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    • 11. 发明申请
    • Embedded semiconductor device and method of manufacturing an embedded semiconductor device
    • 嵌入式半导体器件及其制造方法
    • US20090065845A1
    • 2009-03-12
    • US12230938
    • 2008-09-08
    • Young-Ho KimHee-Seog JeonYong-Kyu Lee
    • Young-Ho KimHee-Seog JeonYong-Kyu Lee
    • H01L27/115H01L21/8247
    • H01L27/11526H01L27/105H01L27/115H01L27/11529H01L29/665H01L29/7833
    • Provided are an embedded semiconductor device and a method of manufacturing an embedded semiconductor device. In a method of manufacturing the embedded semiconductor device, layers of at least one cell gate stack may be formed in a cell area of a substrate. A logic gate structure may be formed in a logic area of the substrate. First source/drain regions may be formed adjacent to the logic gate structure, and metal silicide patterns may be formed on the logic gate structure and the first source/drain regions. At least one hard mask may be formed on the layers of the at least one cell gate stack, and a blocking pattern may be formed to cover the logic gate structure and the first source/drain regions. The at least one cell gate stack may be formed in the cell area by etching the layers of the at least one cell gate stack using the at least one hard mask as an etching mask. A memory transistor in the cell area may have an increased integration degree and a logic transistor in the logic area may have an increased response speed and a decreased resistance.
    • 提供了嵌入式半导体器件和制造嵌入式半导体器件的方法。 在制造嵌入式半导体器件的方法中,可以在衬底的单元区域中形成至少一个单元栅极堆叠的层。 逻辑门结构可以形成在衬底的逻辑区域中。 可以在逻辑门结构附近形成第一源极/漏极区,并且可以在逻辑门结构和第一源极/漏极区上形成金属硅化物图案。 可以在至少一个单元栅极堆叠的层上形成至少一个硬掩模,并且可以形成阻挡图案以覆盖逻辑门结构和第一源极/漏极区域。 可以通过使用至少一个硬掩模作为蚀刻掩模来蚀刻至少一个单元栅极堆叠的层而在单元区域中形成至少一个单元栅极堆叠。 单元区域中的存储晶体管可以具有增加的积分度,并且逻辑区域中的逻辑晶体管可以具有增加的响应速度和降低的电阻。