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    • 13. 发明申请
    • Silicon-based thin-film photoeclectric converter and method of manufacturing the same
    • 硅基薄膜光电转换器及其制造方法
    • US20090133753A1
    • 2009-05-28
    • US11991141
    • 2006-07-25
    • Toshiaki SasakiKenji Yamamoto
    • Toshiaki SasakiKenji Yamamoto
    • H01L31/00B05D5/12
    • H01L31/075H01L31/076H01L31/202Y02E10/548Y02P70/521
    • In order to improve photoelectric conversion properties of a silicon-based thin-film photoelectric converter to which a conductive SiOx layer is inserted to obtain an optical confinement effect, the silicon-based thin-film photoelectric converter according to the present invention includes an i-type photoelectric conversion layer of hydrogenated amorphous silicon or an alloy thereof, an i-type buffer layer made of hydrogenated amorphous silicon, and an n-type Si1-xOx layer (x is 0.25-0.6) stacked successively, wherein the buffer layer has a higher hydrogen concentration at its interface with and as compared with the photoelectric conversion layer and has a thickness of at least 5 nm and at most 50 nm. Accordingly, generation of silicon crystal phase parts and reduction of resistivity are promoted in the n-type Si1-xOx layer, contact resistance at the interface is reduced, and FF of the photoelectric converter is improved, so that the photoelectric converter achieves improved properties.
    • 为了提高插入导电性SiO x层的硅系薄膜光电转换器的光电转换性能,得到光限制效果,本发明的硅系薄膜光电转换元件包括:i- 氢化非晶硅或其合金的类型光电转换层,由氢化非晶硅制成的i型缓冲层和n型Si1-xOx层(x为0.25-0.6),其中缓冲层具有 在与光电转换层相比的界面处的氢浓度较高,并且具有至少5nm至最多50nm的厚度。 因此,在n型Si1-xOx层中促进硅晶相的产生和电阻率的降低,界面处的接触电阻降低,光电转换器的FF提高,光电转换器实现了改善的性能。
    • 15. 发明授权
    • Silicon-based thin-film photoelectric converter and method of manufacturing the same
    • 硅基薄膜光电转换器及其制造方法
    • US07960646B2
    • 2011-06-14
    • US11991141
    • 2006-07-25
    • Toshiaki SasakiKenji Yamamoto
    • Toshiaki SasakiKenji Yamamoto
    • H01L31/00B05D5/12
    • H01L31/075H01L31/076H01L31/202Y02E10/548Y02P70/521
    • In order to improve photoelectric conversion properties of a silicon-based thin-film photoelectric converter to which a conductive SiOx layer is inserted to obtain an optical confinement effect, the silicon-based thin-film photoelectric converter according to the present invention includes an i-type photoelectric conversion layer of hydrogenated amorphous silicon or an alloy thereof, an i-type buffer layer made of hydrogenated amorphous silicon, and an n-type Si1-xOx layer (x is 0.25-0.6) stacked successively, wherein the buffer layer has a higher hydrogen concentration at its interface with and as compared with the photoelectric conversion layer and has a thickness of at least 5 nm and at most 50 nm. Accordingly, generation of silicon crystal phase parts and reduction of resistivity are promoted in the n-type Si1-xOx layer, contact resistance at the interface is reduced, and FF of the photoelectric converter is improved, so that the photoelectric converter achieves improved properties.
    • 为了提高插入导电性SiO x层的硅系薄膜光电转换器的光电转换性能,得到光限制效果,本发明的硅系薄膜光电转换元件包括:i- 氢化非晶硅或其合金的类型光电转换层,由氢化非晶硅制成的i型缓冲层和n型Si1-xOx层(x为0.25-0.6),其中缓冲层具有 在与光电转换层相比的界面处的氢浓度较高,并且具有至少5nm至最多50nm的厚度。 因此,在n型Si1-xOx层中促进硅晶相的产生和电阻率的降低,界面处的接触电阻降低,光电转换器的FF提高,光电转换器实现了改善的性能。