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11. 发明授权

US07728294B2 Semiconductor wafer inspection tool and semiconductor wafer inspection method 失效
标题翻译：半导体晶圆检查工具和半导体晶圆检查方法
公开(公告)号：US07728294B2
公开(公告)日：2010-06-01
申请号：US11808247
申请日：2007-06-07
申请人： Takashi Hiroi , Kenji Tanimoto , Yuko Sasaki , Hiroshi Makino
发明人： Takashi Hiroi , Kenji Tanimoto , Yuko Sasaki , Hiroshi Makino
IPC分类号： H01J37/21 , H01J37/26
CPC分类号： H01J37/20 , G01R31/307 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/2008 , H01J2237/20235 , H01J2237/20292 , H01J2237/221 , H01J2237/24564 , H01J2237/24592 , H01J2237/28
摘要： A semiconductor wafer inspection tool and a semiconductor wafer inspection method capable of conducting an inspection under appropriate conditions in any one of an NVC (Negative Voltage Contrast) mode and a PVC (Positive Voltage Contrast) mode is provided. Primary electrons 2 are irradiated onto a wafer to be inspected 6 and the irradiation position thereof is scanned in an XY direction. Secondary electrons (or reflected electrons) 10 from the wafer to be inspected 6 are controlled by a charge control electrode 5 and detected by a sensor 11. An image processor converts a detection signal from the sensor 11 to a detected image, compares the detected image with a predetermined reference image, judges defects, an overall control section 14 selects inspection conditions from recipe information for each wafer to be inspected 6 and sets a voltage to be applied to the charge control electrode 5. A Z stage 8 sets the distance between the wafer to be inspected 6 and the charge control electrode 5 according to this voltage.
摘要翻译：提供能够在适当条件下进行NVC（负电压对比度）模式和PVC（正电压对比度）模式中的任一种的半导体晶片检查工具和半导体晶片检查方法。将一次电子2照射到要检查的晶片6上，并且其XY照射位置被扫描。来自待检查晶片的二次电子（或反射电子）10由充电控制电极5控制并由传感器11检测。图像处理器将来自传感器11的检测信号转换为检测图像，通过预定的参考图像判断缺陷，总体控制部分14从每个要检查的晶片的配方信息中选择检查条件6并设置要施加到充电控制电极5的电压.Za级8设置晶片之间的距离根据该电压检查6和充电控制电极5。

12. 发明申请

US20060243908A1 Method of inspecting a circuit pattern and inspecting instrument 失效
标题翻译：检查电路图案和检查仪器的方法
公开(公告)号：US20060243908A1
公开(公告)日：2006-11-02
申请号：US11452989
申请日：2006-06-15
申请人： Hiroyuki Shinada , Atsuko Takafuji , Takanori Ninomiya , Yuko Sasaki , Mari Nozoe , Hisaya Murakoshi , Taku Ninomiya , Yuji Kasai , Hiroshi Makino , Yutaka Kaneko , Kenji Tanimoto
发明人： Hiroyuki Shinada , Atsuko Takafuji , Takanori Ninomiya , Yuko Sasaki , Mari Nozoe , Hisaya Murakoshi , Taku Ninomiya , Yuji Kasai , Hiroshi Makino , Yutaka Kaneko , Kenji Tanimoto
IPC分类号： G21K7/00
CPC分类号： G01N23/225 , G01R31/307 , H01J37/28 , H01J2237/2817
摘要： An apparatus for inspecting a sample using a scanning electron microscope includes a sample stage, a first electron-optical system to scan an electron beam of a first beam current on the sample, a second electron-optical system to scan an electron beam of a second beam current smaller than the first beam current on the sample, a mechanism to move the sample stage, a detector provided in each of the first and second electron-optical systems to detect a secondary electron. The first electron-optical system is operable in a first mode and the second electron-optical system is operable in a second mode with higher resolution than that of the first mode. In the first mode, the sample is observed while the sample stage is moved continuously, and in the second mode, the sample is observed by detecting a secondary electron using the detector while the sample stage is held stationary.
摘要翻译：使用扫描电子显微镜检查样品的装置包括样品台，用于扫描样品上的第一束电流的电子束的第一电子 - 光学系统，用于扫描第二电子束的电子束的第二电子 - 光学系统光束电流小于样品上的第一光束电流，移动样品台的机构，设置在每个第一和第二电子光学系统中的检测二次电子的检测器。第一电子 - 光学系统可在第一模式中操作，并且第二电子 - 光学系统可以以比第一模式更高的分辨率在第二模式中操作。在第一模式中，在样品台连续移动时观察样品，在第二模式中，通过在样品台保持静止时使用检测器检测二次电子来观察样品。

