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11. 发明申请

US20130278926A1 Measuring Apparatus 有权
标题翻译：测量仪器
公开(公告)号：US20130278926A1
公开(公告)日：2013-10-24
申请号：US13993630
申请日：2011-11-30
申请人： Kazuo Takahashi , Takahiro Jingu
发明人： Kazuo Takahashi , Takahiro Jingu
IPC分类号： G01N21/95
CPC分类号： G01N21/9501 , G01B11/303 , G01N21/94 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Surface states have traditionally been measured with apparatuses such as an atomic force microscope (AFM), and these measurements have been high in resolution but low in speed. In conventional apparatuses for inspecting the foreign matter sticking to a wafer surface, and for inspecting defects present on the wafer surface, the inspection has had a tendency to be restricted in a region of the highest noise level arising from the roughness of the surface, the surface state, and/or crystal orientations, and thereby to reduce detection sensitivity in a region of lower noise levels. In these conventional techniques, signal processing of the light scattered from the object to be inspected has been based only upon the intensity of the light.This invention acquires three-dimensional data by, during such signal processing, adding detection intervals and the frequency of detection, as well as the intensity of light. The invention measures surface roughness of a target object (wafer) by creating region-specific three-dimensional maps from the three-dimensional data, then estimating the surface state of the wafer from analytical results, processing this estimated surface state as physical quantities, and analyzing the data.
摘要翻译：传统上用诸如原子力显微镜（AFM）的装置测量表面状态，并且这些测量结果分辨率高，而且速度低。在用于检查粘附于晶片表面的异物和用于检查存在于晶片表面上的缺陷的常规设备中，检查具有在表面粗糙度产生的最高噪声水平的区域中被限制的倾向，表面状态和/或晶体取向，从而降低噪声水平较低的区域的检测灵敏度。在这些常规技术中，从被检查物体散射的光的信号处理仅基于光的强度。本发明在这种信号处理期间通过增加检测间隔和检测频率以及光的强度来获取三维数据。本发明通过从三维数据中创建区域特定的三维图来测量目标物体（晶片）的表面粗糙度，然后从分析结果估计晶片的表面状态，将该估计的表面状态处理为物理量，以及分析数据。

12. 发明申请

US20110299088A1 EXAMINATION METHOD AND EXAMINATION DEVICE 有权
标题翻译：检查方法和检查装置
公开(公告)号：US20110299088A1
公开(公告)日：2011-12-08
申请号：US13202708
申请日：2009-11-19
申请人： Takahiro Jingu , Kazuo Takahashi
发明人： Takahiro Jingu , Kazuo Takahashi
IPC分类号： G01N21/55
CPC分类号： G01N21/94 , G01N21/47 , G01N21/9501 , G01N21/956 , G01N2021/4711
摘要： A change in surface state can be dealt with by setting threshold values different for respective regions of an object to be examined in accordance with a magnitude of noises, thereby improving a detection sensitivity.A function for setting an examination threshold value every region is installed. A function for setting examination threshold values every plurality of detectors spatially independent of each other is installed. The magnitude of noises from the object to be examined differs depending on a spatial direction even in the same region. Therefore, the detection sensitivity is maximized by maximizing an S/N ratio of a detection signal by an optimum signal arithmetic operating process according to the magnitude of noises from the object to be examined every detector and every region of the object to be examined and by setting the optimum threshold values.
摘要翻译：表面状态的变化可以通过根据噪声的大小设定对待检测对象的各个区域不同的阈值来处理，从而提高检测灵敏度。安装每个区域设定检查阈值的功能。设置在空间上彼此独立的每个多个检测器设置检查阈值的功能。来自被检查物体的噪声的大小根据空间方向即使在相同的区域也不同。因此，通过根据每个检测器和待检查对象的每个区域将要检查的对象的噪声的大小，通过最佳信号运算处理使检测信号的S / N比最大化，使检测灵敏度最大化，设置最佳阈值。

