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11. 发明授权

US08699906B2 Printing system provided with preheaters 有权
标题翻译：印刷系统配有预热器
公开(公告)号：US08699906B2
公开(公告)日：2014-04-15
申请号：US12887083
申请日：2010-09-21
申请人： Atsushi Miyamoto , Soushi Kikuchi
发明人： Atsushi Miyamoto , Soushi Kikuchi
IPC分类号： G03G15/20
CPC分类号： G03G15/238 , G03G15/2039 , G03G2215/00021 , G03G2215/00455 , G03G2215/00603 , G03G2215/00666 , G03G2215/00772 , G03G2215/2006
摘要： A printing system includes a first printing apparatus, a second printing apparatus, and a control device. The second printing apparatus is provided at a rear stage of the first printing apparatus, and includes a second preheating unit that preheats a recording medium from one surface before thermally fixing a toner image to another surface, and a temperature control unit that increase the temperature of the second preheating unit from a normal temperature to a target temperature, in response to a printing preparation instruction received in a temporary printing stop state from the control device. The control device starts printing, when the temperature of the second preheating unit reaches the target temperature. The temperature control unit decreases the temperature of the second preheating unit from the target temperature to the normal temperature, when the recording medium is conveyed by a length from a deformed portion to the second preheating unit.
摘要翻译：打印系统包括第一打印设备，第二打印设备和控制设备。第二打印装置设置在第一打印装置的后级，并且包括第二预热单元，其在将调色剂图像热定影到另一表面之前从一个表面预热记录介质;以及温度控制单元，其将响应于在临时打印停止状态下从控制装置接收到的打印准备指令，第二预热单元从正常温度到目标温度。当第二预热单元的温度达到目标温度时，控制装置开始打印。当记录介质从变形部分输送到第二预热单元时，温度控制单元将第二预热单元的温度从目标温度降低到常温。

12. 发明授权

US08642957B2 Scanning electron microscope and a method for imaging a specimen using the same 有权
标题翻译：扫描电子显微镜和使用其的成像成像方法
公开(公告)号：US08642957B2
公开(公告)日：2014-02-04
申请号：US13432176
申请日：2012-03-28
申请人： Atsushi Miyamoto , Wataru Nagatomo , Ryoichi Matsuoka , Hidetoshi Morokuma
发明人： Atsushi Miyamoto , Wataru Nagatomo , Ryoichi Matsuoka , Hidetoshi Morokuma
IPC分类号： G01N23/00
CPC分类号： G01N23/20 , H01J37/21 , H01J37/265 , H01J37/28 , H01J2237/1532 , H01J2237/1536 , H01J2237/216 , H01J2237/2817
摘要： (1) part or all of the number, coordinates and size/shape and imaging sequence of imaging points each for observation, the imaging position change method and imaging conditions can be calculated automatically from CAD data, (2) a combination of input information and output information for imaging recipe creation can be set arbitrarily, and (3) decision is made of imaging or processing at an arbitrary imaging point as to whether to be successful/unsuccessful and in case a failure is determined, a relief process can be conducted in which the imaging point or imaging sequence is changed.
摘要翻译：（1）可以从CAD数据自动计算成像点的数量，坐标，成像顺序，成像位置的各部分，成像顺序，成像位置变化方法和成像条件，（2）输入信息和用于成像配方创建的输出信息可以任意设定，并且（3）决定是否成功/成功的任意成像点的成像或处理，并且在确定失败的情况下，可以进行解除处理成像点或成像序列改变。

13. 发明申请

US20130114881A1 METHOD AND APPARATUS FOR REVIEWING DEFECTS 有权
公开(公告)号：US20130114881A1
公开(公告)日：2013-05-09
申请号：US13729635
申请日：2012-12-28
申请人： Minoru HARADA , Ryo Nakagaki , Kenji Obara , Atsushi Miyamoto
发明人： Minoru HARADA , Ryo Nakagaki , Kenji Obara , Atsushi Miyamoto
IPC分类号： G06T7/00
CPC分类号： G06T7/004 , G01N21/9501 , G06T7/0004 , G06T7/001 , G06T7/70 , G06T2207/10061 , G06T2207/30148
摘要： Disclosed is a method for reviewing defects in a large number of samples within a short period of time through the use of a defect review apparatus. To collect defect images steadily and at high throughput, a defect detection method is selected before imaging and set up for each of review target defects in the samples in accordance with the external characteristics of the samples that are calculated from the design information about the samples. The defect images are collected after an imaging sequence is set up for the defect images and reference images in such a manner as to reduce the time required for stage movement in accordance with the defect coordinates of the samples and the selected defect detection method.

