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11. 发明授权

US5643364A Plasma chamber with fixed RF matching 失效
标题翻译：等离子室与固定射频匹配
公开(公告)号：US5643364A
公开(公告)日：1997-07-01
申请号：US641948
申请日：1996-05-02
申请人： Jun Zhao , Stefan Wolff , Kenneth Smyth , William Nixon Taylor, Jr. , Gerald McNutt
发明人： Jun Zhao , Stefan Wolff , Kenneth Smyth , William Nixon Taylor, Jr. , Gerald McNutt
IPC分类号： H01L21/02 , H01J37/32 , H05H1/46 , C23C16/00
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/32935 , H01J37/3299 , H05H1/46
摘要： A plasma chamber RF excitation system includes a high frequency RF power source having a fixed RF match circuit at its output and sensing and control apparatus for sensing the amount of RF power delivered by the RF power source and for regulating the output power level of the RF power source so as to maintain the RF power delivered by the RF power source at a desired level, and an RF plasma chamber including an RF radiator. The power source is mounted proximate or directly on the plasma chamber so that the distance between them is much less than an eighth of a wavelength at thr frequency of the RF source. The system may further include an endpoint detector for a plasma etch process or a chamber cleaning process which halts the process when the VSWR or reflected power ceases to change in response to the progress of the etch process.
摘要翻译：等离子体室RF激励系统包括在其输出端具有固定RF匹配电路的高频RF电源，以及感测和控制装置，用于感测由RF电源传送的RF功率的量并用于调节RF的输出功率电平电源，以将由RF电源提供的RF功率维持在期望的水平，以及包括RF辐射器的RF等离子体室。电源靠近或直接安装在等离子体室上，使得它们之间的距离远小于RF源频率的波长的八分之一。该系统还可以包括用于等离子体蚀刻工艺的端点检测器或室清洁过程，当VSWR或反射功率响应于蚀刻过程的进行而停止变化时，该过程停止该过程。

12. 发明授权

US5853607A CVD processing chamber 失效
标题翻译： CVD处理室
公开(公告)号：US5853607A
公开(公告)日：1998-12-29
申请号：US540812
申请日：1995-10-11
申请人： Jun Zhao , Tom Cho , Charles Dornfest , Stefan Wolff , Kevin Fairbairn , Xin Sheng Guo , Alex Schreiber , John M. White
发明人： Jun Zhao , Tom Cho , Charles Dornfest , Stefan Wolff , Kevin Fairbairn , Xin Sheng Guo , Alex Schreiber , John M. White
IPC分类号： C23C16/44 , C23C16/455 , C23C16/458 , C23C16/46 , C30B25/02 , H01J37/32 , H01L21/205 , H01L21/687 , A62C1/00 , A62D1/00
CPC分类号： C23C16/45502 , C23C16/4401 , C23C16/4412 , C23C16/4586 , C23C16/46 , C23C16/463 , C30B25/02 , H01J37/32477 , H01J37/32724 , H01J37/32834 , H01L21/68742 , H01L21/68785 , H01J2237/022 , Y10S438/909
摘要： A process chamber is disclosed which provides a 360.degree. circular gas/vacuum distribution over a substrate being processed. The substrate being processed is supported on a heated and optionally cooled pedestal assembly. The substrate faces a one-piece gas distribution faceplate being connected to an RF power supply outside the vacuum environment of the processing chamber. A pumping channel view port is provided to verify and confirm instrumentation readings concerning the degree of surface deposition on process chamber internal surfaces. All process chamber wall surfaces facing the region where plasma will be present during processing (except the gas distribution faceplate) are ceramic and therefore highly resistant to corrosion. The pedestal an un-anodized metal is also covered with a loosely fitting ceramic surface having alignment features to maintain concentricity between the wafer support surface of the pedestal and the wafer being processed. A valve body is contained within the wall of the processing chamber helping to reduce the surface area available for condensation of volatile process gas constituents which condense or cool in vacuum passage surfaces and can contaminate the process chamber if allowed to migrate back to it through the vacuum piping.
摘要翻译：公开了一种处理室，其在正在处理的衬底上提供360°圆形气体/真空分布。正在加工的基板被支撑在加热且任选地冷却的基座组件上。衬底面向一体式气体分布面板，其连接到处理室真空环境外的RF电源。提供泵浦通道视图端口以验证和确认关于处理室内表面上的表面沉积程度的仪表读数。在处理过程中等离子体将存在的区域（除气体分布面板之外）的所有处理室壁表面均为陶瓷，因此具有很高的抗腐蚀性。基座是非阳极氧化的金属也被具有对准特征的松散配合的陶瓷表面覆盖，以保持基座的晶片支撑表面和正被处理的晶片之间的同心度。阀体包含在处理室的壁内，有助于减少可用于在真空通道表面中冷凝或冷却的挥发性工艺气体组分的冷凝的表面积，并且如果允许通过真空迁移回到处理室，则可污染处理室管道。

