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11. 发明申请

US20080285602A1 Narrow-Spectrum Laser Device 有权
标题翻译：窄谱激光装置
公开(公告)号：US20080285602A1
公开(公告)日：2008-11-20
申请号：US11631463
申请日：2005-07-07
申请人： Shinji Nagai , Osamu Wakabayashi , Koji Kakizaki , Takayuki Yabu , Takahito Kumazaki
发明人： Shinji Nagai , Osamu Wakabayashi , Koji Kakizaki , Takayuki Yabu , Takahito Kumazaki
IPC分类号： H01S3/10 , H01S3/13
CPC分类号： H01S3/2366 , H01S3/134 , H01S3/225
摘要： A spectral purity range (E95) of a laser beam output from an amplifying laser device (300) is measured by spectral purity range measuring means. To have the measured spectral purity range (E95) within an allowable range E950±dE95 of a target spectral purity range (E950), discharge timing from a time when discharge is started by an oscillating laser device (100) to a time when discharge is started by the amplifying laser device (300) is controlled, and the spectral purity range (E95) is controlled to be stabilized.
摘要翻译：通过光谱纯度范围测量装置测量从放大激光器件（300）输出的激光束的光谱纯度范围（E 95）。为了使测量的光谱纯度范围（E 95）在目标光谱纯度范围（E 950）的允许范围E 950±dE 95内，从通过振荡激光装置（100）开始放电的时间到由放大激光装置（300）开始放电的时间被控制，光谱纯度范围（E 95）被控制为稳定。

12. 发明授权

US06810061B2 Discharge electrode and discharge electrode manufacturing method 有权
标题翻译：放电电极和放电电极的制造方法
公开(公告)号：US06810061B2
公开(公告)日：2004-10-26
申请号：US10225286
申请日：2002-08-22
申请人： Tsukasa Hori , Akira Sumitani , Takayuki Yabu , Teiichirou Chiba , Hakaru Mizoguchi , Osamu Wakabayashi , Junichi Fujimoto
发明人： Tsukasa Hori , Akira Sumitani , Takayuki Yabu , Teiichirou Chiba , Hakaru Mizoguchi , Osamu Wakabayashi , Junichi Fujimoto
IPC分类号： H01S3097
CPC分类号： H01S3/038 , H01S3/0388 , H01S3/225
摘要： A film is formed on the discharge parts of the main discharge electrodes. In order to prevent erosion of the discharge parts by the halogen gas contained in the laser gas, a substance that tends not to react with the halogen gas, i.e., a halogen-resistant substance, is used for this film. Furthermore, in order to prevent deformation of the discharge parts by the bombardment and heat of the main discharge, a substance that has a higher hardness than the metal of the main discharge electrodes or a substance that has a higher melting point than the metal of the main discharge electrodes is used for this film. As a result, deterioration of the electrodes can be inhibited, so that a stable laser output can be obtained, and the replacement interval of the electrodes can be extended.
摘要翻译：在主放电电极的放电部分上形成膜。为了防止由激光气体中所含的卤素气体引起的排出部件的侵蚀，使用与卤素气体即不耐卤素物质倾向不反应的物质。此外，为了防止放电部件由于主放电的轰击和热而发生变形，所以具有比主放电电极的金属更高的硬度的物质或具有比金属的熔点高的物质主放电电极用于该膜。结果，可以抑制电极的劣化，从而可以获得稳定的激光输出，并且可以延长电极的替换间隔。

13. 发明申请

US20120205559A1 TARGET SUPPLY DEVICE AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 审中-公开
标题翻译：目标供应装置和极光超紫外灯发光装置
公开(公告)号：US20120205559A1
公开(公告)日：2012-08-16
申请号：US13351884
申请日：2012-01-17
申请人： Takayuki Yabu , Kouji Kakizaki , Osamu Wakabayashi
发明人： Takayuki Yabu , Kouji Kakizaki , Osamu Wakabayashi
IPC分类号： G21K5/00 , B65D35/38
CPC分类号： H05G2/006 , H05G2/005 , H05G2/008
摘要： A target supply device is configured for supplying a target material for generating an extreme ultraviolet (EUV) light. The target supply device comprises a target storage unit for storing at least the target material, and a target discharge unit comprising a surface having an opening from which a through-hole extends to communicate with the target storage unit. The target material is discharged through the opening for generating the EUV light. The surface at least around the opening is formed of a material so that the target material has a contact angle greater than 90 degrees with the surface.
摘要翻译：目标供给装置被配置为提供用于产生极紫外（EUV）光的目标材料。目标供给装置包括用于至少存储目标材料的目标存储单元和包括具有开口的表面的目标排出单元，通孔从该开口延伸以与目标存储单元连通。目标材料通过用于产生EUV光的开口排出。至少在开口周围的表面由材料形成，使得目标材料具有与表面大于90度的接触角。

