专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明授权

US06986131B2 Method and apparatus for efficient code generation for modulo scheduled uncounted loops 失效
公开(公告)号：US06986131B2
公开(公告)日：2006-01-10
申请号：US10175375
申请日：2002-06-18
申请人： Carol L. Thompson , Uma Srinivasan , Richard E. Hank , Dale Morris
发明人： Carol L. Thompson , Uma Srinivasan , Richard E. Hank , Dale Morris
IPC分类号： G06F9/45
CPC分类号： G06F9/325 , G06F8/4452 , G06F9/30072 , G06F9/3842
摘要： A method of efficient code generation for modulo scheduled uncounted loops includes: assigning a given stage predicate to each instruction in each stage, including assigning a given stage predicate to each instruction in each speculative stage; and using the stage predicate to conditionally enable or disable the execution of an instruction during the prologue and epilogue execution.

12. 发明授权

US08895962B2 Silicon/germanium nanoparticle inks, laser pyrolysis reactors for the synthesis of nanoparticles and associated methods 有权
标题翻译：硅/锗纳米颗粒油墨，用于合成纳米颗粒的激光热解反应器及相关方法
公开(公告)号：US08895962B2
公开(公告)日：2014-11-25
申请号：US13070286
申请日：2011-03-23
申请人： Shivkumar Chiruvolu , Igor Altman , Bernard M. Frey , Weidong Li , Guojun Liu , Robert B. Lynch , Gina Elizabeth Pengra-Leung , Uma Srinivasan
发明人： Shivkumar Chiruvolu , Igor Altman , Bernard M. Frey , Weidong Li , Guojun Liu , Robert B. Lynch , Gina Elizabeth Pengra-Leung , Uma Srinivasan
IPC分类号： H01L51/40 , C09D7/12 , C09D5/24 , H01L21/02 , C09D7/14 , B82Y30/00 , C09D11/52 , C09D11/101 , B01J19/12 , H01L31/00 , C08K3/08 , C08K3/36 , C08K9/02
CPC分类号： C09D11/38 , B01D21/262 , B01J19/121 , B01J2219/0869 , B01J2219/0871 , B01J2219/0875 , B82Y30/00 , C01B33/02 , C08K3/08 , C08K3/36 , C08K9/02 , C09D5/24 , C09D7/67 , C09D7/68 , C09D7/80 , C09D11/037 , C09D11/101 , C09D11/322 , C09D11/36 , C09D11/52 , H01L21/02532 , H01L21/02573 , H01L21/02579 , H01L21/02581 , H01L21/02601 , H01L21/02628 , H01L23/4828 , H01L23/53276 , H01L31/00 , H01L31/02363 , H01L31/03682 , H01L31/03762 , H01L31/0747 , H01L31/182 , H01L31/1864 , H01L2924/0002 , Y02E10/52 , Y02E10/546 , Y02E10/548 , Y02P70/521 , H01L2924/00
摘要： Laser pyrolysis reactor designs and corresponding reactant inlet nozzles are described to provide desirable particle quenching that is particularly suitable for the synthesis of elemental silicon particles. In particular, the nozzles can have a design to encourage nucleation and quenching with inert gas based on a significant flow of inert gas surrounding the reactant precursor flow and with a large inert entrainment flow effectively surrounding the reactant precursor and quench gas flows. Improved silicon nanoparticle inks are described that has silicon nanoparticles without any surface modification with organic compounds. The silicon ink properties can be engineered for particular printing applications, such as inkjet printing, gravure printing or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon nanoparticles.
摘要翻译：描述了激光热解反应器设计和相应的反应物入口喷嘴，以提供特别适合于合成元素硅颗粒的理想的颗粒淬火。特别地，喷嘴可以具有鼓励成形和淬火的设计，其基于围绕反应物前体流的大量惰性气体，并且具有有效围绕反应物前体和骤冷气体流的大的惰性夹带流动的惰性气体。描述了改进的硅纳米颗粒油墨，其具有不含有机化合物的任何表面改性的硅纳米颗粒。硅油墨性能可以针对特定的印刷应用进行设计，例如喷墨印刷，凹版印刷或丝网印刷。描述适当的处理方法以提供油墨设计的灵活性，而无需对硅纳米颗粒进行表面改性。

