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11. 发明授权

US07101259B2 Polishing method and apparatus 失效
公开(公告)号：US07101259B2
公开(公告)日：2006-09-05
申请号：US10694047
申请日：2003-10-28
申请人： Norio Kimura , Mitsuhiko Shirakashi , Katsuhiko Tokushige , Masao Asami , Naoto Miyashita , Masako Kodera , Yoshitaka Matsui , Soichi Nadahara , Hiroshi Tomita
发明人： Norio Kimura , Mitsuhiko Shirakashi , Katsuhiko Tokushige , Masao Asami , Naoto Miyashita , Masako Kodera , Yoshitaka Matsui , Soichi Nadahara , Hiroshi Tomita
IPC分类号： B24B49/00 , B24B51/00 , H01L21/00 , B24B1/00
CPC分类号： B24B37/345
摘要： A polishing apparatus is used for chemical mechanical polishing a copper (Cu) layer formed on a substrate such as a semiconductor wafer and then cleaning the polished substrate. The polishing apparatus has a polishing section having a turntable with a polishing surface and a top ring for holding a substrate and pressing the substrate against the polishing surface to polish a surface having a semiconductor device thereon, and a cleaning section for cleaning the substrate which has been polished. The cleaning section has an electrolyzed water supply device for supplying electrolyzed water to the substrate to clean the polished surface of the substrate while supplying electrolyzed water to the substrate.

12. 发明申请

US20060091662A1 Airbag and airbag apparatus 审中-公开
标题翻译：安全气囊和安全气囊装置
公开(公告)号：US20060091662A1
公开(公告)日：2006-05-04
申请号：US11248236
申请日：2005-10-13
申请人： Kei Tsujimoto , Wataru Nakazawa , Yoshitaka Matsui
发明人： Kei Tsujimoto , Wataru Nakazawa , Yoshitaka Matsui
IPC分类号： B60R21/16
CPC分类号： B60R21/235 , B60R2021/23514 , B60R2021/23576 , B60R2021/23595
摘要： An airbag has two base cloths with a high airtightness at sewn portions, and an airbag apparatus including the airbag and an inflator. The airbag is formed by sewing the two base cloths together with a sewing thread such that chambers are provided between the base cloths. A gas injection hole is provided at an end of the airbag. Each base cloth includes a main body made of a woven cloth and a coating layer made of thermoplastic resin formed on one side of the main body. When the base cloths are sewn together, one of the base cloths is placed on the other in such a manner that the coating layers of the base cloths come into contact with each other, and then the base cloths are adhered to each other by heating the portions to be sewn and applying pressure to the base cloths as necessary.
摘要翻译：安全气囊具有在缝合部分具有高气密性的两个底布，以及包括该气囊和充气机的气囊装置。气囊通过将两根基布与缝纫线缝合在一起形成，使得在基布之间设置室。在气囊的端部设置有气体注入孔。每个基布包括由主体构成的主体和形成在主体的一侧上的由热塑性树脂制成的涂层。当基布缝合在一起时，其中一个基布以这样的方式放置，使得基布的涂层彼此接触，然后通过加热基布粘结基布需要缝制的部分和对基布施加压力。

13. 发明申请

US20050148176A1 Method of manufacturing a semiconductor device 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US20050148176A1
公开(公告)日：2005-07-07
申请号：US11074774
申请日：2005-03-09
申请人： Yoshitaka Matsui , Masako Kodera
发明人： Yoshitaka Matsui , Masako Kodera
IPC分类号： H01L21/02 , H01L21/311 , H01L21/321 , H01L21/3213 , H01L21/768 , H01L21/44
CPC分类号： H01L21/02071 , H01L21/31116 , H01L21/3212 , H01L21/76814 , H01L21/76838 , H01L21/7684 , H01L21/76883
摘要： A method of manufacturing a semiconductor device, comprising the following processes of forming a structure in which a barrier metal containing at least of Ti and Ta and a copper wiring are exposed on its surface, or a structure in which at least one substance selected from the group consisting of Ti, W, and Cu and Al are exposed on its surface, above a semiconductor. substrate, and supplying a hydrogen-dissolved solution dissolving hydrogen gas to the surface of the structure.
摘要翻译：一种制造半导体器件的方法，包括以下工序：形成其中至少含有Ti和Ta和铜布线的阻挡金属在其表面上露出的结构，或者其中至少一种选自由Ti，W和Cu和Al组成的组在其表面上暴露于半导体之上。并且将溶解氢气的氢溶解溶液供给到该结构体的表面。