14. 发明申请

US20100171049A1 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US20100171049A1
公开(公告)日：2010-07-08
申请号：US12382964
申请日：2009-03-27
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
IPC分类号： H05G2/00 , G01N21/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.
摘要翻译： EUV光源装置可以可靠地检测并准确地判断设置在EUV光生成室内的激光束聚焦光学元件中的光学元件的劣化。该EUV光源装置包括：EUV光产生室; 目标材料供应单位; EUV集光镜; 驱动激光器一个窗口; 抛物面镜，其通过反射聚焦准直激光束并设置在EUV光产生室内; 能量检测器，当不产生EUV光时，检测在被激光束聚焦光学器件聚焦之后不会施加到目标材料上的激光束的能量扩散; 以及处理单元，用于根据由能量检测器检测的激光束能量来判断窗口和抛物面镜的劣化。

15. 发明授权

US07683355B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US07683355B2
公开(公告)日：2010-03-23
申请号：US11902596
申请日：2007-09-24
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani
IPC分类号： H05G2/00 , G21G4/00 , A61N5/06 , G01J3/10
CPC分类号： H05G2/001
摘要： An EUV light source apparatus capable of preventing the efficiency of generation of EUV light from decreasing due to deterioration of a window of an EUV light generation chamber. The EUV light source apparatus includes an EUV light generation chamber provided with a window, a driver laser which generates a laser beam, a concave lens which enlarges the laser beam, a convex lens which collimates the enlarged laser beam, a parabolic concave mirror which is arranged in the EUV light generation chamber and reflects the collimated laser beam to collect the laser beam to a target material, a parabolic concave mirror adjusting mechanism which adjusts position and angle of the parabolic concave mirror, an EUV light collector mirror which collects EUV light, and a purge gas supply unit which supplies a purge gas for protecting the window and the parabolic concave mirror.
摘要翻译： EUV光源装置能够防止由于EUV光产生室的窗口的劣化导致的EUV光的产生效率降低。 EUV光源装置包括：具有窗口的EUV光产生室，产生激光束的驱动激光器，放大激光束的凹透镜;使激光束准直的凸透镜;抛物面凹面镜; 布置在EUV光产生室中，并且反射准直激光束以将激光束收集到目标材料上，调整抛物面凹面镜的位置和角度的抛物面凹面镜调节机构，收集EUV光的EUV聚光镜，以及净化气体供给单元，其供给用于保护窗口和抛物面凹面镜的吹扫气体。

16. 发明授权

US07006546B2 Gas laser electrode, laser chamber employing the electrode, and gas laser device 有权
标题翻译：气体激光电极，采用电极的激光室和气体激光装置
公开(公告)号：US07006546B2
公开(公告)日：2006-02-28
申请号：US09795401
申请日：2001-03-01
申请人： Tsukasa Hori , Junichi Fujimoto , Takayuki Yabu
发明人： Tsukasa Hori , Junichi Fujimoto , Takayuki Yabu
IPC分类号： H01S3/22
CPC分类号： H01S3/038 , H01S3/225
摘要： Provided is a gas laser electrode in which a stable laser output can be obtained by inhibiting the deterioration of the electrode (discharge characteristics). In an anode 3, a dielectric material 4 is applied on the surface of a discharging portion 3a in order to inhibit the deterioration of the electrode. Used as a dielectric material 4 may be, for example, fluorides such as calcium fluoride and strontium fluoride. Further, the dielectric material 4 is of a thickness (in a range of 0.005 mm˜1.5 mm, preferably 0.1 mm˜1 mm, for example) sufficient to prevent the erosion of halogen gas in the discharging portion 3a of the anode 3 and to secure a conductivity thereof, whereby it is enabled to form mono-fluoride evenly in extreme precision.
摘要翻译：提供一种气体激光电极，其中通过抑制电极的劣化（放电特性）可以获得稳定的激光输出。在阳极3中，为了抑制电极的劣化，在放电部分3a的表面上施加电介质材料4。用作电介质材料4可以是例如氟化物如氟化钙和氟化锶。此外，电介质材料4的厚度（例如在0.005mm〜1.5mm的范围内，优选为0.1mm〜1mm），足以防止阳极3的放电部分3a中的卤素气体的侵蚀，以及以确保其导电性，从而能够以极高的精度均匀地形成单氟化物。

