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    • 16. 发明授权
    • Photosensitive material processor
    • 感光材料处理器
    • US5341189A
    • 1994-08-23
    • US53780
    • 1993-04-27
    • Jeffrey L. HelferMark J. Devaney, Jr.
    • Jeffrey L. HelferMark J. Devaney, Jr.
    • G03D3/02G03D3/06G03D3/08
    • G03D3/02G03D3/065
    • A processor for processing photosensitive material having a first processing tank containing a first processing fluid containing at least one component of a first concentration and a second processing tank containing processing fluid having the same component to that of the first processing fluid, however, the concentration of the component being different than the first concentration. A weir is provided for causing fluid to flow from the first tank to the second tank resulting from the hydrostatic pressure of the first fluid in the first tank. The weir has a configuration such that concentration difference between processing fluid in said tanks does not change significantly over a predetermined period of time.
    • 一种用于处理感光材料的处理器,其具有包含含有至少一种第一浓度成分的第一处理流体的第一处理槽和含有与第一处理流体相同成分的处理流体的第二处理槽的感光材料, 该组分不同于第一浓度。 提供了一种堰,用于使流体从第一罐中的第一流体的流体静力压力导致从第一罐流到第二罐。 堰具有这样的结构,使得所述罐中的处理流体之间的浓度差在预定的时间段内不会显着变化。