13. 发明授权

US5558717A CVD Processing chamber 失效
标题翻译： CVD加工室
公开(公告)号：US5558717A
公开(公告)日：1996-09-24
申请号：US348273
申请日：1994-11-30
申请人： Jun Zhao , Tom Cho , Charles Dornfest , Stefan Wolff , Kevin Fairbairn , Xin S Guo , Alex Schreiber , John M. White
发明人： Jun Zhao , Tom Cho , Charles Dornfest , Stefan Wolff , Kevin Fairbairn , Xin S Guo , Alex Schreiber , John M. White
IPC分类号： C23C16/44 , C23C16/455 , C23C16/458 , C23C16/46 , C30B25/02 , H01J37/32 , H01L21/205 , H01L21/687 , C23C16/00
CPC分类号： C23C16/45502 , C23C16/4401 , C23C16/4412 , C23C16/4586 , C23C16/46 , C23C16/463 , C30B25/02 , H01J37/32477 , H01J37/32724 , H01J37/32834 , H01L21/68742 , H01L21/68785 , H01J2237/022 , Y10S438/909
摘要： A process chamber is disclosed which provides a 360.degree. circular gas/vacuum distribution over a substrate being processed. The substrate being processed is supported on a heated and optionally cooled pedestal assembly. The substrate faces a one-piece gas distribution faceplate being connected to an RF power supply outside the vacuum environment of the processing chamber. A pumping channel view port is provided to verify and confirm instrumentation readings concerning the degree of surface deposition on process chamber internal surfaces. All process chamber wall surfaces facing the region where plasma will be present during processing (except the gas distribution faceplate) are ceramic and therefore highly resistant to corrosion. The pedestal an un-anodized metal is also covered with a loosely fitting ceramic surface having alignment features to maintain concentricity between the wafer support surface of the pedestal and the wafer being processed. A valve body is contained within the wall of the processing chamber helping to reduce the surface area available for condensation of volatile process gas constituents which condense or cool in vacuum passage surfaces and can contaminate the process chamber if allowed to migrate back to it through the vacuum piping.
摘要翻译：公开了一种处理室，其在正在处理的衬底上提供360°圆形气体/真空分布。正在加工的基板被支撑在加热且任选地冷却的基座组件上。衬底面向一体式气体分布面板，其连接到处理室真空环境外的RF电源。提供泵浦通道视图端口以验证和确认关于处理室内表面上的表面沉积程度的仪表读数。在处理过程中等离子体将存在的区域（除气体分布面板之外）的所有处理室壁表面均为陶瓷，因此具有很高的抗腐蚀性。基座是非阳极氧化的金属也被具有对准特征的松散配合的陶瓷表面覆盖，以保持基座的晶片支撑表面和正被处理的晶片之间的同心度。阀体包含在处理室的壁内，有助于减少可用于在真空通道表面中冷凝或冷却的挥发性工艺气体组分的冷凝的表面积，并且如果允许通过真空迁移回到处理室，则可污染处理室管道。

