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11. 发明授权

US07284230B2 System for search and analysis of systematic defects in integrated circuits 有权
标题翻译：集成电路系统缺陷的搜索和分析系统
公开(公告)号：US07284230B2
公开(公告)日：2007-10-16
申请号：US10605849
申请日：2003-10-30
申请人： Bette L. Bergman Reuter , David L. DeMaris , Mark A. Lavin , William C. Leipold , Daniel N. Maynard , Maharaj Mukherjee
发明人： Bette L. Bergman Reuter , David L. DeMaris , Mark A. Lavin , William C. Leipold , Daniel N. Maynard , Maharaj Mukherjee
IPC分类号： G06F17/50
CPC分类号： G06T7/001 , G06T2207/30148
摘要： Disclosed is a method of locating systematic defects in integrated circuits. Extracting and index processing of a circuit design and feature searching are performed. During extracting and index processing, a window grid for the circuit design is established and basis patterns are merged with shapes within each. Shapes in each window are transformed into feature vectors by finding intersections between basis patterns and shapes. Feature vectors are clustered to produce an index of feature vectors. During feature searching, a defect region window of the circuit layout is identified and basis patterns are merged with shapes in the defect region window. Shapes in the defect region window are transformed into defect vectors by finding intersections between basis patterns and shapes. Feature vectors similar to the defect vector are found using representative feature vectors from the index of feature vectors. Similarities and differences between defect vectors and feature vectors are analyzed.
摘要翻译：公开了一种定位集成电路系统缺陷的方法。执行电路设计和特征搜索的提取和索引处理。在提取和索引处理期间，建立了用于电路设计的窗口网格，并且将基本图案与每个窗体中的形状合并。通过查找基础图案和形状之间的交点，将每个窗口中的形状转换为特征向量。将特征向量聚类以产生特征向量的索引。在特征搜索期间，识别电路布局的缺陷区域窗口，并将基本图案与缺陷区域窗口中的形状合并。通过发现基础图案和形状之间的交点，将缺陷区域窗口中的形状转换为缺陷向量。使用来自特征向量索引的代表特征向量，找到与缺陷向量相似的特征向量。分析缺陷向量和特征向量之间的相似性和差异性。

12. 发明授权

US07127699B2 Method for optimizing a number of kernels used in a sum of coherent sources for optical proximity correction in an optical microlithography process 有权
标题翻译：用于优化在光学微光刻工艺中用于光学邻近校正的相干光源之和中使用的多个内核的方法
公开(公告)号：US07127699B2
公开(公告)日：2006-10-24
申请号：US10737626
申请日：2003-12-16
申请人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan Edward Rosenbluth , Shlomo Shlafman
发明人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan Edward Rosenbluth , Shlomo Shlafman
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： A method is provided for optimizing the number of kernels N used in a sum of coherent sources (SOCS) for optical proximity correction in an optical microlithography process, including setting the number of kernels N to a predetermined minimum value Nmin, where a determination is made as to whether an accuracy estimate of calculated intensity is within a tolerable value, and a determination is also made as to whether an added X/Y asymmetry estimate of the calculated intensity is negligible.
摘要翻译：提供一种用于优化在光学微光刻工艺中用于光学邻近校正的相干源（SOCS）之和中使用的内核数N的方法，包括将内核数N设置为预定的最小值Nmin，其中进行确定关于计算强度的精度估计是否在容许值内，并且还确定所计算的强度的添加的X / Y不对称估计是否可忽略。

13. 发明授权

US07043712B2 Method for adaptive segment refinement in optical proximity correction 失效
标题翻译：光学邻近校正中自适应细分精细化的方法
公开(公告)号：US07043712B2
公开(公告)日：2006-05-09
申请号：US10605102
申请日：2003-09-09
申请人： Maharaj Mukherjee , Zachary Baum , Mark A. Lavin , Donald J. Samuels , Rama N. Singh
发明人： Maharaj Mukherjee , Zachary Baum , Mark A. Lavin , Donald J. Samuels , Rama N. Singh
IPC分类号： G06F17/50
CPC分类号： G03F1/36 , G06F17/5081
摘要： A method of designing lithographic masks is provided where mask segments used in a model-based optical proximity correction (MBOPC) scheme are adaptively refined based on local image information, such as image intensity, gradient and curvature. The values of intensity, gradient and curvature are evaluated locally at predetermined evaluation points associated with each segment. An estimate of the image intensity between the local evaluation points is preferably obtained by curve fitting based only on values at the evaluation points. The decision to refine a segment is based on the deviation of the simulated image threshold contour from the target image threshold contour. The output mask layout will provide an image having improved fit to the target image, without a significant increase in computation cost.
摘要翻译：提供一种设计光刻掩模的方法，其中基于模型的光学邻近校正（MBOPC）方案中使用的掩模段基于局部图像信息（诸如图像强度，梯度和曲率）自适应地进行改进。在与每个片段相关联的预定评估点处本地评估强度，梯度和曲率的值。优选通过仅基于评价点的值的曲线拟合来获得局部评价点之间的图像强度的估计。细化段的决定是基于模拟图像阈值轮廓与目标图像阈值轮廓的偏差。输出掩模布局将提供对目标图像具有改进拟合的图像，而不显着增加计算成本。

