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    • 11. 发明申请
    • PHOTOCURABLE COMPOSITION AND METHOD FOR PRODUCING MOLDED PRODUCT WITH FINE PATTERN
    • 用于生产具有精细图案的模制产品的光致抗蚀剂组合物和方法
    • US20100038831A1
    • 2010-02-18
    • US12542086
    • 2009-08-17
    • Yasuhide KawaguchiKentaro Tsunozaki
    • Yasuhide KawaguchiKentaro Tsunozaki
    • B29C35/08C08F2/46
    • C08F220/20B82Y10/00B82Y40/00C08F220/18C08F220/22G02B5/1852G02B5/1857G03F7/0002G03F7/0046G03F7/0048G03F7/027G03F7/033C08F222/1006
    • To provide a photocurable composition from which a cured product excellent in mold release characteristics and mechanical strength can be obtained, and a method for producing a molded product excellent in durability, with a fine pattern having a reverse pattern of a mold precisely transferred on its surface.A photocurable composition 20 comprising from 15 to 60 mass % of a compound (A) which is an aromatic compound having at least two rings or an alicyclic compound having at least two rings and which has two (meth)acryloyloxy groups, from 5 to 40 mass % of a compound (B) having a fluorine atom and having at least one carbon-carbon unsaturated double bond (excluding the compound (A)), from 10 to 55 mass % of a compound (C) having one (meth)acryloyloxy group (excluding the compound (B)) and from 1 to 12 mass % of a photopolymerization initiator (D) (provided that (A)+(B)+(C)+(D)=100 mass %) is used.
    • 为了提供可以得到脱模特性和机械强度优异的固化物的光固化性组合物,以及耐久性优异的模制品的制造方法,具有在其表面上精确转印的模具的反向图案的精细图案 。 一种光固化性组合物20,其含有15〜60质量%的作为具有至少两个环的芳香族化合物的化合物(A)或至少具有两个环的脂环族化合物,具有两个(甲基)丙烯酰氧基,5〜40个 具有氟原子并且具有至少一个碳 - 碳不饱和双键的化合物(B)的质量%(不包括化合物(A)),10至55质量%的具有一个(甲基)丙烯酰氧基 (不含化合物(B))和1〜12质量%的光聚合引发剂(D)(条件是(A)+(B)+(C)+(D)= 100质量%)。
    • 13. 发明申请
    • MOLD, PROCESS FOR ITS PRODUCTION, AND PROCESS FOR PRODUCING BASE MATERIAL HAVING TRANSFERRED MICROPATTERN
    • 模具,其生产工艺和生产具有转移微孔板的基体材料的方法
    • US20090302507A1
    • 2009-12-10
    • US12542810
    • 2009-08-18
    • Kentaro TSUNOZAKIYasuhide KawaguchiYoshihiko SakaneShuichi ShojiJun MizunoShingo Kataza
    • Kentaro TSUNOZAKIYasuhide KawaguchiYoshihiko SakaneShuichi ShojiJun MizunoShingo Kataza
    • B29C35/08B28B5/00B29C33/40
    • B29C59/02B29C33/40B29C33/424B29C33/56B29C35/0888B29C59/005B29L2011/00
    • To provide a mold having optical transparency, release properties, mechanical strength, dimension stability and a highly precise micropattern, and having less deformation of the micropattern; and a process for producing a base material with a transferred micropattern having less deformation of the transferred micropattern, capable of transferring highly precise micropattern of the mold.A mold 10 comprising a transparent substrate (A) 12 having chemical bonds based on the functional groups (x) on the surface having an interlayer (C) 14 formed, having a difference in linear expansion coefficient (absolute value) of less than 30 ppm/° C. from the linear expansion coefficient of the following fluoropolymer (I), and further having a heat distortion temperature of from 100 to 300° C.; an interlayer (C) 14 made of a fluoropolymer (II) having a fluorinated alicyclic structure in its main chain and further having reactive groups (y) reactive with the functional groups (x); and a surface layer (B) 16 having a micropattern on the surface, made of a fluoropolymer (I) having a fluorinated alicyclic structure in its main chain and having substantially no reactive groups (y).