14. 发明授权

US5981684A Highly functionalized polyurethanes 失效
标题翻译：高功能化聚氨酯
公开(公告)号：US5981684A
公开(公告)日：1999-11-09
申请号：US973729
申请日：1997-12-15
申请人： Bernd Bruchmann , Frank Wingerter , Hermann Graf , Stefan Wolff
发明人： Bernd Bruchmann , Frank Wingerter , Hermann Graf , Stefan Wolff
IPC分类号： C08G18/06 , C08F283/00 , C08G18/10 , C08G18/28 , C08G18/32 , C08G18/80 , C08G18/83 , C08G83/00 , C09D201/00 , C08G18/81 , C08G18/00
CPC分类号： C08G83/003 , C08G18/2825 , C08G18/3203 , C08G18/3275 , C08G18/8064 , C08G18/8077 , C08G18/832 , C09D201/005
摘要： The invention relates to highly functionalized polyurethanes which are synthesized from molecules containing the functional groups A(B).sub.n, where A is an NCO group or a group reactive with an NCO group, B is an NCO group or a group reactive with an NCO group, A is reactive with B and n is a positive number and is at least equal to 2.
摘要翻译： PCT No.PCT / EP96 / 02705 Sec。 371 1997年12月15日第 102（e）日期1997年12月15日PCT提交1996年6月21日PCT公布。公开号WO97 / 02304 日期1997年1月23日本发明涉及由含有官能团A（B）n的分子合成的高官能化聚氨酯，其中A为NCO基团或与NCO基团反应的基团，B为NCO基团或基团与NCO基团反应，A与B反应，n是正数，并且至少等于2。

15. 发明授权

US5641851A Preparation of biuret-containing polyisocyanates 失效
标题翻译：制备含缩二脲的聚异氰酸酯
公开(公告)号：US5641851A
公开(公告)日：1997-06-24
申请号：US551213
申请日：1995-10-31
申请人： Stefan Wolff , Wolfgang Heider , Werner Langer , Hans Renz
发明人： Stefan Wolff , Wolfgang Heider , Werner Langer , Hans Renz
IPC分类号： C07C273/18 , C07C275/62 , C08G18/78 , C08G18/79 , C08G18/30
CPC分类号： C07C273/1872 , C07C275/62
摘要： The invention is to a process for the preparation of biuret-containing polyisocyanates by catalytic reaction of aliphatic and/or cycloaliphatic diisocyanates with a biuretizing agent, where the biuretizing agent employed is water in finely disperse form and the reaction is carried out in the presence of OH-acidic compounds.
摘要翻译：本发明涉及通过脂族和/或脂环族二异氰酸酯与缩二脲化合物的催化反应制备含缩二脲聚异氰酸酯的方法，其中所用的缩二脲化剂是水分散形式，反应在 OH-酸性化合物。

16. 发明授权

US08062525B2 Process for treating water in a treatment plant 有权
标题翻译：处理厂处理水的方法
公开(公告)号：US08062525B2
公开(公告)日：2011-11-22
申请号：US12333945
申请日：2008-12-12
申请人： Jörg Schwerdt , Stefan Wolff , Jan Parmentier
发明人： Jörg Schwerdt , Stefan Wolff , Jan Parmentier
IPC分类号： C02F3/00
CPC分类号： C02F3/1221 , C02F1/78 , C02F2301/043 , Y02W10/15
摘要： The process according to the invention for treating water in a treatment plant comprising a reaction chamber in which a biodegradable material present in the water is biodegraded at least partly by microorganisms, in the course of which, at least temporarily, water is transferred out of the reaction chamber into a separating chamber and the biodegradable material and the microorganisms are separated at least partly from the water therein, a return stream comprising biodegradable material and at least some of the microorganisms flowing out of the separating chamber into the reaction chamber via a recycle line, is characterized in that at least some of the following substances: a) the biodegradable material and b) the microorganisms are treated with ozone (O3), an amount of 15 to 150 milligrams of ozone per kilogram of dry substance of the biodegradable material and of the microorganisms being added per hour in the reaction chamber.
摘要翻译：根据本发明的用于在处理设备中处理水的方法，其包括反应室，其中存在于水中的可生物降解的材料至少部分地被微生物降解，其中至少暂时将水从反应室进入分离室，并且所述可生物降解的材料和所述微生物至少部分地与其中的水分离，所述返回流包含可生物降解的材料，并且所述微生物中的至少一些通过再循环管线流出所述分离室进入所述反应室其特征在于，至少一些以下物质：a）生物可降解材料和b）微生物用臭氧（O 3）处理，每千克干物质的可生物降解材料含有15至150毫克臭氧，的微生物在反应室中每小时加入。

