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    • 11. 发明授权
    • Biological photometric equipment
    • 生物测光设备
    • US07991447B2
    • 2011-08-02
    • US10577944
    • 2004-07-01
    • Hiroki SatoMasashi KiguchiAtsushi MakiTsuyoshi Yamamoto
    • Hiroki SatoMasashi KiguchiAtsushi MakiTsuyoshi Yamamoto
    • A61B5/1455
    • A61B5/14553
    • To control information obtained from inside of a living body with higher precision as compared to that in the conventional technology by controlling a ratio of intensities of light, directed to a trial body, in a plurality of wavelength ranges different in peak wavelength from each other, a measurement error included in information obtained from the living body can be controlled by changing a ratio of intensity of the light in the first wavelength range against that of the light in the second wavelength range. When intensity of irradiated light is limited from the viewpoint of safety to the trial subject, keeping a ratio of the light irradiated to the trial body in the first wavelength range against that of the light in the second wavelength range under a prespecified value and also changing the ratio of irradiated light intensities under the prespecified value.
    • 通过在峰值波长不同的多个波长范围内控制指向试验体的光的强度比,通过控制比现有技术更高的精度从内部获得的生物体的信息, 可以通过改变第一波长范围内的光的强度与第二波长范围内的光的强度的比例来控制从生物体获得的信息中包括的测量误差。 当照射光的强度从安全性的角度受限于试验对象时,将照射在试验体上的光的第1波长范围内的光与第2波长范围内的光的比例保持在规定值以下, 照射光强度的比例在预先指定的值之下。
    • 15. 发明授权
    • Silicon carbide semiconductor device
    • 碳化硅半导体器件
    • US07732821B2
    • 2010-06-08
    • US12073837
    • 2008-03-11
    • Naohiro SuzukiTsuyoshi YamamotoToshiyuki Morishita
    • Naohiro SuzukiTsuyoshi YamamotoToshiyuki Morishita
    • H01L29/72
    • H01L29/66068H01L21/0465H01L29/0615H01L29/063H01L29/0638H01L29/1608H01L29/45H01L29/7828
    • The SiC semiconductor device includes a substrate of a first conduction type made of silicon carbide, a drift layer of the first conduction type made of silicon carbide, the drift layer being less doped than the substrate, a cell portion constituted by a part of the substrate and a part of the drift layer, a circumferential portion constituted by another part of the substrate and another part of the drift layer, the circumferential portion being formed so as to surround the cell portion, and a RESURF layer of a second conduction type formed in a surface portion of the drift layer so as to be located in the circumferential portion. The RESURF layer is constituted by first and second RESURF layers having different impurity concentrations, the second RESURF layer being in contact with an outer circumference of the first RESURF layer and extending to a circumference of the cell portion.
    • SiC半导体器件包括由碳化硅制成的第一导电类型的衬底,由碳化硅制成的第一导电类型的漂移层,漂移层比衬底掺杂少,由衬底的一部分构成的单元部分 以及漂移层的一部分,由基板的另一部分和漂移层的另一部分构成的圆周部分,周向部分形成为围绕电池部分,以及形成在第二导电类型的RESURF层 漂移层的表面部分,以便位于圆周部分中。 RESURF层由具有不同杂质浓度的第一和第二RESURF层构成,第二RESURF层与第一RESURF层的外周接触并延伸到电池单元的周围。