17. 发明授权

US06771685B1 Discharge electrodes connecting structure for laser apparatus and laser apparatus therewith 有权
标题翻译：激光装置的放电电极连接结构和激光装置
公开(公告)号：US06771685B1
公开(公告)日：2004-08-03
申请号：US09648632
申请日：2000-08-28
申请人： Takayuki Yabu , Takanobu Ishihara , Takashi Matsunaga , Yasufumi Kawasuji
发明人： Takayuki Yabu , Takanobu Ishihara , Takashi Matsunaga , Yasufumi Kawasuji
IPC分类号： H01S3097
CPC分类号： H01S3/038 , H01S3/0971 , H01S3/225
摘要： The invention provides a discharge electrodes connecting structure for a laser apparatus in which a thickness of the return plate is set to be within an optimum range, and a laser apparatus employing the same. Accordingly, a laser apparatus is provided with a laser chamber (2) sealing a laser gas, a pair of anode (5A) and cathode (5B) provided within the laser chamber in an opposing manner, generating a discharge so as to excite a laser gas flowing therebetween and oscillating a laser beam, a conductive anode base (6) holding the anode, an insulative cathode base (8) holding the cathode, and a return plate (9) electrically connecting the anode base to the laser chamber so as to supply a current to the anode. A thickness (t) of the return plate is set to be equal to or more than 100 &mgr;m and equal to or less than 500 &mgr;m, and the return plate is arranged substantially in parallel to a gas flow of the laser gas flowing between the discharge electrodes.
摘要翻译：本发明提供一种用于激光装置的放电电极连接结构，其中将返回板的厚度设置在最佳范围内，以及采用该放电电极连接结构的激光装置。因此，激光装置设置有激光室（2），密封激光气体，以相对的方式设置在激光室内的一对阳极（5A）和阴极（5B），产生放电以激发激光在其间流动的气体和激光束的振荡，保持阳极的导电阳极基座（6），保持阴极的绝缘阴极基座（8）和将阳极基座电连接到激光室的回流板（9）向阳极提供电流。返回板的厚度（t）设定为100μm以上且500μm以下，返回板大致平行于在排出口之间流动的激光气体的气流电极。

18. 发明授权

US08450706B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08450706B2
公开(公告)日：2013-05-28
申请号：US12453058
申请日：2009-04-28
申请人： Tamotsu Abe , Hiroshi Someya , Takashi Suganuma , Takayuki Yabu
发明人： Tamotsu Abe , Hiroshi Someya , Takashi Suganuma , Takayuki Yabu
IPC分类号： G21F5/02
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70808 , G03F7/70916 , G03F7/70941 , G03F7/7095 , H05G2/005 , H05G2/006 , H05G2/008
摘要： An extreme ultraviolet light source apparatus in which only particles having a high transmittance for EUV light adhere to an EUV collector mirror even if fast ions emitted from plasma collide with a structural member in a vacuum chamber, and thereby, the reflectance thereof is not easily degraded. The apparatus includes: a vacuum chamber; a target supply unit for supplying a target to a predetermined position in the vacuum chamber; a driver laser for applying a laser beam to the target to generate the plasma; a collector mirror for collecting and outputting extreme ultraviolet light emitted from the plasma; a collector mirror holder for supporting the collector mirror; and a shielding member formed of a material having a high transmittance for the extreme ultraviolet light, for shielding the structural member such as the collector mirror holder from the ions generated from the plasma.
摘要翻译：即使在从等离子体发射的快速离子体与真空室内的结构部件碰撞的情况下，仅将EuV光透射率高的粒子附着在EUV集光镜上的极紫外光源装置，其反射率也不易降解。该装置包括：真空室; 目标供给单元，用于将目标供给到真空室中的预定位置; 用于将激光束施加到靶以产生等离子体的驱动器激光器; 用于收集和输出从等离子体发射的极紫外光的收集镜; 用于支撑收集镜的收集镜支架; 以及由对于极紫外光具有高透射率的材料形成的屏蔽构件，用于将诸如集电镜支架的结构构件与从等离子体产生的离子相屏蔽。