13. 发明授权

US07875858B2 Charged particle beam trajectory corrector and charged particle beam apparatus 有权
标题翻译：带电粒子束轨迹校正器和带电粒子束装置
公开(公告)号：US07875858B2
公开(公告)日：2011-01-25
申请号：US12349708
申请日：2009-01-07
申请人： Hiroyuki Ito , Yuko Sasaki , Ryoichi Ishii , Takashi Doi
发明人： Hiroyuki Ito , Yuko Sasaki , Ryoichi Ishii , Takashi Doi
IPC分类号： H01J1/50 , G21K1/08 , G21K1/093
CPC分类号： H01J37/153 , H01J37/145 , H01J37/28 , H01J2237/1534
摘要： The invention relates to a trajectory correction method for a charged particle beam, and provides a low-cost, high accuracy and high-resolution converging optical system for use with a charged particle beam to solve problems with conventional aberration correction systems. To this end, the present invention uses a configuration which forms electromagnetic field which is concentrated towards a center of a beam trajectory axis, causes oblique of the beam to make use of lens effects and bend the trajectory, and consequently, cancels out large external side non-linear effects such a spherical aberration of the electron lens. Specifically, the configuration generates an electric field concentration in a simple manner by providing electrodes above the axis and applying voltages to the electrodes. Further, the above configuration can be realized trough operations using lenses and deflectors with incident axes and image formation positions that are normal.
摘要翻译：本发明涉及一种用于带电粒子束的轨迹校正方法，并且提供了一种用于带电粒子束的低成本，高精度和高分辨率会聚光学系统，以解决常规像差校正系统的问题。为此，本发明使用形成朝向光束轨迹轴的中心集中的电磁场的结构，使得光束的倾斜利用透镜效果并弯曲轨迹，因此抵消了大的外侧电子透镜的非线性效应如球面像差。具体地说，该配置通过在轴上方设置电极并向电极施加电压，以简单的方式产生电场浓度。此外，可以通过使用具有入射轴和成像位置的透镜和偏转器的槽操作来实现上述配置。

14. 发明申请

US20090139536A1 Lip categorizing method, makeup method, categorizing map, and makeup tool 有权
标题翻译：唇部分类方法，化妆方法，分类图和化妆工具
公开(公告)号：US20090139536A1
公开(公告)日：2009-06-04
申请号：US11665687
申请日：2005-10-25
申请人： Hiroko Yano , Hirofumi Kera , Wakae Matsuyama , Kumiko Kuroki , Miki Ishida , Yuko Sasaki , Miyako Okamoto , Yasuo Goto , Yoshiko Masushio , Etsu Nishijima
发明人： Hiroko Yano , Hirofumi Kera , Wakae Matsuyama , Kumiko Kuroki , Miki Ishida , Yuko Sasaki , Miyako Okamoto , Yasuo Goto , Yoshiko Masushio , Etsu Nishijima
IPC分类号： A45D40/30 , A45D40/26
CPC分类号： A45D44/005 , A45D40/30
摘要： A lip categorizing method uses the size and shape of the lips as viewed from the front of the face as a first categorization index and the three-dimensional form of the lips as a second categorization index. The lip categorizing map is composed of a first coordinate axis showing the degree of the first categorization index and a second coordinate axis showing the degree of the second categorization index and has a coordinate system in which the first and second coordinate axes are orthogonal. It also generates makeup information for two-dimensionally correcting the lips of a subject based on preset reference by setting a plurality of points for determining the form features of lips on an image that depicts the lips, and judges the form features of the lips of the subject based on analytical values of the two-dimensional features of the lips measured from the set points.
摘要翻译：嘴唇分类方法使用从脸部前面观察的嘴唇的大小和形状作为第一分类指数，并将嘴唇的三维形式作为第二分类指数。唇分类图由表示第一分类指数的程度的第一坐标轴和表示第二分类指标的程度的第二坐标轴组成，并具有其中第一和第二坐标轴正交的坐标系。它还通过设置用于确定描绘嘴唇的图像上的嘴唇的形状特征的多个点来基于预设参考来生成用于二维地校正被摄体的嘴唇的化妆信息，并且判断唇部的形状特征基于从设定点测量的唇的二维特征的分析值的主题。