14. 发明申请

US20120104254A1 CHARGED PARTICLE BEAM DEVICE 有权
标题翻译：充电颗粒光束装置
公开(公告)号：US20120104254A1
公开(公告)日：2012-05-03
申请号：US13146436
申请日：2010-01-26
申请人： Chie Shishido , Atsushi Miyamoto , Mayuka Iwasaki , Tomofumi Nishiura , Go Kotaki
发明人： Chie Shishido , Atsushi Miyamoto , Mayuka Iwasaki , Tomofumi Nishiura , Go Kotaki
IPC分类号： H01J37/26
CPC分类号： H01J37/3045 , G01B2210/56 , H01J37/244 , H01J37/28 , H01J2237/24578 , H01J2237/24592 , H01J2237/2817 , H01J2237/2826
摘要： A charged particle beam device enabling prevention of degradation of reproducibility of measurement caused by an increase of the beam diameter attributed to an image shift and having a function of dealing with device-to-device variation. The charged particle beam device is used for measuring the dimensions of a pattern on a specimen using a line profile obtained by detecting secondary charged particles emitted from the specimen when the specimen is scanned with a primary charged particle beam converged on the specimen. A lookup table in which the position of image shift and the variation of the beam diameter are associated is prepared in advance by actual measurement or calculation and registered. When the dimensions are measured, image processing is carried out so as to correct the line profile for the variation of the beam diameter while the lookup table is referenced, and thereby the situation where the beam diameter is effectively equal is produced irrespective of the position of the image shift. Whit this, measurement by the charged particle beam excellent reproducibility can be carried out.
摘要翻译：一种带电粒子束装置，其能够防止由于图像偏移引起的光束直径的增加而导致的测量再现性的劣化，并且具有处理器件到器件变化的功能。带电粒子束装置用于通过使用聚集在样本上的初级带电粒子束扫描样本时检测从样本发射的二次带电粒子而获得的线轮廓来测量样品上的图案的尺寸。通过实际测量或计算预先准备其中图像偏移的位置和光束直径的变化相关联的查找表并注册。当测量尺寸时，执行图像处理，以便在参考查找表时校正用于变化光束直径的线轮廓，从而产生光束直径有效相等的情况，而与图像偏移。这样，可以进行通过带电粒子束测量的优异的再现性。

15. 发明授权

US08158938B2 Scanning electron microscope and a method for imaging a specimen using the same 有权
标题翻译：扫描电子显微镜和使用其的成像成像方法
公开(公告)号：US08158938B2
公开(公告)日：2012-04-17
申请号：US11673219
申请日：2007-02-09
申请人： Atsushi Miyamoto , Wataru Nagatomo , Ryoichi Matsuoka , Hidetoshi Morokuma
发明人： Atsushi Miyamoto , Wataru Nagatomo , Ryoichi Matsuoka , Hidetoshi Morokuma
IPC分类号： G01N23/00
CPC分类号： G01N23/20 , H01J37/21 , H01J37/265 , H01J37/28 , H01J2237/1532 , H01J2237/1536 , H01J2237/216 , H01J2237/2817
摘要： (1) part or all of the number, coordinates and size/shape and imaging sequence of imaging points each for observation, the imaging position change method and imaging conditions can be calculated automatically from CAD data, (2) a combination of input information and output information for imaging recipe creation can be set arbitrarily, and (3) decision is made of imaging or processing at an arbitrary imaging point as to whether to be successful/unsuccessful and in case a failure is determined, a relief process can be conducted in which the imaging point or imaging sequence is changed.
摘要翻译：（1）可以从CAD数据自动计算成像点的数量，坐标，成像顺序，成像位置的各部分，成像顺序，成像位置变化方法和成像条件，（2）输入信息和用于成像配方创建的输出信息可以任意设定，并且（3）决定是否成功/成功的任意成像点的成像或处理，并且在确定失败的情况下，可以进行解除处理成像点或成像序列改变。

