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11. 发明授权

US08629985B2 Displacement measurement method and apparatus thereof, stage apparatus, and probe microscope 失效
标题翻译：位移测量方法及其装置，平台装置和探针显微镜
公开(公告)号：US08629985B2
公开(公告)日：2014-01-14
申请号：US13605395
申请日：2012-09-06
申请人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Mineo Nomoto
发明人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Mineo Nomoto
IPC分类号： G01B9/02
CPC分类号： G01Q20/02 , G01B9/02014 , G01B9/02057 , G01B9/02058 , G01B9/02076 , G01B2290/45 , G01B2290/70 , G01S17/50
摘要： A displacement measurement method, an apparatus thereof, and a probe microscope. which enable stable measure an amount of displacement and a moving distance of an object under measurement with an accuracy of the sub-nanometer order or below without being affected by disturbances such as fluctuations of air and mechanical vibration. A pulsed beam is split into two; one beam is reflected by an object under measurement and then inputted to a delay optical path equivalent to one pulse period; and the other beam is sent through the same delay optical path in the opposite direction up to the object under measurement with a delay of one pulse period, and then reflected by the object under measurement. An optical phase variation caused by the movement of the object under measurement is obtained by subjecting the two pulsed beams to interference.
摘要翻译：位移测量方法，其装置和探针显微镜。这使得能够以亚纳米级或更低的精度稳定地测量被测物体的位移量和移动距离，而不受诸如空气波动和机械振动之类的扰动的影响。脉冲束被分成两部分; 一个光束被测量对象反射，然后输入到等于一个脉冲周期的延迟光路; 并且另一个光束在相对的方向上通过相同的延迟光路被发送到被测物体的一个脉冲周期的延迟，然后被测量对象反射。通过对两束脉冲光束进行干涉而获得由测量对象的运动引起的光学相位变化。

12. 发明授权

US08284406B2 Displacement measurement method and apparatus thereof, stage apparatus, and probe microscope 失效
标题翻译：位移测量方法及其装置，平台装置和探针显微镜
公开(公告)号：US08284406B2
公开(公告)日：2012-10-09
申请号：US12063860
申请日：2006-08-09
申请人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Mineo Nomoto
发明人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Mineo Nomoto
IPC分类号： G01B9/02
CPC分类号： G01Q20/02 , G01B9/02014 , G01B9/02057 , G01B9/02058 , G01B9/02076 , G01B2290/45 , G01B2290/70 , G01S17/50
摘要： The present invention provides a displacement measurement method, an apparatus thereof, a probe microscope. which make it possible to stably measure an amount of displacement and a moving distance of an object under measurement with an accuracy of the sub-nanometer order or below without being affected by disturbances such as fluctuations of air, mechanical vibration.Specifically, with the present invention, a pulsed beam is split into two; one beam is reflected by an object under measurement and then inputted to a delay optical path equivalent to one pulse period; and the other beam is sent through the same delay optical path in the opposite direction up to the object under measurement with a delay of one pulse period, and then reflected by the object under measurement. Then, an optical phase variation caused by the movement of the object under measurement is obtained by subjecting the two pulsed beams to interference.
摘要翻译：本发明提供一种位移测量方法，其装置，探针显微镜。这使得可以在不受空气波动，机械振动等干扰的影响的情况下以亚纳米级或更低的精度来稳定地测量被测物体的位移量和移动距离。具体地说，利用本发明，将脉冲光束分成两部分; 一个光束被测量对象反射，然后输入到等于一个脉冲周期的延迟光路; 并且另一个光束以相同的方向通过相同的延迟光路，直到被测物体的延迟为一个脉冲周期，然后被测量对象反射。然后，通过对两个脉冲光束进行干涉来获得由测量对象的运动引起的光学相位变化。

