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    • 16. 发明授权
    • Processes for producing hafnium complexes
    • 生产铪配合物的方法
    • US07518008B2
    • 2009-04-14
    • US12142223
    • 2008-06-19
    • Shuhei YamadaAtsushi Ryokawa
    • Shuhei YamadaAtsushi Ryokawa
    • C07F7/00C07C49/92
    • C07C49/92C07C29/70C07C41/18C07C45/77C07C31/28C07C43/04
    • Disclosed are first to sixth processes for respectively producing hafnium tetra-tertiary-butoxide, tetrakis(acetylacetonato)hafnium, tetrakis(1-methoxy-2-methyl-2-propanolato)hafnium, hafnium tetra-tertiary-amyloxide, tetrakis(3-methyl-3-pentoxy)hafnium, and tetrakis(hexafluoroacetylacetonato)hafnium. The first process includes the steps of (a) adding a compound A(OyXOnRf)m (e.g., CF3SO3H) to a crude hafnium amide Hf[N(R1)(R2)]4; (b) subjecting a product of the step (a) to a distillation under reduced pressure; (c) adding a lithium alkylamide Li(NR3R4) to a fraction obtained by the step (b); (d) subjecting a product of the step (c) to a distillation under reduced pressure; (e) adding tertiary butanol to a fraction obtained by the step (d); and (f) subjecting a product of the step (e) to a distillation under reduced pressure. The tertiary butanol of the step (e) is replaced with acetylacetone, 1-methoxy-2-methyl-2-propanol, tertiary amyl alcohol, 3-methyl-3-pentanol, and hexafluoroacetylacetone in the second to six processes, respectively.
    • 公开了分别生产四 - 叔丁醇铪,四(乙酰丙酮)铪,四(1-甲氧基-2-甲基-2-丙醇)铪,四 - 叔 - 淀粉铪,四(3-甲基) -3-戊氧基)铪和四(六氟乙酰丙酮)铪。 第一种方法包括以下步骤:(a)向粗铪酰胺Hf [N(R1)(R2)] 4中加入化合物A(OyXOnRf)m(例如CF 3 SO 3 H) (b)将步骤(a)的产物在减压下进行蒸馏; (c)将烷基酰胺锂(NR 3 R 4)加入到通过步骤(b)获得的级分中; (d)将步骤(c)的产物在减压下进行蒸馏; (e)向步骤(d)获得的馏分中加入叔丁醇; 和(f)将步骤(e)的产物在减压下进行蒸馏。 步骤(e)的叔丁醇分别在第二至六个方法中被乙酰丙酮,1-甲氧基-2-甲基-2-丙醇,叔戊醇,3-甲基-3-戊醇和六氟乙酰丙酮代替。
    • 17. 发明申请
    • Process for producing high-purity hafnium amide
    • 生产高纯度铪酰胺的方法
    • US20070197809A1
    • 2007-08-23
    • US11705524
    • 2007-02-13
    • Atsushi RyokawaShuhei Yamada
    • Atsushi RyokawaShuhei Yamada
    • C07F7/28
    • C07C209/84C07C211/65
    • A process for producing a high-purity hafnium amide includes the steps of (a) adding a compound which contains a carbonyl group or sulfonyl group and is represented by the formula of A(OyXOnRf)m (e.g., CF3SO3H, Hf(CF3SO3)4, (CF3SO2)2O, CF3CO2H, CH3SO3H, C6H5SO3H, and (CH3SO2)2O), to a crude hafnium amide which is represented by the formula of Hf[N(R1)(R2)]4, where each of R1 and R2 independently represents a methyl group or ethyl group, and which contains a zirconium component as an impurity; and (b) subjecting a product of the step (a) to a distillation under reduced pressure, thereby removing the zirconium component from the crude hafnium amide.
    • 一种制备高纯度铪酰胺的方法包括以下步骤:(a)加入含有羰基或磺酰基的化合物,并由下式表示:A(O)y X (例如,CF 3 SO 3 H,Hf(CF 3)3) 4(3)3(3)3)3,3(3)SO 2 2 O,CF 3 CO 2 H,CH 3 SO 3 H,C 3 H 3, 6 H 5 SO 3 H,和(CH 3 SO 2)2 对于由Hf [N(R 1')(R 2')] 4表示的粗制铪酰胺, / SUB>,其中R 1和R 2各自独立地表示甲基或乙基,并且其含有作为杂质的锆组分; 和(b)将步骤(a)的产物在减压下进行蒸馏,从而从粗铪酰胺中除去锆组分。
    • 18. 发明授权
    • Polishing composition
    • 抛光组成
    • US07204865B2
    • 2007-04-17
    • US10934670
    • 2004-09-03
    • Shuhei Yamada
    • Shuhei Yamada
    • C09G1/02C09G1/04B24B37/00H01L21/311
    • C09G1/02H01L21/30625
    • The present invention relates to a polishing composition that can be preferably used to polish a silicon wafer. The polishing composition includes a block polyether represented by the chemical formula HO—(EO)a—(PO)b—(EO)c—H, wherein EO represents an oxyethylene group, PO represents an oxypropylene group, each of a and c represents the polymerization degree of ethylene oxide, b represents the polymerization degree of propylene oxide, and each of a, b, and c is an integer of 1 or greater; silicon dioxide; a basic compound; at least either one of hydroxyethyl cellulose and polyvinyl alcohol; and water.
    • 本发明涉及一种可优选用于抛光硅晶片的抛光组合物。 抛光组合物包括由化学式HO-(EO)a - (PO)b - (EO) - - (EO) - H,其中EO表示氧化乙烯基,PO表示氧化亚丙基,a和c各自表示环氧乙烷的聚合度,b表示环氧丙烷的聚合度,a,b和c各自为 1或更大; 二氧化硅; 一个基本的化合物; 羟乙基纤维素和聚乙烯醇中的至少一种; 和水。
    • 19. 发明申请
    • Stream decoding system
    • 流解码系统
    • US20050163275A1
    • 2005-07-28
    • US11020042
    • 2004-12-23
    • Shuhei YamadaHideyuki Kakuno
    • Shuhei YamadaHideyuki Kakuno
    • G10L19/00H03M7/30H04L7/08H04L29/06H04L7/00
    • H04L65/607H04L29/06027H04L65/604H04L65/80H04L69/04H04L69/22
    • For a stream input from a signal input section to a synchronization word analysis section, a synchronization word is searched by the synchronization word analysis section and it is confirmed whether or not the analyzed synchronization word matches a pattern of a decodable synchronization word. When a synchronization word is detected, the synchronization word is selectively output to a header analysis section corresponding to the type of the detected synchronization word by decoding system switching section. Then, using analyzed header information, a frame is decoded by the decoding section and output from a signal output section. After the frame is output, the process returns to the synchronization word analysis section and the same processing is performed to each of all frames in the stream.
    • 对于从信号输入部分到同步字分析部分的流输入,由同步字分析部分搜索同步字,并且确认所分析的同步字是否与可解码同步字的模式匹配。 当检测到同步字时,通过解码系统切换部分,同步字被选择性地输出到与检测到的同步字的类型对应的标题分析部分。 然后,使用分析的标题信息,由解码部分解码帧并从信号输出部分输出。 在输出帧之后,处理返回到同步字分析部分,并且对流中的所有帧中的每一帧执行相同的处理。