16. 发明授权

US08073242B2 SEM system and a method for producing a recipe 有权
标题翻译： SEM系统和生产食谱的方法
公开(公告)号：US08073242B2
公开(公告)日：2011-12-06
申请号：US11954410
申请日：2007-12-12
申请人： Atsushi Miyamoto , Tomofumi Nishiura , Ryoichi Matsuoka , Hidetoshi Morokuma
发明人： Atsushi Miyamoto , Tomofumi Nishiura , Ryoichi Matsuoka , Hidetoshi Morokuma
IPC分类号： G06K9/00
CPC分类号： G06T7/0006 , G06T2207/30148
摘要： This invention relates to a SEM system constructed to create imaging recipes or/and measuring recipes automatically and at high speed, and improve inspection efficiency and an automation ratio, and to a method using the SEM system; a method for creation of imaging recipes and measuring recipes in the SEM system is adapted to include, in a recipe arithmetic unit, the steps of evaluating a tolerance for an imaging position error level at an evaluation point, evaluating a value predicted of the imaging position error level at the evaluation point when any region on circuit pattern design data is defined as an addressing point, and determining an imaging recipe and a measuring recipe on the basis of a relationship between the tolerance for the imaging position error level at the evaluation point and the predicted value of the imaging position error level at the evaluation point.
摘要翻译：本发明涉及一种用于自动和高速创建成像配方或/和测量配方，提高检测效率和自动化比例的SEM系统以及使用SEM系统的方法。用于在SEM系统中创建成像配方和测量配方的方法适于在配方算术单元中包括评估评估点处的成像位置误差水平的公差的步骤，评估成像位置的预测值当将电路图案设计数据上的任何区域定义为寻址点时，在评估点处的误差水平，以及基于评估点处的成像位置误差水平的公差与所述评估点之间的关系确定成像配方和测量配方在评估点的成像位置误差水平的预测值。

17. 发明授权

US08045789B2 Method and apparatus for inspecting defect of pattern formed on semiconductor device 有权
标题翻译：用于检查在半导体器件上形成的图案的缺陷的方法和装置
公开(公告)号：US08045789B2
公开(公告)日：2011-10-25
申请号：US12350260
申请日：2009-01-08
申请人： Tomofumi Nishiura , Atsushi Miyamoto , Chie Shishido , Takumichi Sutani
发明人： Tomofumi Nishiura , Atsushi Miyamoto , Chie Shishido , Takumichi Sutani
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06K9/6255 , G06T2207/10056 , G06T2207/30148 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： In the inspection apparatus for a defect of a semiconductor and the method using it for automatically detecting the defect on a semiconductor wafer and presuming the defect occurrence factor using the circuit design data, a plurality of shapes are formed from the circuit design data by deforming the design data with respect to shape deformation items stipulated for respective defect occurrence factor for comparison with the inspection object circuit pattern. The defect is detected by comparison of the group of shapes formed and the actual pattern. Further, the occurrence factors of these defects are presumed, and the defects are classified according to respective factor.
摘要翻译：在半导体缺陷检查装置及其自动检测半导体晶片上的缺陷的方法中，使用电路设计数据设定缺陷发生因子，通过使电路设计数据变形来形成多个形状相对于与检查对象电路图案进行比较的各个缺陷发生因子规定的形状变形项目的设计数据。通过比较形成的形状组和实际图案来检测缺陷。此外，推测出这些缺陷的发生因素，根据各自的因素对缺陷进行分类。

18. 发明授权

US07816062B2 Method and apparatus for semiconductor device production process monitoring and method and apparatus for estimating cross sectional shape of a pattern 有权
标题翻译：用于半导体器件生产过程监控的方法和装置以及用于估计图案的截面形状的方法和装置
公开(公告)号：US07816062B2
公开(公告)日：2010-10-19
申请号：US11592175
申请日：2006-11-03
申请人： Wataru Nagatomo , Hidetoshi Morokuma , Atsushi Miyamoto , Hideaki Sasazawa
发明人： Wataru Nagatomo , Hidetoshi Morokuma , Atsushi Miyamoto , Hideaki Sasazawa
IPC分类号： G03F9/00 , G03C5/00 , G21G5/00
CPC分类号： H01L22/12 , H01L2924/0002 , Y10S430/143 , H01L2924/00
摘要： In an exposure process or etching process, an image feature amount useful for estimating a cross-sectional shape of a target evaluation pattern, process conditions for the pattern, or device characteristics of the pattern is calculated from an SEM image. The image feature amount is compared with learning data that correlates data preliminarily stored in a database, which data includes cross-sectional shapes of patterns, process conditions for the patterns, or device characteristics of the patterns, to the image feature amount calculated from the SEM image. Thereby, the cross-sectional shape of the target evaluation pattern, the process conditions of the pattern, or the device characteristics of the pattern are nondestructively calculated.
摘要翻译：在曝光处理或蚀刻处理中，从SEM图像计算出用于估计目标评价图案的截面形状，图案的处理条件或图案的装置特性的图像特征量。将图像特征量与将预先存储在数据库中的数据相关联的学习数据与将图案的截面形状，图案的处理条件或者图案的装置特性相关联的学习数据与从SEM计算出的图像特征量相关联图片。由此，非破坏性地计算目标评价图案的截面形状，图案的处理条件或图案的装置特性。