15. 发明授权

US07435960B2 Charged particle beam apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US07435960B2
公开(公告)日：2008-10-14
申请号：US11808376
申请日：2007-06-08
申请人： Makoto Suzuki , Kenji Tanimoto , Yuko Sasaki
发明人： Makoto Suzuki , Kenji Tanimoto , Yuko Sasaki
IPC分类号： H01J37/28 , H01J37/256
CPC分类号： H01J37/21 , H01J37/265 , H01J37/28 , H01J2237/216 , H01J2237/24592 , H01J2237/2487 , H01J2237/2817 , H01J2237/2826
摘要： A charged particle beam apparatus obtains an image by detecting a generation signal inclusively indicative of secondary electrons generated from a specimen. The apparatus has an input unit for inputting current and voltage values to be applied to a charged particle optical system through which the charged particle beam travels, a memory unit for storing shape, position and physical properties of the charged particle optical system and accuracy of the applied current or voltage, an electromagnetic field calculation unit for calculating an electromagnetic field near a path of the charged particle beam, a charged particle trajectory calculation unit for calculating a trajectory of the charged particle beam in the calculated electromagnetic field, a memory unit for storing a result of the trajectory calculation and a controller for controlling the charged particle optical system on the basis of the result of the trajectory calculation.
摘要翻译：带电粒子束装置通过检测包含从样本产生的二次电子的生成信号来获得图像。该装置具有用于输入要施加到带电粒子光束通过的带电粒子光学系统的电流和电压值的输入单元，用于存储带电粒子光学系统的形状，位置和物理特性的存储单元以及施加电流或电压的电磁场计算单元，用于计算带电粒子束路径附近的电磁场的电磁场计算单元，用于计算计算出的电磁场中的带电粒子束的轨迹的带电粒子轨迹计算单元，存储轨迹计算的结果和基于轨迹计算结果来控制带电粒子光学系统的控制器。

16. 发明申请

US20080067381A1 Semiconductor wafer inspection tool and semiconductor wafer inspection method 失效
标题翻译：半导体晶圆检查工具和半导体晶圆检查方法
公开(公告)号：US20080067381A1
公开(公告)日：2008-03-20
申请号：US11808247
申请日：2007-06-07
申请人： Takashi Hiroi , Kenji Tanimoto , Yuko Sasaki , Hiroshi Makino
发明人： Takashi Hiroi , Kenji Tanimoto , Yuko Sasaki , Hiroshi Makino
IPC分类号： G21K7/00
CPC分类号： H01J37/20 , G01R31/307 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/2008 , H01J2237/20235 , H01J2237/20292 , H01J2237/221 , H01J2237/24564 , H01J2237/24592 , H01J2237/28
摘要： A semiconductor wafer inspection tool and a semiconductor wafer inspection method capable of conducting an inspection under appropriate conditions in any one of an NVC (Negative Voltage Contrast) mode and a PVC (Positive Voltage Contrast) mode is provided. Primary electrons 2 are irradiated onto a wafer to be inspected 6 and the irradiation position thereof is scanned in an XY direction. Secondary electrons (or reflected electrons) 10 from the wafer to be inspected 6 are controlled by a charge control electrode 5 and detected by a sensor 11. An image processor converts a detection signal from the sensor 11 to a detected image, compares the detected image with a predetermined reference image, judges defects, an overall control section 14 selects inspection conditions from recipe information for each wafer to be inspected 6 and sets a voltage to be applied to the charge control electrode 5. A Z stage 8 sets the distance between the wafer to be inspected 6 and the charge control electrode 5 according to this voltage.
摘要翻译：提供能够在适当条件下进行NVC（负电压对比度）模式和PVC（正电压对比度）模式中的任一种的半导体晶片检查工具和半导体晶片检查方法。将一次电子2照射到要检查的晶片6上，并且其XY照射位置被扫描。来自待检查晶片的二次电子（或反射电子）10由电荷控制电极5控制，并由传感器11检测。图像处理器将来自传感器11的检测信号转换为检测图像，将检测到的图像与预定参考图像进行比较，判断缺陷，总体控制部14从每个被检查晶片的配方信息中选择检查条件6，施加到充电控制电极5的电压。 Z级8根据该电压设定待检查晶片6与充电控制电极5之间的距离。

