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11. 发明授权

US5909307A Optical system for infrared camera 失效
标题翻译：红外摄像机用光学系统
公开(公告)号：US5909307A
公开(公告)日：1999-06-01
申请号：US969259
申请日：1997-11-13
申请人： Motoo Koyama
发明人： Motoo Koyama
IPC分类号： G02B13/14
CPC分类号： G02B13/14
摘要： An optical system for use in an infrared camera which includes, in order from an object side: a first lens group having a negative refractive power and a second lens group having a positive refractive power arranged a distance from the first lens group. The first lens group comprises a negative meniscus lens having a convex surface facing toward the object side and the second lens group comprising, in order from the object side: a first lens having a positive refractive power, a second lens having a negative refractive power and a third lens having a positive refractive power. The lenses comply with the following conditions: (1) 0.5.PHI.
摘要翻译：一种用于红外照相机的光学系统，其从物体侧依次包括具有负折光力的第一透镜组和具有与第一透镜组相距一定距离的正折光力的第二透镜组。第一透镜组包括具有朝向物体侧的凸表面的负弯月形透镜，并且第二透镜组从物体侧依次包括：具有正屈光力的第一透镜，具有负屈光力的第二透镜和具有正屈光力的第三透镜。透镜符合以下条件：（1）0.5 PHI < - PHI f <0.7 PHI，（2）0.55 PHI

12. 发明授权

US07573019B2 Light detecting apparatus, illumination optical apparatus, exposure apparatus and exposure method 有权
标题翻译：光检测装置，照明光学装置，曝光装置和曝光方法
公开(公告)号：US07573019B2
公开(公告)日：2009-08-11
申请号：US11628052
申请日：2005-06-06
申请人： Motoo Koyama
发明人： Motoo Koyama
IPC分类号： G02B5/30
CPC分类号： G03F7/7085 , G01J1/04 , G01J1/0407 , G01J1/0414 , G03F7/70558
摘要： A light detecting apparatus which can be arranged even in an optical path of which converting angle is relatively large, and can accurately detect light entering along a predetermined direction in an optical path. The light detecting apparatus (10) for detecting light which enters in a predetermined direction in an optical path has a light splitting element (11) having two optical surfaces (11a, 11b) positioned in the optical path, and a photoelectric detector (12) for photo detecting light which propagates inside the light splitting element and which is guided from a side face (11c) of the light splitting element. The light splitting element further has an incident angle conversion section (13) for converting a part of light which enters one optical face of the light splitting element into light entering the other optical surface at an incident angle greater than or equal to a total reflection angle.
摘要翻译：光检测装置即使在转换角度相对较大的光路中也能够被布置，并且能够精确地检测在光路中沿预定方向进入的光。用于检测在光路中沿预定方向进入的光的光检测装置（10）具有位于光路中的具有两个光学面（11a，11b）的光分离元件（11），光电检测器（12）对于在分光元件内部传播并从分光元件的侧面（11c）引导的光检测光。光分离元件还具有入射角转换部（13），其将进入分光元件的一个光学面的一部分光转换成入射角大于或等于全反射角的入射光。

13. 发明授权

US06811953B2 Exposure apparatus, method for manufacturing therof, method for exposing and method for manufacturing microdevice 有权
标题翻译：曝光装置，制造方法，曝光方法以及制造微型装置的方法
公开(公告)号：US06811953B2
公开(公告)日：2004-11-02
申请号：US09861698
申请日：2001-05-22
申请人： Hitoshi Hatada , Masaki Kato , Motoo Koyama , Hiroshi Shirasu , Masahiro Iguchi
发明人： Hitoshi Hatada , Masaki Kato , Motoo Koyama , Hiroshi Shirasu , Masahiro Iguchi
IPC分类号： G01B1100
CPC分类号： G03F9/7026 , G03F7/70275 , G03F7/70358
摘要： The memory unit stores the correlation of the positional change in the image planes of the projection optical modules in the focusing direction and the light quantity change. The image plane position determination unit finds the positional change value of the image planes of the projection optical modules based on the correlation information that is stored in the memory unit and the information on changes in the amount of light that is emitted to the projection optical modules. The compensation value calculating unit calculates the compensation value corresponding to the change in the amount of curvature in the image planes of the projection optical modules. The compensating unit compensates the change value in conformity with the compensation value. The focus compensation optical system is driven based on the change value that is compensated.
摘要翻译：存储单元存储投影光学模块在聚焦方向上的图像平面中的位置变化与光量变化的相关性。图像平面位置确定单元基于存储在存储单元中的相关信息和关于发射到投影光学模块的光量变化的信息，找出投影光学模块的图像平面的位置变化值。补偿值计算单元计算与投影光学模块的图像平面中的曲率量的变化相对应的补偿值。补偿单元根据补偿值补偿变化值。基于补偿的变化值驱动聚焦补偿光学系统。