14. 发明申请

US20090180711A1 RENDERING A MASK USING COARSE MASK REPRESENTATION 有权
标题翻译：使用粗糙表示渲染一个掩码
公开(公告)号：US20090180711A1
公开(公告)日：2009-07-16
申请号：US12015084
申请日：2008-01-16
申请人： Mark A. Lavin , Maharaj Mukherjee , Alan E. Rosenbluth
发明人： Mark A. Lavin , Maharaj Mukherjee , Alan E. Rosenbluth
IPC分类号： G06K9/36
CPC分类号： G03F7/705 , G03F1/36
摘要： A method, system and computer program product for rendering a mask are disclosed. A method of rendering a mask may comprise: providing an initial mask design for a photolithographic process, the initial mask design including polygons; initially rendering the initial mask design as a coarse mask representation in a pixel based image calculation; identifying an overhang portion; and rendering the overhang portion using a set of subpixels whose artifacts from spatial-localization lie outside a practical resolution of a pseudo lens having a numerical aperture larger than that of a projection lens used in the photolithographic process; and updating the initial rendering based on the overhang portion rendering.
摘要翻译：公开了一种用于渲染掩模的方法，系统和计算机程序产品。渲染掩模的方法可以包括：提供用于光刻工艺的初始掩模设计，初始掩模设计包括多边形; 最初在基于像素的图像计算中将初始掩模设计呈现为粗糙掩模表示; 识别突出部分; 并且使用一组子空间渲染悬伸部分，其中来自空间定位的伪像位于具有大于在光刻工艺中使用的投影透镜的数值孔径的假透镜的实际分辨率之外; 并基于突出部分呈现来更新初始呈现。

15. 发明授权

US07366342B2 Simultaneous computation of multiple points on one or multiple cut lines 有权
标题翻译：在一条或多条切割线上同时计算多个点
公开(公告)号：US07366342B2
公开(公告)日：2008-04-29
申请号：US10694299
申请日：2003-10-27
申请人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
发明人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
IPC分类号： G06K9/00
CPC分类号： G03F1/36
摘要： Methods, and program storage devices, for performing model-based optical proximity correction by providing a region of interest (ROI) having an interaction distance and locating at least one polygon within the ROI. A cut line of sample points representative of a set of vertices, or plurality of cut lines, are generated within the ROI across at least one lateral edge of the polygon(s). An angular position, and first and second portions of the cut line residing on opposing sides of an intersection between the cut line and the lateral edge of the polygon are determined, followed by generating a new ROI by extending the original ROI beyond its interaction distance based on such angular position, and first and second portions of the cut line. In this manner, a variety of new ROIs may be generated, in a variety of different directions, to ultimately correct for optical proximity.
摘要翻译：方法和程序存储设备，用于通过提供具有交互距离的感兴趣区域（ROI）和定位ROI内的至少一个多边形来执行基于模型的光学邻近度校正。在多边形的至少一个侧边缘上，在ROI内产生代表一组顶点或多个切割线的采样点的切割线。确定角位置，并且切割线的切割线的第一和第二部分位于切割线和多边形的侧边缘之间的交叉点的相对侧上，随后通过将原始ROI延伸超过其相互作用距离来生成新的ROI 在这种角度位置上，以及切割线的第一和第二部分。以这种方式，可以在各种不同的方向上产生各种新的ROI，以最终校正光学邻近度。