17. 发明授权

US07022874B2 Preparation of biuret-containing polyisocyanates 失效
标题翻译：制备含缩二脲的聚异氰酸酯
公开(公告)号：US07022874B2
公开(公告)日：2006-04-04
申请号：US08894156
申请日：1996-02-01
申请人： Bernd Bruchmann , Stefan Wolff , Wolfgang Heider , Joachim Jähme , Werner Langer , Hans Renz
发明人： Bernd Bruchmann , Stefan Wolff , Wolfgang Heider , Joachim Jähme , Werner Langer , Hans Renz
IPC分类号： C07C273/18 , C07C273/00 , C07C275/62
CPC分类号： C07C273/1863 , C07C265/14 , C07C273/1872 , C08G18/7831 , C07C275/62
摘要： A process for the preparation of polyisocyanates which contain one or more biuret groups, by reacting a) an aliphatic or cycloaliphatic isocyanate containing two or more isocyanate groups (isocyanate a) with b) a tertiary alcohol or a mixture of water and a tertiary alcohol (biuretizing agent b) at from 100 to 250° C., which comprises carrying out the reaction in the presence c) of a stabilizer (c) which constitutes a catalytic amount of urea, ammonia, biuret, a urea derivative of the formula I in which R1, R2, R3 and R4 are hydrogen, C1 to C10 alkyl or C5 to C10 aryl, or a carboxamide of the formula II in which R5 is C1 to C12 alkyl which is unsubstituted or in which 1, 2 or 3 hydrogen atoms are replaced by a radical
摘要翻译：一种制备含有一个或多个缩二脲基团的多异氰酸酯的方法，通过使a）含有两个或多个异氰酸酯基团（异氰酸酯a）的脂族或脂环族异氰酸酯与b）叔醇或水与叔醇的混合物缩合剂b）在100至250℃下进行，其包括在c）中进行反应，c）稳定剂（c）构成催化量的尿素，氨，缩二脲，式I的脲衍生物在其中R 1，R 2，R 3和R 4是氢，C 1〜 C 1 -C 10烷基或C 5至C 10芳基或式II的甲酰胺，其中R 5， C 1 -C 12烷基是未被取代的或其中1,2或3个氢原子被基团取代的C 1 -C 12烷基

18. 发明授权

US5436336A Preparation of isocyanurate- and/or uretidone-containing polysiocyanates having a reduced color index and improved shelf life, and products prepared by this method 失效
标题翻译：具有降低的颜色指数和改善的保质期的含异氰脲酸酯和/或含脲基胺的多聚氰酸酯的制备，以及通过该方法制备的产品
公开(公告)号：US5436336A
公开(公告)日：1995-07-25
申请号：US259105
申请日：1994-06-13
申请人： Bernd Bruchmann , Stefan Wolff , Konrad Stiefenhoefer
发明人： Bernd Bruchmann , Stefan Wolff , Konrad Stiefenhoefer
IPC分类号： C08G18/02 , C07D251/34 , C08G18/79 , C08G18/83 , C08G18/86 , C07D251/32
CPC分类号： C08G18/79 , C07D251/34
摘要： Isocyanurate- and/or uretidone-containing polyisocyanates having a reduced color index and improved shelf life are prepared by conventional catalytic oligomerization of aliphatic and/or cycloaliphatic diisocyanates and treatment of the oligomerization products with peroxycarboxylic acids.
摘要翻译：通过脂族和/或脂环族二异氰酸酯的常规催化低聚法和用过氧羧酸处理低聚产物来制备具有降低的颜色指数和改善的保质期的异氰脲酸酯和/或含脲胺酮的多异氰酸酯。

