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11. 发明授权

US08408158B2 Coating/developing device and method 有权
标题翻译：涂层/显影装置及方法
公开(公告)号：US08408158B2
公开(公告)日：2013-04-02
申请号：US11276662
申请日：2006-03-09
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： B05C11/10 , G03D15/02 , G03D5/04
CPC分类号： H01L21/67742 , G03F7/162 , H01L21/6715 , H01L21/67173 , H01L21/67178
摘要： A coating/developing device includes a processing block having a plurality of coating unit blocks stacked and a developing unit block stacked on the coating unit blocks. Each of the unit blocks is provided with a liquid processing unit for coating a liquid chemical on a substrate, a heating unit for heating the substrate, a cooling unit for cooling the substrate and a transfer unit for transferring the substrate between the units. The liquid processing unit is provided with a coating unit for coating a resist liquid on the substrate, a first bottom antireflection coating (BARC) forming unit for coating a liquid chemical for a BARC on the substrate before the resist liquid is coated thereon, and a second BARC forming unit for coating a liquid chemical for the BARC on the substrate after the resist liquid is coated thereon.
摘要翻译：涂覆/显影装置包括具有堆叠的多个涂布单元块的处理块和堆叠在涂布单元块上的显影单元块。每个单元块设置有用于在基板上涂覆液体化学品的液体处理单元，用于加热基板的加热单元，用于冷却基板的冷却单元和用于在单元之间转移基板的转移单元。液体处理单元设置有用于在基板上涂覆抗蚀剂液体的涂布单元，在其上涂覆抗蚀剂液体之前，在基板上涂布用于BARC的液体化学品的第一底部抗反射涂层（BARC）形成单元，以及第二BARC形成单元，用于在其上涂覆抗蚀剂液体之后，在基板上涂覆用于BARC的液体化学品。

12. 发明授权

US08302556B2 Coating and developing apparatus 有权
标题翻译：涂装显影装置
公开(公告)号：US08302556B2
公开(公告)日：2012-11-06
申请号：US12855534
申请日：2010-08-12
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： B05C5/02 , B05C11/02
CPC分类号： H01L21/67184 , H01L21/67173 , H01L21/67178 , H01L21/67207 , H01L21/67745
摘要： Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks. Unit blocks for application which a wafer goes through are determined depending on the layering positional relationship between an antireflective film and a resist film. An exposed wafer goes only through the unit block for development without going through any one of the unit blocks for application.
摘要翻译：提供一种由多个单元块组成的涂层显影装置。第一单位块堆叠和第二单位块堆叠被布置在相对于前后方向的不同位置。用于显影的单元块，每个包括多个处理单元，包括执行曝光之后的显影处理的显影单元和在处理单元之间传送基板的转印装置布置在最下层。用于应用或涂布的单元块包括多个处理单元，其包括在曝光之前进行施加处理的涂覆单元和在处理单元之间传送基板的转印装置，布置在用于显影的单位块上方。用于应用的单元块被布置在第一和第二单元块堆叠中。根据防反射膜和抗蚀剂膜之间的层叠位置关系确定晶片通过的应用单元块。暴露的晶片仅通过单元块进行开发，而不经过用于应用的单元块中的任何一个。

13. 发明授权

US07841072B2 Apparatus and method of application and development 失效
标题翻译：仪器和应用与开发方法
公开(公告)号：US07841072B2
公开(公告)日：2010-11-30
申请号：US11384323
申请日：2006-03-21
申请人： Nobuaki Matsuoka , Shinichi Hayashi , Yasushi Hayashida , Yoshitaka Hara
发明人： Nobuaki Matsuoka , Shinichi Hayashi , Yasushi Hayashida , Yoshitaka Hara
IPC分类号： B23P19/00 , B05C13/00 , B05C13/02 , B05C11/00
CPC分类号： H01L21/6715 , H01L21/67225 , Y10T29/49004 , Y10T29/49126 , Y10T29/49155 , Y10T29/53174 , Y10T29/53187 , Y10T29/532
摘要： Disclosed herein is a development apparatus having a plurality of coating units and a development process unit stacked on each other in a layered direction in a process block which is connected at the rear side of the carrier block. A first transportation unit, which ascends and descends in the layered direction, is provided in the carrier block. Also, in the carrier block, the bottom of a substrate inspection unit is located above a highest position to which the first transportation unit is able to ascend in the layered direction.
摘要翻译：这里公开了一种显影装置，其具有多个涂布单元和显影处理单元，该印刷单元和显影处理单元在连接在载体块的后侧的处理块中在层叠方向上堆叠。载体块中设置有沿分层方向上升和下降的第一输送单元。此外，在载体块中，基板检查单元的底部位于第一输送单元能够在分层方向上能够上升的最高位置的上方。