17. 发明授权

US07241996B2 Charged particle beam apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US07241996B2
公开(公告)日：2007-07-10
申请号：US11183906
申请日：2005-07-19
申请人： Makoto Suzuki , Kenji Tanimoto , Yuko Sasaki
发明人： Makoto Suzuki , Kenji Tanimoto , Yuko Sasaki
IPC分类号： H01J37/28 , H01J37/256
CPC分类号： H01J37/21 , H01J37/265 , H01J37/28 , H01J2237/216 , H01J2237/24592 , H01J2237/2487 , H01J2237/2817 , H01J2237/2826
摘要： A charged particle beam apparatus obtains an image by detecting a generation signal inclusively indicative of secondary electrons generated from a specimen. The apparatus has an input unit for inputting current and voltage values to be applied to a charged particle optical system through which the charged particle beam travels, a memory unit for storing shape, position and physical properties of the charged particle optical system and accuracy of the applied current or voltage, an electromagnetic field calculation unit for calculating an electromagnetic field near a path of the charged particle beam, a charged particle trajectory calculation unit for calculating a trajectory of the charged particle beam in the calculated electromagnetic field, a memory unit for storing a result of the trajectory calculation and a controller for controlling the charged particle optical system on the basis of the result of the trajectory calculation.
摘要翻译：带电粒子束装置通过检测包含从样本产生的二次电子的生成信号来获得图像。该装置具有用于输入要施加到带电粒子光束通过的带电粒子光学系统的电流和电压值的输入单元，用于存储带电粒子光学系统的形状，位置和物理特性的存储单元以及施加电流或电压的电磁场计算单元，用于计算带电粒子束路径附近的电磁场的电磁场计算单元，用于计算计算出的电磁场中的带电粒子束的轨迹的带电粒子轨迹计算单元，存储轨迹计算的结果和基于轨迹计算结果来控制带电粒子光学系统的控制器。

18. 发明授权

US06584040B1 Electronic timepiece 失效
标题翻译：电子钟表
公开(公告)号：US06584040B1
公开(公告)日：2003-06-24
申请号：US09583136
申请日：2000-05-30
申请人： Kenichi Nakajima , Takayuki Satodate , Akihiro Matouge , Akihiko Inada , Mitsuru Ishii , Yoshio Koyama , Shigeo Suzuki , Masayuki Kawata , Yuko Sasaki , Eriko Takakuwa
发明人： Kenichi Nakajima , Takayuki Satodate , Akihiro Matouge , Akihiko Inada , Mitsuru Ishii , Yoshio Koyama , Shigeo Suzuki , Masayuki Kawata , Yuko Sasaki , Eriko Takakuwa
IPC分类号： G04B1924
CPC分类号： G04C17/0066 , G04C3/12
摘要： To provide an electronic timepiece enabling reliable detection of a state of rotation of an indication wheel such as a date dial. An ultrasonic motor 1130 has an ultrasonic rotor pinion 1134b. A date dial 1120 is disposed on a main plate 1102 in such a way as to rotate relative thereto. The ultrasonic rotor pinion 1134b is meshed with an intermediate date driving gear wheel 1142a. A date driving wheel 1150 is rotatably disposed on the main plate 1102. A date driving gear wheel 1150b is meshed with an intermediate date driving pinion 1142b. A date driving gear portion 1150b is meshed with a dial gear portion 1120a. A contact point spring 1160 is disposed on a spring guiding portion 1150d. The contact point spring 1160 rotates integrally with the date driving wheel 1150 through the rotation of the date driving wheel 1150. The state of rotation of the date driving wheel 1150 can be detected by contact of the contact point spring 1160 with the contact point pattern 1174.
摘要翻译：提供能够可靠地检测诸如日期拨盘等指示轮的旋转状态的电子钟表。超声波马达1130具有超声波转子小齿轮1134b。日历指示盘1120以相对于其旋转的方式设置在主板1102上。超声波转子小齿轮1134b与中间日期驱动齿轮1142a啮合。日期驱动轮1150可旋转地设置在主板1102上。日期驱动齿轮1150b与中间日期驱动小齿轮1142b啮合。日期驱动齿轮部分1150b与表盘齿轮部分1120a啮合。接触点弹簧1160设置在弹簧引导部分1150d上。接触点弹簧1160通过日期驱动轮1150的旋转与日期驱动轮1150一体地旋转。日期驱动轮1150的旋转状态可以通过接触点弹簧1160与接触点图案1174的接触来检测。