    • 提供具有光学透明性,剥离性,机械强度,尺寸稳定性和高精度微图案的模具,并且具有较小的微图案变形; 以及具有转印微图案的转移微图案的基材的制造方法,该转印微图案具有较小的转印微图案的变形,能够转印模具的高精度微图案。 一种模具10,其包括基于所述表面上具有中间层(C)14的官能团(x)的具有化学键的透明基板(A)12,所述中间层(C)14的线性膨胀系数(绝对值)小于30ppm /℃,与以下含氟聚合物(I)的线膨胀系数相比,进一步具有100〜300℃的热变形温度。 由在其主链中具有氟化脂环结构的含氟聚合物(II)制成的中间层(C)14,并且还具有与官能团(x)反应的反应性基团(y); 和表面层(B)16,其表面具有微图案,由主链中具有氟化脂环结构的含氟聚合物(I)制成,基本上没有反应性基团(y)。
    • 14. 发明申请
    • IMPRINTING MOLD AND PROCESS FOR ITS PRODUCTION
    • 印刷模具及其生产工艺
    • US20090285927A1
    • 2009-11-19
    • US12511215
    • 2009-07-29
    • Katsuya UenoYasuhide Kawaguchi
    • Katsuya UenoYasuhide Kawaguchi
    • B29C59/16B28B7/36
    • B29C33/62B82Y10/00B82Y40/00G03F7/0002Y10T428/31663
    • To provide an imprinting mold, of which a coating layer formed on its surface is hardly susceptible to peeling, and a process for its production.An imprinting mold comprising a mold body and a coating layer made of a release agent, formed on the surface of the mold body, wherein the release agent contains a compound of the following formula (1), and a process for its production: wherein R is Rf-X-, both R are the same group, Rf is a perfluoroalkyl group, X is at least one member selected from —(OC3F6)—, —(OC2F4)— and —(OCF2)—, provided that the sum of such units is at least 1, Y is an organic group, is an average of n is from 2 to 10, Z is —Si(R1)m(R2)3-m, R1 is a hydroxyl group or a hydrolysable group, R2 is a hydrogen atom or a hydrocarbon group, and m is from 1 to 3.
    • 为了提供一种在其表面上形成的涂层几乎不易剥离的压印模及其制造方法。 一种压印模具,包括模具体和由脱模剂制成的涂层,其形成在模具体的表面上,其中脱模剂含有下式(1)的化合物及其制备方法:其中R 是Rf-X-,两个R是相同的基团,Rf是全氟烷基,X是至少一个选自 - (OC 3 F 6) - , - (OC 2 F 4) - 和 - (OCF 2) - ,条件是 这些单元至少为1,Y为有机基团,n为2〜10的平均值,Z为-Si(R1)m(R2)3-m,R1为羟基或可水解基团,R2 是氢原子或烃基,m为1〜3。
    • 16. 发明授权
    • Process for producing photocurable material, photocurable material and article
    • 制备光固化材料,光固化材料和制品的方法
    • US08207242B2
    • 2012-06-26
    • US13152740
    • 2011-06-03
    • Hideo NomotoYasuhide KawaguchiHideshi Sasakura
    • Hideo NomotoYasuhide KawaguchiHideshi Sasakura
    • C08J3/28B32B5/16B05D3/00C08G79/00C08F20/06
    • C08F2/44C08F292/00Y10S977/773Y10S977/778Y10T428/2995Y10T428/31678Y10T428/31855C08F220/26
    • To provide a photocurable material which can form a cured product having a high transparency and a high refractive index, a process for producing the material easily, and an article having a high transparency and a high refractive index.The photocurable material is obtained by a production process comprising (i) a step of reacting a polymerizable component (A) comprised of at least one type of a compound (a) having a (meth)acryloyloxy group, and a compound (B) having a mercapto group and a carboxy group to obtain a surface modifier (C) which has the carboxy group derived from the compound (B) at a terminal, (ii) a step of modifying the surface of inorganic fine particles (D) with the surface modifier (C) to obtain surface-modified inorganic fine particles (E), and (iii) a step of obtaining a photocurable material which contains the surface-modified inorganic fine particles (E), a polymerizable component (F) comprised of at least one type of a compound (f) having a (meth)acryloyloxy group, and a photopolymerization initiator (G).