13. 发明申请

US20100225907A1 SURFACE INSPECTION WITH VARIABLE DIGITAL FILTERING 审中-公开
标题翻译：具有可变数字滤波的表面检测
公开(公告)号：US20100225907A1
公开(公告)日：2010-09-09
申请号：US12783318
申请日：2010-05-19
申请人： Kazuo Takahashi , Takahiro Jingu
发明人： Kazuo Takahashi , Takahiro Jingu
IPC分类号： G01N21/17
CPC分类号： G01N21/956 , G01N21/8851
摘要： A semiconductor wafer, which is an inspection object, is stuck by vacuum on a chuck and this chuck is mounted on an inspection object movement stage consisting of a rotational stage and a translational stage, located on a Z-stage. The rotational stage provides a rotational movement and the translational stage provides a translational movement. And when a foreign particle or a defect on an inspection object surface is detected, the parameter of digital filtering is dynamically changed during inspection, and the foreign particle or the defect is differentiated using the result after removing a low frequency fluctuation component to be a noise component.
摘要翻译：作为检查对象的半导体晶片通过真空卡在卡盘上，该卡盘安装在由位于Z平台上的旋转台和平移台构成的检查对象移动台上。旋转台提供旋转运动，平移台提供平移运动。并且当检测到异物或检查物体表面的缺陷时，在检查期间动态地改变数字滤波的参数，并且在将低频波动分量除去为噪声之后，使用结果将异物或缺陷区分开来零件。

14. 发明申请

US20080027665A1 Surface inspection apparatus and surface inspection method 有权
标题翻译：表面检查装置和表面检查方法
公开(公告)号：US20080027665A1
公开(公告)日：2008-01-31
申请号：US11878197
申请日：2007-07-23
申请人： Kazuo Takahashi , Takahiro Jingu
发明人： Kazuo Takahashi , Takahiro Jingu
IPC分类号： G06F19/00
CPC分类号： G01N21/956 , G01N21/8851
摘要： A semiconductor wafer, which is an inspection object, is stuck by vacuum on a chuck and this chuck is mounted on an inspection object movement stage consisting of a rotational stage and a translational stage, located on a Z-stage. The rotational stage provides a rotational movement and the translational stage provides a translational movement. And when a foreign particle or a defect on an inspection object surface is detected, the parameter of digital filtering is dynamically changed during inspection, and the foreign particle or the defect is differentiated using the result after removing a low frequency fluctuation component to be a noise component.
摘要翻译：作为检查对象的半导体晶片通过真空卡在卡盘上，该卡盘安装在由位于Z平台上的旋转台和平移台构成的检查对象移动台上。旋转台提供旋转运动，平移台提供平移运动。并且当检测到异物或检查物体表面的缺陷时，在检查期间动态地改变数字滤波的参数，并且在将低频波动分量除去为噪声之后，使用结果将异物或缺陷区分开来零件。

15. 发明授权

US08884207B2 Photoelectric conversion element, defect inspecting apparatus, and defect inspecting method 有权
标题翻译：光电转换元件，缺陷检查装置和缺陷检查方法
公开(公告)号：US08884207B2
公开(公告)日：2014-11-11
申请号：US13821246
申请日：2011-07-26
申请人： Hiroshi Kawaguchi , Takahiro Jingu
发明人： Hiroshi Kawaguchi , Takahiro Jingu
IPC分类号： H01L27/00 , H04N3/14 , H04N5/347 , H04N5/372 , H01L27/146 , G01N21/95 , G01N21/88
CPC分类号： H01L27/14601 , G01N21/8806 , G01N21/9501 , H04N5/347 , H04N5/37206 , H04N5/37213
摘要： Provided are a photoelectric conversion element, wherein the processing speed can be increased and resolution can be changed without increasing cost, and a defect inspecting apparatus and a defect inspecting method using the photoelectric conversion element. A photoelectric conversion element having a plurality of sensor pixels has a multiplexer and a plurality of horizontal transfer registers. Sensor pixels are divided into a plurality of blocks such that the sensor pixels correspond to each of the horizontal transfer registers. The photoelectric conversion element is configured such that charges of the blocks are read by means of the multiplexer via respective corresponding horizontal transfer registers, and are outputted via the multiplexer.
摘要翻译：提供一种光电转换元件，其中可以提高处理速度并且可以在不增加成本的情况下改变分辨率，以及使用光电转换元件的缺陷检查装置和缺陷检查方法。具有多个传感器像素的光电转换元件具有多路复用器和多个水平传送寄存器。传感器像素被分成多个块，使得传感器像素对应于每个水平传送寄存器。光电转换元件被配置为使得通过多路复用器经由相应的水平传送寄存器读取块的电荷，并且经由多路复用器输出。

