会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 13. 发明授权
    • Method of identifying logical information in a programming and erasing cell by on-side reading scheme
    • 通过旁路读取方案识别编程和擦除单元中的逻辑信息的方法
    • US07773430B2
    • 2010-08-10
    • US12314881
    • 2008-12-18
    • Chao-I WuMing-Hsiu LeeTzu-Hsuan Hsu
    • Chao-I WuMing-Hsiu LeeTzu-Hsuan Hsu
    • G11C11/34
    • G11C16/0475
    • A method of identifying logical information in a cell, particularly in a programming by hot hole injection nitride electron storage (PHINES) cell by one-side reading scheme is disclosed. The method comprise steps of: erasing the first region and the second region of PHINES cell by increasing a local threshold voltage (Vt) to a certain value; programming at least one of the first region and the second region of the PHINES cell by hot hole injection; and reading a logical state of the PHINES cell by measuring an output current of one of the first region and the second region; wherein different quantity of the output current is caused by interaction between different quantity of the hot hole stored in the first region and the second region, so as to determine the logical state of the PHINES cell by one-side reading scheme.
    • 公开了一种识别单元中的逻辑信息的方法,特别是在通过单孔读取方案通过热空穴注入氮化物电子存储(PHINES)单元编程中的方法。 该方法包括以下步骤:通过将局部阈值电压(Vt)增加到一定值来擦除PHINES单元的第一区域和第二区域; 通过热空穴注入来编程PHINES单元的第一区域和第二区域中的至少一个; 以及通过测量所述第一区域和所述第二区域之一的输出电流来读取所述PHINES单元的逻辑状态; 其中,通过存储在第一区域和第二区域中的不同量的热孔之间的相互作用引起不同量的输出电流,以便通过单面读取方案确定PHINES单元的逻辑状态。
    • 15. 发明授权
    • Memory cell and method for manufacturing the same
    • 存储单元及其制造方法
    • US07342264B2
    • 2008-03-11
    • US11302738
    • 2005-12-13
    • Tzu-Hsuan HsuChao-I WuMing-Hsiu Lee
    • Tzu-Hsuan HsuChao-I WuMing-Hsiu Lee
    • H01L29/80H01L29/76
    • H01L21/28282H01L29/4234H01L29/66833H01L29/7851H01L29/7853H01L29/7923
    • The invention is directed to a memory cell on a substrate having a plurality of shallow trench isolations form therein, wherein top surfaces of the shallow trench isolations are lower than a top surface of the substrate and the shallow trench isolations together define a vertical fin structure of the substrate. The memory cell comprises a straddle gate, a carrier trapping structure and at least two source/drain regions. The straddle gate is located on the substrate and straddles over the vertical fin structure. The carrier trapping structure is located between the straddle gate and the substrate, wherein the carrier trapping structure comprises a trapping layer directly in contact with the straddle gate and a tunnel layer located between the trapping layer and the substrate. The source/drain regions are located in a portion of the vertical fin structure of the substrate exposed by the straddle gate.
    • 本发明涉及在其上形成有多个浅沟槽隔离物的衬底上的存储单元,其中浅沟槽隔离物的顶表面低于衬底的顶表面,并且浅沟槽隔离件一起限定垂直鳍状结构 底物。 存储单元包括跨门,载流子俘获结构和至少两个源/漏区。 跨门位于基板上,跨越垂直翅片结构。 载体捕获结构位于跨门和衬底之间,其中载流子俘获结构包括直接与跨骑门接触的捕获层和位于俘获层和基底之间的隧道层。 源极/漏极区域位于由跨门暴露的衬底的垂直鳍结构的一部分中。
    • 16. 发明申请
    • Memory cell and method for manufacturing the same
    • 存储单元及其制造方法
    • US20070132000A1
    • 2007-06-14
    • US11302738
    • 2005-12-13
    • Tzu-Hsuan HsuChao-I WuMing-Hsiu Lee
    • Tzu-Hsuan HsuChao-I WuMing-Hsiu Lee
    • H01L29/788
    • H01L21/28282H01L29/4234H01L29/66833H01L29/7851H01L29/7853H01L29/7923
    • The invention is directed to a memory cell on a substrate having a plurality of shallow trench isolations form therein, wherein top surfaces of the shallow trench isolations are lower than a top surface of the substrate and the shallow trench isolations together define a vertical fin structure of the substrate. The memory cell comprises a straddle gate, a carrier trapping structure and at least two source/drain regions. The straddle gate is located on the substrate and straddles over the vertical fin structure. The carrier trapping structure is located between the straddle gate and the substrate, wherein the carrier trapping structure comprises a trapping layer directly in contact with the straddle gate and a tunnel layer located between the trapping layer and the substrate. The source/drain regions are located in a portion of the vertical fin structure of the substrate exposed by the straddle gate.