    • 为了提供可以形成具有高透明度和高折射率的固化产物的光固化材料,容易制造材料的方法和具有高透明度和高折射率的制品。 光固化性材料通过以下制造方法得到:(i)使由至少一种具有(甲基)丙烯酰氧基的化合物(a)组成的聚合性组分(A)和具有(甲基)丙烯酰氧基的化合物(B))和 巯基和羧基,得到在末端具有来自化合物(B)的羧基的表面改性剂(C),(ii)使表面改性无机微粒(D)的表面的工序, 改性剂(C)以获得表面改性的无机细颗粒(E),和(iii)获得含有表面改性无机细颗粒(E)的光固化材料,至少包含可聚合组分(F)的步骤 一种具有(甲基)丙烯酰氧基的化合物(f)和光聚合引发剂(G)。
    • 18. 发明授权
    • Photocurable composition and process for producing molded product having fine pattern on its surface
    • 可光固化组合物及其表面上具有精细图案的成型体的制造方法
    • US08258201B2
    • 2012-09-04
    • US12888936
    • 2010-09-23
    • Yasuhide Kawaguchi
    • Yasuhide Kawaguchi
    • C08F2/50C08J3/28
    • G03F7/027B82Y10/00B82Y40/00C08F222/1006C08J3/28G03F7/0002G03F7/0005G03F7/0046Y10T428/24802C08F220/18C08F220/24
    • To provide a photocurable composition whereby it is possible to obtain a cured product provided with both release property and high refractive index, and a process whereby it is possible to produce a molded product having a high refractive index and having on its surface a fine pattern having a reverse pattern of a mold precisely transferred. The photocurable composition comprising from 61 to 90 mass % of a compound (A) having a refractive index of at least 1.55 at a wavelength of 589 nm before curing and having at least two (meth)acryloyloxy groups, from 2 to 15 mass % of a compound (B) having fluorine atoms and at least one carbon-carbon unsaturated double bond (provided that compound (A) is excluded), from 5 to 35 mass % of a compound (C) having one (meth)acryloyloxy group (provided that compound (B) is excluded), and from 1 to 12 mass % of a photopolymerization initiator (D) (provided (A)+(B)+(C)+(D)=100 mass %).
    • 为了提供一种可光固化组合物,由此可以获得具有剥离性能和高折射率两者的固化产品,以及可以生产具有高折射率的成型产品并且在其表面上具有精细图案的方法,该精细图案具有 精确转移的模具的反向图案。 所述光固化性组合物包含61〜90质量%的固化前的波长589nm的折射率为1.55以上的具有至少2个(甲基)丙烯酰氧基的折射率的化合物(A),2〜15质量% 具有氟原子和至少一个碳 - 碳不饱和双键的化合物(B)(不包括化合物(A)),5至35质量%的具有一个(甲基)丙烯酰氧基的化合物(C)(提供 (B))和1〜12质量%的光聚合引发剂(D)(式(A)+(B)+(C)+(D)= 100质量%)。
    • 20. 发明授权
    • Photocurable composition and process for producing molded product having fine pattern on its surface
    • 可光固化组合物及其表面上具有精细图案的成型体的制造方法
    • US08703837B2
    • 2014-04-22
    • US13151324
    • 2011-06-02
    • Yasuhide Kawaguchi
    • Yasuhide Kawaguchi
    • C08J3/28
    • C08L33/24B82Y10/00B82Y40/00C08G18/672C08L33/06C08L2205/02G03F7/0002G03F7/0046G03F7/0048G03F7/027C08L2666/04C08L2666/02
    • To provide a photocurable composition whereby it is possible to obtain a cured product having both a release property and flexibility, and a process whereby it is possible to produce a flexible molded product having on its surface a fine pattern having a reverse pattern of a mold precisely transferred. A photocurable composition comprising a compound (A) having at least two urethane bonds and at least two (meth)acryloyloxy groups and having a mass average molecular weight of less than 2,000, a compound (B) having a fluorine atom and at least one carbon-carbon unsaturated double bond, a compound (C) having one (meth)acryloyloxy group, a photopolymerization initiator (D), and a fluorinated surfactant (E), wherein in the total (100 mass %) of (A) to (E), (A) is from 10 to 50 mass %, (B) is from 5 to 35 mass %, (C) is from 15 to 75 mass %, (D) is from 1 to 12 mass %, and (E) is from 0.1 to 5 mass %, is used.
    • 为了提供一种可光固化组合物,由此可以获得具有剥离性和柔软性的固化产物,以及可以制造柔软的模制产品的方法,该柔性模塑产品在其表面上精确地具有模具的反向图案的精细图案 转入。 一种含有具有至少两个氨基甲酸酯键的化合物(A)和至少两个(甲基)丙烯酰氧基且质均分子量小于2,000的光固化性组合物,具有氟原子的化合物(B)和至少一种碳 碳原子数不饱和双键,具有一个(甲基)丙烯酰氧基的化合物(C),光聚合引发剂(D)和氟化表面活性剂(E),其中(A)〜(E ),(A)为10〜50质量%,(B)为5〜35质量%,(C)为15〜75质量%,(D)为1〜12质量% 为0.1〜5质量%。