19. 发明授权

US5369207A Preparation of low-viscosity, isocyanurate and urethane group-containing polyisocyanate mixtures 失效
标题翻译：制备低粘度，异氰脲酸酯和含氨基甲酸酯基团的多异氰酸酯混合物
公开(公告)号：US5369207A
公开(公告)日：1994-11-29
申请号：US90419
申请日：1993-07-12
申请人： Stefan Wolff , Hans Renz , Guenter Mohrhardt
发明人： Stefan Wolff , Hans Renz , Guenter Mohrhardt
IPC分类号： C07D251/34 , C08G18/02 , C08G18/28 , C08G18/78 , C08G18/79 , C08G18/80 , C09D175/00 , C09D175/12 , C08G18/30
CPC分类号： C08G18/8064 , C08G18/283 , C08G18/7837 , C08G18/791 , C08G18/798
摘要： A process for the preparation of isocyanurate and urethane group-containing and, if desired, uretdiode and allophanate group-containing polyisocyanate mixtures by partially cyclizing organic, preferably (cyclo)aliphatic diisocyanates, in the presence of trimerization catalysts, deactivating these catalysts, reacting the partially trimerized, isocyanurate and, if desired, uretdiode group-containing polyisocyanate mixture with 0.5 to 10 mol % of at least one aliphatic or cycloaliphatic alcohol and/or polyoxyalkylene alcohol, and separating off the monomeric diisocyanates.
摘要翻译：通过在三聚催化剂的存在下部分环化有机（优选（环））脂族二异氰酸酯，通过使这些催化剂失活来使得制备含异氰脲酸酯和氨基甲酸酯基团的方法，并且如果需要，含有脲基和脲基甲酸酯基的多异氰酸酯混合物，部分三聚，异氰脲酸酯，并且如果需要，含有脲基团的多异氰酸酯混合物与0.5至10mol％的至少一种脂族或脂环族醇和/或聚氧化烯醇，并分离出单体二异氰酸酯。

20. 发明申请

US20090301965A1 Process for Treating Water in a Treatment Plant and Corresponding Treatment Plant 有权
标题翻译：处理厂和对应处理厂处理水的工艺
公开(公告)号：US20090301965A1
公开(公告)日：2009-12-10
申请号：US12333945
申请日：2008-12-12
申请人： Jörg SCHWERDT , Stefan Wolff , Jan Parmentier
发明人： Jörg SCHWERDT , Stefan Wolff , Jan Parmentier
IPC分类号： C02F3/26
CPC分类号： C02F3/1221 , C02F1/78 , C02F2301/043 , Y02W10/15
摘要： The process according to the invention for treating water in a treatment plant comprising a reaction chamber in which a biodegradable material present in the water is biodegraded at least partly by microorganisms, in the course of which, at least temporarily, water is transferred out of the reaction chamber into a separating chamber and the biodegradable material and the microorganisms are separated at least partly from the water therein, a return stream comprising biodegradable material and at least some of the microorganisms flowing out of the separating chamber into the reaction chamber via a recycle line, is characterized in that at least some of the following substances: a) the biodegradable material and b) the microorganisms are treated with ozone (O3), an amount of 15 to 150 milligrams of ozone per kilogram of dry substance of the biodegradable material and of the microorganisms being added per hour in the reaction chamber.
摘要翻译：根据本发明的用于在处理设备中处理水的方法，其包括反应室，其中存在于水中的可生物降解的材料至少部分地被微生物降解，其中至少暂时将水从反应室进入分离室，并且所述可生物降解的材料和所述微生物至少部分地与其中的水分离，所述返回流包含可生物降解的材料，并且所述微生物中的至少一些通过再循环管线流出所述分离室进入所述反应室其特征在于，至少一些以下物质：a）生物可降解材料和b）微生物用臭氧（O 3）处理，每千克干物质的可生物降解材料含有15至150毫克臭氧，的微生物在反应室中每小时加入。

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