16. 发明申请

US20140198321A1 SURFACE SHAPE MEASURING APPARATUS 有权
标题翻译：表面形状测量装置
公开(公告)号：US20140198321A1
公开(公告)日：2014-07-17
申请号：US14240669
申请日：2012-07-27
申请人： Masaaki Ito , Takahiro Jingu , Hisashi Hatano
发明人： Masaaki Ito , Takahiro Jingu , Hisashi Hatano
IPC分类号： G01B11/24 , G01N21/55
CPC分类号： G01B11/303 , G01B11/24 , G01B2210/56 , G01N21/4738 , G01N21/55 , G01N21/9501 , G01N2201/12
摘要： In related art, consideration is not given to that a spatial distribution of scattered light changes in various direction such as forward/backward/sideways according to a difference in micro roughness. Particularly, although a step-terrace structure appearing on an epitaxial growth wafer produces anisotropy in the scattered light distribution, consideration is not given to this point in the related art. The invention includes a process in which light is illuminated to a sample surface, plural detection optical systems mutually different in directions of optical axes detect a spatial distribution of scattered light, and a spatial frequency spectrum of the sample surface is calculated.
摘要翻译：在现有技术中，不考虑散射光的空间分布根据微粗糙度的差异而在各种方向如前后/侧面变化。特别地，虽然出现在外延生长晶片上的台阶平台结构在散射光分布中产生各向异性，但是在现有技术中没有考虑到这一点。本发明包括将光照射到样品表面的方法，在光轴方向上彼此不同的多个检测光学系统检测散射光的空间分布，并且计算样品表面的空间频谱。

17. 发明申请

US20130286387A1 DEFECT INSPECTION METHOD AND DEFECT INSPECTION DEVICE 有权
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US20130286387A1
公开(公告)日：2013-10-31
申请号：US13996613
申请日：2011-11-25
申请人： Masami Makuuchi , Takahiro Jingu
发明人： Masami Makuuchi , Takahiro Jingu
IPC分类号： G01N21/95
CPC分类号： G01N21/9501
摘要： When the intensity of scattering light from a defect on a sample becomes very low according to the diameter of the defect, the dark noise from a sensor device itself accounts which a large proportion of the detected signal outputted from the sensor and thus it is difficult to detect minute defects. Furthermore, since a laser light source is pulsed into oscillation, pulse components from the laser light source are superimposed on the detected signal outputted from the sensor, and therefore it is difficult to detect defects with high accuracy. The present invention is a defect inspection device having irradiation means which producing pulsed operation and irradiating a surface of a sample with a laser beam, detection means which detecting scattering light generated at the surface of the sample in response to the irradiation provided by the irradiation means, and a processing portion which generating a delay signal based on the laser beam emitted by the irradiation means and processing the scattering light detected by the detection means using the delay signal.
摘要翻译：当来自样品的缺陷的散射光的强度根据缺陷的直径变得非常低时，来自传感器装置本身的暗噪声考虑到从传感器输出的检测信号的大部分，因此难以检测微小缺陷。此外，由于激光光源被脉冲振荡，所以来自激光光源的脉冲成分叠加在从传感器输出的检测信号上，因此难以高精度地检测出缺陷。本发明是一种具有产生脉冲操作并用激光束照射样品表面的照射装置的检测装置，检测装置响应于由照射装置提供的照射而检测在样品表面产生的散射光以及处理部，其基于由照射装置发射的激光束产生延迟信号，并使用延迟信号处理由检测装置检测到的散射光。