13. 发明授权

US08551556B2 Method for obtaining controlled sidewall profile in print-patterned structures 有权
标题翻译：在印刷图案结构中获得受控侧壁轮廓的方法
公开(公告)号：US08551556B2
公开(公告)日：2013-10-08
申请号：US11943453
申请日：2007-11-20
申请人： Eric Shrader , Uma Srinivasan , Clark Crawford , Scott Limb
发明人： Eric Shrader , Uma Srinivasan , Clark Crawford , Scott Limb
IPC分类号： B05D5/12 , B05D5/06 , B05D5/00
CPC分类号： G03F7/2018 , H05K3/0079 , H05K3/108 , H05K3/184 , H05K2203/013 , H05K2203/0577 , H05K2203/0588
摘要： High aspect ratio structures can be obtained by print-patterning masking features in feature stacks such that each feature has a lateral edge which is aligned in a plane roughly perpendicular to the plane of the substrate on which the features are formed. Due to the differential lateral spreading between features formed on a substrate and formed atop other features, the print head is indexed less than the radius of a droplet to a position where a droplet ejected by the print head forms an upper feature atop a lower feature such that the lateral edges of the upper and lower features are aligned in the plane roughly perpendicular to the plane of the substrate. Feature stacks of two or more features may provide a vertical (or re-entrant) sidewall mask for formation of high aspect ratio structures, by e.g., electroplating, etc.
摘要翻译：可以通过在特征堆叠中打印图案化掩模特征来获得高纵横比结构，使得每个特征具有在大致垂直于其上形成有特征的基底的平面的平面中对准的横向边缘。由于形成在基板上并形成在其它特征上的特征之间的差异横向扩展，打印头被折射小于液滴的半径到由打印头喷射的液滴在下部特征顶部形成上部特征的位置，例如上和下特征的侧边缘在大致垂直于基板的平面的平面中对准。两个或更多个特征的特征堆叠可以提供用于形成高纵横比结构的垂直（或重入）侧壁掩模，例如通过电镀等。

14. 发明申请

US20120169820A1 Method for Patterning Using Phase-Change Material 有权
标题翻译：使用相变材料进行图案化的方法
公开(公告)号：US20120169820A1
公开(公告)日：2012-07-05
申请号：US13419351
申请日：2012-03-13
申请人： Scott Limb , Uma Srinivasan
发明人： Scott Limb , Uma Srinivasan
IPC分类号： B41J2/00
CPC分类号： H01L21/0331
摘要： A patterned layer over a wafer is produced by depositing a print-patterned mask structure. Energized particles of a target material are deposited over the wafer and the print-patterned mask such that particles of said target material incident on the mask structure enter the mask structure body and minimally accumulate, if at all, on the surface of the mask structure, and otherwise the particles of target material accumulate as a generally uniform layer over the wafer. The print-patterned mask structure, including particles of target material therein, is removed leaving the generally uniform layer of target material as a patterned layer over the wafer.
摘要翻译：通过沉积印刷图案化的掩模结构来生产晶片上的图案层。目标材料的通电颗粒沉积在晶片和印刷图案化掩模上，使得入射到掩模结构上的所述靶材料的颗粒进入掩模结构体并且最小程度地累积在掩模结构的表面上，否则靶材料的颗粒在晶片上聚集成大致均匀的层。去除其中包括目标材料颗粒的印刷图案掩模结构，留下大致均匀的靶材料层作为晶片上的图案化层。

15. 发明授权

US08136901B2 Method for decimation of images 有权
标题翻译：抽取图像的方法
公开(公告)号：US08136901B2
公开(公告)日：2012-03-20
申请号：US12913825
申请日：2010-10-28
申请人： Uma Srinivasan , Stephen David White
发明人： Uma Srinivasan , Stephen David White
IPC分类号： B41J29/38 , B41J29/393 , G06K9/36 , G06F17/17
CPC分类号： B41J29/38 , G06T3/4023 , H05K3/1241
摘要： In the case of printing at high addressability, where the cell size is smaller than the spot size, an image can be decimated in a manner that will limit the large accumulation of printed material. The proper decimation of the image will depend on the spot size, the physics of drop coalescence and the addressability during printing. A simple method of using concentric decimation is disclosed herein to enable this process.
摘要翻译：在高可寻址性的情况下，其中单元尺寸小于点尺寸，可以以限制印刷材料的大量积累的方式对图像进行抽取。图像的正确抽取将取决于斑点大小，下落聚结的物理学和打印期间的寻址能力。本文公开了一种使用同心抽取的简单方法来实现该过程。