13. 发明申请

US20100064396A1 SCANNING PROBE MICROSCOPE AND SAMPLE OBSERVING METHOD USING THE SAME 有权
标题翻译：扫描探针显微镜和使用其的样品观察方法
公开(公告)号：US20100064396A1
公开(公告)日：2010-03-11
申请号：US12523369
申请日：2008-02-26
申请人： Toshihiko Nakata , Masahiro Watanabe , Takashi Inoue , Kishio Hidaka , Motoyuki Hirooka
发明人： Toshihiko Nakata , Masahiro Watanabe , Takashi Inoue , Kishio Hidaka , Motoyuki Hirooka
IPC分类号： G01Q60/18 , G01Q60/24
CPC分类号： G01Q60/18 , G01Q60/22
摘要： In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.
摘要翻译：在使用孔径探针的近场扫描显微镜中，实际上孔径形成的上限为至多几十nm。在使用散射探针的近场扫描显微镜中，由于外部照明光作为背景噪声，分辨能力被限制在至多几十nm。此外，通过探针的损伤或磨损，测量再现性被严重降低。可以以nm级分辨能力和高再现性测量样品表面的光学数据和不均匀性数据，同时通过制造具有nm级光学分辨率的等离子体增强近场探针而不损害探针和样品通过将nm级圆柱形结构与nm级微粒组合，并在样品上的各个测量点处以低接触力将探针重复地移动到样品并从中离开它们的能力。

14. 发明申请

US20090033924A1 Defects Inspecting Apparatus And Defects Inspecting Method 有权
标题翻译：检测设备缺陷检测方法
公开(公告)号：US20090033924A1
公开(公告)日：2009-02-05
申请号：US12192578
申请日：2008-08-15
申请人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
发明人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
IPC分类号： G01N21/88
CPC分类号： G01N21/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148
摘要： An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.
摘要翻译：一种检查装置和方法，包括：第一和第二照明单元，用于以不同的入射角照射待检查样本的表面;以及第一和第二检测光学单元，其以不同的仰角方向布置在样本的表面上，用于检测样本的图像由第一和第二照明单元照亮。

15. 发明申请

US20080047334A1 Scanning Microscope With Shape Correction Means 审中-公开
标题翻译：扫描显微镜与形状修正手段
公开(公告)号：US20080047334A1
公开(公告)日：2008-02-28
申请号：US11866661
申请日：2007-10-03
申请人： Shuichi Baba , Toshihiko Nakata , Masahiro Watanabe , Takeshi Arai
发明人： Shuichi Baba , Toshihiko Nakata , Masahiro Watanabe , Takeshi Arai
IPC分类号： G01B5/28
CPC分类号： G01Q10/06 , G01Q10/065 , G01Q20/02 , G01Q20/04 , G01Q30/025 , G01Q30/06
摘要： A scanning probe microscope for measuring a surface shape of a sample by scanning a probe by bringing said probe close to, or into contact with, a sample surface and measuring a physical interaction occurring between the probe and the sample, includes a measurement area specific which specifies a measurement area of the sample on the basis of the image of the sample surface, and a measurement shape corrector which corrects the measurement result of the sample surface on the basis of the condition of the probe.
摘要翻译：扫描探针显微镜，其用于通过使所述探针靠近或接触样品表面并测量所述探针和所述样品之间的物理相互作用来扫描探针来测量样品的表面形状，所述扫描探针显微镜包括测量区域特异性，基于样品表面的图像指定样品的测量面积;以及测量形状校正器，其基于探针的条件校正样品表面的测量结果。

16. 发明授权

US07067806B2 Scanning probe microscope and specimen observation method 有权
标题翻译：扫描探针显微镜和标本观察法
公开(公告)号：US07067806B2
公开(公告)日：2006-06-27
申请号：US11077904
申请日：2005-03-11
申请人： Masahiro Watanabe , Toshihiko Nakata
发明人： Masahiro Watanabe , Toshihiko Nakata
IPC分类号： G01N13/16 , G01B5/28
CPC分类号： G01Q10/06 , G01Q10/02 , G01Q20/02 , G01Q60/32 , Y10S977/852
摘要： In order to provide a scanning probe microscope capable of measuring with high throughput distribution information relating to local characteristics of a sample concurrently with accurate three-dimensional shape information of the sample without damaging the sample, the speed of approach to each measurement location is increased by controlling the approach of the sample and probe by the provision of a high-sensitivity proximity sensor of the optical type. Also, additional information relating to the distribution of material quality on the sample can be obtained without lowering the scanning speed by: applying a voltage to the probe, or measuring the response on vibrating the probe, or detecting the local optical intensity of the sample surface concurrently with obtaining sample height data and concurrently with the contact period with the sample, whilst ensuring that the probe is not dragged over the sample, by bringing the probe into contact with the sample intermittently.
摘要翻译：为了提供一种扫描探针显微镜，能够与样品的局部特性相关的高通量分布信息同时测量而不损害样品的准确的三维形状信息，因此，每个测量位置的接近速度通过通过提供光学类型的高灵敏度接近传感器来控制样品和探针的接近。此外，通过以下方式可以获得关于样品的材料质量分布的附加信息，而不降低扫描速度：向探针施加电压，或测量振动探针时的响应，或检测样品表面的局部光强度同时获得样品高度数据，同时与样品的接触期，同时确保探针未被拖动到样品上，通过使探针间断地与样品接触。

