会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 19. 发明授权
    • Method for preparing anisotropic silica aggregates
    • 制备各向异性二氧化硅聚集体的方法
    • US07884153B2
    • 2011-02-08
    • US10563792
    • 2004-07-07
    • Lionel VentelonJulien HernandezFrançoise LafumaChristophe ChassenieuxChristelle Perreur
    • Lionel VentelonJulien HernandezFrançoise LafumaChristophe ChassenieuxChristelle Perreur
    • C08K3/36C01B33/18
    • B82Y30/00C01B33/12C01B33/16C01P2004/32C01P2004/50C01P2004/64C01P2006/12C09C1/3036C09C1/3072C09K3/1409
    • The invention concerns a method for preparing anisotropic silica aggregates comprising the following steps: a) contacting at least one polymer with non-aggregated silica particles and/or highly dispersed in an aqueous medium, with a ratio R, polymer weight to silica particle surface, ranging between 0.03 and 2 mg/m; 2; and whereof the electrostatic value of the silica particle surface is not less than the value of the charge of the silica particle surface measured in an aqueous phase without added salts at a pH not less than 7; b) consolidating the aggregates obtained at step a) either by heat treatment, or by precipitation of a mineral compound. The invention also concerns a silica aggregate comprising a chaining of elementary particles whereof the number of particles ranges between 5 and 15, whereof 80% of elementary particles are in contact with not more than 2 particles and whereof the greatest distance measurable between 2 points of the aggregate is not more than 5 times the average size of one elementary particle.
    • 本发明涉及一种制备各向异性二氧化硅聚集体的方法,包括以下步骤:a)使至少一种聚合物与非聚集的二氧化硅颗粒接触和/或高度分散在水性介质中,R与聚合物重量与二氧化硅颗粒表面的比率, 范围在0.03至2mg / m; 2; 并且二氧化硅颗粒表面的静电值不小于在不低于7的pH下在没有添加盐的情况下在水相中测量的二氧化硅颗粒表面的电荷的值; b)通过热处理或通过沉淀矿物化合物来固化在步骤a)获得的聚集体。 本发明还涉及一种二氧化硅聚集体,其包含基本粒子的连接,其中粒子数目在5至15之间,其中80%的基本粒子与不超过2个粒子接触,并且其中2个点之间的最大距离可以测量 聚集体不超过一个基本粒子的平均尺寸的5倍。