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11. 发明申请

US20070024834A1 Apparatus and process for determination of dynamic scan field curvature 审中-公开
标题翻译：用于确定动态扫描场曲率的装置和过程
公开(公告)号：US20070024834A1
公开(公告)日：2007-02-01
申请号：US11542729
申请日：2006-10-03
申请人： Adlai Smith , Robert Hunter
发明人： Adlai Smith , Robert Hunter
IPC分类号： G03B27/52
CPC分类号： G03F7/70791 , G03F7/70358 , G03F7/70516 , G03F7/706 , G03F7/70641
摘要： A process for the determination of focal plane deviation uniquely due to the scanning dynamics associated with a photolithographic scanner is described. A series of lithographic exposures is performed on a resist coated silicon wafer using a photolithographic scanner. The lithographic exposures produce an array of focusing fiducials that are displaced relative to each other in a unique way. The resulting measurements are fed into a computer algorithm that calculates the dynamic scanning field curvature in an absolute sense in the presence of wafer height variation and other wafer/reticle stage irregularities. The dynamic scan field curvature can be used to improve lithographic modeling, overlay modeling, and advanced process control techniques related to scanner stage dynamics.
摘要翻译：描述了由于与光刻扫描仪相关的扫描动力学而唯一地确定焦平面偏差的过程。使用光刻扫描仪在抗蚀剂涂覆的硅晶片上进行一系列光刻曝光。光刻曝光产生了以独特的方式相对于彼此移位的聚焦基准阵列。所得到的测量值被馈送到计算机算法中，该计算机算法在存在晶片高度变化和其它晶片/标线片级不规则性的情况下以绝对意义计算动态扫描场曲率。动态扫描场曲率可用于改进与扫描仪动态相关的光刻建模，叠加建模和先进的过程控制技术。

12. 发明申请

US20060209410A1 Method and apparatus for compensation or amelioration of lens field curvature and other imaging defects by utilizing a multi-wavelength setting illumination source 审中-公开
标题翻译：通过利用多波长设置照明源补偿或改善透镜视场曲率和其他成像缺陷的方法和装置
公开(公告)号：US20060209410A1
公开(公告)日：2006-09-21
申请号：US11378811
申请日：2006-03-17
申请人： Adlai Smith , Robert Hunter
发明人： Adlai Smith , Robert Hunter
IPC分类号： G02B27/44
CPC分类号： G02B27/0025 , G03F7/70575 , G03F7/706
摘要： Methods and apparatus for correcting imaging defects, particularly focus defects induced by the lens or scan, in a projection imaging tool (PIT) are described. An illumination source is provided that can operate either simultaneously or alternately, at two or more discrete wavelength settings. The repeatable imaging defects of the PIT are measured. The cross field lens chromatic response is characterized at multiple discrete wavelength settings. Then, a compensating arrangement is designed tailored to compensate for the imaging defects and is used in the PIT.
摘要翻译：描述了在投影成像工具（PIT）中校正成像缺陷，特别是由透镜或扫描引起的焦点缺陷的方法和装置。提供可以以两个或更多个离散波长设置同时或交替地操作的照明源。测量PIT的可重复成像缺陷。交叉场透镜色度响应的特征在于多个离散的波长设置。然后，为了补偿成像缺陷而设计一种补偿装置，并在PIT中使用。