14. 发明授权

US5839808A Projection optical system 失效
标题翻译：投影光学系统
公开(公告)号：US5839808A
公开(公告)日：1998-11-24
申请号：US687890
申请日：1996-07-26
申请人： Motoo Koyama , Yuji Manabe , Ikuo Mori
发明人： Motoo Koyama , Yuji Manabe , Ikuo Mori
IPC分类号： G03B21/28
CPC分类号： G03B21/28
摘要： A projection system is disclosed including a light source for producing an illumination light flux, and a light valve for converting the illumination light flux incident on the light valve into a modulated light flux. The projection system also includes a front lens system having a front optical axis. The front lens system is disposed relative to the light source and the light valve to transmit the illumination light flux to the light valve, and to transmit the modulated light flux toward a rear lens system having a rear optical axis that is displaced from but parallel to the front optical axis. The rear lens system is disposed relative to the front lens system to transmit the modulated light flux from the front lens system onto a suitable surface for viewing.
摘要翻译：公开了一种包括用于产生照明光通量的光源的投影系统和用于将入射到光阀上的照明光束转换成调制光束的光阀。投影系统还包括具有前光轴的前透镜系统。前透镜系统相对于光源和光阀布置以将照明光通量传递到光阀，并且将经调制的光束传输到具有后光轴的后透镜系统，该后透镜系统具有从而平行于前光轴。后透镜系统相对于前透镜系统设置，以将经调制的光束从前透镜系统传输到合适的表面上以供观看。

15. 发明授权

US5793473A Projection optical apparatus for projecting a mask pattern onto the surface of a target projection object and projection exposure apparatus using the same 失效
标题翻译：用于将掩模图案投影到目标投影物体的表面上的投影光学装置和使用其的投影曝光装置
公开(公告)号：US5793473A
公开(公告)日：1998-08-11
申请号：US775901
申请日：1997-01-02
申请人： Motoo Koyama , Yutaka Ichihara
发明人： Motoo Koyama , Yutaka Ichihara
IPC分类号： G03F7/20 , G03B3/00 , H01L21/027
CPC分类号： G03F7/70225 , G03F7/70258 , G03F7/70266 , G03F7/70275 , G03F7/707
摘要： A projection exposure apparatus projects the pattern of a reticle at a high resolution even when a wafer which is poor in flatness because of its warping or step is used. An illumination light beam emitted from a light source system illuminates a reticle through a condenser lens. The illumination light beam emerging from the reticle forms the intermediate image of the pattern of the reticle at a position near the reflecting surface of a reflecting mirror through a half prism and a projection lens. The illumination light beam reflected by the reflecting surface forms the pattern image of the reticle onto the surface of a wafer after passing through the projection lens and the half prism again. The shape of the reflecting surface of the reflecting mirror is changed to conform to the shape of the surface of the wafer.
摘要翻译：投影曝光装置即使使用由于其翘曲或台阶而具有平坦度差的晶片，也以高分辨率投影掩模版的图案。从光源系统发射的照明光束通过聚光透镜照射光罩。从掩模版出射的照明光束通过半棱镜和投影透镜在靠近反射镜的反射面的位置处形成标线图案的中间图像。由反射面反射的照明光束在再次通过投影透镜和半棱镜之后将掩模版的图案图像形成在晶片的表面上。反射镜的反射面的形状被改变为符合晶片表面的形状。

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