16. 发明授权

US07633629B2 Tuning optical cavities 有权
标题翻译：调谐光腔
公开(公告)号：US07633629B2
公开(公告)日：2009-12-15
申请号：US11702321
申请日：2007-02-05
申请人： Peter Kiesel , Oliver Schmidt , Michael Bassler , Uma Srinivasan
发明人： Peter Kiesel , Oliver Schmidt , Michael Bassler , Uma Srinivasan
IPC分类号： G01B9/02
CPC分类号： G01J3/26 , G01N21/45 , G01N2021/451 , G02B26/001
摘要： A tunable optical cavity can be tuned by relative movement between two reflection surfaces, such as by deforming elastomer spacers connected between mirrors or other light-reflective components that include the reflection surfaces. The optical cavity structure includes an analyte region in its light-transmissive region, and presence of analyte in the analyte region affects output light when the optical cavity is tuned to a set of positions. Electrodes that cause deformation of the spacers can also be used to capacitively sense the distance between them. Control circuitry that provides tuning signals can cause continuous movement across a range of positions, allowing continuous photosensing of analyte-affected output light by a detector.
摘要翻译：可调光学腔可以通过两个反射表面之间的相对运动进行调节，例如通过变形连接在反射镜之间的弹性体隔离物或包括反射表面的其它光反射部件。光腔结构包括其透光区域中的分析物区域，并且当光学腔被调谐到一组位置时，分析物区域中的分析物的存在影响输出光。导致间隔物变形的电极也可用于电容地感测它们之间的距离。提供调谐信号的控制电路可以在一定范围的位置上引起连续的运动，从而允许由检测器对被分析物影响的输出光进行连续光敏。

17. 发明申请

US20090123873A1 Lamination for Printed Photomask 有权
标题翻译：打印光掩膜层压
公开(公告)号：US20090123873A1
公开(公告)日：2009-05-14
申请号：US11938195
申请日：2007-11-09
申请人： Eric Shrader , Uma Srinivasan , Clark Crawford , Scott Limb
发明人： Eric Shrader , Uma Srinivasan , Clark Crawford , Scott Limb
IPC分类号： G03F7/26 , H05K1/02
CPC分类号： H05K3/0082 , H05K3/0023 , H05K3/28 , H05K3/42 , H05K2201/09545 , H05K2203/013 , H05K2203/0191 , H05K2203/0551 , H05K2203/0783
摘要： A method for masking regions of photoresist in the manufacture of a soldermask for printed circuit boards is disclosed. Following application of photoresist over patterned traces on a substrate, a sheet-like thin film is applied over the photosensitive material. The thin film may adhere to the photosensitive material by way of the adhesive state of the photosensitive material or by way of an adhesive applied to the photosensitive material or the thin film or carried by the thin film. Digital mask printing may proceed on the surface of the thin film. The photosensitive material may then be exposed through the printed photomask, the thin film (with photomask) removed, and the photosensitive material developed.
摘要翻译：公开了一种在制造用于印刷电路板的焊接掩模时掩蔽光致抗蚀剂区域的方法。在基板上的图案化迹线上施加光致抗蚀剂之后，将片状薄膜施加在感光材料上。薄膜可以通过感光材料的粘合状态或通过施加到感光材料或薄膜上的粘合剂或由薄膜承载的粘合剂粘附到感光材料上。数字掩模印刷可以在薄膜的表面上进行。然后可以通过印刷的光掩模曝光感光材料，除去薄膜（带有光掩模），并且感光材料显影。

