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    • 12. 发明授权
    • Optical disk recording apparatus capable of reducing cross-talk between
pre-pits and adjacent tracks
    • 能够减少预凹坑和相邻轨道之间的串扰的光盘记录装置
    • US5777980A
    • 1998-07-07
    • US651272
    • 1996-05-23
    • Tadashi Adachi
    • Tadashi Adachi
    • G11B7/00G11B7/0045G11B7/007G11B7/126G11B7/26G11B7/24G11B9/00
    • G11B7/126G11B7/261G11B7/00456G11B7/00745
    • An apparatus for optical master disk exposure for exposing guide grooves and pre-pits with laser beams has a reference signal generator which generates a reference signal for being supplied to a groove reference voltage generator that generates a groove reference voltage according to the reference signal. A pre-pit designation signal generator generates a pre-pit designation signal designating formation of the pre-pits. A pre-pit region voltage generator generates a pre-pit region voltage with a power of level of 70 to 75% of the groove reference voltage according to the pre-pit designation signal. A bias voltage generator generates a bias voltage with a power level of 80 to 90 of the groove reference voltage when no pre-pit is formed according to the pre-pit designation signal. A guide groove exposure voltage supplier adds together the groove reference voltage, the pre-pit region voltage and the bias voltage and outputs a guide groove exposure voltage to a laser beam modulating means which modulates the laser beams according to the guide groove exposure voltage received from the guide groove exposure voltage supplier. The guide grooves are uniformly formed thereby enabling the reduction of cross-talk.
    • 用于用激光束引导引导槽和预凹坑的光学主盘曝光装置具有参考信号发生器,该参考信号发生器产生参考信号,以供应给根据参考信号产生沟槽参考电压的沟槽参考​​电压发生器。 预凹坑指定信号发生器产生指定预凹坑形成的预凹坑指定信号。 预凹坑区域电压发生器根据预凹坑指定信号产生具有沟槽参考电压的70%至75%的电平的预凹坑区域电压。 当根据预凹坑指定信号不形成预制凹坑时,偏置电压发生器产生功率电平为沟槽参考电压的80至90的偏置电压。 引导槽曝光电压供给器将沟槽基准电压,预制凹坑区域电压和偏置电压相加在一起,并将导向槽暴露电压输出到激光束调制装置,该激光束调制装置根据从 导槽曝光电压供应商。 引导槽均匀地形成,从而能够减少串扰。
    • 13. 发明申请
    • SPACE PROBING APPARATUS
    • 空间探测器
    • US20110260007A1
    • 2011-10-27
    • US13125590
    • 2009-09-11
    • Tadashi Adachi
    • Tadashi Adachi
    • B64G1/58B64G1/44H01Q1/28B64G1/16
    • B64G1/16B64G1/50
    • A space probing apparatus is provided that can further enhance its thermal protective function for electronic apparatuses and batteries that are apparatuses each having a narrow range of permissible temperature.The space probing apparatus includes, as a vehicle body 1 that is an apparatus body, an inner housing 13 that accommodates an electronic apparatus 11 and a battery 12, and an outer housing 15 that accommodates the inner housing 13 supporting the inner housing 13 afloat therein. A thermal insulating layer 16 is formed between the inner housing 13 and the outer housing 15 using a space therebetween. A heat dissipating body 17 is included in an upper portion of the inner housing 13. A lid 18 is included in an upper portion of the outer housing 15. The whole outer faces of the inner and the outer housings 13 and 15 are each covered with a thermal insulating material 20. Thereby, in the nighttime, the temperature of the battery 12 is maintained using the least necessary amount of heat generated and, thereby, the electronic apparatus 11 and the battery 12 are protected from an ultralow temperature. In the daytime, the lid 18 is opened and heat is discharged using the heat dissipating body 17 and, thereby, the electronic apparatus 11 and the battery 12 are protected from a high temperature.
    • 提供一种空间探测装置,其可以进一步增强其作为各自具有窄允许温度范围的装置的电子设备和电池的热保护功能。 空间探测装置包括作为装置主体的车身1,容纳电子设备11和电池12的内壳体13和容纳内壳体13的外壳体15,内壳体13支撑内壳体13浮动在其中 。 使用它们之间的空间,在内壳体13和外壳体15之间形成隔热层16。 散热体17包括在内壳13的上部。盖18包括在外壳15的上部。内外壳13和15的整个外表面各自被覆盖 绝热材料20.因此,在夜间,使用所产生的最少量的热量来保持电池12的温度,由此保护电子设备11和电池12免受超低温度的影响。 白天,打开盖子18,使用散热体17排出热量,从而保护电子设备11和电池12免受高温的影响。
    • 19. 发明申请
    • Wafer polishing apparatus, wafer polishing system and wafer polishing method
    • 晶圆抛光装置,晶片抛光系统和晶片抛光方法
    • US20080274673A1
    • 2008-11-06
    • US12079155
    • 2008-03-25
    • Tadashi Adachi
    • Tadashi Adachi
    • B24B1/00B24B7/04B24B7/06
    • B24B37/345
    • It is possible to execute a one-step polishing or a plural-step polishing at a high throughput, and it is possible to achieve a reduction of an occupied area on the basis of a compact structure of a whole apparatus. Two platens are respectively provided with a first wafer retention head and a second wafer retention head, and a wafer transfer apparatus on which a wafer is mounted is arranged between two platens. The two wafer retention heads are moved between two platens and the wafer transfer apparatus respectively by a first moving means and a second moving means. Further, a two-step polishing is executed by whirl moving two wafer retention heads from one platen to the other platen at 180 degree respectively by a whirl moving means supporting two moving means.
    • 可以以高产量执行一步抛光或多步抛光,并且可以基于整个装置的紧凑结构实现占用面积的减小。 两个压板分别设置有第一晶片保持头和第二晶片保持头,并且其上安装有晶片的晶片转移装置布置在两个压板之间。 两个晶片保持头分别通过第一移动装置和第二移动装置在两个压板和晶片传送装置之间移动。 此外,通过将支撑两个移动装置的旋转移动装置分别将两个晶片保持头从一个压板移动到180度的另一个压板来进行两步抛光。
    • 20. 发明授权
    • Motor and method of manufacturing the same
    • 电动机和制造方法相同
    • US07279817B2
    • 2007-10-09
    • US10542165
    • 2004-03-11
    • Tadashi AdachiYouichi Matsuyama
    • Tadashi AdachiYouichi Matsuyama
    • H02K5/22H02K7/10H02K11/00H02K23/00
    • H02K5/225H02K7/1166H02K11/38
    • A connector housing 45 is formed separately from a gear housing 20 and a closing and fixing member 21. The connector housing 45 includes a retainer 49, which supports an external connector 48 relative to the closing and fixing member 21, and an elastically deformable grommet 50. A retainer-side end of the grommet 50 is interposed between a flange portion of the retainer 49 and an outer surface of the closing and fixing member 21, and the connector housing 45 is secured to a connector installation opening 43. With this construction, it is possible to achieve a high degree of design freedom and to provide a motor having a drip-proof structure of a relatively simple configuration.
    • 连接器壳体45与齿轮壳体20和闭合固定构件21分开形成。 连接器壳体45包括保持器49,该保持器49相对于闭合和固定构件21支撑外部连接器48,以及可弹性变形的索环50。 护环50的保持器侧端部插入在保持器49的凸缘部分和闭合固定构件21的外表面之间,并且连接器壳体45固定到连接器安装开口43。 利用这种结构,可以实现高度的设计自由度,并且提供具有相对简单构造的防滴结构的电动机。