    • 本发明涉及在其上形成有多个浅沟槽隔离物的衬底上的存储单元,其中浅沟槽隔离物的顶表面低于衬底的顶表面,并且浅沟槽隔离件一起限定垂直鳍状结构 底物。 存储单元包括跨门,载流子俘获结构和至少两个源/漏区。 跨门位于基板上,跨越垂直翅片结构。 载体捕获结构位于跨门和衬底之间,其中载流子俘获结构包括直接与跨骑门接触的捕获层和位于俘获层和基底之间的隧道层。 源极/漏极区域位于由跨门暴露的衬底的垂直鳍结构的一部分中。
    • 19. 发明授权
    • Programming method for controlling memory threshold voltage distribution
    • 用于控制存储器阈值电压分布的编程方法
    • US07085168B2
    • 2006-08-01
    • US11026799
    • 2004-12-30
    • Ming-Hsiu LeeChao-I WuTzu-Hsuan Hsu
    • Ming-Hsiu LeeChao-I WuTzu-Hsuan Hsu
    • G11C16/34
    • G11C11/5671G11C16/0475G11C16/12G11C16/3459G11C16/3481
    • A method for programming one or more memory cells is disclosed. The one or more memory cells need to be two sides operated. After verifying both sides of each memory cell to identify the sides of the memory cells to be programmed, a programming voltage pulse is given to the first sides of the memory cells identified to be programmed. Another verification process is performed for both sides of each memory cell to identify the sides of the memory cells to be programmed. Next, a programming voltage pulse is given to the second sides of the memory cells identified to be programmed. The verifying both sides, programming the first sides, verifying both sides, and programming the second sides will continue until the both sides of each memory cell are programmed to a target programming voltage. The target programming voltage might have multiple voltage levels.
    • 公开了一种用于编程一个或多个存储器单元的方法。 一个或多个存储单元需要是双面操作的。 在验证每个存储器单元的两侧以识别待编程的存储器单元的侧面之后,向被识别为被编程的存储器单元的第一侧提供编程电压脉冲。 对每个存储单元的两侧执行另一个验证过程,以识别待编程的存储器单元的侧面。 接下来,将编程电压脉冲提供给被识别为被编程的存储器单元的第二侧。 验证两侧,编程第一面,验证双面,并对第二面进行编程将一直持续到每个存储单元的两侧都编程为目标编程电压。 目标编程电压可能有多个电压电平。
    • 20. 发明申请
    • Method of identifying logical information in a programming and erasing cell by on-side reading scheme
    • 通过旁路读取方案识别编程和擦除单元中的逻辑信息的方法
    • US20050286312A1
    • 2005-12-29
    • US10873623
    • 2004-06-23
    • Chao-I WuMing-Hsiu LeeTzu-Hsuan Hsu
    • Chao-I WuMing-Hsiu LeeTzu-Hsuan Hsu
    • G11C16/04H01L21/8247
    • G11C16/0475
    • A method of identifying logical information in a cell, particularly in a programming by hot hole injection nitride electron storage (PHINES) cell by one-side reading scheme is disclosed. The method comprise steps of: erasing the first region and the second region of PHINES cell by increasing a local threshold voltage (Vt) to a certain value; programming at least one of the first region and the second region of the PHINES cell by hot hole injection; and reading a logical state of the PHINES cell by measuring an output current of one of the first region and the second region; wherein different quantity of the output current is caused by interaction between different quantity of the hot hole stored in the first region and the second region, so as to determine the logical state of the PHINES cell by one-side reading scheme.
    • 公开了一种识别单元中的逻辑信息的方法,特别是在通过单孔读取方案通过热空穴注入氮化物电子存储(PHINES)单元编程中的方法。 该方法包括以下步骤:通过将局部阈值电压(Vt)增加到一定值来擦除PHINES单元的第一区域和第二区域; 通过热空穴注入来编程PHINES单元的第一区域和第二区域中的至少一个; 以及通过测量所述第一区域和所述第二区域之一的输出电流来读取所述PHINES单元的逻辑状态; 其中,通过存储在第一区域和第二区域中的不同量的热孔之间的相互作用引起不同量的输出电流,以便通过单面读取方案确定PHINES单元的逻辑状态。