14. 发明授权

US6015754A Chemical mechanical polishing apparatus and method 失效
标题翻译：化学机械抛光装置及方法
公开(公告)号：US6015754A
公开(公告)日：2000-01-18
申请号：US996695
申请日：1997-12-23
申请人： Yasukazu Mase , Yoshitaka Matsui , Takeshi Kubota , Toshihiko Kitamura
发明人： Yasukazu Mase , Yoshitaka Matsui , Takeshi Kubota , Toshihiko Kitamura
IPC分类号： B24B37/013 , B24B49/10 , H01L21/304 , H01L21/321 , H01L21/302 , C23F1/02
CPC分类号： B24B37/005 , B24B49/10 , H01L21/32115
摘要： A CMP apparatus is used to subject a target surface of a semiconductor wafer to a polishing treatment, by moving the target surface and a polishing surface of a polishing cloth relative to each other while supplying a polishing liquid between the target surface and the polishing surface. Electric resistance is measured between pairs of measuring points arranged on opposite sides of dicing lines on the target surface, while subjecting the target surface to the polishing treatment. The polishing treatment is caused to be ended by comparing detected values of a changing rate in measured values of the electric property with a reference value set to correspond to an end point of the polishing treatment.
摘要翻译： CMP设备用于通过在目标表面和抛光表面之间提供抛光液体的同时相对于彼此移动目标表面和抛光布的抛光表面来对半导体晶片的目标表面进行抛光处理。在目标表面上的切割线的相对侧的测量点对之间测量电阻，同时对目标表面进行抛光处理。通过将电性能的测量值中的变化率的检测值与设置为对应于抛光处理的终点的参考值进行比较，结束抛光处理。

15. 发明授权

US08757660B2 Passenger airbag device 有权
标题翻译：乘客安全气囊装置
公开(公告)号：US08757660B2
公开(公告)日：2014-06-24
申请号：US13357944
申请日：2012-01-25
申请人： Yoshitaka Matsui
发明人： Yoshitaka Matsui
IPC分类号： B60R21/261 , B60R21/217 , B60R21/205
CPC分类号： B60R21/205 , B60R21/217 , B60R21/261
摘要： In one form, a passenger airbag device is provided including an airbag; a retainer having an opening on a passenger side; a bag ring provided to an inside of the retainer; and the gas generating device; wherein: the retainer further includes a base wall that forms a substantially rectangular outer edge shape; two first peripheral wall portions; and two second peripheral wall portions; and the bag ring comprises: a bottom wall portion configured to hold a peripheral edge portion of the opening of the airbag; a first upright wall having a predetermined first height dimension, that is arranged so as to face the first peripheral wall portion of the retainer; and a second upright wall having a predetermined second height dimension larger than the first height dimension, that is arranged so as to face the second peripheral wall portion of the retainer.
摘要翻译：在一种形式中，设置有安全气囊的乘客安全气囊装置; 在乘客侧具有开口的保持器; 设置在保持器内部的袋环; 和气体发生装置; 其中：所述保持器还包括形成基本上矩形的外边缘形状的底壁; 两个第一周边壁部分; 和两个第二周壁部分; 所述袋环包括：底壁部，其构造成保持所述气囊的开口的周缘部; 具有预定的第一高度尺寸的第一直立壁，其被布置成面向保持器的第一周壁部; 以及具有比第一高度尺寸大的预定的第二高度尺寸的第二直立壁，其被布置成面向保持器的第二周壁部分。

16. 发明申请

US20120193895A1 PASSENGER AIRBAG DEVICE 有权
标题翻译：乘客安全气囊设备
公开(公告)号：US20120193895A1
公开(公告)日：2012-08-02
申请号：US13357944
申请日：2012-01-25
申请人： Yoshitaka Matsui
发明人： Yoshitaka Matsui
IPC分类号： B60R21/16
CPC分类号： B60R21/205 , B60R21/217 , B60R21/261
摘要： In one form, a passenger airbag device is provided including an airbag; a retainer having an opening on a passenger side; a bag ring provided to an inside of the retainer; and the gas generating device; wherein: the retainer further includes a base wall that forms a substantially rectangular outer edge shape; two first peripheral wall portions; and two second peripheral wall portions; and the bag ring comprises: a bottom wall portion configured to hold a peripheral edge portion of the opening of the airbag; a first upright wall having a predetermined first height dimension, that is arranged so as to face the first peripheral wall portion of the retainer; and a second upright wall having a predetermined second height dimension larger than the first height dimension, that is arranged so as to face the second peripheral wall portion of the retainer.
摘要翻译：在一种形式中，设置有安全气囊的乘客安全气囊装置; 在乘客侧具有开口的保持器; 设置在保持器内部的袋环; 和气体发生装置; 其中：所述保持器还包括形成基本上矩形的外边缘形状的底壁; 两个第一周边壁部分; 和两个第二周壁部分; 所述袋环包括：底壁部，其构造成保持所述气囊的开口的周缘部; 具有预定的第一高度尺寸的第一直立壁，其被布置成面向保持器的第一周壁部; 以及具有比第一高度尺寸大的预定的第二高度尺寸的第二直立壁，其被布置成面向保持器的第二周壁部分。