19. 发明授权

US06583413B1 Method of inspecting a circuit pattern and inspecting instrument 有权
标题翻译：检查电路图案和检查仪器的方法
公开(公告)号：US06583413B1
公开(公告)日：2003-06-24
申请号：US09652606
申请日：2000-08-30
申请人： Hiroyuki Shinada , Atsuko Takafuji , Takanori Ninomiya , Yuko Sasaki , Mari Nozoe , Hisaya Murakoshi , Taku Ninomiya , Yuji Kasai , Hiroshi Makino , Yutaka Kaneko , Kenji Tanimoto
发明人： Hiroyuki Shinada , Atsuko Takafuji , Takanori Ninomiya , Yuko Sasaki , Mari Nozoe , Hisaya Murakoshi , Taku Ninomiya , Yuji Kasai , Hiroshi Makino , Yutaka Kaneko , Kenji Tanimoto
IPC分类号： G01N2300
CPC分类号： G01N23/225 , G01R31/307 , H01J37/28 , H01J2237/2817
摘要： A circuit pattern inspecting instrument includes an electron-optical system for irradiating an electron beam on a sample, an electron beam deflector, a detector for detecting secondary charged particles from the sample, and a mode setting unit for switching between a first mode and a second mode. An electron beam current is larger in the first mode than in the second mode, and an electron beam scanning speed is higher in the first mode than in the second mode. The circuit pattern inspecting instrument is configured so that first the sample is observed in the first mode, then a particular position on the sample is selected based on image data produced by an output of the detector in the first mode, and then the particular position on the sample is observed in the second mode.
摘要翻译：电路图形检查装置包括用于对样品照射电子束的电子光学系统，电子束偏转器，用于从样品检测二次带电粒子的检测器，以及用于在第一模式和第二模式之间切换的模式设置单元模式。在第一模式中电子束电流比第二模式中的电子束电流大，并且在第一模式中电子束扫描速度高于第二模式。电路图形检查装置被配置为使得首先在第一模式中观察样本，然后基于在第一模式中由检测器的输出产生的图像数据来选择样本上的特定位置，然后选择特定位置在第二模式下观察样品。

20. 发明授权

US09539209B2 Vaccine for mycoplasma infection 有权
标题翻译：疫苗支原体感染
公开(公告)号：US09539209B2
公开(公告)日：2017-01-10
申请号：US13376009
申请日：2010-06-04
申请人： Kazuhiro Matsuda , Koji Ichiyama , Sachie Matsuda , Yuko Sasaki , Yoshichika Arakawa , Ryo Harasawa , Yoshihiro Nishida , Norio Katayama , Yasuo Endo , Nobuo Nomura
发明人： Kazuhiro Matsuda , Koji Ichiyama , Sachie Matsuda , Yuko Sasaki , Yoshichika Arakawa , Ryo Harasawa , Yoshihiro Nishida , Norio Katayama , Yasuo Endo , Nobuo Nomura
IPC分类号： A61K39/02 , A61K39/00 , A61K49/00 , A61K9/127 , A61K39/39 , A61K39/145 , A61K39/12
CPC分类号： A61K39/0241 , A61K9/127 , A61K9/1272 , A61K39/12 , A61K39/145 , A61K39/39 , A61K2039/55555 , A61K2039/55594 , Y02A50/403
摘要： Disclosed is a vaccine which has a high therapeutic effect on mycoplasma infection and is highly safe. For the purpose of developing effective therapeutic methods for mycoplasma infection, mycoplasma-mimic particles which are effective as a vaccine for mycoplasma infection are provided, and also provided are bacterium-mimic particles including common bacteria. Bacterium-mimic particles such as mycoplasma-mimic particles can be provided by producing liposome particles in which a lipid antigen specific to a pathogenic bacterium such as mycoplasma is contained as a liposome-constituting lipid component. The administration of the mycoplasma-mimic particles enables the induction of a potent immunological activity in living bodies. The mycoplasma-mimic particles can be used as an excellent vaccine for the prevention or treatment of mycoplasma infection.
摘要翻译：公开了对支原体感染具有高治疗效果的疫苗，并且是高度安全的。为了开发有效的支原体感染治疗方法，提供了作为支原体感染疫苗有效的支原体模拟颗粒，并且还提供了包括常见细菌的细菌模拟颗粒。可以通过生产脂质体颗粒来提供细菌模拟颗粒，例如支原体模拟颗粒，其中作为构成脂质体的脂质组分含有诸如支原体的致病菌特异性的脂质抗原。支原体模拟颗粒的施用使得能够诱导活体中有效的免疫活性。支原体模拟颗粒可用作预防或治疗支原体感染的优良疫苗。

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