16. 发明授权

US07287239B2 Performance in model-based OPC engine utilizing efficient polygon pinning method 有权
标题翻译：在基于模型的OPC引擎中使用高效多边形钉扎方法的性能
公开(公告)号：US07287239B2
公开(公告)日：2007-10-23
申请号：US10694473
申请日：2003-10-27
申请人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
发明人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： Methods, and a program storage device for executing such methods, for performing model-based optical proximity correction by providing a mask matrix having a region of interest (ROI) and locating a plurality of points of interest within the mask matrix. A first polygon having a number of vertices representative of the located points of interest is computed, followed by determining a spatial relation between its vertices and the ROI. The vertices of the first polygon are then pinned to boundaries of and within the ROI such that a second polygon is formed on the ROI. The process is repeated for all vertices of the first polygon such that the second polygon is collapsed onto the ROI. This collapsed second polygon is then used to correct for optical proximity.
摘要翻译：方法和用于执行这种方法的程序存储装置，用于通过提供具有感兴趣区域（ROI）的掩模矩阵并且在掩模矩阵内定位多个感兴趣点来执行基于模型的光学邻近校正。计算具有代表所述定位的兴趣点的顶点数的第一多边形，然后确定其顶点和ROI之间的空间关系。然后将第一多边形的顶点固定在ROI的边界和内部，使得在ROI上形成第二多边形。对第一多边形的所有顶点重复该过程，使得第二多边形折叠到ROI上。然后使用这个折叠的第二个多边形来校正光学接近度。

17. 发明授权

US07055126B2 Renesting interaction map into design for efficient long range calculations 失效
标题翻译：将交互图重新设计成有效的长距离计算
公开(公告)号：US07055126B2
公开(公告)日：2006-05-30
申请号：US10694339
申请日：2003-10-27
申请人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
发明人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
IPC分类号： G06F17/50
CPC分类号： G03F1/36 , G03F1/68 , G06F17/5068
摘要： Methods, and program storage devices, for performing model-based optical lithography corrections by partitioning a cell array layout, having a plurality of polygons thereon, into a plurality of cells covering the layout. This layout is representative of a desired design data hierarchy. A density map is then generated corresponding to interactions between the polygons and plurality of cells, and then the densities within each cell are convolved. An interaction map is formed using the convolved densities, followed by truncating the interaction map to form a map of truncated cells. Substantially identical groupings of the truncated cells are then segregated respectively into differing ones of a plurality of buckets, whereby each of these buckets comprise a single set of identical groupings of truncated cells. A hierarchal arrangement is generated using these buckets, and the desired design data hierarchy enforced using the hierarchal arrangement to ultimately correct for optical lithography.
摘要翻译：方法和程序存储装置，用于通过将具有多个多边形的单元阵列布局划分成覆盖布局的多个单元来执行基于模型的光学光刻校正。该布局代表了所需的设计数据层次结构。然后根据多边形与多个单元之间的相互作用产生密度图，然后卷积每个单元内的密度。使用卷积密度形成交互图，然后截断交互图以形成截断单元格的图。截短的细胞的基本相同的分组然后分别分离成多个桶中的不同的桶，由此这些桶中的每一个都包含一组相同的截断细胞组。使用这些存储桶生成层次排列，并且使用层级排列来强制执行所需的设计数据层级，以最终校正光学光刻。

18. 发明授权

US07434196B2 Renesting interaction map into design for efficient long range calculations 有权
标题翻译：将交互图重新设计成有效的长距离计算
公开(公告)号：US07434196B2
公开(公告)日：2008-10-07
申请号：US11242723
申请日：2005-10-03
申请人： Gregg M Gallatin , Emanuel Gofman , Kafai Lai , Mark A Lavin , Maharaj Mukherjee , Dov Ramm , Alan E Rosenbluth , Shlomo Shlafman
发明人： Gregg M Gallatin , Emanuel Gofman , Kafai Lai , Mark A Lavin , Maharaj Mukherjee , Dov Ramm , Alan E Rosenbluth , Shlomo Shlafman
IPC分类号： G06F17/50
CPC分类号： G03F1/36 , G03F1/68 , G06F17/5068
摘要： Methods, and program storage devices, for performing model-based optical lithography corrections by partitioning a cell array layout, having a plurality of polygons thereon, into a plurality of cells covering the layout. This layout is representative of a desired design data hierarchy. A density map is then generated corresponding to interactions between the polygons and plurality of cells, and then the densities within each cell are convolved. An interaction map is formed using the convolved densities, followed by truncating the interaction map to form a map of truncated cells. Substantially identical groupings of the truncated cells are then segregated respectively into differing ones of a plurality of buckets, whereby each of these buckets comprise a single set of identical groupings of truncated cells. A hierarchical arrangement is generated using these buckets, and the desired design data hierarchy enforced using the hierarchical arrangement to ultimately correct for optical lithography.
摘要翻译：方法和程序存储装置，用于通过将具有多个多边形的单元阵列布局划分成覆盖布局的多个单元来执行基于模型的光学光刻校正。该布局代表了所需的设计数据层次结构。然后根据多边形与多个单元之间的相互作用产生密度图，然后卷积每个单元内的密度。使用卷积密度形成交互图，然后截断交互图以形成截断单元格的图。截短的细胞的基本相同的分组然后分别分离成多个桶中的不同的桶，由此这些桶中的每一个都包含一组相同的截断细胞组。使用这些桶生成分层布置，并且使用分层布置强制执行所需的设计数据层级以最终校正光刻。

