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    • 16. 发明申请
    • Method of forming laminated resist
    • 形成层压抗蚀剂的方法
    • US20070196763A1
    • 2007-08-23
    • US10579855
    • 2004-11-15
    • Takayuki ArakiMeiten KohKazuyuki SatoMihoko OhashiYosuke Kishikawa
    • Takayuki ArakiMeiten KohKazuyuki SatoMihoko OhashiYosuke Kishikawa
    • G03C11/12
    • G03F7/0046C09D133/16G03F7/091
    • There is formed a laminated resist which exhibits sufficient reflection reducing effect in a photolithography process using light of vacuum ultraviolet region and also has sufficient developing characteristics in a developing process. The method of forming the laminated photoresist comprises (I) a step for forming the photoresist layer (L1) on a substrate and (II) a step for forming the antireflection layer (L2) on the photoresist layer (L1) by applying the coating composition containing the fluorine-containing polymer (A) having hydrophilic group Y. The fluorine-containing polymer (A) contains a structural unit derived from a fluorine-containing ethylenic monomer having hydrophilic group Y and is characterized in that (i) the hydrophilic group Y contains an acidic OH group having a pKa value of not more than 11, (ii) a fluorine content is not less than 50% by mass, and (iii) the number of moles of the hydrophilic group Y in 100 g of the fluorine-containing polymer (A) is not less than 0.14.
    • 形成层叠抗蚀剂,其在使用真空紫外线区域的光的光刻工艺中表现出足够的反射降低效果,并且在显影过程中也具有足够的显影特性。 形成层叠光致抗蚀剂的方法包括:(I)在基板上形成光致抗蚀剂层(L1)的工序,(II)在光致抗蚀剂层(L1)上形成抗反射层(L 2)的工序, 含有具有亲水基团Y的含氟聚合物(A)的涂料组合物。含氟聚合物(A)含有由具有亲水性基团Y的含氟乙烯性单体衍生的结构单元,其特征在于,(i) 亲水性基团Y含有pKa值不大于11的酸性OH基,(ii)氟含量不小于50质量%,和(iii)100g的亲水基Y的摩尔数 含氟聚合物(A)不低于0.14。
    • 19. 发明授权
    • Process for preparing fluorine-containing polymer and method of forming fine pattern using same
    • 制备含氟聚合物的方法和使用其形成精细图案的方法
    • US07163982B2
    • 2007-01-16
    • US10914203
    • 2004-08-10
    • Takayuki ArakiTetsuhiro KodaniTakuji Ishikawa
    • Takayuki ArakiTetsuhiro KodaniTakuji Ishikawa
    • C08F8/32
    • C08F12/20G03F7/0046G03F7/0395
    • There is provided a method of forming a fine pattern by using a practicable fluorine-containing polymer which has a high transparency to exposure light having a short wavelength such as F2 laser and can undergo resolution of a fine pattern. The method comprises (I) a step for preparing a fluorine-containing polymer (A) having OH group which has a structural unit derived from a fluorine-containing norbornene derivative having OH group, (II) a step for preparing a fluorine-containing polymer (B) having a protective group by reacting a compound represented by X—CH2OR, wherein X is Cl, Br or I; R is a hydrocarbon group having 1 to 30 carbon atoms in which a part or the whole of hydrogen atoms may be substituted with fluorine atoms, with the above-mentioned fluorine-containing polymer (A) having OH group in the presence of a base, (III) a step for preparing a resist composition comprising (a) the above-mentioned fluorine-containing polymer (B) having a protective group, (b) a photoacid generator and (c) a solvent, (IV) a step for forming a resist film comprising the above-mentioned resist composition on a substrate or on a given layer on the substrate, (V) a step for exposing by selectively irradiating a given area of the resist film with energy rays, and (VI) a step for subjecting the exposed resist film to developing to selectively remove the exposed portion of the resist film, thus forming a fine pattern.
    • 提供了通过使用对具有短波长的曝光光如F 2激光具有高透明度的可行的含氟聚合物来形成精细图案的方法,并且可以经历精细图案的分辨 。 该方法包括:(I)具有OH基的含氟聚合物(A)的制备步骤,其具有衍生自具有OH基的含氟降冰片烯衍生物的结构单元,(II)制备含氟聚合物的步骤 (B)通过使由X-CH 2 OR表示的化合物与其中X为Cl,Br或I的化合物反应而具有保护基; R是具有1至30个碳原子的烃基,其中一部分或全部氢原子可以被氟原子取代,上述含碱基的含氟聚合物(A)具有OH基团, (III)制备抗蚀剂组合物的步骤,包括(a)具有保护基的上述含氟聚合物(B),(b)光致酸产生剂和(c)溶剂,(IV)形成步骤 在基板上或基板上的给定层上包含上述抗蚀剂组合物的抗蚀剂膜,(V)通过用能量射线选择性地照射抗蚀剂膜的给定区域来曝光的步骤,以及(VI) 使曝光的抗蚀剂膜显影以选择性地除去抗蚀剂膜的暴露部分,从而形成精细图案。