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    • 13. 发明授权
    • Resin composition, filling material, insulating layer and semiconductor device
    • 树脂组合物,填充材料,绝缘层和半导体器件
    • US07999354B2
    • 2011-08-16
    • US12664003
    • 2008-06-11
    • Toyosei TakahashiRie TakayamaHirohisa DejimaJunya Kusunoki
    • Toyosei TakahashiRie TakayamaHirohisa DejimaJunya Kusunoki
    • H01L29/40
    • C08L63/10H01L21/76898H01L23/481H01L2224/02372H01L2224/0401H01L2224/05548H01L2224/06181H01L2224/13022H01L2224/13024H01L2224/131Y10T428/24273H01L2924/014
    • A resin composition of the present invention is used for forming a filling material which fills at least a through-hole of a semiconductor substrate, the through-hole extending through the semiconductor substrate in a thickness direction thereof and having a conductive portion therein. The resin composition is composed of: a resin having a radical-polymerizable double bond, a thermosetting resin and a resin which differs from the resin having the radical-polymerizable double bond and has an alkali-soluble group and a double bond; or a cyclic olefin resin. A filling material of the present invention is formed of a cured product of the above resin composition. An insulating layer of the present invention is formed of a cured product of the above resin composition. The insulating layer includes: a layer-shaped insulating portion provided on a surface opposite to a functional surface of the semiconductor substrate; and a filling portion integrally formed with the insulating portion and filling the through-hole. A semiconductor device of the present invention includes the above insulating layer.
    • 本发明的树脂组合物用于形成填充半导体衬底的至少通孔的填充材料,所述通孔在其厚度方向上延伸穿过半导体衬底并且在其中具有导电部分。 树脂组合物由具有自由基聚合性双键的树脂,热固性树脂和树脂组成,该树脂与具有自由基聚合双键的具有碱溶性基团和双键的树脂不同; 或环状烯烃树脂。 本发明的填充材料由上述树脂组合物的固化物形成。 本发明的绝缘层由上述树脂组合物的固化物形成。 绝缘层包括:设置在与半导体衬底的功能表面相对的表面上的层状绝缘部分; 以及与所述绝缘部一体形成并填充所述通孔的填充部。 本发明的半导体器件包括上述绝缘层。