19. 发明授权

US06570899B1 Gas laser device 有权
标题翻译：气体激光装置
公开(公告)号：US06570899B1
公开(公告)日：2003-05-27
申请号：US09648630
申请日：2000-08-28
申请人： Takayuki Yabu , Takanobu Ishihara , Shunsuke Yoshioka
发明人： Takayuki Yabu , Takanobu Ishihara , Shunsuke Yoshioka
IPC分类号： H01S500
CPC分类号： H01S3/225 , H01S3/036 , H01S3/038
摘要： A gas laser device including a dust filter with which a flow rate of laser gas flowing between discharge electrodes is approximately uniform in a longitudinal direction of the discharge electrodes without a variation with time is provided. For this purpose, the gas laser device includes a laser chamber (2) containing laser gas, a pair of discharge electrodes (5, 5) disposed inside the laser chamber (2) to face to each other for exciting a laser medium by discharge to thereby oscillate laser light, a fan (14) for circulating the laser gas to send the same to an area between the discharge electrodes (5, 5), and a dust filter (12) for eliminating dust generated inside the laser chamber (2), and has a configuration in which a filter inlet port (15), which is formed in an inner wall (2A) of the laser chamber (2) and guides the laser gas into the dust filter (12), is formed to be approximately vertical to the inner wall (2A) of the laser chamber (2).
摘要翻译：本发明提供一种气体激光装置，其特征在于，具备：尘埃滤波器，其在放电电极之间流过的激光气体的流量在放电电极的长度方向上大致均匀，而不随时间变化。为此，气体激光装置包括含有激光气体的激光室（2），设置在激光室（2）的内部的一对放电电极（5,5），以相互面对，通过放电激励激光介质从而振荡激光;用于循环激光气体以将其发送到放电电极（5）之间的区域的风扇（14）和用于消除激光室（2）内部产生的灰尘的防尘过滤器（12）并且具有这样的结构，其中形成在激光室（2）的内壁（2A）中并将激光气体引导到防尘过滤器（12）中的过滤器入口（15）形成为近似垂直于激光室（2）的内壁（2A）。

20. 发明授权

US08343429B2 Target supply unit of extreme ultraviolet light source apparatus and method of manufacturing the same 有权
标题翻译：极紫外光源装置的目标供应单元及其制造方法
公开(公告)号：US08343429B2
公开(公告)日：2013-01-01
申请号：US12581461
申请日：2009-10-19
申请人： Takayuki Yabu , Takanobu Ishihara , Masaki Nakano
发明人： Takayuki Yabu , Takanobu Ishihara , Masaki Nakano
IPC分类号： G21K5/08
CPC分类号： H05G2/003 , H05G2/005 , Y10T29/49826
摘要： In a target supply unit of an extreme ultraviolet light source apparatus for generating extreme ultraviolet light by applying a laser beam to a target material to turn the target material into plasma, clogging of a target nozzle for supplying the target material to a laser beam application point is suppressed. The target supply unit includes: a target container for accommodating the target material; a target nozzle for injecting the target material supplied from the target container; and a reducing gas supply unit for supplying a reducing gas into the target container. Instead of using the reducing gas, a carbon-based material having a reduction action may be provided within the target container for causing reduction reaction.
摘要翻译：在用于通过向目标材料施加激光以将目标材料转化为等离子体来产生极紫外光的目标供应单元中，将用于将目标材料供应的目标喷嘴堵塞到激光束施加点被压制目标供给单元包括：用于容纳目标材料的目标容器; 用于喷射从目标容器供给的目标材料的目标喷嘴; 以及用于向目标容器供给还原气体的还原气体供给单元。代替使用还原气体，可以在目标容器内提供具有还原作用的碳基材料用于引起还原反应。

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