13. 发明申请

US20060174734A1 Automatic sizing one-handed locking pliers 有权
标题翻译：自动尺寸单手锁定钳
公开(公告)号：US20060174734A1
公开(公告)日：2006-08-10
申请号：US11052509
申请日：2005-02-07
申请人： Robert Hunter
发明人： Robert Hunter
IPC分类号： B25B7/12
CPC分类号： B25B7/123
摘要： An automatically adjustable locking pliers includes an upper jaw fixed to a handle and lower jaws that pivot about the handle. The lower jaws are connected to a lower tightening handle. A lever connects the tightening handle and upper body. This is the standard structure of locking pliers well known in the industry. The improvement includes a self-adjusting sizing and locking mechanism A thumb jaw sizing lever is located near the jaws and may be moved to open the jaws so that they can be sized around a workpiece. When the thumb jaw lever is released, the jaws automatically size and clamp lightly around the workpiece. The locking mechanism uses metal ball bearings to surround a metal plunger that rests in a tapered metal housing. A spring maintains constant pressure. Locking occurs when the balls wedge between the plunger and the tapered inner walls. A release cylinder is connected to the release paddle to unlock the mechanism. The sizing lever and locking mechanism operate together to automatically size and lock the pliers. An adjusting screw in the lower handle near a pivot point sets the clamping force. Turning the screw adjusts the tension of the pliers for gripping the workpiece.
摘要翻译：可自动调节的锁定钳包括固定在手柄上的上颚和围绕手柄枢转的下颚。下钳口连接到下紧固手柄。杠杆连接紧固手柄和上身。这是业界众所周知的锁紧钳的标准结构。改进包括自调节尺寸和锁定机构拇指钳尺寸杆位于钳口附近，并且可以移动以打开钳口，使得它们可以围绕工件定尺寸。当拇指爪杆被释放时，钳口自动调整大小并夹紧工件。锁定机构使用金属球轴承围绕搁置在锥形金属外壳中的金属柱塞。弹簧保持恒定的压力。当球体在柱塞和锥形内壁之间楔入时发生锁定。释放气缸连接到释放桨以解锁机构。定型杆和锁定机构一起工作，自动调整和锁定钳子。靠近枢轴点的下手柄中的调节螺钉设定夹紧力。转动螺丝可调整钳子夹紧工件的张力。

14. 发明申请

US20050240895A1 Method of emulation of lithographic projection tools 审中-公开
标题翻译：光刻投影工具的仿真方法
公开(公告)号：US20050240895A1
公开(公告)日：2005-10-27
申请号：US11111302
申请日：2005-04-20
申请人： Adlai Smith , Robert Hunter , Joseph Bendik
发明人： Adlai Smith , Robert Hunter , Joseph Bendik
IPC分类号： G03F20060101 , G03F7/20 , G06F17/50 , G06G7/62
CPC分类号： G03F7/705 , G06F17/5009 , G06F2217/10 , G06F2217/86
摘要： Techniques for producing emulations of lithographic tools and processes using virtual wafers and lithographic libraries are described. Emulating a lithographic projection imaging machine includes determining characteristics of the imaging machine, of a reticle used in the imaging machine, and of layer specific processes. Then performing emulation on a virtual wafer using the characteristics of the imaging machine, reticle, and layer specific processes. The machine characteristics determined include characteristics of an exposure source, lens aberration, exit pupil, mechanics, vibration, calibration offsets, or resist. The reticle characteristics determined include distortion, critical dimension, phase transmission error, mask clips, as drawn specifications, or mask sites. And, the layer specific process characteristics include machine model, machine setting identification, and field exposure sequencing. Emulation results can be entered into an optimizer and optimum operating conditions related to the projection imaging machine are determined.
摘要翻译：描述了用于生产使用虚拟晶片和光刻库的光刻工具和工艺仿真的技术。仿真光刻投影成像机包括确定成像机的特征，成像机中使用的掩模版和特定于层的工艺。然后使用成像机，掩模版和层特定工艺的特征在虚拟晶片上进行仿真。所确定的机器特性包括曝光源的特性，透镜像差，出射光瞳，力学，振动，校准偏移或抗蚀剂。确定的掩模版特性包括失真，临界尺寸，相位传输误差，掩模夹，绘图规范或掩模位置。而且，层的具体过程特征包括机器模型，机器设置识别和现场曝光测序。可以将仿真结果输入到优化器中，并且确定与投影成像机相关的最佳操作条件。

15. 发明申请

US20050231705A1 Apparatus and method for high resolution in-situ illumination source measurement in projection imaging systems 有权
标题翻译：投影成像系统中高分辨率原位照明光源测量的装置和方法
公开(公告)号：US20050231705A1
公开(公告)日：2005-10-20
申请号：US10828579
申请日：2004-04-20
申请人： Adlai Smith , Robert Hunter , Bruce McArthur
发明人： Adlai Smith , Robert Hunter , Bruce McArthur
IPC分类号： G03F7/20 , G03B27/72
CPC分类号： G03F7/70133 , G03F7/70091
摘要： An in-situ apparatus for high resolution imaging in lithographic steppers and scanners (machines) is described. It comprises a multiple field in-situ imaging objective that images the source directly onto the machine reticle or objective plane. The image on the wafer side of the machine is then recorded electronically or in photo resist. Alternative embodiments create source images at locations before or beyond the wafer plane that can be more conveniently recorded with sensors embedded in the wafer stage chuck.
摘要翻译：描述了用于光刻步进机和扫描仪（机器）中的高分辨率成像的原位装置。它包括多场原位成像目标，将源直接成像到机器掩模版或物镜平面上。然后以电子方式或光抗蚀剂记录机器晶圆侧的图像。替代实施例在晶片平面之前或之后的位置处创建源图像，其可以利用嵌入在晶片台卡盘中的传感器更方便地记录。