19. 发明授权

US07343271B2 Incorporation of a phase map into fast model-based optical proximity correction simulation kernels to account for near and mid-range flare 有权
标题翻译：将相位图并入基于快速模型的光学邻近校正模拟内核，以解决近距离和中等范围的闪光
公开(公告)号：US07343271B2
公开(公告)日：2008-03-11
申请号：US10694465
申请日：2003-10-27
申请人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
发明人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan E. Rosenbluth , Shlomo Shlafman
IPC分类号： G06F7/60 , G06F17/50 , G06F19/00 , G06K9/00
CPC分类号： G03F7/70441 , G03F1/36 , G03F1/70 , G03F7/705
摘要： A first method to compute a phase map within an optical proximity correction simulation kernel utilizes simulated wavefront information from randomly generated data. A second method uses measured data from optical tools. A phase map is created by analytically embedding a randomly generated two-dimensional array of complex numbers of wavefront information, and performing an inverse Fourier Transform on the resultant array. A filtering function requires the amplitude of each element of the array to be multiplied by a Gaussian function. A power law is then applied to the array. The elements of the array are shuffled, and converted from the phasor form to real/imaginary form. A two-dimensional Fast Fourier Transform is applied. The array is then unshuffled, and converted back to phasor form.
摘要翻译：计算光学邻近校正模拟核心内的相位图的第一种方法利用来自随机产生的数据的模拟波阵面信息。第二种方法使用来自光学工具的测量数据。通过分析地嵌入复数数目的波阵面信息的随机生成的二维阵列并在所得到的阵列上执行逆傅里叶变换来创建相位图。滤波函数要求阵列的每个元素的幅度乘以高斯函数。然后将幂律应用于阵列。数组的元素被洗牌，并从相量形式转换为实数/虚数形式。应用二维快速傅立叶变换。然后数组被清洗，并转换回到相量形式。

20. 发明授权

US08073288B2 Rendering a mask using coarse mask representation 有权
标题翻译：使用粗糙掩码表示渲染掩模
公开(公告)号：US08073288B2
公开(公告)日：2011-12-06
申请号：US12015084
申请日：2008-01-16
申请人： Mark A. Lavin , Maharaj Mukherjee , Alan E. Rosenbluth
发明人： Mark A. Lavin , Maharaj Mukherjee , Alan E. Rosenbluth
IPC分类号： G06K9/20
CPC分类号： G03F7/705 , G03F1/36
摘要： A method, system and computer program product for rendering a mask are disclosed. A method of rendering a mask may comprise: providing an initial mask design for a photolithographic process, the initial mask design including polygons; initially rendering the initial mask design as a coarse mask representation in a pixel based image calculation; identifying an overhang portion; and rendering the overhang portion using a set of subpixels whose artifacts from spatial-localization lie outside a practical resolution of a pseudo lens having a numerical aperture larger than that of a projection lens used in the photolithographic process; and updating the initial rendering based on the overhang portion rendering.
摘要翻译：公开了一种用于渲染掩模的方法，系统和计算机程序产品。渲染掩模的方法可以包括：提供用于光刻工艺的初始掩模设计，初始掩模设计包括多边形; 最初在基于像素的图像计算中将初始掩模设计呈现为粗糙掩模表示; 识别突出部分; 并且使用一组子空间渲染悬伸部分，其中来自空间定位的伪像位于具有大于在光刻工艺中使用的投影透镜的数值孔径的假透镜的实际分辨率之外; 并基于突出部分呈现来更新初始呈现。

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