18. 发明申请

US20080244544A1 Using hardware checkpoints to support software based speculation 审中-公开
标题翻译：使用硬件检查点来支持基于软件的猜测
公开(公告)号：US20080244544A1
公开(公告)日：2008-10-02
申请号：US11729724
申请日：2007-03-29
申请人： Naveen Neelakantam , Craig Zilles , Uma Srinivasan , Suresh Srinivas , Ravi Rajwar , Konrad Lai
发明人： Naveen Neelakantam , Craig Zilles , Uma Srinivasan , Suresh Srinivas , Ravi Rajwar , Konrad Lai
IPC分类号： G06F9/45
CPC分类号： G06F8/443
摘要： Hardware checkpoints may be used to mark software-based speculation regions. An instruction may be provided at the beginning of a speculation region and at the end of the speculation region. If an exception occurs during the speculation region, a hardware rollback may be occurred. The hardware rollback rolls back to the instruction at the beginning of the speculation region. The hardware may take a checkpoint by taking a register snapshot and treating future memory updates as tentative. When the instruction marking the end of the speculation is reached, all the tentative memory updates are committed and the previously taken register snapshot is discarded.
摘要翻译：硬件检查点可用于标记基于软件的推测区域。可以在投机区域的开始处和投机区域的末尾提供指令。如果在推测区域发生异常，则可能会发生硬件回滚。硬件回滚回滚到投机区域开头的指令。硬件可以通过注册快照并将未来的内存更新视为暂时性来检查点。当达到臆测结束的指示时，所有暂时的内存更新被提交，并且先前注册的注册快照被丢弃。

19. 发明申请

US20080241712A1 Method and system for patterning a mask layer 有权
标题翻译：图案化掩模层的方法和系统
公开(公告)号：US20080241712A1
公开(公告)日：2008-10-02
申请号：US11731689
申请日：2007-03-30
申请人： Scott Jong Ho Limb , Eric J. Shrader , Uma Srinivasan
发明人： Scott Jong Ho Limb , Eric J. Shrader , Uma Srinivasan
IPC分类号： G03F1/00
CPC分类号： G03F7/2018 , H05K3/0023 , H05K3/0082 , H05K3/28 , H05K2203/0551
摘要： The presently described embodiments use a printing process, e.g. a wax printing technique, to pattern a mask layer (such as a soldermask layer) of, for example, a printed circuit. Substantially all other conventional processes in developing soldermask and exposure processes can be maintained. According to the presently described embodiments, each printed circuit will have a unique pattern that matches uniform and non-uniform runout. In one form, the pattern is comprised of wax single drops having a specified gap to make the process transparent to the current industry practice. Furthermore, the single drops can be used for both large and small areas without any development time differences. In at least one form, the wax pattern and the soldermask in the gap are removed during development.
摘要翻译：目前描述的实施例使用打印过程，例如。蜡印刷技术，用于对例如印刷电路的掩模层（例如焊接掩模层）进行图案化。可以维持开发焊接掩模和曝光工艺中的所有其他常规工艺。根据目前描述的实施例，每个印刷电路将具有匹配均匀和非均匀跳动的独特图案。在一种形式中，图案由具有特定间隙的蜡单滴组成，以使得该过程对于当前行业实践是透明的。此外，单滴可以用于大小区域而没有任何显影时间差。在至少一种形式中，间隙中的蜡图案和焊接掩模在显影期间被去除。

20. 发明申请

US20080186508A1 Tuning optical cavities 有权
标题翻译：调谐光腔
公开(公告)号：US20080186508A1
公开(公告)日：2008-08-07
申请号：US11702321
申请日：2007-02-05
申请人： Peter Kiesel , Oliver Schmidt , Michael Bassler , Uma Srinivasan
发明人： Peter Kiesel , Oliver Schmidt , Michael Bassler , Uma Srinivasan
IPC分类号： G01B9/02
CPC分类号： G01J3/26 , G01N21/45 , G01N2021/451 , G02B26/001
摘要： A tunable optical cavity can be tuned by relative movement between two reflection surfaces, such as by deforming elastomer spacers connected between mirrors or other light-reflective components that include the reflection surfaces. The optical cavity structure includes an analyte region in its light-transmissive region, and presence of analyte in the analyte region affects output light when the optical cavity is tuned to a set of positions. Electrodes that cause deformation of the spacers can also be used to capacitively sense the distance between them. Control circuitry that provides tuning signals can cause continuous movement across a range of positions, allowing continuous photosensing of analyte-affected output light by a detector.
摘要翻译：可调光学腔可以通过两个反射表面之间的相对运动进行调节，例如通过变形连接在反射镜之间的弹性体隔离物或包括反射表面的其它光反射部件。光腔结构包括其透光区域中的分析物区域，并且当光学腔被调谐到一组位置时，分析物区域中的分析物的存在影响输出光。导致间隔物变形的电极也可用于电容地感测它们之间的距离。提供调谐信号的控制电路可以在一定范围的位置上引起连续的运动，从而允许由检测器对被分析物影响的输出光进行持续的光敏。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式