16. 发明申请

US20050111951A1 Linkage assembly restraint 失效
标题翻译：联动装配约束
公开(公告)号：US20050111951A1
公开(公告)日：2005-05-26
申请号：US10705343
申请日：2003-11-10
申请人： Dana Branham , Andy Fowkes , Robert Hunter , Paul Pottschmidt
发明人： Dana Branham , Andy Fowkes , Robert Hunter , Paul Pottschmidt
IPC分类号： B66F9/00 , E02F3/28 , E02F3/34
CPC分类号： E02F3/3411 , E02F3/283 , Y10S414/125
摘要： Work machines having linkages may need to have the linkage assembly locked in a predetermined position to prevent damage to an implement attached to the work machine, to prevent tipping of the work machine, to operate the implement, or other reasons. Locking the linkage assembly, however, can create significant loads on the linkage assembly. The disclosed method and apparatus is for a work machine that comprises a chassis, at least one linkage assembly attached to the work machine, at least one restraint having a first-end portion and a second-end portion, the second-end portion being attached to the chassis and the first-end portion being attached to the linkage assembly, the restraint transferring a load from the linkage assembly to the chassis.
摘要翻译：具有连接的工作机械可能需要将连杆组件锁定在预定位置，以防止对附接到作业机器的工具的损坏，以防止作业机器倾倒，操作工具或其它原因。然而，锁定连杆组件可能在连杆组件上产生显着的负载。所公开的方法和设备是用于工作机器，其包括底盘，附接到作业机器的至少一个连杆组件，至少一个具有第一端部分和第二端部分的限制器，所述第二端部部分被附接并且所述第一端部附接到所述连杆组件，所述约束件将负载从所述连杆组件传递到所述底盘。

17. 发明申请

US20110253060A1 PET SCRATCHING APPARATUSES 审中-公开
标题翻译： PET切割装置
公开(公告)号：US20110253060A1
公开(公告)日：2011-10-20
申请号：US13088388
申请日：2011-04-17
申请人： Randy Schotthoefer , Robert Hunter
发明人： Randy Schotthoefer , Robert Hunter
IPC分类号： A01K13/00 , A01K15/02
CPC分类号： A01K15/024
摘要： A pet scratching apparatus including a base defining a top face and a scratching element extending vertically from the top face of the base, the scratching element including an internal member the top face of the base and defining an exterior surface and a scratchable sleeve removably mounted on the exterior surface of the internal member. In some examples, the pet scratching apparatus includes two bases. In some further examples, the pet scratching apparatus includes a connection system.
摘要翻译：一种宠物刮擦装置，包括限定顶面的基部和从基部的顶面垂直延伸的划痕元件，所述划痕元件包括内部构件，所述内部构件位于基部的顶面并且限定外表面和可移除地安装在其上的可刮擦套管内部构件的外表面。在一些示例中，宠物划痕装置包括两个基座。在一些其它示例中，宠物划痕装置包括连接系统。

18. 发明申请

US20100229651A1 COINTEGRATED MEMS SENSOR AND METHOD 有权
标题翻译：组合MEMS传感器和方法
公开(公告)号：US20100229651A1
公开(公告)日：2010-09-16
申请号：US12404792
申请日：2009-03-16
申请人： Peter Seesink , Horst Obermeier , Omar Abed , Dan Rodriguez , Robert Hunter , Calin Miclaus
发明人： Peter Seesink , Horst Obermeier , Omar Abed , Dan Rodriguez , Robert Hunter , Calin Miclaus
IPC分类号： G01L7/08 , H01L29/84 , H01L21/30
CPC分类号： B81C1/00246 , B81B2207/015
摘要： Described herein is a method for integrating MEMS with submicron semiconductor electrical circuits such as CMOS to provide more complex signal processing, on-chip calibration and integration with RF technologies. A MEMS sensor is provided having an upper layer, an insulating layer into which a cavity has been formed and a handle layer. The upper layer acts as both the substrate of the semiconductor electrical circuit and as the active MEMS element. The remainder of the circuitry is fabricated either in or on the upper layer. In a preferred method of the present invention a first wafer assembly and a second wafer assembly are fabricated such that a MEMS sensor and the substrate of at least one semiconductive electrical circuit is formed.
摘要翻译：这里描述的是将MEMS与亚微米半导体电路如CMOS集成的方法，以提供更复杂的信号处理，片上校准和与RF技术的集成。提供了一种MEMS传感器，其具有上层，已经形成空腔的绝缘层和手柄层。上层用作半导体电路的基板和作为有源MEMS元件。电路的其余部分被制造在上层中或上层。在本发明的优选方法中，制造第一晶片组件和第二晶片组件，使得形成MEMS传感器和至少一个半导体电路的衬底。