14. 发明授权

US07403260B2 Coating and developing system 有权
标题翻译：涂装和开发系统
公开(公告)号：US07403260B2
公开(公告)日：2008-07-22
申请号：US11156571
申请日：2005-06-21
申请人： Nobuaki Matsuoka , Shinichi Hayashi , Yasushi Hayashida
发明人： Nobuaki Matsuoka , Shinichi Hayashi , Yasushi Hayashida
IPC分类号： G03B27/52 , G03D5/00
CPC分类号： H01L21/67178 , H01L21/67745
摘要： The coating and developing system carries a substrate delivered to a carrier handling block to a processing block to form a film on the substrate by a coating block included in the processing block, carries the substrate through an interface block to the exposure system, processes the substrate having the exposed film by a developing process by a developing block included in the processing block and returns the thus processed substrate to the carrier handling block. A direct carrying means is superposed on the coating block and the developing block to carry a substrate having a surface coated with a film from the carrier handling block directly to the interface block. A test substrate can be carried to the exposure system to inspect the condition of the exposure system even in a state where the coating block and the developing block are under maintenance work.
摘要翻译：涂覆和显影系统将传送到载体处理块的基底运送到处理块，以通过包含在处理块中的涂层在基板上形成膜，将基板通过界面块运送到曝光系统，处理基板通过由处理块中包含的显影块通过显影处理使曝光的胶片具有曝光的胶片，并将这样处理的基材返回到载体处理块。直接承载装置重叠在涂层块和显影块上，以将载体处理块上具有涂覆有表面的表面的基底直接运送至界面块。即使在涂布块和显影块处于维护工作的状态下，也可以将测试基板运送到曝光系统以检查曝光系统的状况。

15. 发明授权

US07241061B2 Coating and developing system and coating and developing method 有权
标题翻译：涂层开发系统及涂层开发方法
公开(公告)号：US07241061B2
公开(公告)日：2007-07-10
申请号：US11336990
申请日：2006-01-23
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： G03D5/00
CPC分类号： H01L21/6715 , H01L21/00 , H01L21/67178 , H01L21/67184 , H01L21/6719
摘要： A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system is capable of coping with either of a case where antireflection films are formed and a case where any antireflection film is not formed and needs simple software. Film forming unit blocks, namely, a TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks, namely, DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a simple carrying program and simple software.
摘要翻译：涂覆显影系统包括：抗蚀剂膜形成单元块和层叠的抗反射膜形成单元块，以形成抗蚀剂膜和抗反射膜下面的抗反射膜以及在小空间中覆盖抗蚀剂膜的抗反射膜。涂层显影系统能够应对形成防反射膜的情况和没有形成任何抗反射膜的情况，并且需要简单的软件。成膜单位块，即TCT层B 3，COT层B 4和BCT层B 5以及显影单元块，即DEV层B 1和B 2，层叠在处理块S 2。在形成防反射膜的情况下，选择性地使用TCT层B 3，COT层B 4和BCT层B 5以及未形成任何抗反射膜的情况。涂层和显影系统由简单的携带程序和简单的软件控制。

16. 发明申请

US20060201616A1 Coating and developing system 有权
公开(公告)号：US20060201616A1
公开(公告)日：2006-09-14
申请号：US11373118
申请日：2006-03-13
申请人： Nobuaki Matsuoka , Shinichi Hayashi , Yasushi Hayashida
发明人： Nobuaki Matsuoka , Shinichi Hayashi , Yasushi Hayashida
IPC分类号： B32B37/00
CPC分类号： H01L21/67178 , G03F7/162 , G03F7/3021 , G03F7/7075 , G03F7/70758 , H01L21/6715 , H01L21/67173 , H01L21/67745
摘要： A coating and developing system is constructed so as to enable the maintenance of an exposure system combined therewith at desired time. The coating and developing system carries a substrate delivered to a carrier handling block to a processing block to form a film on the substrate by a coating block included in the processing block, carries the substrate through an interface block to the exposure system, processes the substrate having the exposed film by a developing process by a developing block included in the processing block and returns the thus processed substrate to the carrier handling block. A direct carrying means is superposed on the coating block and the developing block to carry a substrate having a surface coated with a film from the carrier handling block directly to the interface block. A test substrate can be carried to the exposure system to inspect the condition of the exposure system even in a state where the coating block and the developing block are under maintenance work.

