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    • 19. 发明授权
    • Giant magnetoresistance (GMR) read head with reactive-ion-etch defined read width and fabrication process
    • 具有反应离子蚀刻定义的读宽度和制造工艺的巨磁电阻(GMR)读头
    • US06989971B2
    • 2006-01-24
    • US10118407
    • 2002-04-05
    • Tsann LinDaniele Mauri
    • Tsann LinDaniele Mauri
    • G11B5/39
    • B82Y25/00B82Y10/00G11B5/3116G11B5/3903G11B2005/3996Y10T29/49039Y10T29/49043Y10T29/49044Y10T29/49046Y10T29/49052
    • The GMR read head includes a GMR read sensor and a longitudinal bias (LB) stack in a read region, and the GMR read sensor, the LB stack and a first conductor layer in two overlay regions. In its fabrication process, the GMR read sensor, the LB stack and the first conductor layer are sequentially deposited on a bottom gap layer. A monolayer photoresist is deposited, exposed and developed in order to open a read trench region for the definition of a read width, and RIE is then applied to remove the first conductor layer in the read trench region. After liftoff of the monolayer photoresist, bilayer photoresists are deposited, exposed and developed in order to mask the read and overlay regions, and a second conductor layer is deposited in two unmasked side regions. As a result, side reading is eliminated and a read width is sharply defined by RIE.
    • GMR读取头包括读取区域中的GMR读取传感器和纵向偏置(LB)堆栈,并且GMR读取传感器,LB堆叠和两个覆盖区域中的第一导体层。 在其制造过程中,GMR读取传感器,LB叠层和第一导体层依次沉积在底部间隙层上。 沉积,曝光和显影单层光致抗蚀剂以便打开用于定义读取宽度的读取沟槽区域,然后施加RIE以去除读取沟槽区域中的第一导体层。 在剥离单层光致抗蚀剂之后,将双层光致抗蚀剂沉积,曝光和显影以掩盖读取和覆盖区域,并且将第二导体层沉积在两个未掩模的侧面区域中。 结果,消除了侧读,并且通过RIE清晰地定义了读宽度。