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    • 12. 发明申请
    • Method of fabricating non-volatile memory device
    • 制造非易失性存储器件的方法
    • US20050142725A1
    • 2005-06-30
    • US11019301
    • 2004-12-23
    • Sung JungJum Kim
    • Sung JungJum Kim
    • H01L21/762H01L21/8247H01L27/115H01L21/8238H01L27/108H01L29/76H01L29/94H01L31/119
    • H01L27/11521H01L21/76224H01L27/115
    • The present invention provides a method of fabricating a non-volatile memory device, in which trench isolation can be achieved using an insulating layer that needs no separate removal process. The present invention includes sequentially forming a first insulating layer, a first conductor layer, and a second insulating layer on a semiconductor substrate, patterning the second insulating layer, the first conductor layer, and the first insulating layer to expose a prescribed portion of the semiconductor substrate, forming a trench having a prescribed depth in the semiconductor substrate by removing the exposed portion of the semiconductor substrate, forming a third insulating layer on the second insulating layer including the trench, planarizing the third insulating layer to remove the second insulating layer until the first conductor layer is exposed, forming a fourth insulating layer on the exposed first conductor layer and the remaining third insulating layer, and forming a second conductor layer on the fourth insulating layer.
    • 本发明提供一种制造非易失性存储器件的方法,其中可以使用不需要单独去除工艺的绝缘层来实现沟槽隔离。 本发明包括在半导体衬底上依次形成第一绝缘层,第一导体层和第二绝缘层,图案化第二绝缘层,第一导体层和第一绝缘层以暴露半导体的规定部分 衬底,通过去除半导体衬底的暴露部分在半导体衬底中形成具有规定深度的沟槽,在包括沟槽的第二绝缘层上形成第三绝缘层,平坦化第三绝缘层以移除第二绝缘层,直到 暴露第一导体层,在暴露的第一导体层和剩余的第三绝缘层上形成第四绝缘层,并在第四绝缘层上形成第二导体层。
    • 14. 发明申请
    • Method for fabricating a semiconductor device
    • 半导体器件的制造方法
    • US20050074940A1
    • 2005-04-07
    • US10954484
    • 2004-10-01
    • Sung JungDong Kim
    • Sung JungDong Kim
    • H01L21/76H01L21/265H01L21/336H01L21/8247
    • H01L27/11521H01L21/26586
    • A method for fabricating the semiconductor device includes forming linear field oxide regions on a semiconductor substrate; forming gate oxide lines on the semiconductor substrate between the field oxide regions; forming gate lines on the field oxide regions and the gate oxide lines, the gate lines being substantially perpendicular to the field oxide regions; etching the gate oxide lines and the field oxide regions between the gate lines; and forming a self-aligned source (SAS) region by injecting impurity ions into the etched regions, the impurity ion being injected in a direction at a predetermined angle other than 90° relative to the semiconductor substrate.
    • 一种制造半导体器件的方法包括在半导体衬底上形成线性场氧化物区域; 在所述场氧化物区域之间的所述半导体衬底上形成栅极氧化物线; 在场氧化物区域和栅极氧化物线上形成栅极线,栅极线基本上垂直于场氧化物区域; 蚀刻栅极线之间的栅极氧化物线和场氧化物区域; 以及通过将杂质离子注入蚀刻区域而形成自对准源(SAS)区域,杂质离子以相对于半导体衬底的90°以外的预定角度的方向注入。
    • 18. 发明申请
    • Apparatus for aligning a tray and tray holder
    • 用于对准托盘和托架支架的装置
    • US20060196802A1
    • 2006-09-07
    • US11324609
    • 2006-01-04
    • Sung JungSang HanEu Kang
    • Sung JungSang HanEu Kang
    • B65D1/34B65D85/00
    • C23C14/042
    • An apparatus for aligning a tray and tray holder, including a vertically positioned tray formed with coupling holes and a tray holder having coupling arms to couple with the coupling holes, and to prevent the bending of the tray and the tray holder. The tray includes a substrate frame that can receive a substrate, and the tray holder is coupled with a drive shaft for transferring the tray in the vertical position to a mask for vapor deposition. One end of a plurality of guide shafts securely contacts the rear side of the tray holder to prevent bending of the tray holder. The tray can have magnetic attaching members and the tray holder can have supporting members corresponding to the attaching members. The supporting members can magnetically couple with the attaching members in a position determined by corresponding grooves or protrusions to align the tray and tray holder.
    • 用于对准托盘和托盘保持器的装置,包括形成有联接孔的垂直定位的托盘和具有联接臂以与联接孔联接的托盘保持器,并且防止托盘和托盘托架的弯曲。 托盘包括可接收基底的基底框架,并且托盘保持器与用于将托盘在垂直位置转移到用于气相沉积的掩模的驱动轴联接。 多个引导轴的一端牢固地接触托盘保持器的后侧,以防止托架保持器的弯曲。 托盘可以具有磁性附接构件,并且托盘保持器可以具有对应于附接构件的支撑构件。 支撑构件可以通过相应的凹槽或突出部分确定的位置与附接构件磁耦合,以对准托盘和托盘支架。
    • 19. 发明申请
    • Apparatus for transferring a tray
    • 用于传送托盘的装置
    • US20060147298A1
    • 2006-07-06
    • US11325465
    • 2006-01-05
    • Sung JungMin Hwang
    • Sung JungMin Hwang
    • B65G1/133
    • H01L21/67751B65G1/133
    • An apparatus for transferring an upright tray at high speeds that can sense an entrance and discharge of the tray. The apparatus includes a transferring unit with pulleys driven by a driving source to form a transferring path. The pulleys contact a fixing member, which is attached to a lower edge of a substrate and mask fixed to the tray. The apparatus also includes a sensing unit with a sensor installed beneath the transferring path to detect the entrance and discharge of the tray. The apparatus may also include rollers disposed to contact both sides of the upper portion of the tray, and the rollers may be coupled with moveable members encased within rails along the transferring path so that the rollers can translate when a tray passes between two rollers. The rollers along both sides of the tray can be arranged symmetrically or alternately in a zigzag pattern.
    • 一种用于高速传送直立托盘的装置,其可感测托盘的进入和排出。 该装置包括一转印单元,该转印单元具有由驱动源驱动的带轮,以形成转印路径。 滑轮接触固定构件,固定构件附接到基板的下边缘并且掩模固定到托盘。 该装置还包括感测单元,其具有安装在传送路径下方的传感器,以检测托盘的进入和排出。 该设备还可以包括设置成接触托盘上部两侧的滚子,并且滚子可与沿着传送路径包围在轨道内的可移动部件联接,使得当托盘通过两个滚筒之间时,辊可以平移。 沿托盘两侧的辊可以以锯齿形图案对称地或交替地布置。