18. 发明申请

US20130286191A1 INSPECTION APPARATUS 有权
标题翻译：检查装置
公开(公告)号：US20130286191A1
公开(公告)日：2013-10-31
申请号：US13997496
申请日：2011-11-02
申请人： Masaaki Ito , Hidetoshi Nishimura , Takahiro Jingu
发明人： Masaaki Ito , Hidetoshi Nishimura , Takahiro Jingu
IPC分类号： H04N7/18
CPC分类号： H04N7/18 , G01N21/47 , G01N21/9501 , G01N21/956 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： In a defect inspecting apparatus, the strength of a fatal defect signal decreases due to miniaturization. Thus, in order to assure a high SN ratio, it is necessary to reduce noises caused by scattered light from a wafer. Roughness of a pattern edge and surface roughness which serve as a scattered-light source are spread over the entire wafer. The present invention has discovered the fact that reduction of an illuminated area is a technique effective for decreasing noises. That is to say, the present invention has discovered the fact that creation of an illuminated area having a spot shape and reduction of the dimension of a spot beam are effective. A plurality of temporally and spatially divided spot beams are radiated to the wafer serving as a sample.
摘要翻译：在缺陷检查装置中，致命缺陷信号的强度由于小型化而降低。因此，为了确保高的SN比，需要减少由晶片散射的光产生的噪声。用作散射光源的图案边缘和表面粗糙度的粗糙度分布在整个晶片上。本发明已经发现，减少照明区域是有效降低噪声的技术。也就是说，本发明已经发现了具有斑点形状的照明区域的创建和点光束的尺寸的减小的事实是有效的。将多个时间上和空间上分开的光束照射到作为样品的晶片。

19. 发明申请

US20130010281A1 INSPECTION METHOD AND INSPECTION DEVICE 审中-公开
公开(公告)号：US20130010281A1
公开(公告)日：2013-01-10
申请号：US13621121
申请日：2012-09-15
申请人： Izuo Horai , Hirokazu Koyabu , Yuta Urano , Takahiro Jingu
发明人： Izuo Horai , Hirokazu Koyabu , Yuta Urano , Takahiro Jingu
IPC分类号： G01N21/956
CPC分类号： G01N21/9501 , G01N21/65 , G01N21/9505 , G01N2021/4711 , G01N2021/473 , G01N2021/8861 , G01N2021/8864
摘要： An inspection method and an inspection device, or apparatus each capable of conducting composition analysis of a defect detected by elastic or stokes scattered light, an inspection surface or defect on the surface of the inspection surface, or a defect on the surface of the inspection object and its internal composition. A surface inspection method for optically detecting elastic or stokes scattering or inelastic or anti-stokes scattered light from inside the surface of the inspection object, for detecting existence of defects of the inspection object and features of the defects, for detecting positions of the detected defects on the surface of the inspection object, classifying and analyzing the detected defects in accordance with their features on the basis of the positions of the defects and the features of the defects or the classification result of the defects.

20. 发明申请

US20120262709A1 DEFECTS INSPECTING APPARATUS AND DEFECTS INSPECTING METHOD 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US20120262709A1
公开(公告)日：2012-10-18
申请号：US13529363
申请日：2012-06-21
申请人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
发明人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
IPC分类号： G01N21/88
CPC分类号： G01N21/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148
摘要： An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.
摘要翻译：一种检查装置和方法，包括：第一和第二照明单元，用于以不同的入射角照射待检查样本的表面;以及第一和第二检测光学单元，其以不同的仰角方向布置在样本的表面上，用于检测样本的图像由第一和第二照明单元照亮。

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