17. 发明申请

US20060165408A1 Coating and developing apparatus and coating and developing method 有权
标题翻译：涂装开发设备及涂层开发方法
公开(公告)号：US20060165408A1
公开(公告)日：2006-07-27
申请号：US11239403
申请日：2005-09-30
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka
IPC分类号： G03D11/00
CPC分类号： H01L21/67276 , H01L21/67173 , H01L21/67178 , H01L21/67754
摘要： A coating and developing apparatus comprises a process block which forms a resist film on a wafer, then transfers the wafer to an exposure apparatus, and performs a developing process on the wafer after exposure, and an interface transfer mechanism provided between the process block and the exposure apparatus. The process block includes unit blocks for coating-film formation and unit blocks for development laid out in a stacked manner. When an abnormality occurs in the interface transfer mechanism, an ordinary process in the unit block for coating-film formation is performed on those substrates which are present in that unit block for coating-film formation, after which processed wafers are retreated to a retaining unit and transfer of any wafer into the unit block for coating-film formation is inhibited.
摘要翻译：涂层显影装置包括在晶片上形成抗蚀剂膜的处理块，然后将晶片转移到曝光装置，并且在曝光后对晶片进行显影处理，以及设置在处理块和曝光装置处理块包括用于涂膜形成的单元块和以堆叠方式布置的用于显影的单元块。当在界面转移机构发生异常时，在用于涂膜形成的单元块中存在的那些基板上进行用于涂膜形成的单元块中的常规工艺，之后将处理的晶片退回到保持单元并且将任何晶片转移到用于涂膜形成的单元块中被抑制。

18. 发明授权

US08863373B2 Apparatus and method of application and development 有权
标题翻译：仪器和应用与开发方法
公开(公告)号：US08863373B2
公开(公告)日：2014-10-21
申请号：US12909191
申请日：2010-10-21
申请人： Nobuaki Matsuoka , Shinichi Hayashi , Yasushi Hayashida , Yoshitaka Hara
发明人： Nobuaki Matsuoka , Shinichi Hayashi , Yasushi Hayashida , Yoshitaka Hara
IPC分类号： B23P19/00 , H05K3/36 , H05K3/10 , H01L21/67
CPC分类号： H01L21/6715 , H01L21/67225 , Y10T29/49004 , Y10T29/49126 , Y10T29/49155 , Y10T29/53174 , Y10T29/53187 , Y10T29/532
摘要： An application and development apparatus has a plurality of vertically stacked blocks directed to coating film formation on a substrate. This plurality of blocks includes first processing units, a first substrate transportation region, and a first transportation unit for transporting substrates between the first processing units within the first transportation region. A development process block also is vertically stacked with the blocks directed to coating film formation to constitute a layered block as the process block. The development process block also includes second processing units and a second transportation unit for transporting substrates between the second processing units within the second transportation region. The application and development apparatus further has a shelf-type delivery stage group, a vertical transportation unit and a substrate inspection unit such that a substrate input into the inspection unit passes through the delivery stage group from the vertical transportation unit.
摘要翻译：应用和显影装置具有多个垂直堆叠的块，用于在基底上形成涂膜。该多个块包括第一处理单元，第一基板输送区域和用于在第一输送区域内的第一处理单元之间输送基板的第一输送单元。显影处理块也被垂直堆叠，其中块被指向涂膜形成以构成作为处理块的分层块。显影处理块还包括第二处理单元和用于在第二输送区域内的第二处理单元之间输送基板的第二输送单元。应用和开发设备还具有搁板式传送台组，垂直传送单元和基板检查单元，使得输入到检查单元的基板从垂直传送单元通过传送台组。

19. 发明申请

US20100326353A1 COATING AND DEVELOPING APPARATUS 审中-公开
公开(公告)号：US20100326353A1
公开(公告)日：2010-12-30
申请号：US12855524
申请日：2010-08-12
申请人： Masami AKIMOTO , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami AKIMOTO , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： B05C9/12
CPC分类号： H01L21/67184 , H01L21/67173 , H01L21/67178 , H01L21/67207 , H01L21/67745
摘要： Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks. Unit blocks for application which a wafer goes through are determined depending on the layering positional relationship between an antireflective film and a resist film. An exposed wafer goes only through the unit block for development without going through any one of the unit blocks for application.

20. 发明授权

US07793609B2 Coating and developing apparatus 有权
标题翻译：涂装显影装置
公开(公告)号：US07793609B2
公开(公告)日：2010-09-14
申请号：US11342616
申请日：2006-01-31
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： B05C5/02
CPC分类号： H01L21/67184 , H01L21/67173 , H01L21/67178 , H01L21/67207 , H01L21/67745
摘要： Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks. Unit blocks for application which a wafer goes through are determined depending on the layering positional relationship between an antireflective film and a resist film. An exposed wafer goes only through the unit block for development without going through any one of the unit blocks for application.
摘要翻译：提供一种由多个单元块组成的涂层显影装置。第一单位块堆叠和第二单位块堆叠被布置在相对于前后方向的不同位置。用于显影的单元块，每个包括多个处理单元，包括执行曝光之后的显影处理的显影单元和在处理单元之间传送基板的转印装置布置在最下层。用于应用或涂布的单元块包括多个处理单元，其包括在曝光之前进行施加处理的涂布单元和在处理单元之间传送基板的转印装置，布置在用于显影的单位块上方。用于应用的单元块被布置在第一和第二单元块堆叠中。根据防反射膜和抗蚀剂膜之间的层叠位置关系确定晶片通过的应用单元块。暴露的晶片仅通过单元块进行开发，而不经过用于应用的单元块中的任何一个。

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