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    • 12. 发明授权
    • Heat treatment apparatus
    • 热处理设备
    • US06518547B2
    • 2003-02-11
    • US09788086
    • 2001-02-16
    • Mitsukazu TakahashiHideo NishiharaYoshio Ito
    • Mitsukazu TakahashiHideo NishiharaYoshio Ito
    • F27B514
    • H01L21/67115H05B3/0047
    • A substrate heat treatment apparatus irradiating a substrate such as a semiconductor wafer with light and performing heat treatment is provided. 19 lamps 82 are arranged on a plane in the form of a honeycomb to form a lamp group 81. The lamp group 81 has 6-fold rotation symmetry about a symmetry axis XR. A substrate W is rotated about a rotation axis XW in a plane parallel to that formed by the lamp group 81. The symmetry axis XR of the lamp group 81 and the rotation axis XW of the substrate W are displaced for relaxing peaks and bottoms of illuminance distribution on the substrate W resulting from regularity of arrangement of the lamp group 81. Consequently, fluctuation of radial illuminance distribution on the substrate W is reduced and improving uniformity is improved. When the uniformity of radial illuminance distribution on the substrate W is improved, temperature uniformity of the substrate W in heat treatment can be ensured.
    • 提供了用光照射诸如半导体晶片的基板并进行热处理的基板热处理设备。 19个灯82布置在蜂窝形式的平面上以形成灯组81.灯组81围绕对称轴XR具有6倍的旋转对称性。 基板W在与灯组81形成的平面平行的平面内绕旋转轴线XW旋转。灯组81的对称轴XR和基板W的旋转轴XW移位,以放宽照度的峰值和底部 由于灯组81的布置的规则性而导致的基板W上的分布。因此,基板W上的径向照度分布的波动减小,并且提高了均匀性。 当基板W上的径向照度分布的均匀性提高时,能够确保热处理时的基板W的温度均匀性。
    • 14. 发明授权
    • Process for treating a copper-beryllium alloy
    • 处理铜 - 铍合金的方法
    • US6059905A
    • 2000-05-09
    • US412834
    • 1995-03-29
    • Sam FriedmanSherwood GoldsteinYoshio Ito
    • Sam FriedmanSherwood GoldsteinYoshio Ito
    • C22C9/06C22F1/08
    • C22F1/08C22C9/06
    • A treatment process is provided for a copper-beryllium alloy comprising from about 0.2% to about 0.7% beryllium, no greater than 3.5% of cobalt and/or nickel, no greater than 0.5% of titanium and/or zirconium and at least 90% copper, wherein the alloy has been cold worked to a ready-to-finish gauge, comprising the steps of annealing the cold worked ready-to-finish gauge copper-beryllium alloy at a temperature from about 1500.degree. F. to about 1685.degree. F., cold working the annealed copper-beryllium alloy to reduce its gauge to a range of from about 20% to about 60%, and age hardening the copper-beryllium alloy at a temperature of from about 700.degree. F. to about 950.degree. F. for about 1 to about 7 hours. The alloy is characterized by satisfactory levels of strength and electrical conductivity as well as enhanced levels of formability, particularly in the direction parallel to the direction of rolling the alloy.
    • 提供了一种铜 - 铍合金的处理方法,其包括约0.2%至约0.7%的铍,不超过3.5%的钴和/或镍,不超过0.5%的钛和/或锆和至少90% 铜,其中所述合金已经被冷加工成即将完成的规格,包括以下步骤:在约1500°F至约1685°F的温度下退火冷加工的即刻即刻即将完成的铜 - 铍合金 对退火的铜 - 铍合金进行冷加工,将其规格减小到约20%至约60%的范围,并且将铜 - 铍合金在约700°F至约950°F的温度下老化硬化 约1至约7小时。 该合金的特征在于强度和导电性能达到令人满意的水平,并且特别是在平行于合金的滚动方向的方向上的增强的成形性水平。
    • 15. 发明授权
    • Paper slip storage unit
    • 纸张存放单元
    • US5769412A
    • 1998-06-23
    • US702577
    • 1996-09-03
    • Takatoshi TakemotoYoshio ItoMotohiro Sugawara
    • Takatoshi TakemotoYoshio ItoMotohiro Sugawara
    • B65H29/70B65H31/36
    • B65H29/70B65H31/36B65H2301/42146B65H2404/1114B65H2701/1912
    • A first shaft 21 and a second shaft 31 parallel with each other are provided near an inlet 14 of a bill storage chamber 10. Taking-in runners 20 are disposed on the first shaft 21 and taking-in rollers 30 are disposed on the second shaft 31. The taking-in runners 20 and the taking-in rollers 30 differ in position in a direction in which the shafts extend. Further, the sum of the radius of each taking-in runner 20 and that of each taking-in roller 30 is larger than the spacing between the first shaft 21 and the second shaft 31. Thus, if a plurality of overlapped bills are caught in the space between the taking-in runners 20 and the taking-in rollers 30, they are bent in a wavy form and the intimate contact force between the bill is lowered significantly, causing the bills to be easily aligned.