17. 发明申请

US20100206628A1 TRANSPARENT ELECTROMAGNETIC WAVE SHIELD MEMBER AND METHOD FOR MANUFACTURING THE SAME 审中-公开
标题翻译：透明电磁波屏蔽部件及其制造方法
公开(公告)号：US20100206628A1
公开(公告)日：2010-08-19
申请号：US12440016
申请日：2007-09-04
申请人： Yoshitaka Matsui , Masaaki Kotoura , Osamu Watanabe , Tadashi Yoshioka , Keitaro Sakamoto
发明人： Yoshitaka Matsui , Masaaki Kotoura , Osamu Watanabe , Tadashi Yoshioka , Keitaro Sakamoto
IPC分类号： H05K9/00 , B05D5/12 , C23C14/14 , C23C14/34 , B23K26/00
CPC分类号： H05K9/0096 , H01J11/10 , H01J11/44 , H01J2211/446
摘要： The present invention aims to provide a transparent electromagnetic wave shield member, which is free from a moirè phenomenon which could not be solved by the prior art, and in which an excellent electromagnetic wave shielding properties and a sufficient total light transmittance based on an appropriate network structure are compatible, and a method for manufacturing the same.The transparent electromagnetic wave shield member of the present invention is a transparent electromagnetic wave shield member in which a metal layer of an electroconductive metal network structure having a geometrical shape is formed on a transparent substrate, and which is characterized in that a spacing of said network structure is 200 μm or less, an opening ratio of the network structure is 84% or more, and in addition, a thickness of the electroconductive metal layer is 2 μm or less.Furthermore, the method for manufacturing such transparent electromagnetic wave shield member is a method for manufacturing a transparent electromagnetic wave shield member in which a metal layer of a network structure having a geometrical shape is formed on a transparent substrate, which is characterized in that a metal layer of a thickness of 2 μm or less is provided on a transparent substrate and the metal layer is removed by laser abrasion to form a metal layer of a network structure having a spacing of the network structure of 200 μm or less, and in addition, an opening ratio of the network structure of 84% or more.
摘要翻译：本发明的目的在于提供一种透明的电磁波屏蔽构件，其不存在现有技术无法解决的莫尔现象，并且其中基于适当的网络具有优异的电磁波屏蔽性能和足够的全光透射率结构是兼容的，以及其制造方法。本发明的透明电磁波屏蔽部件是在透明基板上形成具有几何形状的导电金属网络结构的金属层的透明电磁波屏蔽部件，其特征在于，所述网络的间隔结构为200μm以下，网状结构的开口率为84％以上，另外导电性金属层的厚度为2μm以下。此外，这种透明电磁波屏蔽部件的制造方法是在透明基板上形成具有几何形状的网状结构的金属层的透明电磁波屏蔽部件的制造方法，其特征在于，金属在透明基板上设置厚度为2μm以下的层，通过激光研磨去除金属层，形成网状结构的间隔为200μm以下的网状结构体的金属层，另外，网络结构的开放率为84％以上。