19. 发明申请

US20070206168A1 Systems And Methods For Determination of Focus And Telecentricity, Amelioration of Metrology Induced Effects And Application to Determination Of Precision Bossung Curves 有权
标题翻译：用于确定焦点和远心性的系统和方法，改进计量感应效应和应用于确定精密滚动曲线
公开(公告)号：US20070206168A1
公开(公告)日：2007-09-06
申请号：US11676959
申请日：2007-02-20
申请人： Adlai Smith , Robert Hunter
发明人： Adlai Smith , Robert Hunter
IPC分类号： G03B27/68
CPC分类号： G03F9/7023 , G03B27/68 , G03F7/70083 , G03F7/70191 , G03F7/705 , G03F7/70633 , G03F7/70641
摘要： An apparatus and method for the simultaneous determination of focus and source boresighting error for photolithographic steppers and scanners is described. A reticle containing custom arrays of box-in-box test structures specifically designed for performing source or exit pupil division using an aperture plate is exposed onto a resist coated wafer several times. The resulting exposure patterns are measured with a conventional overlay tool. The overlay data is processed with a slope-shift algorithm for the simultaneous determination of both focus and source telecentricity as a function of field position. Additionally, methods for ameliorating metrology induced effects and methods for producing precision Bossung curves are also described. This Abstract is provided for the sole purpose of complying with the Abstract requirement rules, it shall not be used to interpret or to limit the scope or the meaning of the claims.
摘要翻译：描述了用于光刻步进机和扫描仪同时确定焦距和光源瞄准误差的装置和方法。包含专门设计用于使用孔板执行光源或出射光瞳划分的盒装盒测试结构的定制阵列的掩模版被暴露在抗蚀剂涂覆的晶片上多次。所得到的曝光图案用传统的覆盖工具测量。覆盖数据用斜率移位算法处理，用于同时确定作为场位置的函数的焦点和源远心。此外，还描述了用于改善计量学诱导效应的方法和用于产生精确Bossung曲线的方法。本摘要仅用于遵守抽象要求规则，不得用于解释或限制权利要求的范围或含义。

20. 发明申请

US20070142437A1 CHEMICAL COMPOUNDS 审中-公开
标题翻译：化学化合物
公开(公告)号：US20070142437A1
公开(公告)日：2007-06-21
申请号：US11670498
申请日：2007-02-02
申请人： Matthew Brown , Mui Cheung , Scott Dickerson , Cassandra Gauthier , Philip Harris , Robert Hunter , Gregory Pacofsky , Michael Peel , Jeffrey Stafford
发明人： Matthew Brown , Mui Cheung , Scott Dickerson , Cassandra Gauthier , Philip Harris , Robert Hunter , Gregory Pacofsky , Michael Peel , Jeffrey Stafford
IPC分类号： A61K31/4439 , A61K31/427 , A61K31/423 , C07D413/02 , C07D417/02
CPC分类号： C07D263/48 , C07D413/04 , C07D413/10 , C07D413/12 , C07D413/14 , C07D417/10 , C07D417/12 , C07D417/14
摘要： Oxazole derivatives, which are useful as VEGFR2, CDK2, and CDK4 inhibitors are described herein. The described invention also includes methods of making such oxazole derivatives as well as methods of using the same in the treatment of hyperproliferative diseases.
摘要翻译：本文描述了可用作VEGFR2，CDK2和CDK4抑制剂的恶唑衍生物。所述的发明还包括制备这种恶唑衍生物的方法以及使用它们在治疗过度增殖性疾病中的方法。

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