In addition, in the first and the second modes of the present invention, the resist pattern is removed by the use of an acid having an oxidizing power, so that the resist pattern can be easily removed from the substrate.

16. 发明专利

NL189301C 未知
公开(公告)号：NL189301C
公开(公告)日：1993-03-01
申请号：NL8104316
申请日：1981-09-18
申请人： JAPAN SYNTHETIC RUBBER CO LTD
IPC分类号： B65H75/40 , C08C19/44 , C08F2/06 , C08F4/46 , C08F8/42 , C08F8/44 , C08F30/04 , C08F30/10 , C08F36/06 , C08F212/08 , C08G81/02 , C08L9/00 , C08L9/06 , C08L25/04 , D21H13/44 , B60C1/00

17. 发明专利

IT1171539B 未知
公开(公告)号：IT1171539B
公开(公告)日：1987-06-10
申请号：IT4931981
申请日：1981-09-18
申请人： JAPAN SYNTHETIC RUBBER CO LTD
发明人： TAKEUCHI YASUMASA , YOSHIMURA YOSHITO , OSHIMA NOBURO , SAKAKIBARA MITSUHITO , TSUJI AKIRA
IPC分类号： B65H75/40 , C08C19/44 , C08F2/06 , C08F4/46 , C08F8/42 , C08F8/44 , C08F30/04 , C08F30/10 , C08F36/06 , C08F212/08 , C08G81/02 , C08L9/00 , C08L9/06 , C08L25/04 , D21H13/44 , C08F

18. 发明专利

CA1169186A HIGH VINYL POLYBUTADIENE OR STYRENE-BUTADIENE COPOLYMER 未知
公开(公告)号：CA1169186A
公开(公告)日：1984-06-12
申请号：CA386112
申请日：1981-09-17
申请人： JAPAN SYNTHETIC RUBBER CO LTD
发明人： TAKEUCHI YASUMASA , YOSHIMURA YOSHITO , OHSHIMA NOBORU , SAKAKIBARA MITSUHIKO , TSUJI AKIRA
IPC分类号： B65H75/40 , C08C19/44 , C08F2/06 , C08F4/46 , C08F8/42 , C08F8/44 , C08F30/04 , C08F30/10 , C08F36/06 , C08F212/08 , C08G81/02 , C08L9/00 , C08L9/06 , C08L25/04 , D21H13/44 , C08F2/00
摘要： High vinyl polybutadiene or styrene-butadiene copolymer obtained by polymerizing 1,3-butadiene alone or with styrene in a hydrocarbon solvent using an organolithium compound as an initiator and coupling the resulting polymer, characterized in that (1) the polybutadiene or styrene-butadiene copolymer comprises at least 20% by weight of a polymer having in its molecular chain a linkage between butadienyl and at least one element selected from the group consisting of silicon, germanium, tin and lead, (2) the styrene content of said copolymer is 40% by weight or less, and (3) the polybutadiene or the butadiene portion of the styrenebutadiene copolymer has a vinyl content of 50 to 95%. Said polybutadiene or sytrene-butadiene copolymer has a low rolling resistance, high wet skid resistance, highly improved fracture property and, an excellent processability.

19. 发明专利

GB2085896A BUTADIENE POLYMER AND ITS PREPARATION 未知
公开(公告)号：GB2085896A
公开(公告)日：1982-05-06
申请号：GB8128468
申请日：1981-09-21
申请人： JAPAN SYNTHETIC RUBBER CO LTD
IPC分类号： B65H75/40 , C08C19/44 , C08F2/06 , C08F4/46 , C08F8/42 , C08F8/44 , C08F30/04 , C08F30/10 , C08F36/06 , C08F212/08 , C08G81/02 , C08L9/00 , C08L9/06 , C08L25/04 , D21H13/44

20. 发明授权

US5262246A Material for use in spacecraft parts 失效
标题翻译：用于航天器零件的材料
公开(公告)号：US5262246A
公开(公告)日：1993-11-16
申请号：US633236
申请日：1990-12-21
申请人： Takao Nishikawa , Katsumi Sonoda , Yoshiko Aiba , Hiroshi Adachi
发明人： Takao Nishikawa , Katsumi Sonoda , Yoshiko Aiba , Hiroshi Adachi
IPC分类号： C09D143/00 , C09D183/04 , B32B27/30 , C08F30/10 , C08F112/08
CPC分类号： C09D183/04 , C09D143/00 , Y10T428/31855 , Y10T428/31931
摘要： A material for spacecrafts pertaining to this invention is made of a compound containing the group IV b elements, as a material of which proof for oxygen atom is absolutely necessary. The application of this material, in the form of a shield part (a resin layer) for covering at least a portion of material used in a structural part of the spacecraft enables a long use (from several months to several decades or more) in the oxygen atom environment in the space, which was impossible in the part.
摘要翻译：用于本发明的航天器的材料由含有第Ⅳb族元素的化合物制成，作为绝对需要证明氧原子的材料。将这种材料应用于用于覆盖航天器的结构部分中使用的材料的至少一部分的屏蔽部分（树脂层）的形式使得能够长期使用（几个月到几十年或更长时间）在氧原子环境在空间，这是不可能的。

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