18. 发明授权

US07581754B2 Airbag apparatus and method of manufacturing airbag 有权
标题翻译：安全气囊装置及安全气囊的制造方法
公开(公告)号：US07581754B2
公开(公告)日：2009-09-01
申请号：US11139800
申请日：2005-05-31
申请人： Yoshitaka Matsui , Kei Tsujimoto , Wataru Nakazawa , Masahiko Kaifuki
发明人： Yoshitaka Matsui , Kei Tsujimoto , Wataru Nakazawa , Masahiko Kaifuki
IPC分类号： B60R21/16
CPC分类号： B60R21/231 , B60R2021/23533
摘要： An airbag apparatus to be mounted on a vehicle such as a motor vehicle includes an airbag and a gas supply device. The airbag is inflated to a rear side of a vehicle from a front side thereof in front of a vehicle passenger for protecting the passenger in case of a vehicle accident. The airbag includes a right airbag section extending vertically on a right side of the vehicle and a left airbag section extending vertically on a left side of the vehicle in the inflated state. The right or left airbag section located closer to a side portion of the vehicle has an upper edge lower than that of the left or right airbag section, so that the right or left airbag section does not interfere with the side portion.
摘要翻译：安装在诸如机动车辆的车辆上的气囊装置包括气囊和气体供给装置。安全气囊从车辆前方的前方充气到车辆的后侧，用于在发生车祸的情况下保护乘客。安全气囊包括在车辆右侧垂直延伸的右安全气囊部分和在膨胀状态下在车辆左侧垂直延伸的左安全气囊部分。更靠近车辆侧部的右侧或左侧的安全气囊部分具有比左侧或右侧气囊部分低的上边缘，使得右侧或左侧气囊部分不会与侧面部分相干涉。

19. 发明授权

US07413989B2 Method of manufacturing semiconductor device 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US07413989B2
公开(公告)日：2008-08-19
申请号：US10944866
申请日：2004-09-21
申请人： Atsushi Shigeta , Kazuhiko Ida , Yoshitaka Matsui
发明人： Atsushi Shigeta , Kazuhiko Ida , Yoshitaka Matsui
IPC分类号： H01L21/302
CPC分类号： H01L21/02074 , B24B37/044 , C09G1/02 , H01L21/3212 , H01L21/7684
摘要： A semiconductor wafer including an underlying layer including an insulating film having at least one recess therein and a metallic material layer formed over a top surface of the underlying layer and filling the recess, on a semiconductor substrate, is subjected to a polishing treatment while supplying a basic CMP slurry containing metal ions on the semiconductor wafer to at least partially remove the metallic material layer. Then, an organic acid which chelates the metal ions is added to the basic CMP slurry, and polishing is conducted, using the organic acid-added CMP slurry, until a surface of the insulating film is exposed.
摘要翻译：在半导体基板上包括具有至少一个凹部的绝缘膜和在下层的顶面上形成的填充凹部的金属材料层的下层的半导体晶片经受抛光处理，同时供给在半导体晶片上含有金属离子的基本CMP浆料以至少部分地去除金属材料层。然后，向碱性CMP浆料中加入螯合金属离子的有机酸，并使用添加有机酸的CMP浆料进行研磨，直至暴露出绝缘膜的表面。

20. 发明授权

US08363180B2 Liquid crystal display device 失效
标题翻译：液晶显示装置
公开(公告)号：US08363180B2
公开(公告)日：2013-01-29
申请号：US13500812
申请日：2010-10-04
申请人： Yoshitaka Matsui , Yoshiyuki Kawagoe
发明人： Yoshitaka Matsui , Yoshiyuki Kawagoe
IPC分类号： G02F1/1335
CPC分类号： G09G3/3648 , G09G3/3426 , G09G3/3611 , G09G2320/0252 , G09G2320/0271 , G09G2320/041 , G09G2340/16
摘要： A liquid crystal display device performs suitable overshoot drive, even if a panel temperature is changed due to a change of the backlight emission luminance. The liquid crystal display device includes: a temperature sensor which detects the temperature in the device; an emphasis conversion section, which obtains, after the elapse of one vertical display period, an emphasis conversion parameter for making the transmissivity of the liquid crystal panel reach the transmissivity specified by input image signals, and which outputs applying voltage signals for the liquid crystal panel on the basis of the emphasis conversion parameter; and a main microcomputer which corrects the panel temperature of the liquid crystal panel on the basis of the changed light emission luminance when the light emission luminance of the backlight is changed. The emphasis conversion section variably controls the emphasis conversion parameter on the basis of the panel temperature corrected via the main microcomputer.
摘要翻译：即使面板温度由于背光发光亮度的变化而变化，液晶显示装置也进行合适的过冲驱动。液晶显示装置包括：检测装置内的温度的温度传感器; 强调转换部，其在经过一个垂直显示周期之后获得用于使液晶面板的透射率达到由输入图像信号指定的透射率的强调转换参数，并且输出为液晶面板施加电压信号在强调转换参数的基础上; 以及当改变背光的发光亮度时，基于改变的发光亮度校正液晶面板的面板温度的主微型计算机。强调转换部分可以根据通过主微型计算机校正的面板温度来可变地控制强调转换参数。

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