    • PCT No.PCT / JP95 / 00346 Sec。 371日期1996年9月3日 102(e)日期1996年9月3日PCT 1995年3月3日PCT PCT。 WO95 / 23757 PCT出版物 日期1995年9月8日在纸币收纳室10的入口14附近设置有彼此平行的第一轴21和第二轴31。在第一轴21上设置有吸入流道20, 设置在第二轴31上。引入滑轮20和插入辊30在轴延伸的方向上的位置不同。 此外,每个吸入流道20的半径和每个吸入辊30的半径的总和大于第一轴21和第二轴31之间的间隔。因此,如果多个重叠的纸币被卡住 吸引用跑步器20和插入辊30之间的空间被弯曲成波浪形,并且纸币之间的紧密接触力显着降低,导致纸币容易对齐。
    • 17. 发明授权
    • Recording apparatus capable of precisely positioning a recording sheet
    • 能够精确定位记录纸的记录装置
    • US4614950A
    • 1986-09-30
    • US654105
    • 1984-09-24
    • Yoshio Ito
    • Yoshio Ito
    • B41J2/325B41J13/26G01D15/10
    • G01D15/10B41J13/26B41J2/325
    • A heat transfer recording apparatus comprises rotatable means for winding a recording sheet thereon, a transfer sheet having a layer of heat transfer material, guide means for winding the transfer sheet on the outer peripheral surface of the rotatable means with tension and guiding the recording sheet so that it is held by and between the rotatable means and the transfer sheet, means for applying heat to the transfer sheet wound on the rotatable means on the basis of recording information and effecting transfer recording on the recording sheet, and drive means for rotating the rotatable means in forward direction to cause recording to be effected by the recording means and rotating the rotatable means in reverse direction to discharge the recorded recording sheet.
    • 传热记录装置包括用于在其上卷绕记录纸的可旋转装置,具有传热材料层的转印纸,用于将转印纸张紧并转印到可旋转装置的外周表面上并引导记录纸的引导装置 其被可旋转装置和转印纸之间保持并且在可转动装置和转印纸之间保持,用于根据记录信息和在记录纸上进行转印记录对卷绕在可旋转装置上的转印纸施加热量的装置,以及用于使可旋转 意味着向前方向,由记录装置进行记录,并使可旋转装置反向旋转以排出记录的记录纸。
    • 19. 发明授权
    • Dry developing mechanism
    • 干发展机制
    • US4004714A
    • 1977-01-25
    • US549768
    • 1975-02-13
    • Yoshio ItoTadayuki KitajimaYoshikuni Touyama
    • Yoshio ItoTadayuki KitajimaYoshikuni Touyama
    • G01F23/22G03G15/08G03G21/10B67D5/22
    • G03G15/0856
    • A dry developing apparatus equipped with a developer amount detector, includes a container in which the developer is contained, a rotational member for agitating or carrying the developer, a support for supporting the rotational member in such a way that the rotational member, when rotated, is displaceable axially under the force of the load resistance produced by the presence of the developer, a holder for holding the rotational member so as to cause the member to return in the direction opposite to the direction of the displacement when the lead resistance is lessened with decrease of the developer, and a detector for detecting the difference in the amount of the axial displacement of the rotational member.
    • 装有显影剂量检测器的干燥显影装置包括容纳显影剂的容器,用于搅拌或携带显影剂的旋转构件,用于支撑旋转构件的支撑件,使得旋转构件在旋转时, 在由显影剂的存在产生的负载阻力的作用下轴向移动,用于保持旋转构件的保持器,以便当引线电阻减小时使构件沿与位移方向相反的方向返回, 显影剂的减少,以及用于检测旋转构件的轴向位移量的差异的检测器。