17. 发明申请

US20060113469A1 Scanning probe microscope and sample observing method using this and semiconductor device production method 有权
公开(公告)号：US20060113469A1
公开(公告)日：2006-06-01
申请号：US10542624
申请日：2004-01-29
申请人： Shuichi Baba , Toshihiko Nakata , Masahiro Watanabe , Takeshi Arai
发明人： Shuichi Baba , Toshihiko Nakata , Masahiro Watanabe , Takeshi Arai
IPC分类号： G21K7/00
CPC分类号： G01Q10/06 , G01Q10/065 , G01Q20/02 , G01Q20/04 , G01Q30/025 , G01Q30/06
摘要： A scanning probe microscope capable of measuring accurate 3-D shape information of a sample with high through-put without damaging a sample. In a method for acquiring an accurate 3-D shape of a sample without imparting damage to the sample by bringing a probe into contact at only a measurement point, once pulling up and retracting the probe when it moves towards a next measurement point, moving the probe towards the next measurement point and allowing it to approach, a deflection signal of the probe and its twist signal area analyzed so that measurement can be made at a minimum necessary retraction distance. Control for minimizing residual oscillation at the time of transverse movement is made so that a measurement frequency can be raised and high speed measurement can be accomplished.

18. 发明授权

US08736830B2 Pattern inspection device of substrate surface and pattern inspection method of the same 有权
标题翻译：基板表面图案检查装置及图案检验方法相同
公开(公告)号：US08736830B2
公开(公告)日：2014-05-27
申请号：US13145968
申请日：2009-12-10
申请人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
发明人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
IPC分类号： G01N21/00
CPC分类号： G01Q60/22 , G01N21/95607 , G11B5/84
摘要： There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.
摘要翻译：提供了一种用于基板表面的图案检查装置，其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。用于基板表面的图案检查装置包括：具有精细重复图案的近场光学头101; a＆thetas; 驱动单元311，其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201，用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。

19. 发明授权

US08272068B2 Scanning probe microscope and sample observing method using the same 有权
标题翻译：扫描探针显微镜及使用其的样品观察方法
公开(公告)号：US08272068B2
公开(公告)日：2012-09-18
申请号：US12523369
申请日：2008-02-26
申请人： Toshihiko Nakata , Masahiro Watanabe , Takashi Inoue , Kishio Hidaka , Motoyuki Hirooka
发明人： Toshihiko Nakata , Masahiro Watanabe , Takashi Inoue , Kishio Hidaka , Motoyuki Hirooka
IPC分类号： G01N13/00 , G01B11/30
CPC分类号： G01Q60/18 , G01Q60/22
摘要： In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.
摘要翻译：在使用孔径探针的近场扫描显微镜中，实际上孔径形成的上限为至多几十nm。在使用散射探针的近场扫描显微镜中，由于外部照明光作为背景噪声，分辨能力被限制在至多几十nm。此外，通过探针的损伤或磨损，测量再现性被严重降低。可以以nm级分辨能力和高再现性测量样品表面的光学数据和不均匀性数据，同时通过制造具有nm级光学分辨率的等离子体增强近场探针而不损害探针和样品通过将nm级圆柱形结构与nm级微粒组合，并在样品上的各个测量点处以低接触力将探针重复地移动到样品并从中离开它们的能力。

20. 发明申请

US20120013890A1 PATTERN INSPECTION DEVICE OF SUBSTRATE SURFACE AND PATTERN INSPECTION METHOD OF THE SAME 有权
标题翻译：基板表面图案检测装置及其图案检测方法
公开(公告)号：US20120013890A1
公开(公告)日：2012-01-19
申请号：US13145968
申请日：2009-12-10
申请人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
发明人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
IPC分类号： G01N21/956 , G01N21/47
CPC分类号： G01Q60/22 , G01N21/95607 , G11B5/84
摘要： There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.
摘要翻译：提供了一种用于基板表面的图案检查装置，其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。用于基板表面的图案检查装置包括：具有精细重复图案的近场光学头101; a＆thetas; 驱动单元311，其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201，用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。

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