19. 发明授权

US07795197B2 Cleaning liquid for lithography and method for resist pattern formation 有权
标题翻译：光刻用清洗液及抗蚀剂图案形成方法
公开(公告)号：US07795197B2
公开(公告)日：2010-09-14
申请号：US11791723
申请日：2005-11-29
申请人： Yoshihiro Sawada , Kazumasa Wakiya , Jun Koshiyama , Atsushi Miyamoto , Hidekazu Tajima
发明人： Yoshihiro Sawada , Kazumasa Wakiya , Jun Koshiyama , Atsushi Miyamoto , Hidekazu Tajima
IPC分类号： C11D1/75
CPC分类号： G03F7/40
摘要： This invention provides a novel cleaning liquid for lithography that, for a photoresist pattern, is used for reducing a surface defect, that is, defect, of a product, preventing pattern collapse during water rinsing, and further imparting electron beam irradiation resistance to a resist to suppress pattern shrinkage. Further, in the novel cleaning liquid for lithography, bacteria contamination does not occur during storage. The cleaning liquid for lithography comprises an aqueous solution containing an amine oxide compound represented by general formula wherein R1 represents an alkyl or hydroxyalkyl group having 8 to 20 carbon atoms which may be interrupted by an oxygen atom; and R2 and R3 represent an alkyl or hydroxyalkyl group having 1 to 5 carbon atoms.
摘要翻译：本发明提供了一种用于光刻的新型清洁液，其用于光致抗蚀剂图案，用于减少产品的表面缺陷，即产品的缺陷，防止水洗过程中的图案塌陷，并进一步赋予抗蚀剂电子束照射抗力抑制图案收缩。此外，在用于光刻的新型清洁液中，在储存期间不会发生细菌污染。用于光刻的清洁液包含含有由通式表示的氧化胺化合物的水溶液，其中R 1表示可被氧原子中断的具有8-20个碳原子的烷基或羟烷基; R2和R3表示碳原子数1〜5的烷基或羟烷基。

20. 发明授权

US07741260B2 Rinsing fluid for lithography 失效
标题翻译：用于光刻的冲洗液
公开(公告)号：US07741260B2
公开(公告)日：2010-06-22
申请号：US11587268
申请日：2005-04-20
申请人： Jun Koshiyama , Kazumasa Wakiya , Fumitake Kaneko , Atsushi Miyamoto , Hidekazu Tajima , Yoshihiro Sawada
发明人： Jun Koshiyama , Kazumasa Wakiya , Fumitake Kaneko , Atsushi Miyamoto , Hidekazu Tajima , Yoshihiro Sawada
IPC分类号： C11D7/32
CPC分类号： G03F7/32 , C11D3/245 , C11D3/349 , C11D11/0041 , G03F7/322
摘要： The invention provides a novel rinsing fluid which can convert an easily wettable resist pattern surface having a contact angle of 40° or below into one having a contact angle of 70° or above to inhibit pattern collapse effectively and thereby give high-quality products. The rinsing fluid consists of a solution containing at least one fluorine compound soluble in water or alcoholic solvents which is selected from among compounds represented by the general formula (I), those represented by the general formula (II), and those represented by the general formula: Rf′—COOH: wherein R1 and R2 are each optionally substituted C1-5 alkyl whose hydrogen atoms are partially or wholly replaced by fluorine, or R1 and R2 together with the SO2 groups to which they are bonded and the nitrogen atom may form a five- or six-membered ring; Rf is optionally substituted C1-5 alkyl whose hydrogen atoms are partially or wholly replaced by fluorine; m and n are each an integer of 2 or 3; and Rf′ is at least partially fluorinated alkyl having 8 to 20 carbon atoms.
摘要翻译：本发明提供了一种新颖的冲洗液，其可以将具有40°或更低接触角的容易润湿的抗蚀剂图案表面转变成接触角为70°或更高的接触角，以有效抑制图案塌陷，从而产生高质量的产品。冲洗液由含有至少一种可溶于水的氟化合物或醇溶剂的溶液组成，所述氟化合物选自由通式（I）表示的化合物，由通式（II）表示的化合物和由通式式：Rf'-COOH：其中R 1和R 2各自是氢或被氟部分或全部取代的任选取代的C 1-5烷基，或者R 1和R 2与它们所键合的SO 2基团和氮原子可形成五元或六元环; Rf是任选取代的C 1-5烷基，其氢原子部分或全部被氟取代; m和n分别为2或3的整数; Rf'为至少部分氟化的碳原子数为8〜20的烷基。

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