会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 11. 发明授权
    • Grooving apparatus and grooving method
    • 开沟设备和开槽方法
    • US06930961B2
    • 2005-08-16
    • US10108702
    • 2002-03-29
    • Yasumitsu Wada
    • Yasumitsu Wada
    • G11B7/007G11B7/26G11B7/00
    • G11B7/261G11B7/24082
    • Disclosed is a grooving apparatus which can carry information on an information track at high recording density when carrying the information on the information track through a change in shape of a groove and which also can improve the signal-to-noise ratio of the information under reproduction. A grooving apparatus for forming a groove to function as an information track in an optical disk comprises an electron beam generator which emits an electron beam, an objective lens which focuses the emitted electron beam on the optical disk and which focuses the electron beam on a smaller range than the size of the groove, and an X-direction deflector and a Y-direction deflector which controls the electron beam so that the electron beam is focused in position on the optical disk, thereby forming the groove in the optical disk.
    • 公开了一种开槽装置,当通过凹槽的形状改变在信息轨道上传送信息时,能够以高记录密度携带信息在信息轨道上,并且还可以提高再现中的信息的信噪比 。 用于形成用作光盘中的信息轨道的槽的切槽装置包括发射电子束的电子束发生器,将发射的电子束聚焦在光盘上并使电子束聚焦在较小的电子束上的物镜 以及控制电子束的X方向偏转器和Y方向偏转器,使得电子束聚焦在光盘上的适当位置,从而在光盘中形成凹槽。
    • 13. 发明授权
    • Electron beam projection apparatus
    • 电子束投影仪
    • US5319198A
    • 1994-06-07
    • US982964
    • 1992-11-30
    • Yasumitsu Wada
    • Yasumitsu Wada
    • G11B9/10H01J37/06H01J37/244H01J37/28H01J37/256
    • H01J37/28G11B9/10H01J2237/062H01J2237/06341H01J2237/188
    • An electron beam projection apparatus including electron injection unit for irradiating an object with an electron beam. The electron injection unit includes a substrate, a cathode formed on the substrate for emitting the electrons, a control electrode formed on the substrate via an insulation layer in a manner enclosing the cathode for accelerating the electrons, and an anode formed on the control electrode via an insulation layer in a manner enclosing the cathode for converging the electron beam. The electron beam projection apparatus further including detecting unit formed on the anode via an insulation layer for detecting secondary electrons emitted from the object irradiated with the electron beam and differential pumping unit for producing a low vacuum condition in an space where the electron beam travels from the microscopic electron injection unit to the object. By maintaining a low vacuum condition, in the area where the electron beam is projected and detected, by using simple structural differential pumping unit, the detection accuracy can be achieved since the secondary electrons are amplified in the low vacuum area by the ionization of gas molecules.
    • 一种电子束投影装置,包括用电子束照射物体的电子注入单元。 电子注入单元包括:衬底,形成在用于发射电子的衬底上的阴极;以包围用于加速电子的阴极的方式通过绝缘层形成在衬底上的控制电极;以及形成在控制电极上的阳极 绝缘层以包围用于会聚电子束的阴极的方式。 电子束投影装置还包括检测单元,该检测单元经由用于检测从电子束照射的物体发射的二次电子的绝缘层和差分泵浦单元形成在阳极上,用于在电子束从电子束传播的空间中产生低真空条件 微观电子注入单元对象。 通过维持低真空条件,通过使用简单的结构差分泵浦单元,在电子束投射和检测的区域中,可以实现检测精度,因为二次电子通过气体分子的离子化在低真空区域中被放大 。